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Influence of Ar/N_2 Flow Rate on Structure and Property for TaN/NbN Multilayered Coatings 被引量:2
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作者 Xuehua ZHANG Yuanbin KANG Sipeng LIU Qiang LI Ying YANG Xiangyun DENG Dejun LI 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2007年第4期461-464,共4页
TaN/NbN multilayered coatings with nanoscale bilayer periods were synthesized at different Ar/N2 flow rates by RF (radio frequency) magnetron sputtering. XRD (X-ray diffraction) and Nano Indenter System were emplo... TaN/NbN multilayered coatings with nanoscale bilayer periods were synthesized at different Ar/N2 flow rates by RF (radio frequency) magnetron sputtering. XRD (X-ray diffraction) and Nano Indenter System were employed to investigate the influence of Ar/N2 flow rate (FAr:FN2) on microstructure and mechanical properties of the coatings. The low-angle XRD pattern indicated a well-defined composition modulation and layer structure of the multilayered coating. All multilayered coatings almost revealed higher hardness than the rule-of-mixtures value of monolithic TaN and NbN coatings. At FAr:FN2=10, the multilayered coating possessed desirable hardness, elastic modulus, internal stress, and fracture resistance, compared with ones synthesized at other Ar/N2 flow rates. The layered structure with strong mixture of TaN (110), (111), (200) and Nb2N (101)textures should be related to the enhanced mechanical properties. 展开更多
关键词 RF magnetron sputtering TaN/nbn multilayered coatings Nanoscale mechnical properties
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Deposition of TiN/TiAlN multilayers by plasma-activated EB-PVD:tailored microstructure by jumping beam technology 被引量:5
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作者 Guo-Yuan Yang Hui Peng +1 位作者 Hong-Bo Guo Sheng-Kai Gong 《Rare Metals》 SCIE EI CAS CSCD 2017年第8期651-658,共8页
Plasma-activated electron beam-physical vapor deposition(EB-PVD)was used for depositing nitride multilayer coatings in this work.Different from the conventional coating methods,the multilayers were obtained by manip... Plasma-activated electron beam-physical vapor deposition(EB-PVD)was used for depositing nitride multilayer coatings in this work.Different from the conventional coating methods,the multilayers were obtained by manipulating electron beam(EB)to jump between two different evaporation sources alternately with variable frequencies(jumping beam technology).The plasma activation was generated by a hollow cathode plasma unit.The deposition process was demonstrated by means of tailoring TiN/TiAlN multilayers with different modulation periods(M1:26.5 nm,M2:80.0 nm,M3:6.0 nm,M4:4.0 nm).The microstructure and hardness of the multilayer coatings were comparatively studied with TiN and TiAlN singlelayer coatings.The columnar structure of the coatings(TiN,TiAlN,M1,M2)is replaced by a glassy-like microstructure when the modulation period decreases to less than 10 nm(M3,M4).Simultaneously,superlattice growth occurs.With the decrease of modulation period,both the hardness and the plastic deformation resistance(H^3/E^2,H-hardness and E-elastic modulus)increase.M4coating exhibits the maximum hardness of(49.6±2.7)GPa and the maximum plastic deformation resistance of^0.74 GPa. 展开更多
关键词 Nano-multilayer coatings SUPERLATTICE Plasmaactivation tin/TiAlN EB-PVD Hardness
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Mechanical Properties of Polycrystalline TiN/TaN Multilayers
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作者 W.H.Soe and R.Yamamoto(Institute of Industrial Science, University of Tokyo, 7-22-1 Roppongi, Minato-ku, Tokyo 106, Japan ) 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 1997年第4期245-248,共4页
Polycrystalline TiN/TaN multilayers were grown by reactive magnetron sputtering on WC-Co sintered hard alloy Substrates. Multilayer structure and composition modulation amplitudes were studied using X-ray diffraction ... Polycrystalline TiN/TaN multilayers were grown by reactive magnetron sputtering on WC-Co sintered hard alloy Substrates. Multilayer structure and composition modulation amplitudes were studied using X-ray diffraction method. Hardness and elastic modulus were measured by nanoindentation tester. For A>8.0 nm, hardness is lower than rule-of mixtures value of individual single layer, and increased rapidly with decreasing A, peaking at hardness values≈33% higher than that at A=4.3 nm. As a result of analysing the inclination of applied load for indenter displacement on P-h curve (△P/△h), this paper exhibits that the enhancement of the resistance to dislocation motion and elastic anomaly due to coherency strains are responsibie for the hardness change 展开更多
关键词 TAN Mechanical Properties of Polycrystalline tin/TaN multilayers tin nm
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TiN/NbN纳米多层薄膜的交变应力场和超硬效应 被引量:6
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作者 赖倩茜 虞晓江 +2 位作者 戴嘉维 李戈扬 宁兆元 《真空科学与技术》 CSCD 北大核心 2002年第4期313-316,共4页
为了研究纳米多层薄膜的超硬效应 ,采用反应溅射法制备从 1 4nm至 2 7nm不同调制周期的一系列TiN/NbN纳米多层膜。高分辨电子显微镜对薄膜的调制结构和界面生长方式的观察发现 ,TiN/NbN膜具有很好的调制结构 ,并呈现以面心立方晶体结构... 为了研究纳米多层薄膜的超硬效应 ,采用反应溅射法制备从 1 4nm至 2 7nm不同调制周期的一系列TiN/NbN纳米多层膜。高分辨电子显微镜对薄膜的调制结构和界面生长方式的观察发现 ,TiN/NbN膜具有很好的调制结构 ,并呈现以面心立方晶体结构穿过调制界面外延生长的多晶超晶格结构特征。显微硬度测量表明 ,TiN/NbN纳米多层膜存在随调制周期变化的超硬效应。薄膜在调制周期为 8 3nm时达到HK39 0GPa的最高硬度。分析认为 ,两种不同晶格常数的晶体外延生长形成的交变应力场 ,对材料有强化作用 。 展开更多
关键词 纳米多层薄膜 超硬效应 tin/nbn超晶格薄膜 调制结构 超硬度 交变应力场 氮化钛 氮化铌
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TiN/NbN纳米多层膜的微结构与超硬度效应 被引量:4
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作者 李戈扬 赖倩茜 +1 位作者 虞晓江 顾明元 《上海交通大学学报》 EI CAS CSCD 北大核心 2002年第5期730-732,共3页
采用反应溅射法制备了一系列不同调制周期的 Ti N/Nb N纳米多层膜 ,并使用 X射线衍射分析 ( XRD)、透射电子显微镜 ( TEM)和显微硬度计表征了薄膜的调制结构、界面结构和显微硬度 .结果表明 :Ti N/Nb N多层膜具有周期性良好的调制结构 ... 采用反应溅射法制备了一系列不同调制周期的 Ti N/Nb N纳米多层膜 ,并使用 X射线衍射分析 ( XRD)、透射电子显微镜 ( TEM)和显微硬度计表征了薄膜的调制结构、界面结构和显微硬度 .结果表明 :Ti N/Nb N多层膜具有周期性良好的调制结构 ,调制界面清晰、平直 ;薄膜呈现为多晶外延生长的面心立方结构 ;薄膜硬度出现异常升高的超硬度效应 ,并在调制周期为 8.3nm左右达到硬度峰值 ( HK  3 9.0  GPa) 展开更多
关键词 tin/nbn纳米多层膜 调制结构 超硬度效应
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Effects of surface roughness of substrate on properties of Ti/TiN/Zr/ZrN multilayer coatings 被引量:9
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作者 林松盛 周克崧 +6 位作者 代明江 胡芳 石倩 侯惠君 韦春贝 李福球 佟鑫 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2015年第2期451-456,共6页
Ti/TiN/Zr/ZrN multilayer coatings were deposited on Cr_17Ni_2 steel substrates with different surface roughnesses by vacuum cathodic arc deposition method. Microstructure, micro-hardness, adhesion strength and cross-s... Ti/TiN/Zr/ZrN multilayer coatings were deposited on Cr_17Ni_2 steel substrates with different surface roughnesses by vacuum cathodic arc deposition method. Microstructure, micro-hardness, adhesion strength and cross-sectional morphology of the obtained multilayer coatings were investigated. The results show that the Vickers hardness of Ti/TiN/Zr/ZrN multilayer coating, with a film thickness of 11.37 μm, is 29.36 GPa. The erosion and salt spray resistance performance of Cr_17Ni_2 steel substrates can be evidently improved by Ti/TiN/Zr/ZrN multilayer coating. The surface roughness of Cr_17Ni_2 steel substrates plays an important role in determining the mechanical and erosion performances of Ti/TiN/Zr/ZrN multilayer coatings. Overall, a low value of the surface roughness of substrates corresponds to an improved performance of erosion and salt spray resistance of multilayer coatings. The optimized performance of Ti/TiN/Zr/ZrN multilayer coatings can be achieved provided that the surface roughness of Cr_17Ni_2 steel substrates is lower than 0.4μm. 展开更多
关键词 Ti/tin/Zr/ZrN multilayer coatings surface roughness sand erosion resistance corrosion resistance vacuum cathodicarc deposition tin ZRN
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HiPIMS频率对弧辉复合沉积TiZrN/TiN纳米多层膜微观结构和性能的影响 被引量:1
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作者 魏永强 张晓晓 +5 位作者 张华森 顾艳阳 杨佳乐 蒋志强 韦春贝 钟素娟 《中国表面工程》 北大核心 2025年第5期312-325,共14页
随着先进制造业的快速发展,单元单层氮化物涂层刀具很难满足苛刻工况条件下的高性能要求,通过设计多层结构,可以提高基体材料的硬度、耐摩擦磨损和耐腐蚀等综合性能,提高关键零部件的使用寿命。采用电弧离子镀(Arc ion plating,AIP)和... 随着先进制造业的快速发展,单元单层氮化物涂层刀具很难满足苛刻工况条件下的高性能要求,通过设计多层结构,可以提高基体材料的硬度、耐摩擦磨损和耐腐蚀等综合性能,提高关键零部件的使用寿命。采用电弧离子镀(Arc ion plating,AIP)和高功率脉冲磁控溅射(High power impulse magnetron sputtering,HiPIMS)复合技术,通过调控Hi PIMS频率在M2高速钢基体和单晶Si片上沉积TiZrN/TiN纳米多层膜,探究HiPIMS频率对TiZrN/TiN纳米多层膜微观结构和性能的影响规律。研究发现,HiPIMS频率的增加有助于改善TiZrN/TiN纳米多层薄膜表面质量,降低薄膜表面大颗粒数量,TiZrN/TiN纳米多层薄膜厚度呈先增大后减小趋势。不同HiPIMS频率下制备的TiZrN/TiN纳米多层薄膜均以(220)晶面为择优取向,平均晶粒尺寸为4.01~5.31 nm,膜基结合力等级均为HF1级,硬度均在30 GPa以上,稳定摩擦因数在0.79左右。在HiPIMS频率为600 Hz时,平均晶粒尺寸降低到最小4.01 nm。当HiPIMS频率为800 Hz时,硬度达到最大46.28 GPa,磨损率最小,为1.46×10^(-8)mm^(3)·N^(-1)·mm^(-1),此时薄膜的耐磨损性能较好。当HiPIMS频率为1000 Hz时,自腐蚀电位升高到最大-0.39 V(vs.SCE),自腐蚀电流密度降低到最小0.731μA/cm^(2),薄膜耐腐蚀性能最强,腐蚀速率最低。纳米多层结构提升TiZrN/TiN薄纳米多层薄膜的硬度、摩擦磨损和耐腐蚀性能,为薄膜工艺优化提供了试验依据和技术支撑,具有良好的应用前景。 展开更多
关键词 电弧离子镀(AIP) 高功率脉冲磁控溅射技术(HiPIMS) HiPIMS频率 TiZrN/tin纳米多层膜 硬度 耐蚀性
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N_(2)/Ar流量比对TiZrN/TiN纳米多层薄膜微观结构和性能的影响
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作者 魏永强 张华森 +5 位作者 张晓晓 顾艳阳 刘畅 吕怿东 韦春贝 钟素娟 《表面技术》 北大核心 2025年第14期92-104,共13页
目的 通过改变N2/Ar流量比,研究TiZrN/TiN纳米多层薄膜微观结构和性能的变化规律。方法采用电弧离子镀(Arc Ion Plating,AIP)和高功率脉冲磁控溅射(High Power Pulsed Magnetron Sputtering,Hi PIMS)复合方法,通过调节N_(2)/Ar流量比,... 目的 通过改变N2/Ar流量比,研究TiZrN/TiN纳米多层薄膜微观结构和性能的变化规律。方法采用电弧离子镀(Arc Ion Plating,AIP)和高功率脉冲磁控溅射(High Power Pulsed Magnetron Sputtering,Hi PIMS)复合方法,通过调节N_(2)/Ar流量比,分别在M2高速钢和单晶硅片(100)上制备TiZrN/TiN纳米多层薄膜。研究N2/Ar流量比对TiZrN/TiN纳米多层薄膜形貌结构、元素成分、相结构、纳米硬度、膜基结合力、摩擦磨损性能和耐腐蚀性能的影响。结果在N2/Ar流量比为35/65时,薄膜表面粗糙度最低达到0.298μm;在N2/Ar流量比为40/60时,薄膜总厚度最高达574 nm;TiZrN/TiN纳米多层薄膜均以(111)晶面为择优取向,硬度在22.95~27.15 GPa。在N2/Ar流量比为25/75时,TiZrN/TiN纳米多层薄膜离子轰击作用最强,Zr/(Ti+Zr)的值较大(0.088),硬度和弹性模量最高分别达到27.15 GPa和271.14 GPa。在N_(2)/Ar流量比为25/75和30/70时,TiZrN/TiN纳米多层薄膜的膜基结合力最好,达到HF1等级。TiZrN/TiN纳米多层薄膜稳定摩擦系数均在0.8左右,磨损率先增大后减小。N_(2)/Ar流量比为25/75时,TiZrN/TiN纳米多层薄膜的自腐蚀电位和自腐蚀电流密度分别为-0.546 V和1.167μA/cm^(2),薄膜对M2高速钢基体的保护率最高达到87.9%。结论采用电弧离子镀和高功率脉冲磁控溅射复合方法,大幅改善了薄膜表面质量;N_(2)/Ar流量比可改变离子轰击强度的强弱,随着N_(2)/Ar流量比的增加,沉积离子轰击强度逐渐减弱,薄膜硬度和耐腐蚀性能逐渐下降;在N_(2)/Ar流量比为25/75时,薄膜综合性能最优。 展开更多
关键词 高功率脉冲磁控溅射 电弧离子镀 TiZrN/tin纳米多层薄膜 N_(2)/Ar流量比 纳米硬度 耐磨性
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Microstructure,mechanical and corrosion properties of TiN/Ni nanomultilayered films 被引量:2
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作者 Chun-Lin He Jin-Lin Zhang +4 位作者 Lei-Peng Xie Guo-Feng Ma Zhao-Fu Du Jian-Ming Wang Dong-Liang Zhao 《Rare Metals》 SCIE EI CAS CSCD 2019年第10期979-988,共10页
Nanomultilayered TiN/Ni thin films with different bilayer periods(57.8-99.7 nm) and Ni single-layer thickness(3.9-19.2 nm) were prepared by alternatively sputtering Ti and Ni targets in N2 gas atmosphere.The micros tr... Nanomultilayered TiN/Ni thin films with different bilayer periods(57.8-99.7 nm) and Ni single-layer thickness(3.9-19.2 nm) were prepared by alternatively sputtering Ti and Ni targets in N2 gas atmosphere.The micros tructure,mechanical and corrosion properties of the multilayer films were investigated by X-ray diffraction(XRD),field emission scanning electron microscopy(FESEM),X-ray photoelectron spectroscopy(XPS),nanoindenter and electrochemical technologies.The multilayer films are fine with a mean grain size of ~8-9 nm independent of the bilayer period.However,the smoothness and compactness seem to decrease with the bilayer period increasing.The hardness(H) and elastic modulus(E) of the multilayer films gradually decrease as the bilayer period increases,and the multilayer film with bilayer period of 57.8 nm exhibits higher H,ratios of(H/E^*and H^3/E^*2)(E^*is effective Young’s modulus)than the monolithic TiN film and the other multilayers.The multilayer films exhibit an obvious passivation phenomenon in 10% H2SO4 solution,and the passive current and corrosion current densities decrease,whereas the corrosion potential increases when the bilayer period or Ni single-layer thickness decreases.It is found that the passivating behavior and corrosion potential of the multilayers are more sensitive to Ni single-layer thickness than the bilayer period.More corrosion pits and lamellar flaking could be found on the films with larger bilayer period or Ni single-layer thickness. 展开更多
关键词 tin/Ni multilayer film Reactive SPUTTERING MICROSTRUCTURE MECHANICAL property CORROSION resistance
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Pulsed DC plasma enhanced chemical vapor deposited TiN/Ti(C,N) multilayer coatings 被引量:2
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作者 马胜利 李雁淮 +1 位作者 南俊马 徐可为 《中国有色金属学会会刊:英文版》 EI CSCD 2000年第4期489-492,共4页
TiN single coatings and TiN/Ti(C,N) multilayer coatings deposited on Cr12MoV substrate have been completed by pulsed DC plasma enhanced chemical vapor deposition(PCVD) process. The SEM, XRD and microvicker’s hardness... TiN single coatings and TiN/Ti(C,N) multilayer coatings deposited on Cr12MoV substrate have been completed by pulsed DC plasma enhanced chemical vapor deposition(PCVD) process. The SEM, XRD and microvicker’s hardness as well as the indentation test were used to study the microstructure and mechanical properties of TiN/Ti(C,N) multilayer coatings. The results show that TiN/Ti(C,N) coatings are fine and have free column structure, and carbon atoms take the place of some nitrogen atoms in Ti(C,N) coatings when lower flow ratio of CH 4 is used. The microvicker’s hardness and interfacial adhesion between TiN/Ti(C,N) coatings and Cr12MoV substrate increases more obviously than that of TiN single hard coatings due to the more dense and free column structure when process is optimized. 展开更多
关键词 PCVD tin/Ti(C N) multilayER coating MICROSTRUCTURES properties
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Fretting wear behavior of Ti/TiN multilayer film on uranium surface under various displacement amplitudes 被引量:3
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作者 Yan-ping WU Zheng-yang LI +3 位作者 Wen-jin YANG Sheng-fa ZHU Xian-dong MENG Zhen-bing 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2018年第8期1593-1601,共9页
Ti/TiN multilayer film was deposited on uranium surface by arc ion plating technique to improve fretting wear behavior. The morphology, structure and element distribution of the film were measured by scanning electric... Ti/TiN multilayer film was deposited on uranium surface by arc ion plating technique to improve fretting wear behavior. The morphology, structure and element distribution of the film were measured by scanning electric microscopy(SEM), X-ray diffractometry(XRD) and Auger electron spectroscopy(AES). Fretting wear tests of uranium and Ti/TiN multilayer film were carried out using pin-on-disc configuration. The fretting tests of uranium and Ti/TiN multilayer film were carried out under normal load of 20 N and various displacement amplitudes ranging from 5 to 100 μm. With the increase of the displacement amplitude, the fretting changed from partial slip regime(PSR) to slip regime(SR). The coefficient of friction(COF) increased with the increase of displacement amplitude. The results indicated that the displacement amplitude had a strong effect on fretting wear behavior of the film. The damage of the film was very slight when the displacement amplitude was below 20 μm. The observations indicated that the delamination was the main wear mechanism of Ti/TiN multilayer film in PSR. The main wear mechanism of Ti/TiN multilayer film in SR was delamination and abrasive wear. 展开更多
关键词 Ti/tin multilayer film fretting wear wear mechanism displacement amplitude
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TiN/CrN multilayered hard coatings with TiCrN interlayer deposited by a filtered cathodic vacuum arc technique 被引量:1
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作者 ChengmingLi QiHe +3 位作者 GangLin XiaojunSunt WeizhongTang FanxiuLu 《Journal of University of Science and Technology Beijing》 CSCD 2004年第5期420-424,共5页
TiN/CrN multilayered hard coatings with TiCrN interlayer were deposited onhigh speed steel substrates by using a filtered cathodic vacuum arc technique. The structure andcomposition of the coatings were characterized ... TiN/CrN multilayered hard coatings with TiCrN interlayer were deposited onhigh speed steel substrates by using a filtered cathodic vacuum arc technique. The structure andcomposition of the coatings were characterized by scanning electron microscopy (SEM) and Augerelectron spectroscopy (AES). A high adhesion of up to 80 N was demonstrated by scratching tests forthe multi-layered coatings. Nanoindentation tests were performed to determine the hardness andelastic modulus of the coatings as a function of the multiplayer modulation period. It was observedthat the hardness of the multilayered coatings is higher than those of either TiN or CrN singlecoatings, and it increases with decreasing modulation periods, which is consistent with predictionsfrom the Hall-Petch type strengthening mechanism, though at small modulation periods, deviation fromthe Hall-Petch relation has been observed for the multilayered coatings. The life-span of drillscoated with TiN/CrN multilayered is triple as long as that coated with TiN layer. 展开更多
关键词 tin/CrN multilayer hard coatings TiCrN interlayer HARDNESS drilling life
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Effect of TiN/Ti multilayer on fretting fatigue resistance of Ti-811 alloy at elevated temperature 被引量:4
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作者 张晓化 刘道新 《中国有色金属学会会刊:英文版》 CSCD 2009年第3期557-562,共6页
The TiN/Ti multilayer was deposited on Ti-811 alloy surface by magnetron sputtering(MS) technique for improving fretting fatigue(FF) resistance of the titanium alloy at elevated temperature. The element distribution, ... The TiN/Ti multilayer was deposited on Ti-811 alloy surface by magnetron sputtering(MS) technique for improving fretting fatigue(FF) resistance of the titanium alloy at elevated temperature. The element distribution, bonding strength, micro-hardness and ductility of the TiN/Ti multilayer were measured. The effects of the TiN/Ti multilayer on the tribological property and fretting fatigue resistance of the titanium alloy substrate at elevated temperature were compared. The results indicate that by MS technique a TiN/Ti multilayer with high hardness, good ductility and high bearing load capability can be prepared. The MS TiN/Ti multilayer, for its good toughness and tribological behavior, can significantly improve the wear resistance and FF resistance of the Ti-811 alloy at 350 ℃. 展开更多
关键词 微动疲劳 tin 多层膜 钛合金 疲劳抗力 高温 摩擦学性能 技术改进
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Microstructure and physical properties of PVD TiN/(Ti, Al)N multilayer coatings 被引量:1
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作者 吴恩熙 陈利 +1 位作者 尹飞 汪秀全 《中国有色金属学会会刊:英文版》 EI CSCD 2005年第5期1072-1076,共5页
Magnetron sputtered (Ti, Al)N monolayer and TiN/(Ti, Al)N multilayer coatings grown on cemented carbide substrates were studied by using energy dispersive X-ray spectroscopy (EDX), scanning electron microscopy(SEM), n... Magnetron sputtered (Ti, Al)N monolayer and TiN/(Ti, Al)N multilayer coatings grown on cemented carbide substrates were studied by using energy dispersive X-ray spectroscopy (EDX), scanning electron microscopy(SEM), nanoindentation, Rockwell A indentation test, strength measurements and cutting tests. The results show that the (Ti, Al)N monolayer and TiN/(Ti, Al)N multilayer coatings perform good affinity to substrate, and the TiN/(Ti, Al)N multilayer coating exhibits higher hardness, higher toughness and better cutting performance compared with the (Ti, Al)N monolayer coating. Moreover, the strength measurement indicates that the physical vapour deposition (PVD) coating has no effect on the substrate strength. 展开更多
关键词 多层结构 涂层 微观结构 物理性能 金属表面防护
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SYNTHESIS AND MICROSTRUCTURE OF SUPERHARD TiN/SiN_x MULTILAYER THIN FILMS
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作者 Z.F.Zhou Y.G.Shen +1 位作者 Y.W.Mai K.Y.Li 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2005年第3期242-248,共7页
Multilayer thin films of TiN/SiNx have been deposited onto heated Si 100 substra tes (200℃) by reactive dc-magnetron sputtering from Ti and Si targets in an Ar- N2 gas mixture. The rotation speed of the substrate hol... Multilayer thin films of TiN/SiNx have been deposited onto heated Si 100 substra tes (200℃) by reactive dc-magnetron sputtering from Ti and Si targets in an Ar- N2 gas mixture. The rotation speed of the substrate holder was varied from 1 to 20rpm, while target currents were held constant, to produce bilayer periods vary ing from approximately 22 to 0.6nm. These multilayer films were characterized by atomic force microscopy (AFM), cross-sectional transmission electron microscopy (TEM), scanning electron microscopy (SEM), and microhardness measurements. TEM and SEM studies showed elimination of columnar structure in TiN, owing to the in corporation of amorphous SiNx layers. The crystallinity of TiN and amorphous nat ure of SiNx were confirmed by high resolution TEM. An optimum rotation speed was observed, at which hardness was a maximum. The resulting bilayer period was fou nd to be approximately 1.6nm, which resulted in a significant improvement in mic rohardness (~57GPa). The rms surface roughness for this film was less than 1.5nm . 展开更多
关键词 multilayers HARDNESS supermodulu s stress tin/SiNx
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Microstructures and properties of Si_3N_4/TiN ceramic nano-multilayer films
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作者 许俊华 顾明元 +1 位作者 李戈扬 金燕平 《中国有色金属学会会刊:英文版》 CSCD 1999年第4期764-767,共4页
The polycrystalline Si3N4/TiN ceramic nano-multilayer films have been synthesized on Si substrates by a reactive magnetron Sputtering technique, aiming at investigating the effects of modulation ratio and modulation p... The polycrystalline Si3N4/TiN ceramic nano-multilayer films have been synthesized on Si substrates by a reactive magnetron Sputtering technique, aiming at investigating the effects of modulation ratio and modulation period on the microhardness and to elucidate the hardening mechanisms of the synthesized nanomultilayer films. The results showed that the hardness of Si3N4/TiN nano-multilayers is affected not only by modulation period, but also by modulation ratio. The hardness reaches its maximum value when modulation period equa1s a critical value λ0, which is about 12 nm with a modulation ratio of 3: 1. The maximum hardness value is about 40% higher than the value calculated from the rule of mixtures. The hardness of nano-multilayer thin films was found to decrease rapidly with increasing or decreasing modulation period from the Point of λ0. The microstructures of the nano-multilayer films have been investigated using XRD and TEM. Based on experimental results, the mechanism of the superhardness in this system was proposed. 展开更多
关键词 Si3N4/tin multilayer films MICRO HARDNESS MICRO structures
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基于小样本机器学习加速有限元分析TiN/Ti多层涂层的动态冲击响应
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作者 詹研 许柄权 +1 位作者 彭健 王传彬 《高压物理学报》 北大核心 2025年第11期104-118,共15页
服役于极端环境下的发动机高压涡轮叶片,因长期承受高温燃气携带的沙尘颗粒的高速撞击,使役寿命会大幅降低。TiN/Ti多层涂层凭借其高硬、高韧的特性成为叶片表面涂层的首选材料。然而,其抗冲蚀性能与其结构参数紧密相关,传统的实验试错... 服役于极端环境下的发动机高压涡轮叶片,因长期承受高温燃气携带的沙尘颗粒的高速撞击,使役寿命会大幅降低。TiN/Ti多层涂层凭借其高硬、高韧的特性成为叶片表面涂层的首选材料。然而,其抗冲蚀性能与其结构参数紧密相关,传统的实验试错法与有限元模拟往往耗时耗力。为了解决这一困境,提出了一个基于小样本机器学习(machine learning,ML)与有限元分析融合的TiN/Ti多层涂层设计框架。评估了多种回归算法,并优选出高斯过程回归模型,实现了涂层在动态冲击下的层内最大应力与基体最大塑性应变的高精度预测(决定系数R2分别为0.88和0.85)。结合残差与不确定性分析,进一步强化了模型的拟合能力。此外,通过SHAP(shapley additive explanations)模型分析揭示各特征对目标的影响。最终设计了8种新的结构与冲击条件下的涂层仿真模型,并验证了ML模型预测结果的准确性。该框架为高维参数空间下涂层抗冲击设计提供了数据高效、计算经济的解决方案。 展开更多
关键词 tin/Ti多层涂层 机器学习 有限元分析 动态冲击
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TiN/Ti多层膜调制比对摩擦磨损行为影响的研究 被引量:12
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作者 龚海飞 邵天敏 +1 位作者 张晨辉 徐军 《无机材料学报》 SCIE EI CAS CSCD 北大核心 2008年第4期758-762,共5页
考察了TiN/Ti多层膜调制比对其摩擦磨损行为的影响.采用磁过滤阴极弧沉积的方法制备了具有不同调制比的TiN/Ti多层膜,用扫描电镜和透射电镜对其层状结构及子层结构进行了观察和分析.用纳米压痕和SRV摩擦磨损试验的方法,对多层膜进行了... 考察了TiN/Ti多层膜调制比对其摩擦磨损行为的影响.采用磁过滤阴极弧沉积的方法制备了具有不同调制比的TiN/Ti多层膜,用扫描电镜和透射电镜对其层状结构及子层结构进行了观察和分析.用纳米压痕和SRV摩擦磨损试验的方法,对多层膜进行了纳米硬度和弹性模量测试以及摩擦磨损实验.结果表明,所制备的TiN/Ti多层膜层状结构清晰,与基底结合良好,调制比对多层膜的硬度和磨损特性影响较大,而对摩擦系数的影响却不明显.结合实验结果,讨论了硬度与弹性模量的比值(H/E值)对TiN/Ti多层膜耐磨性的影响. 展开更多
关键词 tin/TI 多层膜 层状结构 摩擦磨损
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脉冲偏压对电弧离子镀Ti/TiN纳米多层薄膜显微硬度的影响 被引量:17
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作者 赵彦辉 林国强 +2 位作者 李晓娜 董闯 闻立时 《金属学报》 SCIE EI CAS CSCD 北大核心 2005年第10期1106-1110,共5页
采用脉冲偏压电弧离子镀方法在高速钢基体上沉积Ti/TiN纳米多层薄膜,采用正交实验法设计脉冲偏压电参数,考察脉冲偏压对Ti/TiN纳米多层薄膜显微硬度的影响.结果表明,在所有偏压参数(脉冲偏压幅值、占空比和频率)和几何参数(调制周期和... 采用脉冲偏压电弧离子镀方法在高速钢基体上沉积Ti/TiN纳米多层薄膜,采用正交实验法设计脉冲偏压电参数,考察脉冲偏压对Ti/TiN纳米多层薄膜显微硬度的影响.结果表明,在所有偏压参数(脉冲偏压幅值、占空比和频率)和几何参数(调制周期和周期比)中,脉冲偏压幅值是影响显微硬度的最主要因素;当沉积工艺中脉冲偏压幅值为900V、占空比为50%及频率为30kHz时,薄膜硬度可高达34.1GPa,此时多层膜调制周期为84nm,TiN和Ti单元层厚度分别为71和13nm;由于薄膜中的单层厚度较厚,纳米尺寸的强化效应并未充分体现于薄膜硬度的贡献中,硬度的提高主要与脉冲偏压工艺,尤其是脉冲偏压幅值对薄膜组织的改善有关. 展开更多
关键词 脉冲偏压 电弧离子镀 Ti/tin纳米多层薄膜 显微硬度
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TiN/TiCN/Al_2O_3/TiN CVD多层涂层硬质合金的氧化行为 被引量:14
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作者 谢灿强 陈康华 +3 位作者 王社权 祝昌军 徐银超 陈响明 《粉末冶金材料科学与工程》 EI 2011年第1期26-31,共6页
采用高温化学气相沉积(HT-CVD)和中温化学气相沉积(MT-CVD)相结合的复合化学气相沉积新技术在硬质合金基体WC-(W,Ti)C-(Ta,Nb)C-6%Co上分别沉积TiN/TiCN/TiN和TiN/TiCN/Al2O3/TiN涂层,制备TiN/TiCN/TiN和TiN/TiCN/Al2O3/TiN CVD多层涂... 采用高温化学气相沉积(HT-CVD)和中温化学气相沉积(MT-CVD)相结合的复合化学气相沉积新技术在硬质合金基体WC-(W,Ti)C-(Ta,Nb)C-6%Co上分别沉积TiN/TiCN/TiN和TiN/TiCN/Al2O3/TiN涂层,制备TiN/TiCN/TiN和TiN/TiCN/Al2O3/TiN CVD多层涂层硬质合金。通过氧化实验,X射线衍射仪(XRD)、扫描电镜(SEM)和显微硬度计等手段研究TiN/TiCN/TiN和TiN/TiCN/Al2O3/TiN CVD多层涂层硬质合金的氧化行为。结果表明,涂层后硬质合金的抗氧化性能明显提高,Al2O3的加入能进一步提高CVD多层涂层硬质合金的抗氧化性能,并使涂层硬质合金表现出独特的氧化行为。Al2O3涂层的抗氧化机理为Al2O3具有良好的高温化学稳定性,能起到很好的隔热和阻碍氧扩散的作用。 展开更多
关键词 tin/TiCN/tin tin/TiCN/Al2O3/tin CVD多层涂层硬质合金 氧化行为
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