The effect of W-doping on the structure and properties of TiAlSiN coatings was investigated through scanning electron microscopy,X-ray diffraction,differential scanning calorimetry,and nanoindentation.Tungsten doping ...The effect of W-doping on the structure and properties of TiAlSiN coatings was investigated through scanning electron microscopy,X-ray diffraction,differential scanning calorimetry,and nanoindentation.Tungsten doping in the coatings forms both substitution solid solution of Ti and/or Al in TiAlN and W simple substance.W-addition improves the surface quality of the coatings.Ti_(0.46)Al_(0.45)Si_(0.09)N,Ti_(0.43)Al_(0.46)Si_(0.08)W_(0.03)N,and Ti_(0.41)Al_(0.46)Si_(0.07)W_(0.06)N present similar hardness of(29.1±0.4),(29.7±1.1),and(30.2±1.0)GPa,respectively.During annealing,Ti_(0.41)Al_(0.46)Si_(0.07)W_(0.06)N achieves peak hardness of(35.3±1.0)GPa at 1100℃,whereas those of Ti_(0.46)Al_(0.45)Si_(0.09)N and Ti_(0.43)Al_(0.46)Si_(0.08)W_(0.03)N are only(33.1±0.8)and(33.9±0.8)GPa at 1000℃.Furthermore,moderate W-addition(3 at.%)upgrades the oxidation resistance of TiAlSiN.After oxidation at 1000℃for 10 h,the oxide thicknesses of Ti_(0.46)Al_(0.45)Si_(0.09)N,Ti_(0.43)Al_(0.46)S_(i0.08)W_(0.03)N,and Ti_(0.41)Al_(0.46)Si_(0.07)W_(0.06)N are~0.70,~0.52,and~0.90μm,respectively.展开更多
基金financially supported by the National Natural Science Foundation of China(Nos.51775560,51771234).
文摘The effect of W-doping on the structure and properties of TiAlSiN coatings was investigated through scanning electron microscopy,X-ray diffraction,differential scanning calorimetry,and nanoindentation.Tungsten doping in the coatings forms both substitution solid solution of Ti and/or Al in TiAlN and W simple substance.W-addition improves the surface quality of the coatings.Ti_(0.46)Al_(0.45)Si_(0.09)N,Ti_(0.43)Al_(0.46)Si_(0.08)W_(0.03)N,and Ti_(0.41)Al_(0.46)Si_(0.07)W_(0.06)N present similar hardness of(29.1±0.4),(29.7±1.1),and(30.2±1.0)GPa,respectively.During annealing,Ti_(0.41)Al_(0.46)Si_(0.07)W_(0.06)N achieves peak hardness of(35.3±1.0)GPa at 1100℃,whereas those of Ti_(0.46)Al_(0.45)Si_(0.09)N and Ti_(0.43)Al_(0.46)Si_(0.08)W_(0.03)N are only(33.1±0.8)and(33.9±0.8)GPa at 1000℃.Furthermore,moderate W-addition(3 at.%)upgrades the oxidation resistance of TiAlSiN.After oxidation at 1000℃for 10 h,the oxide thicknesses of Ti_(0.46)Al_(0.45)Si_(0.09)N,Ti_(0.43)Al_(0.46)S_(i0.08)W_(0.03)N,and Ti_(0.41)Al_(0.46)Si_(0.07)W_(0.06)N are~0.70,~0.52,and~0.90μm,respectively.
