期刊文献+
共找到9篇文章
< 1 >
每页显示 20 50 100
Deriving T-gates from cubic phase gates via GKP encoding
1
作者 Lingxuan Feng Shunlong Luo 《Communications in Theoretical Physics》 2025年第10期147-158,共12页
In discrete-variable quantum computation,non-Clifford T-gates play a pivotal role in achieving genuine quantum advantage.However,in the literature,T-gates are only defined for prime dimensional systems,and the absence... In discrete-variable quantum computation,non-Clifford T-gates play a pivotal role in achieving genuine quantum advantage.However,in the literature,T-gates are only defined for prime dimensional systems,and the absence of their high-dimensional counterparts in non-prime dimensional systems raises the issue of how to introduce certain T-gates in such systems.In continuous-variable quantum computation,universality is achieved through a combination of Gaussian gates and some non-Gaussian gates,such as the widely used cubic phase gates.In this work,we establish some connections between discrete-variable(Clifford/non-Clifford)gates and continuous-variable(Gaussian/non-Gaussian)gates via the powerful GKP(Gottesman-Kitaev-Preskill)encoding,which maps qudits to oscillators and serves as a bridge between discrete and continuous realms.By exploiting the analogies between the Clifford hierarchy and the Gaussian hierarchy,we derive(discrete-variable)T-gates in arbitrary(not necessarily prime)dimensional systems from well established(continuous-variable)cubic phase gates.We reveal some basic properties of the unified T-gates,and make a comparative study of various T-gates.As an application,we employ the T-gates to construct equidistributed n-angular frames and certain MUBs(mutually unbiased bases). 展开更多
关键词 Clifford gates t-gates Gaussian gates cubic phase gates n-angular frames
原文传递
A High Performance AlGaN/GaN HEMT with a New Method for T-Gate Layout Design
2
作者 陈志刚 张杨 +4 位作者 罗卫军 张仁平 杨富华 王晓亮 李晋闽 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2008年第9期1654-1656,共3页
We propose and fabricate an A1GaN/GaN high electron mobility transistor (HEMT) on sapphire substrate using a new kind of electron beam (EB) lithography layout for the T-gate. Using this new layout,we can change th... We propose and fabricate an A1GaN/GaN high electron mobility transistor (HEMT) on sapphire substrate using a new kind of electron beam (EB) lithography layout for the T-gate. Using this new layout,we can change the aspect ratio (ratio of top gate dimension to gate length) and modify the shape of the T-gate freely. Therefore, we obtain a 0.18μm gate-length AlGaN/GaN HEMT with a unity current gain cutoff frequency (fT) of 65GHz. The aspect ratio of the T-gate is 10. These single finger devices also exhibit a peak extrinsic transconductance of 287mS/mm and a maximum drain current as high as 980mA/mm. 展开更多
关键词 GAN HEMT t-gate layout
在线阅读 下载PDF
Optimality of T-gate for generating magic resource
3
作者 Xiaohui Li Shunlong Luo 《Communications in Theoretical Physics》 SCIE CAS CSCD 2023年第4期1-9,共9页
In the stabilizer formalism of fault-tolerant quantum computation,stabilizer states serve as classical objects,while magic states(non-stabilizer states)are a kind of quantum resource(called magic resource)for promotin... In the stabilizer formalism of fault-tolerant quantum computation,stabilizer states serve as classical objects,while magic states(non-stabilizer states)are a kind of quantum resource(called magic resource)for promoting stabilizer circuits to universal quantum computation.In this framework,the T-gate is widely used as a non-Clifford gate which generates magic resource from stabilizer states.A natural question arises as whether the T-gate is in some sense optimal for generating magic resource.We address this issue by employing an intuitive and computable quantifier of magic based on characteristic functions(Weyl transforms)of quantum states.We demonstrate that the qubit T-gate,as well as its qutrit extension,the qutrit T-gate,are indeed optimal for generating magic resource among the class of diagonal unitary operators.Moreover,up to Clifford equivalence,the T-gate is essentially the only gate having such an optimal property.This reveals some intrinsic optimal features of the T-gate.We further compare the T-gate with general unitary gates for generating magic resource. 展开更多
关键词 stabilizer formalism Pauli group Clifford group quantifiers of magic t-gate
原文传递
Group frames via magic states with applications to SIC-POVMs and MUBs
4
作者 Lingxuan Feng Shunlong Luo 《Communications in Theoretical Physics》 2025年第1期41-53,共13页
We connect magic(non-stabilizer)states,symmetric informationally complete positive operator valued measures(SIC-POVMs),and mutually unbiased bases(MUBs)in the context of group frames,and study their interplay.Magic st... We connect magic(non-stabilizer)states,symmetric informationally complete positive operator valued measures(SIC-POVMs),and mutually unbiased bases(MUBs)in the context of group frames,and study their interplay.Magic states are quantum resources in the stabilizer formalism of quantum computation.SIC-POVMs and MUBs are fundamental structures in quantum information theory with many applications in quantum foundations,quantum state tomography,and quantum cryptography,etc.In this work,we study group frames constructed from some prominent magic states,and further investigate their applications.Our method exploits the orbit of discrete Heisenberg-Weyl group acting on an initial fiducial state.We quantify the distance of the group frames from SIC-POVMs and MUBs,respectively.As a simple corollary,we reproduce a complete family of MUBs of any prime dimensional system by introducing the concept of MUB fiducial states,analogous to the well-known SIC-POVM fiducial states.We present an intuitive and direct construction of MUB fiducial states via quantum T-gates,and demonstrate that for the qubit system,there are twelve MUB fiducial states,which coincide with the H-type magic states.We compare MUB fiducial states and SIC-POVM fiducial states from the perspective of magic resource for stabilizer quantum computation.We further pose the challenging issue of identifying all MUB fiducial states in general dimensions. 展开更多
关键词 Group frames magic states MUBs SIC-POVMs quantum t-gates
原文传递
Device research on GaAs-based InAlAs/InGaAs metamorphic high electron mobility transistors grown by metal organic chemical vapour deposition 被引量:2
5
作者 徐静波 张海英 +2 位作者 付晓君 郭天义 黄杰 《Chinese Physics B》 SCIE EI CAS CSCD 2010年第3期491-495,共5页
This paper applies a novel quad-layer resist and e-beam lithography technique to fabricate a GaAs-based InAlAs/InGaAs metamorphic high electron mobility transistor (HEMT) grown by metal organic chemical vapour depos... This paper applies a novel quad-layer resist and e-beam lithography technique to fabricate a GaAs-based InAlAs/InGaAs metamorphic high electron mobility transistor (HEMT) grown by metal organic chemical vapour deposition (MOCVD). The gate length of the metamorphic HEMT was 150 nm, the maximum current density was 330 mA/mm, the maximum transconductanee was 470 mS/mm, the threshold voltage was -0.6 V, and the maximum current gain cut-off frequency and maximum oscillation frequency were 102 GHz and 450 GHz, respectively. This is the first report on tri-termination devices whose frequency value is above 400 GHz in China. The excellent frequency performances promise the possibility of metamorphic HEMTs grown by MOCVD for millimetre-wave applications, and more outstanding device performances would be obtained after optimizing the material structure, the elaborate T-gate and other device processes further. 展开更多
关键词 GaAs-based metamorphic HEMT maximum current gain cut-off frequency maximum oscillation frequency t-gate
原文传递
Research on self-supporting T-shaped gate structure of GaN-based HEMT devices
6
作者 张鹏 李苗 +2 位作者 陈俊文 刘加志 马晓华 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第6期551-555,共5页
A self-supporting T-shaped gate(SST-gate) GaN device and process method using electron beam lithography are proposed.An AlGaN/GaN high-electron-mobility transistor(HEMT) device with a gate length of 100 nm is fabricat... A self-supporting T-shaped gate(SST-gate) GaN device and process method using electron beam lithography are proposed.An AlGaN/GaN high-electron-mobility transistor(HEMT) device with a gate length of 100 nm is fabricated by this method.The current gain cutoff frequency(f_(T)) is 60 GHz,and the maximum oscillation frequency(f_(max)) is 104 GHz.The current collapse has improved by 13% at static bias of(V_(GSQ),V_(DSQ))=(-8 V,10 V),and gate manufacturing yield has improved by 17% compared with the traditional floating T-shaped gate(FT-gate) device. 展开更多
关键词 GAN high-electron-mobility transistor(HEMT) SELF-SUPPORTING t-gate
原文传递
TERNARY (T-GATE) INPUT VECTOR MAP AND ITS APPLICATION
7
作者 唐桂明 《Chinese Science Bulletin》 SCIE EI CAS 1992年第10期860-864,共5页
It is obviously advantageous to use single-pattern cell ternary tree (T-gate)network to obtain ternary logic function. Many scholars at home and abroad have done much in minimization of T-gate realization of multiple-... It is obviously advantageous to use single-pattern cell ternary tree (T-gate)network to obtain ternary logic function. Many scholars at home and abroad have done much in minimization of T-gate realization of multiple-valued logic. It is generally acknowledged that it is necessary to try N! times in order to get an optimal result. However, using the Input Vector Map presented here, which is as simple and convenient as Binary Karnaugh Map, we can get an optimal result by trying only N times. 展开更多
关键词 INPUT VECTOR CONTROL order TERNARY TREE (t-gate)
在线阅读 下载PDF
Fabrication of 150-nm Al_(0.48)In_(0.52)As/Ga_(0.47)In_(0.53)As mHEMTs on GaAs substrates 被引量:3
8
作者 WU XiaoFeng LIU HongXia +4 位作者 LI HaiOu LI Qi HU ShiGang XI ZaiFang ZHAO Jin 《Science China(Physics,Mechanics & Astronomy)》 SCIE EI CAS 2012年第12期2389-2391,共3页
High performance 150-nm gate-length metamorphic Al0.48In0.52As/Ga0.47In0.53 As high electron mobility transistors(mHEMTs) with very good device performance have been successfully fabricated.A T-shaped gate is fabricat... High performance 150-nm gate-length metamorphic Al0.48In0.52As/Ga0.47In0.53 As high electron mobility transistors(mHEMTs) with very good device performance have been successfully fabricated.A T-shaped gate is fabricated by using a combined technique of optical and e-beam photolithography,which is beneficial to decreasing parasitic capacitance and parasitic resistance of the gate.The ohmic contact resistance R c is as low as 0.03 mm when using a novel ohmic contact metal system(Ni/Ge/Ti/Au).The devices exhibit excellent DC and RF performance.A peak extrinsic transconductance of 775 mS/mm and a maximum drain current density of 720 mA/mm are achieved.The unity current gain cut-off frequency(fT) and the maximum oscillation frequency(f max) are 188.4 and 250 GHz,respectively. 展开更多
关键词 AlInAs/GaInAs mHEMTs GaAs substrate t-gate
原文传递
Fabrication and characterization of high performance AlGaN/GaN HEMTs on sapphire with silicon nitride passivation 被引量:2
9
作者 张仁平 颜伟 +1 位作者 王晓亮 杨富华 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2011年第6期24-26,共3页
AlGaN/GaN high electron mobility transistors(HEMTs)with high performance were fabricated and characterized.A variety of techniques were used to improve device performance,such as AlN interlayer,silicon nitride passi... AlGaN/GaN high electron mobility transistors(HEMTs)with high performance were fabricated and characterized.A variety of techniques were used to improve device performance,such as AlN interlayer,silicon nitride passivation,high aspect ratio T-shaped gate,low resistance ohmic contact and short drain-source distance. DC and RF performances of as-fabricated HEMTs were characterized by utilizing a semiconductor characterization system and a vector network analyzer,respectively.As-fabricated devices exhibited a maximum drain current density of 1.41 A/mm and a maximum peak extrinsic transconductance of 317 mS/mm.The obtained current density is larger than those reported in the literature to date,implemented with a domestic wafer and processes.Furthermore, a unity current gain cut-off frequency of 74.3 GHz and a maximum oscillation frequency of 112.4 GHz were obtained on a device with an 80 nm gate length. 展开更多
关键词 GaN HEMT t-gate AIN interlayer SiN passivation current density
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部