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DTA INVESTIGATION OF CRYSTALLIZATION BEHAVIOUR IN SrO-TiO_2-SiO_2 GLASS-CERAMICS 被引量:1
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作者 谢为民 丁振亚 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 1995年第2期11-16,共6页
The crystallization process of STS glass-ce-ramics was carried out in a constant temperature. The glass-ceramics still show good piezoelectric properties. The mecha-nism of orientation crystallization was investigated... The crystallization process of STS glass-ce-ramics was carried out in a constant temperature. The glass-ceramics still show good piezoelectric properties. The mecha-nism of orientation crystallization was investigated bv means of DTA. 展开更多
关键词 sro-tio2-SiO2 glass-ceramics crystal-lization
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SrO包覆TiO_2光阳极的制备及性能 被引量:5
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作者 王辉利 郝洪顺 +4 位作者 杨阳 聂铭歧 李长瑶 冉帅 程春棠 《大连工业大学学报》 CAS 北大核心 2014年第4期289-292,共4页
采用浸泡包覆的方法在染料敏化太阳电池的TiO2光阳极表面包覆了一薄层SrO,对TiO2光阳极和TiO2光阳极在饱和SrCl2溶液中浸泡不同时间得到的TiO2/SrO复合光阳极的紫外可见光谱进行了表征,并对SrO包覆TiO2光阳极制备的染料敏化太阳电池的... 采用浸泡包覆的方法在染料敏化太阳电池的TiO2光阳极表面包覆了一薄层SrO,对TiO2光阳极和TiO2光阳极在饱和SrCl2溶液中浸泡不同时间得到的TiO2/SrO复合光阳极的紫外可见光谱进行了表征,并对SrO包覆TiO2光阳极制备的染料敏化太阳电池的光电转化率、单色光转化效率进行了测试。研究表明,包覆不同厚度的SrO后,在380nm左右出现红移现象,拓宽了可见光区吸收范围;在浸泡时间为20min时制备的具有TiO2/SrO核壳结构的光阳极具有高的转化效率,比同条件下制备的纯TiO2光阳极染料敏化电池的转化率提高了22.3%,单色光转化率提高了16%。 展开更多
关键词 染料敏化太阳电池 TiO2光阳极 SRO 包覆
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SYNTHESIS AND CHARACTERIZATION OF A NEW NIOBATE: Sr_6Ti_7Nb_9O_(42)
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作者 张辉 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2000年第3期59-61,78,共4页
A new niabate Sr6Ti7Nb9O42 was synthesized for the first time by solid state reaction in SrO-TiO2-Nb2O5 ternary system. The new compound was characterized by EPMA, XRD, SEM and DTA. The X-ray powder diffraction data o... A new niabate Sr6Ti7Nb9O42 was synthesized for the first time by solid state reaction in SrO-TiO2-Nb2O5 ternary system. The new compound was characterized by EPMA, XRD, SEM and DTA. The X-ray powder diffraction data of Sr6Ti7Nb9O42 were firstly reported in the paper. Sr6Ti7Nb9O42 crystallizes the hexagonal system with unit cell parameters a=8.9991(4) A,c= 11.5118(9)A. and space group P6/mcm (193), z=1. The calculated and measured densities are 4. 783 g/cm3 and 4. 764 g/cm3, respectively. 展开更多
关键词 sro-tio2-Nb2O5 system NIOBATE X-ray powder diffraction
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Effects of SrO/Li_2O/La_2O_3/Ta_2O_5/TiO_2-coating on electrochemical performance of LiCoO_2
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作者 王洪 邓璋琼 陈鸣才 《Journal of Rare Earths》 SCIE EI CAS CSCD 2009年第2期234-239,共6页
Commercial cathode material (LiCoO2) was modified by coating with a thin layer of SrO/Li2O/La2O3/Ta2O5/TiO2 for improving its performance in lithium ion battery. The morphology and structure of the modified cathode ... Commercial cathode material (LiCoO2) was modified by coating with a thin layer of SrO/Li2O/La2O3/Ta2O5/TiO2 for improving its performance in lithium ion battery. The morphology and structure of the modified cathode material were characterized by scanning electron microscopy (SEM) and X-ray diffraction (XRD). The performance including cycling stability, diffusion coefficient under different voltage, C-rate discharge of the batteries with this modified cathode material was examined. The results showed that the battery with the coated cathode material could discharge at a large current density, and it possessed a stable cycle performance in the range from 3.0 V to 4.2 V. It was explained that the rate of Li ion diffusion increased in the batteries using SrO/Li2O/La2O3/Ta2O5/TiO2-coated LiCoO2 as the cathode and the coated layer could act as a fast ion conductor (SrO/Li2O/La2O3/Ta2O5/TiO2) and as a protecting shell to prevent LiCoO2particles from being attacked by the acidic electrolyte. 展开更多
关键词 SrO/Li2O/La2O3/Ta2O5/TiO2-coated LiCoO2 lithium-ion batteries diffusion coefficient fast ion conductor rare earths
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Theoretical Simulation of Surface Evolution Using the Random Deposition and Surface Relaxation for Metal Oxide Film in Atomic Layer Deposition
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作者 Ji-Hoon Ahn Se-Hun Kwon +2 位作者 Jin-Hyock Kim Ja-Yong Kim Sang-Won Kang 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2010年第4期371-374,共4页
Atomic layer deposition (ALD) has become an essential deposition method for forming nanometer scale thin films in the microelectronics industry, and its applications have been extended to multi-component thin films,... Atomic layer deposition (ALD) has become an essential deposition method for forming nanometer scale thin films in the microelectronics industry, and its applications have been extended to multi-component thin films, as well as to single metal oxide films. In order to investigate the development of the surface structure of ultra-thin film qualitatively as well as quantitatively, ALD processes are simulated with a molecular scale. For this simulation, the film materials are deposited on a imaginary substrate that consists of small lattice. The deposition behaviors are described by using random deposition (RD) model or random deposition with surface relaxation (RDSR) model as the ALD growth mode, and the proposed model was applied to the deposition of SrO-TiO2 thin films. Through this work, growth characteristics such as surface morphology, deposited film coverage can be predicted. 展开更多
关键词 Atomic layer deposition Random deposition sro-tio2
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