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一个适用于短沟HALO结构MOS器件的直接隧穿栅电流模型
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作者 赵要 许铭真 谭长华 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2006年第7期1264-1268,共5页
对沟道长度从10μm到0.13μm,栅氧化层厚度为2.5nm的HALO结构nMOS器件的直接隧穿栅电流进行了研究,得到了一个适用于短沟道HALO结构MOS器件的直接隧穿栅电流模型.随着沟道尺寸的缩短,源/漏扩展区占据沟道的比例越来越大,源漏扩展区的影... 对沟道长度从10μm到0.13μm,栅氧化层厚度为2.5nm的HALO结构nMOS器件的直接隧穿栅电流进行了研究,得到了一个适用于短沟道HALO结构MOS器件的直接隧穿栅电流模型.随着沟道尺寸的缩短,源/漏扩展区占据沟道的比例越来越大,源漏扩展区的影响不再可以忽略不计.文中考虑了源/漏扩展区对直接隧穿栅电流的影响,给出了适用于不同HALO掺杂剂量的超薄栅(2~4nm)短沟(0.13~0.25μm)nMOS器件的半经验直接隧穿栅电流模拟表达式. 展开更多
关键词 MOS器件 HALO结构 直接隧穿电流 源/漏扩展区
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Design Consideration in the Development of Multi-Fin FETs for RF Applications
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作者 Peijie Feng Prasanta Ghosh 《World Journal of Nano Science and Engineering》 2012年第2期88-91,共4页
In this paper, we propose multi-fin FET design techniques targeted for RF applications. Overlap and underlap design configuration in a base FinFET are compared first and then multi-fin device (consisting of transistor... In this paper, we propose multi-fin FET design techniques targeted for RF applications. Overlap and underlap design configuration in a base FinFET are compared first and then multi-fin device (consisting of transistor unit up to 50) is studied to develop design limitations and to evaluate their effects on the device performance. We have also investigated the impact of the number of fins (up to 50) in multi-fin structure and resulting RF parameters. Our results show that as the number of fin increases, underlap design compromises RF performance and short channel effects. The results provide technical understanding that is necessary to realize new opportunities for RF and analog mixed-signal design with nanoscale FinFETs. 展开更多
关键词 FINFET Analog RF source/drain extension region engineering Simulation Multi-Fin FET
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