以Sn(OEt)2为起始原料,采用水热晶化法合成了分散性良好的金红石结构的SnO2纳米颗粒.采用X射线衍射对其进行了表征,表明SnO2纳米颗粒的结晶性良好,颗粒尺寸小于10nm.将合成的SnO2纳米颗粒均匀分散到Sb:SnO2镀膜液中,经陈化后制成镀膜溶...以Sn(OEt)2为起始原料,采用水热晶化法合成了分散性良好的金红石结构的SnO2纳米颗粒.采用X射线衍射对其进行了表征,表明SnO2纳米颗粒的结晶性良好,颗粒尺寸小于10nm.将合成的SnO2纳米颗粒均匀分散到Sb:SnO2镀膜液中,经陈化后制成镀膜溶胶,以溶胶-凝胶浸渍镀膜工艺制备纳米颗粒掺杂Sb:SnO2薄膜.分别采用范德堡(Van Der Pauw)法、UV/VIS分光光度计和FTIR中红外分析仪测量并分析膜层的导电性能、光学性能及结构特征,研究了导电纳米颗粒添加对Sb:SnO2薄膜电性能、光学性能和结构的影响.展开更多
CeO2-TiO2 films and CeO2-TiO/SnO2：Sb （6 mol%） double films were deposited on glass substrates by radio-frequency magnetron sputtering （R.F. Sputtering）, using SnO2：Sb（6 mol%） target, and CeO2- TiO2 targets wit...CeO2-TiO2 films and CeO2-TiO/SnO2：Sb （6 mol%） double films were deposited on glass substrates by radio-frequency magnetron sputtering （R.F. Sputtering）, using SnO2：Sb（6 mol%） target, and CeO2- TiO2 targets with different molar ratio of CeO2 to TiO2 （CeO2：TiO2-0：1.0; 0.1：0.9; 0.2：0.8; 0.3：0.7; 0.4：0.6; 0.5：0.5; 0.6：0.4; 0.7：0.3; 0.8：0.2; 0.9：0.1; 1.0：0）. The films are characterized by UV-visible transmission and infrared reflection spectra, scanning electron microscopy （SEM）, Raman spectroscopy, X-ray photoelectron spectroscopy （XPS） and X-ray diffraction （XRD）, respectively. The obtained results show that the amorphous phases composed of CeO2-TiO2 play an important role in absorbing UV, there are Ce^3-, Ce^4- and Ti^4- on the surface of the films; the glass substrates coated with CeO2-TiO2 （Ce/Ti=0.5：0.5; 0.6：0.4）/SnO2：Sb（6 mol%） double films show high absorbing UV（〉99）, high visible light transmission （75%） and good infrared reflection （〉70%）. The sheet resistance of the films is 30-50 Ω/□. The glass substrates coated with the double functional films can be used as window glass of buildings, automobile and so on.展开更多
PdAuIr/C-Sb2O5·SnO2electrocatalysts with Pd∶Au∶Ir molar ratios of 90∶5∶5,70∶20∶10 and 50∶45∶5 were prepared by borohydride reduction method.These electrocatalysts were characterized by EDX,X-ray diffracti...PdAuIr/C-Sb2O5·SnO2electrocatalysts with Pd∶Au∶Ir molar ratios of 90∶5∶5,70∶20∶10 and 50∶45∶5 were prepared by borohydride reduction method.These electrocatalysts were characterized by EDX,X-ray diffraction,transmission electron microscopy and the catalytic activity toward formic acid electro-oxidation in acid medium investigated by cyclic voltammetry(CV),chroamperometry(CA)and tests on direct formic acid fuel cell(DFAFC)at 100℃.X-ray diffractograms of PdAuIr/C-Sb2O5·SnO2electrocatalysts showed the presence of Pd fcc phase,Pd-Au fcc alloys,carbon and ATO phases,while Ir phases were not observed.TEM micrographs and histograms indicated that the nanoparticles were not well dispersed on the support and some agglomerates.The cyclic voltammetry and chroamperometry studies showed that PdAuIr/C-Sb2O5·SnO2(50∶45∶5)had superior performance toward formic acid electro-oxidation at 25℃compared to PdAuIr/C-Sb2O5·SnO2(70∶20∶10),PdAuIr/C-Sb2O5·SnO2(90∶5∶5)and Pd/C-Sb2O5·SnO2electrocatalysts.The experiments in a single DFAFC also showed that all PdAuIr/C-Sb2O5·SnO2electrocatalysts exhibited higher performance for formic acid oxidation in comparison with Pd/C-Sb2O5·SnO2electrocatalysts,however PdAuIr/C-Sb2O5·SnO2(90∶5∶5)had superior performance.These results indicated that the addition of Au and Ir to Pd favor the electro-oxidation of formic acid,which could be attributed to the bifunctional mechanism(the presence of ATO,Au and Ir oxides species)associated to the electronic effect(Pd-Au fcc alloys).展开更多
This article presents the elaboration of tin oxide （SnO2） thin films on glass substrates by using a home-made spray pyrolysis system. Effects of film thickness on the structural, optical, and electrical film propert...This article presents the elaboration of tin oxide （SnO2） thin films on glass substrates by using a home-made spray pyrolysis system. Effects of film thickness on the structural, optical, and electrical film properties are investigated. The films are characterized by several techniques such as x-ray diffraction （XRD）, atomic force microscopy （AFM）, ultraviolet- visible （UV-Vis） transmission, and four-probe point measurements, and the results suggest that the prepared films are uniform and well adherent to the substrates. X-ray diffraction （XRD） patterns show that SnO2 film is of polycrystal with cassiterite tetragonal crystal structure and a preferential orientation along the （110） plane. The calculated grain sizes are in a range from 32.93 nm to 56.88 nm. Optical transmittance spectra of the films show that their high transparency average transmittances are greater than 65% in the visible region. The optical gaps of SnO2 thin films are found to be in a range of 3.64 eV-3.94 eV. Figures of merit for SnO2 thin films reveal that their maximum value is about 1.15 x 10-4 Ω-1 at λ = 550 nm. Moreover, the measured electrical resistivity at room temperature is on the order of 10^-2 Ω.cm.展开更多
The multiple-state storage capability of phase change memory （PCM） is confirmed by using stacked chalcogenide films as the storage medium. The current-voltage characteristics and the resistance-current characteristi...The multiple-state storage capability of phase change memory （PCM） is confirmed by using stacked chalcogenide films as the storage medium. The current-voltage characteristics and the resistance-current characteristics of the PCM clearly indicate that four states can be stored in this stacked film structure. Qualitative analysis indicates that the multiple-state storage capability of this stacked film structure is due to successive crystallizations in different Si-Sb-Te layers triggered by different amplitude currents.展开更多
We elucidate the importance of a capping layer on the structural evolution and phase change properties of carbondoped Ge2 Sb2 Te5（C-GST） films during heating in air. Both the C-GST films without and with a thin SiO2...We elucidate the importance of a capping layer on the structural evolution and phase change properties of carbondoped Ge2 Sb2 Te5（C-GST） films during heating in air. Both the C-GST films without and with a thin SiO2 capping layer（C-GST and C-GST/SiO2） are deposited for comparison. Large differences are observed between C-GST and C-GST/SiO2 films in resistance-temperature, x-ray diffraction, x-ray photoelectron spectroscopy,Raman spectra, data retention capability and optical band gap measurements. In the C-GST film, resistancetemperature measurement reveals an unusual smooth decrease in resistance above 110℃ during heating. Xray diffraction result has excluded the possibility of phase change in the C-GST film below 170℃. The x-ray photoelectron spectroscopy experimental result reveals the evolution of Te chemical valence because of the carbon oxidation during heating. Raman spectra further demonstrate that phase changes from an amorphous state to the hexagonal state occur directly during heating in the C-GST film. The quite smooth decrease in resistance is believed to be related with the formation of Te-rich GeTe4-n Gen（n = 0, 1） units above 110℃ in the C-GST film. The oxidation of carbon is harmful to the C-GST phase change properties.展开更多
The amorphous Ge2Sb2Te5 film with stoichiometric compositions was deposited by co-sputtering of separate Ge, Sb, and Te targets on SiO2/Si (100) wafer in ultrahigh vacuum magnetron sputtering apparatus. The crystalliz...The amorphous Ge2Sb2Te5 film with stoichiometric compositions was deposited by co-sputtering of separate Ge, Sb, and Te targets on SiO2/Si (100) wafer in ultrahigh vacuum magnetron sputtering apparatus. The crystallization behavior of amorphous Ge2Sb2Te5 film was investigated by X-ray diffraction (XRD), atomic force microscopy (AFM) and differential scanning calorimetry (DSC). With an increase of annealing temperature, the amorphous Ge2Sb2Te5 film undergoes a two-step crystallization process that it first crystallizes in face-centered-cubic (fcc) crystal structure and finally fcc structure changes to hexagonal (hex) structure. Activation energy values of 3.636±0.137 and 1.579±0.005 eV correspond to the crystallization and structural transformation processes, respectively. From annealing temperature dependence of the film resistivity, it is determined that the first steep decrease of the resistivity corresponds to crystallization while the second one is primarily caused by structural transformation from 'fcc' to 'hex' and growth of the crystal grains. Current-voltage (Ⅰ-Ⅴ) characteristics of the device with 40 nm-thick Ge2Sb2Te5 film show that the Ge2Sb2Te5 film with nanometer order thickness is still applicable for memory medium of nonvolatile phase change memory.展开更多
The effects of annealing on structural, optical and electrical properties of Sn2Sb2S5 thin films were studied. Sn2Sb2S5 thin films were deposited on no-heated glass substrates by single source vacuum evaporation metho...The effects of annealing on structural, optical and electrical properties of Sn2Sb2S5 thin films were studied. Sn2Sb2S5 thin films were deposited on no-heated glass substrates by single source vacuum evaporation method. The as- deposited films were annealed in air for 1 h at 100, 200 and 300 ℃. XRD study shows that annealed films are crystallized according to the preferential orientation （602）. Optical measurements show that the thin films have relatively high absorption coefficients in the range of 10s-106 cm-1 in the energy range of 2-3.25 eV. It is also found that Sn2Sb2S5 exhibit two optical direct transitions. The models of Wemple-DiDomenico and Spitzer-Fan were applied for the analysis of the dispersion of the refractive index and the determination of the optical and dielectric constants. The electrical resistivity measurements are recorded, and two activation energy values are determined. The layers annealed at 200 and 300 ℃ exhibit a resistive hysteresis behavior. The properties reported here offer perspective to Sn2SbES5 for its application in many advanced technologies.展开更多
After compositing with SiO_2 layers, it is shown that superlattice-like Sb/SiO_2 thin films have higher crystallization temperature（~240°C）, larger crystallization activation energy（6.22 e V）, and better data...After compositing with SiO_2 layers, it is shown that superlattice-like Sb/SiO_2 thin films have higher crystallization temperature（~240°C）, larger crystallization activation energy（6.22 e V）, and better data retention ability（189°C for 10 y）. The crystallization of Sb in superlattice-like Sb/SiO_2 thin films is restrained by the multilayer interfaces. The reversible resistance transition can be achieved by an electric pulse as short as 8 ns for the Sb（3 nm）/SiO_2（7 nm）-based phase change memory cell. A lower operation power consumption of 0.09 m W and a good endurance of 3.0 × 10~6 cycles are achieved. In addition, the superlattice-like Sb（3 nm）/SiO_2（7 nm） thin film shows a low thermal conductivity of 0.13 W/（m·K）.展开更多
The Sb6 Te4/VO2 multilayer thin films are prepared by magnetron sputtering and the potential application in phase change memory is investigated in detail. Compared with Sb6 Te4, Sb6 Te4/VO2 multilayer composite thin f...The Sb6 Te4/VO2 multilayer thin films are prepared by magnetron sputtering and the potential application in phase change memory is investigated in detail. Compared with Sb6 Te4, Sb6 Te4/VO2 multilayer composite thin films have higher phase change temperature and crystallization resistance, indicating better thermal stability and less power consumption. Also, Sb6 Te4/VO2 has a broader energy band of 1.58 eV and better data retention （125℃ for 103/）. The crystallization is suppressed by the multilayer interfaces in Sbf Te4/VO2 thin film with a smaller rms surface roughness for Sbf Te4/VO2 than monolayer Sb4Te6. The picosecond laser technology is applied to study the phase change speed. A short crystallization time of 5.21 ns is realized for the Sb6Te4 （2nm）/VO2 （8nm） thin film. The Sb6 Te4/VO2 multilayer thin film is a potential and competitive phase change material for its good thermal stability and fast phase change speed.展开更多
We propose a new type of quantum spin Hall （QSH） insulator in chemically functionalized As （110） and Sb （110） film. According to first-principles calculations, we find that metallic As （110） and Sb （110） fil...We propose a new type of quantum spin Hall （QSH） insulator in chemically functionalized As （110） and Sb （110） film. According to first-principles calculations, we find that metallic As （110） and Sb （110） films become QSH insulators after being chemically functionalized by hydrogen （H） or halogen （C1 and Br） atoms. The energy gaps of the functionalized films range from 0.121 eV to 0.304 eV, which are sufficiently large for practical applications at room temperature. The energy gaps originate from the spin-orbit coupling （SOC）. The energy gap increases linearly with the increase of the SOC strength λ/λ0. The Z2 invariant and the penetration depth of the edge states are also calculated and studied for the functionalized films.展开更多
As a thin film solar cell absorber material, antimony selenide (Sb<sub>2</sub>Se<sub>3</sub>) has become a potential candidate recently because of its unique optical and electrical properties a...As a thin film solar cell absorber material, antimony selenide (Sb<sub>2</sub>Se<sub>3</sub>) has become a potential candidate recently because of its unique optical and electrical properties and easy fabrication method. X-ray photoelectron spectroscopy (XPS) was used to determine the stoichiometry and composition of electroless Sb<sub>2</sub>Se<sub>3</sub> thin films using depth profile studies. The surface layers were analyzed nearly stoichiometric. But the abundant amount of antimony makes the inner layer electrically more conductive.展开更多
Sb<sub>2</sub>S<sub>3</sub> has gained tremendous research recently for thin film solar cell absorber material because of their easy synthesis, unique electrical and optical properties. The sto...Sb<sub>2</sub>S<sub>3</sub> has gained tremendous research recently for thin film solar cell absorber material because of their easy synthesis, unique electrical and optical properties. The stoichiometry and composition of electroless Sb<sub>2</sub>S<sub>3</sub> thin films were analyzed using XPS depth profile studies. The surface layers were found nearly stoichiometric. On the other hand, the inner layer was rich in antimony composition making it more conductive electrically.展开更多
文摘以Sn(OEt)2为起始原料,采用水热晶化法合成了分散性良好的金红石结构的SnO2纳米颗粒.采用X射线衍射对其进行了表征,表明SnO2纳米颗粒的结晶性良好,颗粒尺寸小于10nm.将合成的SnO2纳米颗粒均匀分散到Sb:SnO2镀膜液中,经陈化后制成镀膜溶胶,以溶胶-凝胶浸渍镀膜工艺制备纳米颗粒掺杂Sb:SnO2薄膜.分别采用范德堡(Van Der Pauw)法、UV/VIS分光光度计和FTIR中红外分析仪测量并分析膜层的导电性能、光学性能及结构特征,研究了导电纳米颗粒添加对Sb:SnO2薄膜电性能、光学性能和结构的影响.
基金the program for Changjiang Scholars and Innovative Research Team in University (No.IRT0547
文摘CeO2-TiO2 films and CeO2-TiO/SnO2：Sb （6 mol%） double films were deposited on glass substrates by radio-frequency magnetron sputtering （R.F. Sputtering）, using SnO2：Sb（6 mol%） target, and CeO2- TiO2 targets with different molar ratio of CeO2 to TiO2 （CeO2：TiO2-0：1.0; 0.1：0.9; 0.2：0.8; 0.3：0.7; 0.4：0.6; 0.5：0.5; 0.6：0.4; 0.7：0.3; 0.8：0.2; 0.9：0.1; 1.0：0）. The films are characterized by UV-visible transmission and infrared reflection spectra, scanning electron microscopy （SEM）, Raman spectroscopy, X-ray photoelectron spectroscopy （XPS） and X-ray diffraction （XRD）, respectively. The obtained results show that the amorphous phases composed of CeO2-TiO2 play an important role in absorbing UV, there are Ce^3-, Ce^4- and Ti^4- on the surface of the films; the glass substrates coated with CeO2-TiO2 （Ce/Ti=0.5：0.5; 0.6：0.4）/SnO2：Sb（6 mol%） double films show high absorbing UV（〉99）, high visible light transmission （75%） and good infrared reflection （〉70%）. The sheet resistance of the films is 30-50 Ω/□. The glass substrates coated with the double functional films can be used as window glass of buildings, automobile and so on.
基金the Laboratório de Microscopia do Centro de Ciências e Tecnologia de Materiais(CCTM) by TEM measurements,FAPESP(2011/18246-0,2012/03516-5) and CNPQ(150639/2013-9)for the financial support
文摘PdAuIr/C-Sb2O5·SnO2electrocatalysts with Pd∶Au∶Ir molar ratios of 90∶5∶5,70∶20∶10 and 50∶45∶5 were prepared by borohydride reduction method.These electrocatalysts were characterized by EDX,X-ray diffraction,transmission electron microscopy and the catalytic activity toward formic acid electro-oxidation in acid medium investigated by cyclic voltammetry(CV),chroamperometry(CA)and tests on direct formic acid fuel cell(DFAFC)at 100℃.X-ray diffractograms of PdAuIr/C-Sb2O5·SnO2electrocatalysts showed the presence of Pd fcc phase,Pd-Au fcc alloys,carbon and ATO phases,while Ir phases were not observed.TEM micrographs and histograms indicated that the nanoparticles were not well dispersed on the support and some agglomerates.The cyclic voltammetry and chroamperometry studies showed that PdAuIr/C-Sb2O5·SnO2(50∶45∶5)had superior performance toward formic acid electro-oxidation at 25℃compared to PdAuIr/C-Sb2O5·SnO2(70∶20∶10),PdAuIr/C-Sb2O5·SnO2(90∶5∶5)and Pd/C-Sb2O5·SnO2electrocatalysts.The experiments in a single DFAFC also showed that all PdAuIr/C-Sb2O5·SnO2electrocatalysts exhibited higher performance for formic acid oxidation in comparison with Pd/C-Sb2O5·SnO2electrocatalysts,however PdAuIr/C-Sb2O5·SnO2(90∶5∶5)had superior performance.These results indicated that the addition of Au and Ir to Pd favor the electro-oxidation of formic acid,which could be attributed to the bifunctional mechanism(the presence of ATO,Au and Ir oxides species)associated to the electronic effect(Pd-Au fcc alloys).
文摘This article presents the elaboration of tin oxide （SnO2） thin films on glass substrates by using a home-made spray pyrolysis system. Effects of film thickness on the structural, optical, and electrical film properties are investigated. The films are characterized by several techniques such as x-ray diffraction （XRD）, atomic force microscopy （AFM）, ultraviolet- visible （UV-Vis） transmission, and four-probe point measurements, and the results suggest that the prepared films are uniform and well adherent to the substrates. X-ray diffraction （XRD） patterns show that SnO2 film is of polycrystal with cassiterite tetragonal crystal structure and a preferential orientation along the （110） plane. The calculated grain sizes are in a range from 32.93 nm to 56.88 nm. Optical transmittance spectra of the films show that their high transparency average transmittances are greater than 65% in the visible region. The optical gaps of SnO2 thin films are found to be in a range of 3.64 eV-3.94 eV. Figures of merit for SnO2 thin films reveal that their maximum value is about 1.15 x 10-4 Ω-1 at λ = 550 nm. Moreover, the measured electrical resistivity at room temperature is on the order of 10^-2 Ω.cm.
文摘The multiple-state storage capability of phase change memory （PCM） is confirmed by using stacked chalcogenide films as the storage medium. The current-voltage characteristics and the resistance-current characteristics of the PCM clearly indicate that four states can be stored in this stacked film structure. Qualitative analysis indicates that the multiple-state storage capability of this stacked film structure is due to successive crystallizations in different Si-Sb-Te layers triggered by different amplitude currents.
基金Supported by the National Natural Science Foundation of China under Grant No 11704161the Natural Science Foundation of Jiangsu Province under Grant Nos BK20170309 and BK20151172the Changzhou Science and Technology Bureau under Grant Nos CJ20159049 and CJ20160028
文摘We elucidate the importance of a capping layer on the structural evolution and phase change properties of carbondoped Ge2 Sb2 Te5（C-GST） films during heating in air. Both the C-GST films without and with a thin SiO2 capping layer（C-GST and C-GST/SiO2） are deposited for comparison. Large differences are observed between C-GST and C-GST/SiO2 films in resistance-temperature, x-ray diffraction, x-ray photoelectron spectroscopy,Raman spectra, data retention capability and optical band gap measurements. In the C-GST film, resistancetemperature measurement reveals an unusual smooth decrease in resistance above 110℃ during heating. Xray diffraction result has excluded the possibility of phase change in the C-GST film below 170℃. The x-ray photoelectron spectroscopy experimental result reveals the evolution of Te chemical valence because of the carbon oxidation during heating. Raman spectra further demonstrate that phase changes from an amorphous state to the hexagonal state occur directly during heating in the C-GST film. The quite smooth decrease in resistance is believed to be related with the formation of Te-rich GeTe4-n Gen（n = 0, 1） units above 110℃ in the C-GST film. The oxidation of carbon is harmful to the C-GST phase change properties.
文摘The amorphous Ge2Sb2Te5 film with stoichiometric compositions was deposited by co-sputtering of separate Ge, Sb, and Te targets on SiO2/Si (100) wafer in ultrahigh vacuum magnetron sputtering apparatus. The crystallization behavior of amorphous Ge2Sb2Te5 film was investigated by X-ray diffraction (XRD), atomic force microscopy (AFM) and differential scanning calorimetry (DSC). With an increase of annealing temperature, the amorphous Ge2Sb2Te5 film undergoes a two-step crystallization process that it first crystallizes in face-centered-cubic (fcc) crystal structure and finally fcc structure changes to hexagonal (hex) structure. Activation energy values of 3.636±0.137 and 1.579±0.005 eV correspond to the crystallization and structural transformation processes, respectively. From annealing temperature dependence of the film resistivity, it is determined that the first steep decrease of the resistivity corresponds to crystallization while the second one is primarily caused by structural transformation from 'fcc' to 'hex' and growth of the crystal grains. Current-voltage (Ⅰ-Ⅴ) characteristics of the device with 40 nm-thick Ge2Sb2Te5 film show that the Ge2Sb2Te5 film with nanometer order thickness is still applicable for memory medium of nonvolatile phase change memory.
文摘The effects of annealing on structural, optical and electrical properties of Sn2Sb2S5 thin films were studied. Sn2Sb2S5 thin films were deposited on no-heated glass substrates by single source vacuum evaporation method. The as- deposited films were annealed in air for 1 h at 100, 200 and 300 ℃. XRD study shows that annealed films are crystallized according to the preferential orientation （602）. Optical measurements show that the thin films have relatively high absorption coefficients in the range of 10s-106 cm-1 in the energy range of 2-3.25 eV. It is also found that Sn2Sb2S5 exhibit two optical direct transitions. The models of Wemple-DiDomenico and Spitzer-Fan were applied for the analysis of the dispersion of the refractive index and the determination of the optical and dielectric constants. The electrical resistivity measurements are recorded, and two activation energy values are determined. The layers annealed at 200 and 300 ℃ exhibit a resistive hysteresis behavior. The properties reported here offer perspective to Sn2SbES5 for its application in many advanced technologies.
基金Supported by the National Natural Science Foundation of China under Grant No 11774438the Natural Science Foundation of Jiangsu Province under Grant No BK20151172+2 种基金the Changzhou Science and Technology Bureau under Grant No CJ20160028the Qing Lan Project,the Opening Project of State Key Laboratory of Silicon Materials under Grant No SKL2017-04the Opening Project of Key Laboratory of Microelectronic Devices and Integrated Technology of Institute of Microelectronics of Chinese Academy of Sciences
文摘After compositing with SiO_2 layers, it is shown that superlattice-like Sb/SiO_2 thin films have higher crystallization temperature（~240°C）, larger crystallization activation energy（6.22 e V）, and better data retention ability（189°C for 10 y）. The crystallization of Sb in superlattice-like Sb/SiO_2 thin films is restrained by the multilayer interfaces. The reversible resistance transition can be achieved by an electric pulse as short as 8 ns for the Sb（3 nm）/SiO_2（7 nm）-based phase change memory cell. A lower operation power consumption of 0.09 m W and a good endurance of 3.0 × 10~6 cycles are achieved. In addition, the superlattice-like Sb（3 nm）/SiO_2（7 nm） thin film shows a low thermal conductivity of 0.13 W/（m·K）.
基金Supported by the National Natural Science Foundation of China under Grant No 11774438the Natural Science Foundation of Jiangsu Province under Grant No BK20151172+2 种基金the Qing Lan Project,the Opening Project of State Key Laboratory of Silicon Materials under Grant No SKL2017-04the Opening Project of Key Laboratory of Microelectronic Devices and Integrated Technology of Chinese Academy of Sciencesthe Postgraduate Research and Practice Innovation Program of Jiangsu Province under Grant No SJCX18_1024
文摘The Sb6 Te4/VO2 multilayer thin films are prepared by magnetron sputtering and the potential application in phase change memory is investigated in detail. Compared with Sb6 Te4, Sb6 Te4/VO2 multilayer composite thin films have higher phase change temperature and crystallization resistance, indicating better thermal stability and less power consumption. Also, Sb6 Te4/VO2 has a broader energy band of 1.58 eV and better data retention （125℃ for 103/）. The crystallization is suppressed by the multilayer interfaces in Sbf Te4/VO2 thin film with a smaller rms surface roughness for Sbf Te4/VO2 than monolayer Sb4Te6. The picosecond laser technology is applied to study the phase change speed. A short crystallization time of 5.21 ns is realized for the Sb6Te4 （2nm）/VO2 （8nm） thin film. The Sb6 Te4/VO2 multilayer thin film is a potential and competitive phase change material for its good thermal stability and fast phase change speed.
基金Project supported by the National Natural Science Foundation of China(Grant Nos.11474197,U1632272,and 11521404)
文摘We propose a new type of quantum spin Hall （QSH） insulator in chemically functionalized As （110） and Sb （110） film. According to first-principles calculations, we find that metallic As （110） and Sb （110） films become QSH insulators after being chemically functionalized by hydrogen （H） or halogen （C1 and Br） atoms. The energy gaps of the functionalized films range from 0.121 eV to 0.304 eV, which are sufficiently large for practical applications at room temperature. The energy gaps originate from the spin-orbit coupling （SOC）. The energy gap increases linearly with the increase of the SOC strength λ/λ0. The Z2 invariant and the penetration depth of the edge states are also calculated and studied for the functionalized films.
文摘As a thin film solar cell absorber material, antimony selenide (Sb<sub>2</sub>Se<sub>3</sub>) has become a potential candidate recently because of its unique optical and electrical properties and easy fabrication method. X-ray photoelectron spectroscopy (XPS) was used to determine the stoichiometry and composition of electroless Sb<sub>2</sub>Se<sub>3</sub> thin films using depth profile studies. The surface layers were analyzed nearly stoichiometric. But the abundant amount of antimony makes the inner layer electrically more conductive.
文摘Sb<sub>2</sub>S<sub>3</sub> has gained tremendous research recently for thin film solar cell absorber material because of their easy synthesis, unique electrical and optical properties. The stoichiometry and composition of electroless Sb<sub>2</sub>S<sub>3</sub> thin films were analyzed using XPS depth profile studies. The surface layers were found nearly stoichiometric. On the other hand, the inner layer was rich in antimony composition making it more conductive electrically.
