Based on a submicrometer-sized SiGe-SOI waveguide, the coupling loss mechanism is analyzed between the submicrometer-sized SiGe-SOI waveguide and the fiber. The main sources of coupling loss are analyzed, and the mism...Based on a submicrometer-sized SiGe-SOI waveguide, the coupling loss mechanism is analyzed between the submicrometer-sized SiGe-SOI waveguide and the fiber. The main sources of coupling loss are analyzed, and the mismatch loss of the mode field is the mainly lost during connection between the submicrometer-sized waveguide and the fiber. In order to reduce the mismatch loss of the mode field, the structure ofa nanotaper SiGeSOI waveguide with a nanometer-sized tip is adopted. By reducing the waveguide dimensions to increase the mode field size, coupling loss could be reduced between the waveguide and the fiber. Different mode field dimensions ofnanotaper SiGe-SOI waveguides and fiber are quantitatively analyzed, and the quantitative relationship between nanotaper SiGe-SOI waveguide dimensions and mode field dimensions are obtained. Finally, nanotaper SiGe-SOI waveguides are made, and the test and analysis have been done. The final experimental results accord well with the theoretical analysis. When the waveguide width is 0.5 μm, the minimum coupling loss of the SiGe-SOI waveguide is 0.56 dB/facet, and also the correctness of the design method and theoretical analysis are verified.展开更多
A SiGe/Si multi-quantum wells resonant-cavity-enhanced(RCE) detector with high reflectivity bottom mirror is fabricated by a new method.The bottom mirror is deposited in the hole,which is etched from the backside of t...A SiGe/Si multi-quantum wells resonant-cavity-enhanced(RCE) detector with high reflectivity bottom mirror is fabricated by a new method.The bottom mirror is deposited in the hole,which is etched from the backside of the sample by ethylenediamine-pyrocatechol-water(EPW) solution with the buried SiO 2 layer in SOI substrate as the etching-stop layer.Reflectivity spectrum indicates that the mirror deposited in the hole has a reflectivity as high as 99% in the range of 1.2～1.5μm.The peak responsivity of the RCE detector at 1.344μm is 1.2mA/W and the full width at half maximum is 12nm.Compared with the conventional p-i-n photodetector,the responsivity of RCE detector is enhanced 8 times.展开更多
在 SOI(Silicon on Insulator)结构硅膜上面生长一层 Si Ge合金 ,采用类似 SOICMOS工艺制作成具有Si Ge沟道的 SOICMOS集成电路。该电路不仅具有 SOICMOS电路的优点 ,而且因为 Si Ge中的载流子迁移率明显高于 Si中载流子的迁移率 ,所以...在 SOI(Silicon on Insulator)结构硅膜上面生长一层 Si Ge合金 ,采用类似 SOICMOS工艺制作成具有Si Ge沟道的 SOICMOS集成电路。该电路不仅具有 SOICMOS电路的优点 ,而且因为 Si Ge中的载流子迁移率明显高于 Si中载流子的迁移率 ,所以提高了电路的速度和驱动能力。另外由于两种极性的 SOI MOSFET都采用 Si Ge沟道 ,就避免了只有 SOIPMOSFET采用 Si Ge沟道带来的选择性生长 Si Ge层的麻烦。采用二维工艺模拟得到了器件的结构 ,并以此结构参数进行了器件模拟。模拟结果表明 ,N沟和 P沟两种 MOSFET的驱动电流都有所增加 。展开更多
基金supported by the National Natural Science Foundation of China(No.61204080)the Natural Science Foundation of Shaanxi Province(No.2012JM1011)+2 种基金the Shaanxi Provincial Education Department(No.2013JK1111)the Doctoral Program Foundation of Xi’an Polytechnic University of China(No.BS1128)the Shaanxi Province Ordinary University Key Disciplines Construction Projects of Special Funds(No.(2008)169)
文摘Based on a submicrometer-sized SiGe-SOI waveguide, the coupling loss mechanism is analyzed between the submicrometer-sized SiGe-SOI waveguide and the fiber. The main sources of coupling loss are analyzed, and the mismatch loss of the mode field is the mainly lost during connection between the submicrometer-sized waveguide and the fiber. In order to reduce the mismatch loss of the mode field, the structure ofa nanotaper SiGeSOI waveguide with a nanometer-sized tip is adopted. By reducing the waveguide dimensions to increase the mode field size, coupling loss could be reduced between the waveguide and the fiber. Different mode field dimensions ofnanotaper SiGe-SOI waveguides and fiber are quantitatively analyzed, and the quantitative relationship between nanotaper SiGe-SOI waveguide dimensions and mode field dimensions are obtained. Finally, nanotaper SiGe-SOI waveguides are made, and the test and analysis have been done. The final experimental results accord well with the theoretical analysis. When the waveguide width is 0.5 μm, the minimum coupling loss of the SiGe-SOI waveguide is 0.56 dB/facet, and also the correctness of the design method and theoretical analysis are verified.
文摘A SiGe/Si multi-quantum wells resonant-cavity-enhanced(RCE) detector with high reflectivity bottom mirror is fabricated by a new method.The bottom mirror is deposited in the hole,which is etched from the backside of the sample by ethylenediamine-pyrocatechol-water(EPW) solution with the buried SiO 2 layer in SOI substrate as the etching-stop layer.Reflectivity spectrum indicates that the mirror deposited in the hole has a reflectivity as high as 99% in the range of 1.2～1.5μm.The peak responsivity of the RCE detector at 1.344μm is 1.2mA/W and the full width at half maximum is 12nm.Compared with the conventional p-i-n photodetector,the responsivity of RCE detector is enhanced 8 times.
文摘在 SOI(Silicon on Insulator)结构硅膜上面生长一层 Si Ge合金 ,采用类似 SOICMOS工艺制作成具有Si Ge沟道的 SOICMOS集成电路。该电路不仅具有 SOICMOS电路的优点 ,而且因为 Si Ge中的载流子迁移率明显高于 Si中载流子的迁移率 ,所以提高了电路的速度和驱动能力。另外由于两种极性的 SOI MOSFET都采用 Si Ge沟道 ,就避免了只有 SOIPMOSFET采用 Si Ge沟道带来的选择性生长 Si Ge层的麻烦。采用二维工艺模拟得到了器件的结构 ,并以此结构参数进行了器件模拟。模拟结果表明 ,N沟和 P沟两种 MOSFET的驱动电流都有所增加 。
