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Theoretical Studies on the Si(001)-SiO_2 Interface Structure 被引量:1
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作者 ZHOU Ming-Xiu YANG Chun +2 位作者 DENG Xiao-Yan YU Wei-Fei LI Jin-Shan 《Chinese Journal of Structural Chemistry》 SCIE CAS CSCD 北大核心 2006年第6期647-652,共6页
Novel models (2× 1) of Si(001)-SiO2 interface structure have been established. The method of the first-principle General Gradient Approximation (GGA) is employed to structurally optimize the established the... Novel models (2× 1) of Si(001)-SiO2 interface structure have been established. The method of the first-principle General Gradient Approximation (GGA) is employed to structurally optimize the established theoretical models under the K-point space of periodic boundary condition. The structures after optimization have been analyzed, and the results show that the interfaces present in disordered state and both Si-O-Si and Si=O structures exist. Meanwhile, the bonding of surface structure is analyzed via the graphics of electron localization function(ELF). 展开更多
关键词 si/sio2 dft interface structure
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强脉冲X射线辐照Si-SiO_2界面对C-V和I-V特性曲线的影响 被引量:1
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作者 杨志安 靳涛 +3 位作者 杨祖慎 姚育娟 罗尹虹 戴慧莹 《强激光与粒子束》 EI CAS CSCD 北大核心 2002年第2期302-306,共5页
利用强脉冲 X射线对 Si-Si O2 界面进行了辐照 ,测量了 C-V曲线和 I-V曲线。实验发现 ,经过强脉冲 X射线对 Si-Si O2 界面进行的辐照 ,使 C-V曲线产生了正向漂移 ,这一点与低剂量率辐射结果不同 ;辐射后 ,感生 I-V曲线产生畸变 ;特别地 ... 利用强脉冲 X射线对 Si-Si O2 界面进行了辐照 ,测量了 C-V曲线和 I-V曲线。实验发现 ,经过强脉冲 X射线对 Si-Si O2 界面进行的辐照 ,使 C-V曲线产生了正向漂移 ,这一点与低剂量率辐射结果不同 ;辐射后 ,感生 I-V曲线产生畸变 ;特别地 ,从 I-V曲线上还反映出强脉冲 X射线辐照的总剂量效应造成电特性参数明显退化 ,最后甚至失效。讨论了强脉冲 X射线辐照对 Si-Si O2 界面产生损伤的机理 。 展开更多
关键词 强脉冲X射线 si-sio2界面 辐射损伤 C-V曲线 I-V曲线 损伤机理 MOS器件
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衬底温度对VUV光直接光CVD SiO_2/Si界面缺陷的影响 被引量:2
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作者 谢茂浓 杜开瑛 刘玉荣 《半导体光电》 CAS CSCD 北大核心 1998年第3期198-201,共4页
研究了VUV(真空紫外)光直接光CVD(化学汽相淀积)SiO2/Si界面微结构缺陷与衬底温度(Ts)的关系。实验结果表明:在32℃~180℃的温度范围内,与Si-O-Si伸缩模相对应的IR峰位随Ts的降低从1060c... 研究了VUV(真空紫外)光直接光CVD(化学汽相淀积)SiO2/Si界面微结构缺陷与衬底温度(Ts)的关系。实验结果表明:在32℃~180℃的温度范围内,与Si-O-Si伸缩模相对应的IR峰位随Ts的降低从1060cm-1增加至1080cm-1。固定氧化物电荷密度(ΔNot)在Ts>120℃后,呈正电性,与位于3.10eV的氧空位缺陷相关;在Ts<100℃一侧,呈负电性,与2.84eV能级位置的过剩氧缺陷相关;而在100℃~120℃间,ΔNot具有极小值,其大小约在1010cm-2数量级。 展开更多
关键词 真空紫外光CVD 界面缺陷 二氧化硅
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应用渐进因子分析法研究SiO_2/Si样品俄歇深度剖析 被引量:1
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作者 谢舒平 范垂祯 《分析测试学报》 CAS CSCD 1997年第5期5-7,共3页
首次利用渐进因子分析法对SiO2/Si样品俄歇深度剖析过程进行研究,发现SiO2/Si界面处有SiOx成分存在,x值在10~15之间,厚度约为30nm,含量接近50%。Ar+离子束的轰击使得SiO2薄膜内分解产生... 首次利用渐进因子分析法对SiO2/Si样品俄歇深度剖析过程进行研究,发现SiO2/Si界面处有SiOx成分存在,x值在10~15之间,厚度约为30nm,含量接近50%。Ar+离子束的轰击使得SiO2薄膜内分解产生亚稳态SiO2,含量在17%左右。研究结果表明,渐进因子分析法非常适合于俄歇深度剖析的化学态分析。 展开更多
关键词 界面 俄歇电子谱 化学态 硅半导体 二氧化硅
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工艺参数对真空紫外光直接光CVDSiO_2/Si界面特性的影响
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作者 谢茂浓 杜开瑛 刘玉荣 《微电子学》 CAS CSCD 北大核心 1998年第3期172-175,共4页
采用高频(1MHz)C-V测试和红外谱,研究了工艺参数对Xe激发真空紫外光(VUV)直接光CVDSiO2的SiO2/Si界面特性的影响。结果表明:衬底温度Ts对固定氧化物电荷密度ΔNot、慢界面态密度ΔNst的影响比... 采用高频(1MHz)C-V测试和红外谱,研究了工艺参数对Xe激发真空紫外光(VUV)直接光CVDSiO2的SiO2/Si界面特性的影响。结果表明:衬底温度Ts对固定氧化物电荷密度ΔNot、慢界面态密度ΔNst的影响比反应室总气压Pc和SiH2/O2分压比显著。ΔNot和ΔNst在110°C附近有极小值,大小为1010cm-2量级。Ts>120°C,ΔNot呈正电荷性,Ts<110°C,ΔNot呈负电荷性。Si-O-Si伸缩振动吸收峰位在1060~1080cm-2间,随Ts的减少而增加。 展开更多
关键词 光CVD 半导体 光化学汽相淀积
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A DOMINANT DEFECT AT THE Si/SiO_2 INTERFACE IN MOS STRUCTURE
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作者 陈开茅 卢殿通 《Science China Mathematics》 SCIE 1989年第12期1458-1468,共11页
The interface defects at the Si/SiO_2 interface in ρ-type silicon (111) MOS structures have been studied by the DLTS method. A dominant defect H_(it),(0.503) at the Si/SiO_2 interface has been found. Its characterist... The interface defects at the Si/SiO_2 interface in ρ-type silicon (111) MOS structures have been studied by the DLTS method. A dominant defect H_(it),(0.503) at the Si/SiO_2 interface has been found. Its characteristics are (i) the average hole ionization Gibbs free energy △G_p≥0.503 eV; (ii) by changing the gate bias when the distance from Fermi level to the top of Si valence band at the Si/SiO_2 interface is less than △G_p there is still the strong DLTS peak; (iii) its hole apparent activation energy increases with the dectease of the height of semiconductor surface potential barrier; and (iv) its hole capture process causes the multiexponential capacitance transience as a function of pulse width and the H_(it)(0.503) level are very difficult to be fully filled with the holes introduced by thepulst with alimited width. All above show that there is a continuous transition energy band between the energy bands of the covalent crystal silicon and the SiO_2 in the Si/SiO_2 systems formed by thermal oxidation; the dominant defect H_(it)(0.503) is distributed in the transition region, and the distance of H_(it)(0.503) level from the top of the valence band increases with the distance from the silicon surface. 展开更多
关键词 interface defects MOS structure physics model of si/sio_2 interface.
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β-FeSi_2/Si薄膜位向关系的计算 被引量:1
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作者 朱玉满 张文征 叶飞 《材料科学与工程学报》 CAS CSCD 北大核心 2003年第5期635-639,共5页
利用从固态相变产生的沉淀相惯习面总结出的Δg平行法则 ,计算了 β FeSi2 半导体薄膜和Si基体之间可能的择优取向关系。根据界面匹配和结构的分析 ,建议最优衬底基面的晶体学位向。预测的界面是一个无理面 ,含有原子尺度台阶 ,晶格间... 利用从固态相变产生的沉淀相惯习面总结出的Δg平行法则 ,计算了 β FeSi2 半导体薄膜和Si基体之间可能的择优取向关系。根据界面匹配和结构的分析 ,建议最优衬底基面的晶体学位向。预测的界面是一个无理面 ,含有原子尺度台阶 ,晶格间具有良好匹配关系。以该界面位向作为Si衬底的基面有可能导致高质量金属硅化物 β FeSi2 展开更多
关键词 β-Fesi2/si薄膜 位向关系 计算 固态相变 半导体薄膜 晶格 取向
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Temperature and metal composition dependence of lateral photovoltaic effect in Al-Alq_3/SiO_2/Si structures
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作者 王超 邵军强 +2 位作者 穆泽林 刘文明 倪刚 《Chinese Optics Letters》 SCIE EI CAS CSCD 2014年第4期13-16,共4页
A series of Al=-(Alq3)l-x granular films is prepared on Si wafer with native oxide layer using co-evaporation technique. Large lateral photovoltaic effect (LPE) is observed, with an optimal LPV sensitivity of 75 m... A series of Al=-(Alq3)l-x granular films is prepared on Si wafer with native oxide layer using co-evaporation technique. Large lateral photovoltaic effect (LPE) is observed, with an optimal LPV sensitivity of 75 mV/mm in x=0.35 sample. The dependence of LPE on temperature and A1 composition is investigated, and the possible mechanism is discussed. 展开更多
关键词 sio Temperature and metal composition dependence of lateral photovoltaic effect in Al-Alq3/sio2/si structures LPE LPV AL
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高取向锐钛矿TiO_2薄膜的MOCVD法制备与表征 被引量:4
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作者 孙一军 夏冠群 +1 位作者 张良莹 姚熹 《功能材料与器件学报》 EI CAS CSCD 1998年第3期208-212,共5页
采用热壁低压MOCVD方法,以Ti(OC4H9)4为源在SiO2/Si衬底上制备出了高取向锐钛矿TiO2薄膜。用X射线衍射技术研究了沉积温度和衬底对薄膜的结构和相组成的影响规律,采用XPS和SEM分别研究薄膜的组成和... 采用热壁低压MOCVD方法,以Ti(OC4H9)4为源在SiO2/Si衬底上制备出了高取向锐钛矿TiO2薄膜。用X射线衍射技术研究了沉积温度和衬底对薄膜的结构和相组成的影响规律,采用XPS和SEM分别研究薄膜的组成和形貌。结果表明,当沉积温度为5000C和6000C时,薄膜为锐钛矿结构,3000C和4000C时,薄膜以无定形结构为主。薄膜的组成为TiO2,衬底影响薄膜的相组成。不同沉积温度下制备的薄膜具有不同的显微结构,薄膜厚度均匀。 展开更多
关键词 MOCVD 锐钛矿 光电子材料 二氧化钛 薄膜
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Accurate Determination for the Energy & Temperature Dependence of Electron Capture CrossSection of Si-SiO_2 Interface States Using a New Method
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作者 陈开茅 武兰清 +1 位作者 许慧英 刘鸿飞 《Science China Mathematics》 SCIE 1993年第11期1397-1408,共12页
A new technique for accurate determination of the electron and hole capture cross-sections of interface states at the insulator-semiconductor interface has been developed through measuring the initial time variation i... A new technique for accurate determination of the electron and hole capture cross-sections of interface states at the insulator-semiconductor interface has been developed through measuring the initial time variation in the carrier filling capacitance transient, and full consideration is given to the charge-potential feedback effect on carrier capture process. A simplified calculation of the effect is also given. The interface states have been investigated with this technique at the Si-SiO_2 interface in an n-type Si MOS diode. The results show that the electron capture cross-section strongly depends on both temperature and energy. 展开更多
关键词 the capacitance transient of the carrier filling charge-potential feedback effect si-sio_2 interface temperature and energy dependence of the capture cross-section of the interface states.
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Electronic structure evolution accompanying heavy fermion formation in CeCu2Si2
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作者 XueBing Luo Yun Zhang +5 位作者 QiuYun Chen Qin Liu LiZhu Luo ShiYong Tan XieGang Zhu XinChun Lai 《Science China(Physics,Mechanics & Astronomy)》 SCIE EI CAS CSCD 2020年第8期123-131,共9页
The cooper pairs in the heavy-fermion superconductor CeCu2Si2 are formed of heavy fermions.Therefore,the heavy fermions are fundamental to the emergence of unconventional superconductivity and associated non-Fermi-liq... The cooper pairs in the heavy-fermion superconductor CeCu2Si2 are formed of heavy fermions.Therefore,the heavy fermions are fundamental to the emergence of unconventional superconductivity and associated non-Fermi-liquid behavior in the normal state.The interplay between localization and itinerancy manifested on the electronic structure is key for understanding the heavyfermion behavior.Here,via the first-principle density functional theory(DFT)combined with single-site dynamical mean-field theory(DMFT),we investigate the temperature(T)evolution of the electronic structure of CeCu2Si2 in the normal state,focusing on the role of the 4f states in the low energy regime.Two characteristic temperature scales of this evolution,which accompanied the heavy-fermion formation,are established.The coherence onset temperature is around 130K,whereas the heavy-fermion band formation temperature is between 40 and 80K;both characteristic temperature scales are higher than the transport coherence temperature.Furthermore,the heavy-fermion formation is confirmed by calculating its effective mass variation with the temperature.Based on the calculated T-dependent evolution of the 4 f orbital occupancy and electronic structure,an explanation on the behavior of the temperature evolution of the correlation strength of CeCu2Si2 is provided.Our results offer a comprehensive microscopic picture of the heavy-fermion formation in CeCu2Si2,which is essential for further understanding the emergent superconducting pairing mechanism. 展开更多
关键词 CeCu2si2 heavy-fermion formation temperature electronic structure dft+DMFT
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Density functional theory studies of the optical properties of a β-FeSi_2 (100)/Si(001) interface at high pressure
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作者 李海涛 钱军 +1 位作者 韩芳芳 李廷会 《Journal of Semiconductors》 EI CAS CSCD 2013年第7期11-14,共4页
High pressure has a significant influence onβ-FeSi_2 band gaps and optical absorption tuning.In this work,using density functional theory,we investigate the effect of high pressure on the optical absorption behavior ... High pressure has a significant influence onβ-FeSi_2 band gaps and optical absorption tuning.In this work,using density functional theory,we investigate the effect of high pressure on the optical absorption behavior of aβ-FeSi_2(100)/Si(001) interface with some Si vacancies.As the pressure increases,the optical absorption peak down-shifts firstly,reach minimum values,and then un-shifts slowly.The electronic orbital analysis indicates that the electronic transition between the highest occupied states and the lowest unoccupied states mainly originate from Fe atoms at the interface regions.Structural analysis discloses that the Si(001) slab partially offsets the pressure exerted on theβ-FeSi_2(100) interface,but this effect will become weaker with further increasing pressure,and this physical mechanism plays an important role in its optical absorption behavior. 展开更多
关键词 β-Fesi2 (100)/si (001) interface optical absorption electronic structure high-pressure
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1.1 GHz声表面波滤波器的设计和制作 被引量:2
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作者 任天令 杨磊 刘理天 《压电与声光》 CSCD 北大核心 2002年第2期85-88,共4页
随着第三代通信技术的发展 ,可与硅片集成的滤波器受到了越来越多的关注。基于 Zn O/ Si O2 / Si结构设计、制作了声表面波 (SAW)射频 (RF)滤波器 ,其工艺与普通的 IC工艺兼容 ,具有与其他电路集成在一块芯片上的可能。测试结果显示滤... 随着第三代通信技术的发展 ,可与硅片集成的滤波器受到了越来越多的关注。基于 Zn O/ Si O2 / Si结构设计、制作了声表面波 (SAW)射频 (RF)滤波器 ,其工艺与普通的 IC工艺兼容 ,具有与其他电路集成在一块芯片上的可能。测试结果显示滤波器的中心频率可达 1.12 GHz,带宽达 10 % ,插损为 11d 展开更多
关键词 ZnO/sio2/si结构 声表面波滤波器 电路设计
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氮化N沟MOS场效应管的界面陷阱特性
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作者 王伟 《半导体杂志》 1998年第1期14-16,49,共4页
一种经过氮化处理背面吸杂的N沟MOS场效应管,在较宽的温度和偏置范围下对其闪烁噪声进行测量。将经过不等时间吸杂处理后的器件的噪声能量谱进行比较发现:器件经过短时间背面吸杂,其闪烁噪声降低;稍长时间吸杂则噪声趋高。探究... 一种经过氮化处理背面吸杂的N沟MOS场效应管,在较宽的温度和偏置范围下对其闪烁噪声进行测量。将经过不等时间吸杂处理后的器件的噪声能量谱进行比较发现:器件经过短时间背面吸杂,其闪烁噪声降低;稍长时间吸杂则噪声趋高。探究噪声能量谱与温度的依赖关系表明:器件的低频噪声是由载流子对SiSiO2界面陷阱的热激发造成的,而背面吸杂则导致SiSiO2的应力衰减,进而改变了截面陷阱的能量分布。 展开更多
关键词 低频噪声 截面陷阱 背面吸杂 MOS场效应管
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