A new design of stato magnetic System is Proposed for 3-phase & 12-pole HB stepper, and it features bet-ter distribution of magntic lield to incare Pullou tope and bopmve Operaonal stability of moor and minimummut...A new design of stato magnetic System is Proposed for 3-phase & 12-pole HB stepper, and it features bet-ter distribution of magntic lield to incare Pullou tope and bopmve Operaonal stability of moor and minimummutual inductance between phase windimp to make design of control circuit easier, and application proved it is as good as expected.展开更多
A scanning probe microscope(SPM)stage controlled by three stepper motors is designed,which has more flexibilitiesthan that of one motor controlled stage,while the control whom is more complicated.In this project,we bu...A scanning probe microscope(SPM)stage controlled by three stepper motors is designed,which has more flexibilitiesthan that of one motor controlled stage,while the control whom is more complicated.In this project,we build the stageactions in an Arduino microcontroller,and finite state machine(FSM)is also built in the Arduino micro controller to communicatewith a computer and a radio frequency(RF)controller.A special displaying scheme with five states is employed to indicatethe operation of the stage.Finally,the stage is fully tested and has a700nm resolution in Z motion of the SPM.展开更多
This paper presents the design and implementation of a Stepper Motor using Nexys2 circuit board based on a Xilinx Spartan 3E Field Programmable Gate Array (FPGA) device with VHDL code. The algorithm implemented on FPG...This paper presents the design and implementation of a Stepper Motor using Nexys2 circuit board based on a Xilinx Spartan 3E Field Programmable Gate Array (FPGA) device with VHDL code. The algorithm implemented on FPGA allows a substantial decrease of the equivalent processing time developed by different velocity controllers. The Stepper Speed control is achieved using VHDL code, and the hardware digital circuit is designed for a programmable rotational stepper motor using VHDL as a tool and FPGA as a target technology. The 50 MHZ provided by the starter kit is divided to obtain the necessary delay time between the motor phases that ranges between 2 - 10 m seconds. Though output selections, the direction of rotation of the stepper motor besides the magnitude of the angle of movement and the rotation speed can be controlled. The major advantage of using reconfigurable hardware (FPGA) in implementing the Stepper Motor instead of a discrete digital component is that it makes modifications to the design easy and quick and also, the total design hence represents an embedded system (works without computer). The total programmable hardware design that controlled on the stepper motor movement, occupied an area that did not exceed 12% of the chip resources.展开更多
Light manipulation and control are essential in various contemporary technologies,and as these technologies evolve,the demand for miniaturized optical components increases.Planar-lens technologies,such as metasurfaces...Light manipulation and control are essential in various contemporary technologies,and as these technologies evolve,the demand for miniaturized optical components increases.Planar-lens technologies,such as metasurfaces and difractive optical elements,have gained attention in recent years for their potential to dramatically reduce the thickness of traditional refractive optical systems.However,their fabrication,particularly for visible wavelengths,involves complex and costly processes,such as high-resolution lithography and dry-etching,which has limited their availability.In this study,we present a simplifed method forfabricating visible Fresnel zone plate(FZP)planar lenses,a type of diffractive optical element,using an i-line stepper and a special photoresist(color resist)that only necessitates coating,exposure,and development,eliminating the need for etching or other post-processing steps.We fabricated visible FZp lens patterns using conventional photolithography equipment on 8-inch silica glass wafers,and demonstrated focusing of 550 nm light to a diameter of 1.1μm with a focusing efficiency of 7.2%.Numerical simulations showed excellent agreement with experimental results,confirming the high precision and designability of our method.Our lenses were also able to image objects with features down to 1.1μm,showcasing their potential for practical applications in imaging.Our method is a cost-effective,simple,and scalable solution for mass production of planar lenses and other optical components operating in the visible region.It enables the development of advanced,miniaturized optical systems to meet modern technology demand,making it a valuable contribution to optical component manufacturing.展开更多
This article discusses the transition of a form of nanoimprint lithography technology,known as Jet and Flash Imprint Lithography(J-FIL),from research to a commercial fabrication infrastructure for leading-edge semicon...This article discusses the transition of a form of nanoimprint lithography technology,known as Jet and Flash Imprint Lithography(J-FIL),from research to a commercial fabrication infrastructure for leading-edge semiconductor integrated circuits(ICs).Leadingedge semiconductor lithography has some of the most aggressive technology requirements,and has been a key driver in the 50-year history of semiconductor scaling.Introducing a new,disruptive capability into this arena is therefore a case study in a“highrisk-high-reward”opportunity.This article first discusses relevant literature in nanopatterning including advanced lithography options that have been explored by the IC fabrication industry,novel research ideas being explored,and literature in nanoimprint lithography.The article then focuses on the J-FIL process,and the interdisciplinary nature of risk,involving nanoscale precision systems,mechanics,materials,material delivery systems,contamination control,and process engineering.Next,the article discusses the strategic decisions that were made in the early phases of the project including:(i)choosing a step and repeat process approach;(ii)identifying the first target IC market for J-FIL;(iii)defining the product scope and the appropriate collaborations to share the risk-reward landscape;and(iv)properly leveraging existing infrastructure,including minimizing disruption to the widely accepted practices in photolithography.Finally,the paper discusses the commercial J-FIL stepper system and associated infrastructure,and the resulting advances in the key lithographic process metrics such as critical dimension control,overlay,throughput,process defects,and electrical yield over the past 5 years.This article concludes with the current state of the art in J-FIL technology for IC fabrication,including description of the high volume manufacturing stepper tools created for advanced memory manufacturing.展开更多
文摘A new design of stato magnetic System is Proposed for 3-phase & 12-pole HB stepper, and it features bet-ter distribution of magntic lield to incare Pullou tope and bopmve Operaonal stability of moor and minimummutual inductance between phase windimp to make design of control circuit easier, and application proved it is as good as expected.
文摘A scanning probe microscope(SPM)stage controlled by three stepper motors is designed,which has more flexibilitiesthan that of one motor controlled stage,while the control whom is more complicated.In this project,we build the stageactions in an Arduino microcontroller,and finite state machine(FSM)is also built in the Arduino micro controller to communicatewith a computer and a radio frequency(RF)controller.A special displaying scheme with five states is employed to indicatethe operation of the stage.Finally,the stage is fully tested and has a700nm resolution in Z motion of the SPM.
文摘This paper presents the design and implementation of a Stepper Motor using Nexys2 circuit board based on a Xilinx Spartan 3E Field Programmable Gate Array (FPGA) device with VHDL code. The algorithm implemented on FPGA allows a substantial decrease of the equivalent processing time developed by different velocity controllers. The Stepper Speed control is achieved using VHDL code, and the hardware digital circuit is designed for a programmable rotational stepper motor using VHDL as a tool and FPGA as a target technology. The 50 MHZ provided by the starter kit is divided to obtain the necessary delay time between the motor phases that ranges between 2 - 10 m seconds. Though output selections, the direction of rotation of the stepper motor besides the magnitude of the angle of movement and the rotation speed can be controlled. The major advantage of using reconfigurable hardware (FPGA) in implementing the Stepper Motor instead of a discrete digital component is that it makes modifications to the design easy and quick and also, the total design hence represents an embedded system (works without computer). The total programmable hardware design that controlled on the stepper motor movement, occupied an area that did not exceed 12% of the chip resources.
文摘Light manipulation and control are essential in various contemporary technologies,and as these technologies evolve,the demand for miniaturized optical components increases.Planar-lens technologies,such as metasurfaces and difractive optical elements,have gained attention in recent years for their potential to dramatically reduce the thickness of traditional refractive optical systems.However,their fabrication,particularly for visible wavelengths,involves complex and costly processes,such as high-resolution lithography and dry-etching,which has limited their availability.In this study,we present a simplifed method forfabricating visible Fresnel zone plate(FZP)planar lenses,a type of diffractive optical element,using an i-line stepper and a special photoresist(color resist)that only necessitates coating,exposure,and development,eliminating the need for etching or other post-processing steps.We fabricated visible FZp lens patterns using conventional photolithography equipment on 8-inch silica glass wafers,and demonstrated focusing of 550 nm light to a diameter of 1.1μm with a focusing efficiency of 7.2%.Numerical simulations showed excellent agreement with experimental results,confirming the high precision and designability of our method.Our lenses were also able to image objects with features down to 1.1μm,showcasing their potential for practical applications in imaging.Our method is a cost-effective,simple,and scalable solution for mass production of planar lenses and other optical components operating in the visible region.It enables the development of advanced,miniaturized optical systems to meet modern technology demand,making it a valuable contribution to optical component manufacturing.
基金This work was partially funded by DARPA Contract No.N66001-02-C-8011NIST Advanced Technology Program Contract No.70NANB4H3012+2 种基金US DoD Contract No.N66001-06-C-2003DARPA A2P Program administered by AFRL Contract No.FA8650-15-C-7542by the National Science Foundation under Cooperative Agreement No.EEC-1160494.
文摘This article discusses the transition of a form of nanoimprint lithography technology,known as Jet and Flash Imprint Lithography(J-FIL),from research to a commercial fabrication infrastructure for leading-edge semiconductor integrated circuits(ICs).Leadingedge semiconductor lithography has some of the most aggressive technology requirements,and has been a key driver in the 50-year history of semiconductor scaling.Introducing a new,disruptive capability into this arena is therefore a case study in a“highrisk-high-reward”opportunity.This article first discusses relevant literature in nanopatterning including advanced lithography options that have been explored by the IC fabrication industry,novel research ideas being explored,and literature in nanoimprint lithography.The article then focuses on the J-FIL process,and the interdisciplinary nature of risk,involving nanoscale precision systems,mechanics,materials,material delivery systems,contamination control,and process engineering.Next,the article discusses the strategic decisions that were made in the early phases of the project including:(i)choosing a step and repeat process approach;(ii)identifying the first target IC market for J-FIL;(iii)defining the product scope and the appropriate collaborations to share the risk-reward landscape;and(iv)properly leveraging existing infrastructure,including minimizing disruption to the widely accepted practices in photolithography.Finally,the paper discusses the commercial J-FIL stepper system and associated infrastructure,and the resulting advances in the key lithographic process metrics such as critical dimension control,overlay,throughput,process defects,and electrical yield over the past 5 years.This article concludes with the current state of the art in J-FIL technology for IC fabrication,including description of the high volume manufacturing stepper tools created for advanced memory manufacturing.
