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Structures and electrochemical hydrogen storage performance of Si added A_2B_7-type alloy electrodes 被引量:6
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作者 张羊换 任慧平 +3 位作者 蔡颖 杨泰 张国芳 赵栋梁 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2014年第2期406-414,共9页
In order to ameliorate the electrochemical hydrogen storage performance of La-Mg-Ni system A2B7-type electrode alloys, a small amount of Si was added. The La0.8Mg0.2Ni3.3Co0.2Six (x=0-0.2) electrode alloys were prep... In order to ameliorate the electrochemical hydrogen storage performance of La-Mg-Ni system A2B7-type electrode alloys, a small amount of Si was added. The La0.8Mg0.2Ni3.3Co0.2Six (x=0-0.2) electrode alloys were prepared by casting and annealing. The effects of adding Si on the structure and electrochemical hydrogen storage characteristics of the alloys were investigated systematically. The results indicate that the as-cast and annealed alloys hold multiple structures, involving two major phases of (La, Mg)2Ni7 with a Ce2Ni7-type hexagonal structure and LaNi5 with a CaCu5-type hexagonal structure as well as one residual phase LaNi3. The addition of Si results in a decrease in (La, Mg)2Ni7 phase and an increase in LaNi5 phase without changing the phase structure of the alloys. What is more, it brings on an obvious effect on electrochemical hydrogen storage characteristics of the alloys. The discharge capacities of the as-cast and annealed alloys decline with the increase of Si content, but their cycle stabilities clearly grow under the same condition. Furthermore, the measurements of the high rate discharge ability, the limiting current density, hydrogen diffusion coefficient as well as electrochemical impedance spectra all indicate that the electrochemical kinetic properties of the electrode alloys first increase and then decrease with the rising of Si content. 展开更多
关键词 A2B7-type electrode alloy si additive structure electrochemical characteristics
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Formation mechanism of periodic layered structure in Ni_3Si/Zn system
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作者 刘亚 董振 +2 位作者 宋媛媛 苏旭平 涂浩 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2014年第12期4053-4058,共6页
The formation of periodic layered structure in Ni3Si/Zn diffusion couples with Zn in vapor or liquid state was investigated by SEM-EDS, FESEM and XRD. The results show that the diffusion path in solid-liquid reaction ... The formation of periodic layered structure in Ni3Si/Zn diffusion couples with Zn in vapor or liquid state was investigated by SEM-EDS, FESEM and XRD. The results show that the diffusion path in solid-liquid reaction is Ni3Si/(T+γ)/γ/…T/γ/Ni4Zn12Si3/γ/…Ni4Zn12Si3/γ/Ni4Zn12Si3/δ…/Ni4Zn12Si3/δ/liquid-Zn, and the diffusion path in solid-vapor reaction is Ni3Si/θ/(T+γ)/γ/…/T/γ/…T/γ/vapor-Zn. With increasing Zn diffusion flux, the diffusion reaction path moves toward the Zn-rich direction, and the distance from the Ni3Si substrate to the periodic layer pair nearest to the interface decreases. In the initial stage of both reactions,γphase nucleates and grows within T matrix phase at first, and then conjuncts together to form a band to reduce the surface energy. Based on the experimental results and diffusion kinetics analysis, the microstructure differences were compared and the formation mechanism of the periodic layered structure in Ni3Si/Zn system was discussed. 展开更多
关键词 NI3si ZN periodic layered structure INTERFACE DIFFUsiON
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SIPOS/Si结构的界面特性
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作者 曹广军 徐彦忠 《华中理工大学学报》 CSCD 北大核心 1996年第3期74-75,共2页
采用红外吸收光谱分析了SIPOS薄膜中Si—O键的结构,对比了热退火、快速灯光退火对SIPOS中Si—O键结构的影响,并结合SIPOS/Si结构的C-V,I-V测试结果,对其界面特性进行了分析.
关键词 界面特性 半导体薄膜 sipos薄膜 si-O键
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Fabrication,characterization and electrochemical properties of porous coral-structured Si/C composite anode for lithium ion battery 被引量:1
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作者 唐芬玲 雷建飞 +3 位作者 崔朝阳 欧阳剑 刘钢 赵灵智 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2015年第12期4046-4053,共8页
A porous coral-structured Si/C composite as an anode material was fabricated by coating Si nanoparticles with a carbon layer from polyvinyl alcohol(PVA), erosion of hydrofluoric(HF) acid, and secondary coating wit... A porous coral-structured Si/C composite as an anode material was fabricated by coating Si nanoparticles with a carbon layer from polyvinyl alcohol(PVA), erosion of hydrofluoric(HF) acid, and secondary coating with pitch. Three samples with different pitch contents of 30%, 40% and 50% were synthesized. The composition and morphology of the composites were characterized by X-ray diffractometry(XRD) and scanning electron microscopy(SEM), respectively, and the properties were tested by electrochemical measurements. The results indicated that the composites showed obviously enhanced electrochemical performance compared with that without secondary carbon coating. The second discharge capacity of the composite was 773 m A·h/g at a current density of 100 m A/g, and still retained 669 m A·h/g after 60 cycles with a small capacity fade of less than 0.23%/cycle, while the content of secondary carbon source of pitch was set at 40%. Therefore, the cycle stability of the composite could be excellently improved by regulating carbon content of secondary coating. 展开更多
关键词 si/C composite secondary coating coral structure anode material Li-ion battery
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镀层重量对热成形后Al-10%Si镀层组织演变的影响
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作者 李建英 张斌 +4 位作者 纪明龙 韩冰 闫佳鹤 刘国龙 冯运莉 《河北冶金》 2025年第10期30-35,共6页
为深入探讨镀层重量对22MnB5热成形钢Al-10%Si镀层组织演化的影响规律,通过在910℃下保温10 min,采用扫描电子显微镜(SEM)、电子探针(EPMA)等技术,系统地对不同重量Al-10%Si镀层奥氏体化后的微观结构及物相组成进行了详细表征。结果表明... 为深入探讨镀层重量对22MnB5热成形钢Al-10%Si镀层组织演化的影响规律,通过在910℃下保温10 min,采用扫描电子显微镜(SEM)、电子探针(EPMA)等技术,系统地对不同重量Al-10%Si镀层奥氏体化后的微观结构及物相组成进行了详细表征。结果表明,奥氏体化处理后,所有镀层均实现了完全合金化,未观察到纯铝相。镀层质量对合金化行为具有显著影响:AS80和AS150镀层形成了典型的四层结构,表现出连续且致密的富Si相;AS40镀层为三层结构,合金化速率更快,这归因于其较短的Fe和Al扩散路径。随着镀层质量的增加,裂纹数量和尺寸显著增多,柯肯达尔孔洞的规模和聚集程度加剧。AS150由于更长的扩散路径,造成更大的扩散不均性和应力梯度,增加了裂纹萌生和扩展的风险。此外,镀层表面颜色的变化直接与Fe氧化程度相关。AS150以FeO为主,氧化程度最低,呈灰色;AS80富含Fe_(3)O_(4),氧化程度适中,呈蓝色;AS40则富含Fe_(2)O_(3),氧化程度最高,呈棕褐色。这种现象表明,镀层重量通过调控Fe向表面的扩散程度,影响氧化产物比例及表面颜色。 展开更多
关键词 镀层重量 热成形钢Al-10%si镀层 镀层结构 扩散 物相 表面色差
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一种基于SIPOS结构的高压深结复合终端 被引量:1
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作者 王振硕 李学宝 +1 位作者 马浩 吴昊天 《电子元件与材料》 CAS CSCD 北大核心 2021年第6期591-596,共6页
为了提高功率芯片的可靠性和耐压能力,结合VLD(横向变掺杂)、JTE(结终端扩展)与SIPOS(半绝缘多晶硅)技术,设计了一种高压深结复合终端结构。所提新结构是在VLD与JTE的复合终端上方覆盖一层SIPOS结构,可以实现终端电场更为均衡,受界面电... 为了提高功率芯片的可靠性和耐压能力,结合VLD(横向变掺杂)、JTE(结终端扩展)与SIPOS(半绝缘多晶硅)技术,设计了一种高压深结复合终端结构。所提新结构是在VLD与JTE的复合终端上方覆盖一层SIPOS结构,可以实现终端电场更为均衡,受界面电荷的影响更小,同时具有更高的击穿电压。以3.3 kV耐压等级的终端为例,利用仿真软件TCAD对所提出的新型终端复合结构进行了工艺和结构上的仿真,并且对影响新结构击穿电压的关键因素进行了分析。结果表明,随着SIPOS结构氧含量的减少,新结构的击穿电压不断提高,并且当界面电荷浓度为4×10^(11) cm^(-2)时,新结构仍能满足芯片耐压等级要求。 展开更多
关键词 终端结构 sipos 界面电荷 功率器件 复合终端
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Si含量对316L不锈钢激光熔覆层凝固行为和显微组织的影响 被引量:2
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作者 古青 包海斌 +5 位作者 王永强 冯敏敏 董刚 尤涵潇 杨高林 姚建华 《表面技术》 北大核心 2025年第5期167-175,共9页
目的研究Si元素含量对316L不锈钢激光熔覆层凝固行为和显微组织的影响。方法利用LDF400-2000光纤耦合半导体激光器和ABB机械手组成的激光熔覆系统,在316L不锈钢基体上制备Si元素的质量分数分别为0.8%、1.6%的316L激光熔覆层。使用金相... 目的研究Si元素含量对316L不锈钢激光熔覆层凝固行为和显微组织的影响。方法利用LDF400-2000光纤耦合半导体激光器和ABB机械手组成的激光熔覆系统,在316L不锈钢基体上制备Si元素的质量分数分别为0.8%、1.6%的316L激光熔覆层。使用金相显微镜、扫描电镜(SEM)、电子背散射衍射(EBSD)、透射电镜(TEM)和维氏硬度计,分别从激光束扫描方向(SD)和切向(TD)分析熔覆层的微观组织、晶粒取向、织构和显微硬度。结果在SD方向,0.8%-Si熔覆层的中下部晶粒呈垂直于底部界面的柱状生长趋势,而顶部晶粒则呈胞状,1.6%-Si熔覆层晶粒的生长模式与0.8%-Si熔覆层类似,但取向更随机。在TD方向,0.8%-Si熔覆层晶粒呈外延状,取向为<100>方向,而1.6%-Si熔覆层则为<111>方向。与0.8%-Si熔覆层相比,1.6%-Si熔覆层内小角度晶界占比更高,超过了50%,在晶粒内部可见被位错缠绕的亚微米颗粒,其硬度也从0.8%-Si熔覆层的199.7HV0.3提升到212.2HV0.3。结论Si元素的含量对激光熔覆316L凝固行为和组织有着显著影响,改变了熔覆层的凝固模式,使组织结构由粗大外延生长的树枝晶转变为沿温度梯度方向生长的细小晶粒。 展开更多
关键词 激光熔覆 si元素 316L 凝固组织 晶粒细化
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SiCp/Al-Si基复合材料制备工艺的研究现状 被引量:2
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作者 苏嶓 王爱琴 +2 位作者 刘瑛 张津浩 谢敬佩 《粉末冶金工业》 北大核心 2025年第2期125-135,共11页
碳化硅颗粒增强铝硅基复合材料由于其具有高的比强度、高的比刚度,耐磨性良好和不易变形等优点,作为结构功能材料在车辆交通、航空航天和精密仪器等领域有着广阔的应用前景。但其在制备和加工过程中会受到热/应力场耦合作用,复合材料微... 碳化硅颗粒增强铝硅基复合材料由于其具有高的比强度、高的比刚度,耐磨性良好和不易变形等优点,作为结构功能材料在车辆交通、航空航天和精密仪器等领域有着广阔的应用前景。但其在制备和加工过程中会受到热/应力场耦合作用,复合材料微观组织中会出现界面反应、增强相的偏聚、Si相及金属间化合物相的多尺度析出及微观结构演变现象,这对于复合材料力学性能的调控是不利的。主要总结了粉末冶金、搅拌铸造、浸渗制备和喷射沉积几种较为成熟的制备工艺的优缺点,并分析了几种制备工艺在参数变量上对复合材料组织和性能的影响。 展开更多
关键词 siCp/Al-si复合材料 制备工艺 组织与性能 颗粒增强 粉末冶金 搅拌铸造 浸渗制备 喷射沉积
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Fabrication and Simulation of Silicon-on-Insulator Structure with Si_3N_4 as a Buried Insulator
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作者 刘奇斌 林青 +2 位作者 刘卫丽 封松林 宋志棠 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2005年第9期1722-1726,共5页
In order to minimize the self-heating effect of the classic SOI devices,SOI structures with Si3 N4 film as a buried insulator (SOSN) are successfully formed using epitaxial layer transfer technology for the first ti... In order to minimize the self-heating effect of the classic SOI devices,SOI structures with Si3 N4 film as a buried insulator (SOSN) are successfully formed using epitaxial layer transfer technology for the first time. The new SOI structures are investigated with high-resolution cross-sectional transmission electron microscopy and spreading resistance profile. Experiment results show that the buried Si3 N4 layer is amorphous and the new SOI material has good structural and electrical properties. The output current characteristics and temperature distribution are simulated and compared to those of standard SOI MOSFETs. Furthermore, the channel temperature and negative differential resistance are reduced during high-temperature operation, suggesting that SOSN can effectively mitigate the selfheating penalty. The new SOI device has been verified in two-dimensional device simulation and indicated that the new structures can reduce device self-heating and increase drain current of the SOI MOSFET. 展开更多
关键词 si3 N4 new SOI structures self-heating effects
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Structure and internal stress of Au films deposited on SiO_2/Si(100) and mica by dc sputtering 被引量:3
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作者 Hong Qiu, Jingchun Sun, Yue Tian, Yan Huang, Liqing Pan, Fengping Wang, and Ping WuDepartment of Physics, Applied Science School, University of Science and Technology Beijing, Beijing 100083, China 《Journal of University of Science and Technology Beijing》 CSCD 2004年第5期415-419,共5页
Au films with a thickness of about 300 nm were deposited on SiO_2/Si(100) andmica substrates by dc sputtering. X-ray diffraction spectroscopy and field emission scanningelectron microscopy were used to analyze the str... Au films with a thickness of about 300 nm were deposited on SiO_2/Si(100) andmica substrates by dc sputtering. X-ray diffraction spectroscopy and field emission scanningelectron microscopy were used to analyze the structure and internal stress of the Au films. Thefirms grown on SiO_2/Si(100) show a preferential orientation of [111] in the growth direction.However the films grown on mica have mixture crystalline orientations of [111], [200], [220] and[311] in the growth direction and the orientations of [200] and [311] are slightly more than thoseof [111] and [220]. An internal stress in the films grown on SiO_2/Si(100) is tensile. For Au filmsgrown on mica the internal stresses in the [111]- and [311]-orientation grains are compressive whilethose in the [200]- and [220]-orientation grains are tensile. Au films grown SiO_2/Si(100) havesome very large grains with a size of about 400 nm and have a wider grain size distribution comparedwith those grown on mica. 展开更多
关键词 gold film MICA siO_2/si(100) structure internal stress
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High-performance Si-Containing anode materials in lithium-ion batteries: A superstructure of Si@Co-NC composite works effectively 被引量:4
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作者 Qiongguang Li Yanhong Wang +4 位作者 Jing Yu Menglei Yuan Qiangqiang Tan Ziyi Zhong Fabing Su 《Green Energy & Environment》 SCIE EI CSCD 2022年第1期116-129,共14页
To mitigate the massive volume expansion of Si-based anode during the charge/discharge cycles,we synthesized a superstructure of Si@Co±NC composite via the carbonization of zeolite imidazolate frameworks incorpor... To mitigate the massive volume expansion of Si-based anode during the charge/discharge cycles,we synthesized a superstructure of Si@Co±NC composite via the carbonization of zeolite imidazolate frameworks incorporated with Si nanoparticles.The Si@Co±NC is comprised of Sinanoparticle core and N-doped/Co-incorporated carbon shell,and there is void space between the core and the shell.When using as anode material for LIBs,Si@Co±NC displayed a super performance with a charge/discharge capacity of 191.6/191.4 mA h g^(-1)and a coulombic efficiency of 100.1%at 1000 mA g^(-1)after 3000 cycles,and the capacity loss rate is 0.022%per cycle only.The excellent electrochemical property of Si@Co±NC is because its electronic conductivity is enhanced by doping the carbon shell with N atoms and by incorporating with Co particles,and the pathway of lithium ions transmission is shortened by the hollow structure and abundant mesopores in the carbon shell.Also,the volume expansion of Si nanoparticles is well accommodated in the void space and suppressed by the carbon host matrix.This work shows that,through designing a superstructure for the anode materials,we can synergistically reduce the work function and introduce the confinement effect,thus significantly enhancing the anode materials’electrochemical performance in LIBs. 展开更多
关键词 Confinement effect Work function regulation Doping Hollow core-shell structure si anode
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Microstructure evolution of a hypereutectic Nb–Ti–Si–Cr–Al–Hf alloy processed by directional solidification 被引量:5
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作者 Ding Fei Jia Lina +3 位作者 Yuan Sainan Su Linfen Weng Junfei Zhang Hu 《Chinese Journal of Aeronautics》 SCIE EI CAS CSCD 2014年第2期438-444,共7页
In this work, the Nb-14Si 24Ti-10Cr-2Al-2Hf-0.1Y alloy (at.%) was processed by the liquid-metal-cooled directional solidification (DS) at 1750 ℃ with withdrawal rates of 1.2, 6, 18 mm/min and post heat treatment ... In this work, the Nb-14Si 24Ti-10Cr-2Al-2Hf-0.1Y alloy (at.%) was processed by the liquid-metal-cooled directional solidification (DS) at 1750 ℃ with withdrawal rates of 1.2, 6, 18 mm/min and post heat treatment (HT) at 1450 ℃ for 10 h. The microstructures of the direction- ally solidified and heat treated samples were investigated. The results show that the microstructure of directionally solidified alloy mainly consists of petaloid Nbss + Nb5Si3 eutectics and Ti-rich Nbss + Nb5Si3 + Cr2Nb eutectics. With the increase of withdrawal rate, the primary NbsSi3 is eliminated, Nbss + Nb5Si3 eutectic cells turn round and connected with the microstructure refine- ment and Nbss + Nb5Si3 + CrzNb eutectics turn to a river-like morphology. After heat treatment, Nbss + Nb5Si3 + Cr2Nb eutectics disappeared and petaloid Nbss + Nb5Si3 eutectics turn to a spe- cific fiber-mesh structure gradually, which is promoted by higher withdrawal rates. Furthermore, both the volume fraction of Cr2Nb and the content of Cr in Nbss of Nbss + Nb5Si3 eutectics change regularly with the increase of withdrawal rate and heat treatment at 1450 ℃ for 10 h. 展开更多
关键词 Directional solidification Fiber-mesh structure Heat treatment Microstructure evolution Nbss Nb5si3 eutectics Solutc diffusion Volume fraction
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Theoretical Studies on the Si(001)-SiO_2 Interface Structure 被引量:1
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作者 ZHOU Ming-Xiu YANG Chun +2 位作者 DENG Xiao-Yan YU Wei-Fei LI Jin-Shan 《Chinese Journal of Structural Chemistry》 SCIE CAS CSCD 北大核心 2006年第6期647-652,共6页
Novel models (2× 1) of Si(001)-SiO2 interface structure have been established. The method of the first-principle General Gradient Approximation (GGA) is employed to structurally optimize the established the... Novel models (2× 1) of Si(001)-SiO2 interface structure have been established. The method of the first-principle General Gradient Approximation (GGA) is employed to structurally optimize the established theoretical models under the K-point space of periodic boundary condition. The structures after optimization have been analyzed, and the results show that the interfaces present in disordered state and both Si-O-Si and Si=O structures exist. Meanwhile, the bonding of surface structure is analyzed via the graphics of electron localization function(ELF). 展开更多
关键词 si/siO2 DFT interface structure
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Theoretical prediction of new C–Si alloys in C2/m-20 structure 被引量:1
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作者 徐向阳 柴常春 +1 位作者 樊庆扬 杨银堂 《Chinese Physics B》 SCIE EI CAS CSCD 2017年第4期283-292,共10页
We study structural,mechanical,and electronic properties of C_(20),Si_(20) and their alloys(C_(16)Si_4,C_(12)Si_8,C_8Si_(12),and C_4Si_(16)) in C2/m structure by using density functional theory(DFT) ba... We study structural,mechanical,and electronic properties of C_(20),Si_(20) and their alloys(C_(16)Si_4,C_(12)Si_8,C_8Si_(12),and C_4Si_(16)) in C2/m structure by using density functional theory(DFT) based on first-principles calculations.The obtained elastic constants and the phonon spectra reveal mechanical and dynamic stability.The calculated formation enthalpy shows that the C-Si alloys might exist at a specified high temperature scale.The ratio of BIG and Poisson's ratio indicate that these C-Si alloys in C2/m-20 structure are all brittle.The elastic anisotropic properties derived by bulk modulus and shear modulus show slight anisotropy.In addition,the band structures and density of states are also depicted,which reveal that C_(20),C_(16)Si_4,and Si_(20) are indirect band gap semiconductors,while C_8Si_(12) and C_4Si_(16) are semi-metallic alloys.Notably,a direct band gap semiconductor(C_(12)Si_8) is obtained by doping two indirect band gap semiconductors(C_(20) and Si_(20)). 展开更多
关键词 C–si alloys mechanical properties band structure direct band gap semiconductor
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Fabrication of Anti-reflecting Si Nano-structures with Low Aspect Ratio by Nano-sphere Lithography Technique 被引量:1
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作者 Shenghua Sun Peng Lu +4 位作者 Jun Xu Ling Xu Kunji Chen Qimin Wang Yuhua Zuo 《Nano-Micro Letters》 SCIE EI CAS 2013年第1期18-25,共8页
Nano-structured photon management is currently an interesting topic since it can enhance the optical absorption and reduce the surface reflection which will improve the performance of many kinds of optoelectronic devi... Nano-structured photon management is currently an interesting topic since it can enhance the optical absorption and reduce the surface reflection which will improve the performance of many kinds of optoelectronic devices, such as Si-based solar cells and light emitting diodes. Here, we report the fabrication of periodically nano-patterned Si structures by using polystyrene nano-sphere lithography technique. By changing the diameter of nano-spheres and the dry etching parameters, such as etching time and etching power, the morphologies of formed Si nano-structures can be well controlled as revealed by atomic force microscopy.A good broadband antireflection property has been achieved for the formed periodically nano-patterned Si structures though they have the low aspect ratio(<0.53). The reflection can be significantly reduced compared with that of flat Si substrate in a wavelength range from 400 nm to 1200 nm. The weighted mean reflection under the AM1.5 solar spectrum irradiation can be as low as 3.92% and the corresponding optical absorption is significantly improved, which indicates that the present Si periodic nano-structures can be used in Si-based thin film solar cells. 展开更多
关键词 Nano-sphere lithograph Nano-patterned si structures ANTIREFLECTION
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Microstructure and mechanical properties of Cu/Al joints brazed using(Cu,Ni,Zr,Er)-modified Al−Si filler alloys 被引量:3
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作者 Hua-xin LI Ying-dian FENG +7 位作者 Wei-jian SHEN Chuan-yang LÜ Wen-jian ZHENG Ying-he MA Gang MA Zhong-ping JIN Yan-ming HE Jian-guo YANG 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2022年第11期3623-3634,共12页
To design a promising Al−Si filler alloy with a relatively low melting-point,good strength and plasticity for the Cu/Al joint,the Cu,Ni,Zr and Er elements were innovatively added to modify the traditional Al−Si eutect... To design a promising Al−Si filler alloy with a relatively low melting-point,good strength and plasticity for the Cu/Al joint,the Cu,Ni,Zr and Er elements were innovatively added to modify the traditional Al−Si eutectic filler.The microstructure and mechanical properties of filler alloys and Cu/Al joints were investigated.The result indicated that the Al−Si−Ni−Cu filler alloys mainly consisted of Al(s,s),Al_(2)(Cu,Ni)and Si(s,s).The Al−10Si−2Ni−6Cu filler alloy exhibited relatively low solidus(521℃)and liquidus(577℃)temperature,good tensile strength(305.8 MPa)and fracture elongation(8.5%).The corresponding Cu/Al joint brazed using Al−10Si−2Ni−6Cu filler was mainly composed of Al_(8)(Mn,Fe)_(2)Si,Al_(2)(Cu,Ni)3,Al(Cu,Ni),Al_(2)(Cu,Ni)and Al(s,s),yielding a shear strength of(90.3±10.7)MPa.The joint strength was further improved to(94.6±2.5)MPa when the joint was brazed using the Al−10Si−2Ni−6Cu−0.2Er−0.2Zr filler alloy.Consequently,the(Cu,Ni,Zr,Er)-modified Al−Si filler alloy was suitable for obtaining high-quality Cu/Al brazed joints. 展开更多
关键词 Cu/Al joint BRAZING Al−si filler alloy interface structure joint strength
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Extended x-ray absorption fine structure study of MnFeP_(0.56)Si_(0.44) compound 被引量:3
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作者 李英杰 哈斯朝鲁 +4 位作者 乌仁图雅 宋志强 欧志强 特古斯 中井生央 《Chinese Physics B》 SCIE EI CAS CSCD 2015年第8期444-449,共6页
The Mn Fe P0.56Si0.44 compound is investigated by x-ray diffraction, magnetic measurements, and x-ray absorption fine structure spectroscopy. It crystallizes in Fe2P-type structure with the lattice parameters a = b = ... The Mn Fe P0.56Si0.44 compound is investigated by x-ray diffraction, magnetic measurements, and x-ray absorption fine structure spectroscopy. It crystallizes in Fe2P-type structure with the lattice parameters a = b = 5.9823(0) and c = 3.4551(1) and undergoes a first-order phase transition at the Curie temperature of 255 K. The Fe K edge and Mn K edge x-ray absorption fine structure spectra show that Mn atoms mainly reside at 3g sites, while 3f sites are occupied by Fe atoms. The distances between the absorbing Fe atom and the first and second nearest neighbor Fe atoms in a 3f-layer shift from 2.65 and 4.01 in the ferromagnetic state to 2.61 and 3.96 in the paramagnetic phase. On the other hand, the distance between the 3g-layer and 3f-layer changes a little as 2.66 –2.73 below the Curie temperature and2.68 –2.75 above it. 展开更多
关键词 Mn Fe P0.56si0.44 compound Mn K edge Fe K edge EXAFS local structure
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Effects of Si δ-Doping Condition and Growth Interruption on Electrical Properties of InP-Based High Electron Mobility Transistor Structures 被引量:3
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作者 周书星 齐鸣 +4 位作者 艾立鹍 徐安怀 汪丽丹 丁芃 金智 《Chinese Physics Letters》 SCIE CAS CSCD 2015年第9期112-115,共4页
The InGaAs/InAIAs/InP high electron mobility transistor (HEM:F) structures with lattice-matched and pseudo- morphic channels are grown by gas source molecular beam epitaxy. Effects of Si ^-doping condition and grow... The InGaAs/InAIAs/InP high electron mobility transistor (HEM:F) structures with lattice-matched and pseudo- morphic channels are grown by gas source molecular beam epitaxy. Effects of Si ^-doping condition and growth interruption on the electrical properties are investigated by changing the Si-cell temperature, doping time and growth process. It is found that the optimal Si ^-doping concentration (Nd) is about 5.0 x 1012 cm-2 and the use of growth interruption has a dramatic effect on the improvement of electrical properties. The material structure and crystal interface are analyzed by secondary ion mass spectroscopy and high resolution transmission elec- tron microscopy. An InGaAs/InAiAs/InP HEMT device with a gate length of lOOnm is fabricated. The device presents good pinch-off characteristics and the kink-effect of the device is trifling. In addition, the device exhibits fT = 249 GHa and fmax 〉 400 GHz. 展开更多
关键词 InP InGaAs Doping Condition and Growth Interruption on Electrical Properties of InP-Based High Electron Mobility Transistor structures Effects of si
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Effect of electric pulse treatment on solidification structure of an Al-15%Si alloy 被引量:7
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作者 SHI Xiangdong WANG Jingsong +3 位作者 XUE Qingguo CANG Daqiang WANG Liping WU Shupiao 《Rare Metals》 SCIE EI CAS CSCD 2005年第3期288-292,共5页
The effect of electric pulse modifying on the solidification structure of an Al-15%Si alloy was investigated. The result shows that the primary silicon disappears sometimes and the eutectic phase is refined after the ... The effect of electric pulse modifying on the solidification structure of an Al-15%Si alloy was investigated. The result shows that the primary silicon disappears sometimes and the eutectic phase is refined after the treatrnent of EP (electric pulse) though there are different modalities in different treating durations. DSC (differential scanning calorimetry) analysis indicates that the super-cooling texture decreases and the freezing range narrows evidently after the electric pulse treatment. 展开更多
关键词 solidification structure electric pulse Al-si alloy DSC
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Preparation,structure and luminescence properties of deep red phosphors SrSiN2:Eu^2+ 被引量:1
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作者 陈磊 刘荣辉 +4 位作者 庄卫东 刘元红 胡运生 马小乐 胡斌 《Journal of Rare Earths》 SCIE EI CAS CSCD 2016年第1期30-35,共6页
This paper reported a novel synthetic route to Eu2+ doped SrSiN2 deep red phosphors for white light-emitting diodes. A series of single-phased and high-efficiency SrSiN2:Eu2+ red phosphors were synthesized based on... This paper reported a novel synthetic route to Eu2+ doped SrSiN2 deep red phosphors for white light-emitting diodes. A series of single-phased and high-efficiency SrSiN2:Eu2+ red phosphors were synthesized based on this method. Their structure, morphology, luminescence, quantum efficiency (QE) and thermal quenching properties were investigated and compared with those of SrSiN2: Eu2+ prepared by the conventional route. It was found that the addition of a small amount of Si3N4 could promote the formation of SrSiN2 from Sr2SisN8 phase. A highly uniform rod-shaped morphology was obtained based on this method. The X-ray powder diffraction and the Rietveld refinement analysis identified the preferential crystalline orientation growth. Under the blue light excitation, Eu2+ doped SrSiN2 phosphors showed excellent optical properties. Compared with those prepared by the conventional approaches, the external QE of SrSiN2:Eu2+ phosphor was greatly improved, allowing it a promising phosphor for white LEDs. 展开更多
关键词 red phosphors NITRIDE quantum efficiency Sr2si5N8 structure rare earths
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