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Effects of Post-Thermal Treatment on Quality of SiC Grown by PVT Method 被引量:1
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作者 朱丽娜 陈小龙 +3 位作者 杨慧 彭同华 倪代秦 胡伯清 《Chinese Physics Letters》 SCIE CAS CSCD 2006年第8期2273-2276,共4页
We report the effects of post-thermal treatment on the quality of 2-inch 6H-SiC wafer cut from a crystal boule grown by physical vapour transportation method. The full widths at half maximum of x-ray diffraction rocki... We report the effects of post-thermal treatment on the quality of 2-inch 6H-SiC wafer cut from a crystal boule grown by physical vapour transportation method. The full widths at half maximum of x-ray diffraction rocking curves measured on sites across the 2-inch wafer become narrower, indicating the quality improvement after a three-step post-thermal treatment. It is found that the most common defects such as micropipes and inclusions can be significantly reduced after the treatment. Our results show that the post-thermal treatment is an effective route to improve the quality of SiC single crystals. 展开更多
关键词 CARBIDE SINGLE-CRYSTALS silicon-carbide SUBLIMATION GROWTH VAPORTRANSPORT DEFECTS INGOTS
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Study on Synthesis of Nanometer SiC Precursors with Sol-Gel of SiO_2-Lignin in the Pulp Black Liquor 被引量:1
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作者 LIU Deqi(Chemistry and Chemical Engineering Department of University, Suzhou, Jiangsu 215006, China) 《China's Refractories》 CAS 2002年第1期17-20,共4页
In the process of synthesis of nanometer SiC precursors with sol-gel of SiO2 and lignin , the products of all sizes required can be controlled by the concentration of reac-t ants , pH, temperature, reaction and ageing... In the process of synthesis of nanometer SiC precursors with sol-gel of SiO2 and lignin , the products of all sizes required can be controlled by the concentration of reac-t ants , pH, temperature, reaction and ageing time , and so on . The best conditions in this research are : the concentration of Na2SiO3 and organic matters are 4. 50% and 26.4% respectively, pH = 3.3 , T = 65℃ , ageing time is 30min , dried at 150 ℃ , the size of SiC precursors is about 2.0μm . 展开更多
关键词 Pulp black liquor Silica LIGNIN Sol-gel method silicon-carbide Precursors
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Sinusoidal Steady State Analysis on 4H-SiC Buried Channel MOSFETs
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作者 张韬 吕红亮 +2 位作者 张义门 张玉明 叶丽辉 《Chinese Physics Letters》 SCIE CAS CSCD 2008年第5期1818-1821,共4页
With the combined use of the drift-diffusion (DD) model, experiment measured parameters and small-signal sinusoidM steady-state analysis, we extract the Y-parameters for 4H-SiC buried-channel metal oxide semicon- du... With the combined use of the drift-diffusion (DD) model, experiment measured parameters and small-signal sinusoidM steady-state analysis, we extract the Y-parameters for 4H-SiC buried-channel metal oxide semicon- ductor field effect transistors (BCMOSFETs). Output short-circuit current gain G and Mason's invariant U are cMculated for extrapolating unity current gain frequency in the common-source configuration fT and the maximum frequency of oscillation fmax, respectively. Here fT = 800 MHz and fmax= 5 GHz are extracted for the 4H-SiC BCMOSFETs, while the field effect mobility reaches its peak value 87cm2/Vs when VGs = 4.5 V. Simulation results clearly show that the characteristic frequency of 4H-SiC BCMOSFETs and field effect mobility are superior, due to the novel structure, compared with conventional MOSFETs. 展开更多
关键词 INTERFACE STATES silicon-carbide MOS DEVICES MOBILITY SIMULATION DENSITY 6H
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X-Ray Photoelectron Spectroscopy and Reflection High Energy Electron Diffraction of Epitaxial Growth SiC on Si(100) Using C60 and Si
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作者 刘衍芳 刘金峰 +1 位作者 徐彭寿 潘海斌 《Chinese Physics Letters》 SCIE CAS CSCD 2007年第7期2022-2024,共3页
The formation of silicon carbide upon deposition of C60 and Si on Si(100) surface at 850^o C is studied via x-ray photoelectron spectroscopy and reflection high energy electron diffraction (RHEED). The C ls, O ls ... The formation of silicon carbide upon deposition of C60 and Si on Si(100) surface at 850^o C is studied via x-ray photoelectron spectroscopy and reflection high energy electron diffraction (RHEED). The C ls, O ls and Si 2p core-level spectra and the RHEED patterns indicate the formation of 3C-SiC. 展开更多
关键词 silicon-carbide FILMS CARBONIZATION TEMPERATURE MOLECULES SURFACE
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