The self-assembled monolayers （SAMs） of imidazoline （IM） on the iron surface were characterized by scanning electron microscope （SEM） and scanning electrochemical microscopy （SECM）. The results showed that SAM...The self-assembled monolayers （SAMs） of imidazoline （IM） on the iron surface were characterized by scanning electron microscope （SEM） and scanning electrochemical microscopy （SECM）. The results showed that SAMs were an effective inhibition film for iron.展开更多
s: Cellulose/cellulose acetate membranes were prepared and functionalized by introducing amino group on it, and then immobilized the glucose oxidase (Gox) on the functionalizd membrane. SECM was applied for the detec...s: Cellulose/cellulose acetate membranes were prepared and functionalized by introducing amino group on it, and then immobilized the glucose oxidase (Gox) on the functionalizd membrane. SECM was applied for the detection of enzyme activity immobilized on the membrane. Immobilized biomolecules on such membranes was combined with analysis apparatus and can be used in bioassays.展开更多
Here we report a novel generation/collection operation mode of scanning electrochemical microscopy,in which a theta micropipette was employed to support two adjacent water/1,2-dichloroethane interfaces separated by th...Here we report a novel generation/collection operation mode of scanning electrochemical microscopy,in which a theta micropipette was employed to support two adjacent water/1,2-dichloroethane interfaces separated by the thin central glass wall：one acts as the generator while the other as the collector.The generation current,collection current and collection efficiency were enhanced significantly when the tip approached to an insulate substrate.展开更多
The etching resolution of electrochemical fabrication technique is influenced significantly by the diffusion layer of the etchant. It has been shown that a fast etching rate can achieve higher etching resolution due t...The etching resolution of electrochemical fabrication technique is influenced significantly by the diffusion layer of the etchant. It has been shown that a fast etching rate can achieve higher etching resolution due to so-called heterogeneous scavenging effect, while a lower etching rate will result in rather lower etching resolution. For the latter case, the confined etchant layer technique(CELT) has been employed to improve the etching resolution. i. e., a certain redox couple which can consume the etchant homogeneously and rapidly was added to the solution. The homogeneous scavenging effect confined the etchant within a narrow layer around the electrode surface and much improved etching resolution was achieved. Using the CELT and a needle-shaped microelectrode, an etching spot of several micro-meters was obtained at silicon wafer surface.展开更多
文摘目的发展具有空间分辨的腐蚀电化学研究方法。方法用电沉积方法在铜基体上制备Ni和Ni-P涂层,应用扫描电镜和XRD检测涂层表面形貌和晶体结构,采用扫描电化学显微镜(SECM)研究Ni和Ni-P涂层在不同浓度Na Cl溶液中的失效行为,并结合COMSOL多物理场软件建立二维和三维模型,模拟量化活性点大小和反馈机制。结果低浓度Cl-对于纯Ni涂层具有活化作用,增加Cl-浓度会促进腐蚀发生。Ni-P合金涂层在低浓度Na Cl溶液中,短时间内保持良好的稳定性,浸泡6 h后,低P合金涂层出现典型的活性点和腐蚀产物,而高P合金涂层在浸泡24 h后出现腐蚀产物和活性区域。0.1 mol/L的Na Cl溶液促进低P合金涂层局部腐蚀的发生,而涂层在0.3 mol/L Na Cl溶液中则以发生均匀腐蚀为主。逼近曲线及其模拟结果表明,腐蚀产物对于Fc Me OH的电化学过程完全失活,而新鲜Cu表面对Fc Me OH氧化还原过程受扩散控制。三维模拟结果显示,低P合金涂层失效过程中活性点大小接近10μm。结论 Ni和Ni-P合金涂层的失效过程中活性点的形成、腐蚀产物的生成和累积过程与SECM面扫描图谱中正负反馈效应相关,Cl-促进腐蚀发生,其浓度影响腐蚀类型。COMSOL多物理场模拟明确反馈效应与探针和基底的距离有关,Ni-P涂层失效活性点大小在微米级。
基金the National Natural Science Foundation of China(No.20573069)for financial support of this research.
文摘The self-assembled monolayers （SAMs） of imidazoline （IM） on the iron surface were characterized by scanning electron microscope （SEM） and scanning electrochemical microscopy （SECM）. The results showed that SAMs were an effective inhibition film for iron.
文摘s: Cellulose/cellulose acetate membranes were prepared and functionalized by introducing amino group on it, and then immobilized the glucose oxidase (Gox) on the functionalizd membrane. SECM was applied for the detection of enzyme activity immobilized on the membrane. Immobilized biomolecules on such membranes was combined with analysis apparatus and can be used in bioassays.
基金supported by the National Natural Science Foundation of China(No.20973142)the NSFC Innovation Group of Interfacial Electrochemistry(No.21021002)National Project 985 of High Education,New Faculty Starting Package of Xiamen University
文摘Here we report a novel generation/collection operation mode of scanning electrochemical microscopy,in which a theta micropipette was employed to support two adjacent water/1,2-dichloroethane interfaces separated by the thin central glass wall：one acts as the generator while the other as the collector.The generation current,collection current and collection efficiency were enhanced significantly when the tip approached to an insulate substrate.
基金Funding from the U.S.Army Research Laboratory under agreement No.W911NF-14–2–0005 with Dr.Joe Labukas as project manager supported co-author JMFFunding by the Office of Naval Research grant No.N000141210967 with Dr.David A.Shifler as scientific officer supported co-author LGBThe Bruker Dimension Icon AFM utilized in this work is located in the Boise State University Surface Science Laboratory(SSL),which is part of the FaCT Core Facility,RRID:SCR_024733,that receives support from the National Institutes of Health under the Institutional Development Awards Program of the National Institute of General Medical Sciences via grants#P20GM148321 and P20GM103408,the former of which also partially supports co-authors CME and PHD.
文摘The etching resolution of electrochemical fabrication technique is influenced significantly by the diffusion layer of the etchant. It has been shown that a fast etching rate can achieve higher etching resolution due to so-called heterogeneous scavenging effect, while a lower etching rate will result in rather lower etching resolution. For the latter case, the confined etchant layer technique(CELT) has been employed to improve the etching resolution. i. e., a certain redox couple which can consume the etchant homogeneously and rapidly was added to the solution. The homogeneous scavenging effect confined the etchant within a narrow layer around the electrode surface and much improved etching resolution was achieved. Using the CELT and a needle-shaped microelectrode, an etching spot of several micro-meters was obtained at silicon wafer surface.
