Van der Waals （vdW） heterojunctions are equipped to avert dangling bonds due to weak, inter-layer vdW force, and ensure strong in-plane covalent bonding for two-dimensional layered structures. We fabricated four het...Van der Waals （vdW） heterojunctions are equipped to avert dangling bonds due to weak, inter-layer vdW force, and ensure strong in-plane covalent bonding for two-dimensional layered structures. We fabricated four heterojunctions devices of different layers based on p-type distorted 1T-MX2 ReSe2 and n-type hexagonal MoS2 nanoflakes, and measured their electronic and optoelectronic properties. The device showed a high rectification coefficient of 500 for the diode, a high ON/OFF ratio and higher electron mobility for the field-effect transistor （FET） compared with the individual components, and a high current responsivity （Rλ） and external quantum efficiency （EQE） of 6.75 A/W and 1,266%, respectively, for the photodetector.展开更多
Heterojunction and morphology control assume a significant part in adjusting the intrinsic electromagnetic properties of absorbers to acquire outstanding microwave absorption(MA)performance,but this still faces huge c...Heterojunction and morphology control assume a significant part in adjusting the intrinsic electromagnetic properties of absorbers to acquire outstanding microwave absorption(MA)performance,but this still faces huge challenges.Herein,FeS_(2)/C/MoS_(2)composite with core–shell structure was successfully designed and prepared via a multi-interface engineering.MoS_(2)nanosheets with 1T and 2H phases are coated on the outside of FeS_(2)/C to form a porous interconnected structure that can optimize the impedance matching characteristics and strengthen the interfacial polarization loss capacity.Remarkably,as-fabricated FCM-3 harvests a broad effective absorption bandwidth(EAB)of 5.12 GHz and a minimum reflection loss(RL_(min))value of-45.1 d B.Meanwhile,FCM-3 can accomplish a greatest radar cross section(RCS)reduction value of 18.52 d B m^(2)when the detection angle is 0°.Thus,the convenient computer simulation technology(CST)simulations and encouraging accomplishments provide a novel avenue for the further development of efficient and lightweight MA materials.展开更多
Metal–insulator–semiconductor(MOS) capacitor is a key structure for high performance MOS field transistors(MOSFETs), requiring low leakage current, high breakdown voltage, and low interface states. In this paper, β...Metal–insulator–semiconductor(MOS) capacitor is a key structure for high performance MOS field transistors(MOSFETs), requiring low leakage current, high breakdown voltage, and low interface states. In this paper, β-Ga_(2)O_(3) MOS capacitors were fabricated with ALD deposited Al_(2)O_(3) using H_(2)O or ozone(O_(3)) as precursors. Compared with the Al_(2)O_(3) gate dielectric with H_(2)O as ALD precursor, the leakage current for the O_(3) precursor case is decreased by two orders of magnitude, while it keeps the same level at the fixed charges, interface state density, and border traps. The SIMS tests show that Al_(2)O_(3) with O_(3) as precursor contains more carbon impurities. The current transport mechanism analysis suggests that the C–H complex in Al_(2)O_(3) with O_(3) precursor serves as deep energy trap to reduce the leakage current. These results indicate that the Al_(2)O_(3)/β-Ga_(2)O_(3)MOS capacitor using the O_(3) precursor has a low leakage current and holds potential for application in β-Ga_(2)O_(3) MOSFETs.展开更多
基于密度泛函理论的第一性原理方法,计算了Se掺杂单层MoS_2能带结构和光吸特性,并分析了对其光解水性质的影响。结果表明:本征单层MoS_2为直接带隙结构,禁带宽度为1.740 e V,导带底电位在H+/H2还原势之上0.430 e V,价带顶电位在O2/H2O...基于密度泛函理论的第一性原理方法,计算了Se掺杂单层MoS_2能带结构和光吸特性,并分析了对其光解水性质的影响。结果表明:本征单层MoS_2为直接带隙结构,禁带宽度为1.740 e V,导带底电位在H+/H2还原势之上0.430 e V,价带顶电位在O2/H2O的氧化势之下0.080 e V,具有可见光催化分解水的能力,但氧化和还原能力不均衡,导致单层MoS_2作为光催化剂分解水的效率不高。通过Se掺杂计算发现,单层MoS_2的禁带宽度变为1.727 e V,相应的光吸收谱变化幅度几乎不变,且体系的形成能较低,表明其热力学稳定性良好。然而,导带底电位调整到H+/H2还原势之上0.253 e V,价带顶电位处于O2/H2O的氧化势之下0.244e V,平衡了氧化与还原能力,单层MoS_2可见光催化分解水的效率得到提高。展开更多
基金This work was supported by the ＂Hundred Talents Program＂ of Chinese Academy of Sciences （CAS）,the National Natural Science Foundation of China （No. 91233120）, and the CAS/SAFEA International Partnership Program for Creative Research Teams.
文摘Van der Waals （vdW） heterojunctions are equipped to avert dangling bonds due to weak, inter-layer vdW force, and ensure strong in-plane covalent bonding for two-dimensional layered structures. We fabricated four heterojunctions devices of different layers based on p-type distorted 1T-MX2 ReSe2 and n-type hexagonal MoS2 nanoflakes, and measured their electronic and optoelectronic properties. The device showed a high rectification coefficient of 500 for the diode, a high ON/OFF ratio and higher electron mobility for the field-effect transistor （FET） compared with the individual components, and a high current responsivity （Rλ） and external quantum efficiency （EQE） of 6.75 A/W and 1,266%, respectively, for the photodetector.
基金financially supported by the National Natural Science Foundation of China(Nos.52402354,62174016 and 12374394)China Postdoctoral Science Foundation(Nos.2023M740471)the Natural Science Foundation of Jiangsu Higher Education Institutions(Nos.24KJB430002)。
文摘Heterojunction and morphology control assume a significant part in adjusting the intrinsic electromagnetic properties of absorbers to acquire outstanding microwave absorption(MA)performance,but this still faces huge challenges.Herein,FeS_(2)/C/MoS_(2)composite with core–shell structure was successfully designed and prepared via a multi-interface engineering.MoS_(2)nanosheets with 1T and 2H phases are coated on the outside of FeS_(2)/C to form a porous interconnected structure that can optimize the impedance matching characteristics and strengthen the interfacial polarization loss capacity.Remarkably,as-fabricated FCM-3 harvests a broad effective absorption bandwidth(EAB)of 5.12 GHz and a minimum reflection loss(RL_(min))value of-45.1 d B.Meanwhile,FCM-3 can accomplish a greatest radar cross section(RCS)reduction value of 18.52 d B m^(2)when the detection angle is 0°.Thus,the convenient computer simulation technology(CST)simulations and encouraging accomplishments provide a novel avenue for the further development of efficient and lightweight MA materials.
基金Project supported in part by the Science and Technology Development Plan Project of Jilin Province, China (Grant No. YDZJ202303CGZH022)the National Key Research and Development Program of China (Grant No. 2024YFE0205300)+1 种基金the National Natural Science Foundation of China (Grant No. 62471504)the Open Fund of the State Key Laboratory of Optoelectronic Materials and Technologies (Sun Yat-Sen University) (Grant No. OEMT-2023KF-05)。
文摘Metal–insulator–semiconductor(MOS) capacitor is a key structure for high performance MOS field transistors(MOSFETs), requiring low leakage current, high breakdown voltage, and low interface states. In this paper, β-Ga_(2)O_(3) MOS capacitors were fabricated with ALD deposited Al_(2)O_(3) using H_(2)O or ozone(O_(3)) as precursors. Compared with the Al_(2)O_(3) gate dielectric with H_(2)O as ALD precursor, the leakage current for the O_(3) precursor case is decreased by two orders of magnitude, while it keeps the same level at the fixed charges, interface state density, and border traps. The SIMS tests show that Al_(2)O_(3) with O_(3) as precursor contains more carbon impurities. The current transport mechanism analysis suggests that the C–H complex in Al_(2)O_(3) with O_(3) precursor serves as deep energy trap to reduce the leakage current. These results indicate that the Al_(2)O_(3)/β-Ga_(2)O_(3)MOS capacitor using the O_(3) precursor has a low leakage current and holds potential for application in β-Ga_(2)O_(3) MOSFETs.
文摘基于密度泛函理论的第一性原理方法,计算了Se掺杂单层MoS_2能带结构和光吸特性,并分析了对其光解水性质的影响。结果表明:本征单层MoS_2为直接带隙结构,禁带宽度为1.740 e V,导带底电位在H+/H2还原势之上0.430 e V,价带顶电位在O2/H2O的氧化势之下0.080 e V,具有可见光催化分解水的能力,但氧化和还原能力不均衡,导致单层MoS_2作为光催化剂分解水的效率不高。通过Se掺杂计算发现,单层MoS_2的禁带宽度变为1.727 e V,相应的光吸收谱变化幅度几乎不变,且体系的形成能较低,表明其热力学稳定性良好。然而,导带底电位调整到H+/H2还原势之上0.253 e V,价带顶电位处于O2/H2O的氧化势之下0.244e V,平衡了氧化与还原能力,单层MoS_2可见光催化分解水的效率得到提高。
