This paper proposes an effective method of fabricating top contact organic field effect transistors by using a pho- tolithographic process. The semiconductor layer is protected by a passivation layer. Through photolit...This paper proposes an effective method of fabricating top contact organic field effect transistors by using a pho- tolithographic process. The semiconductor layer is protected by a passivation layer. Through photolithographic and etching processes, parts of the passivation layer are etched off to form source/drain electrode patterns. Combined with conventional evaporation and lift-off techniques, organic field effect transistors with a top contact are fabricated suc- cessfully, whose properties are comparable to those prepared with the shadow mask method and one order of magnitude higher than the bottom contact devices fabricated by using a photolithographic process.展开更多
Microdisplay panels are critical components for metaverse technology.Aiming to achieve high-resolution and full-color microdisplay,we report the photolithographic fabrication of color-converted Micro-quantum dot light...Microdisplay panels are critical components for metaverse technology.Aiming to achieve high-resolution and full-color microdisplay,we report the photolithographic fabrication of color-converted Micro-quantum dot light emitting diodes(QLED)panel by combining blue Micro-QLED electroluminescence(EL)device and red-green quantum dot color converter(QDCC).Pre-patterned templates were firstly photolithographically fabricated and then applied as substrate to fabricate patterned blue Micro-QLED device,achieving an ultra-high pixel resolution up to 6350 pixels per inch(pixel size ranging from 20μm×20μm to 2μm×2μm).Notably,the patterned blue devices achieve a peak external quantum efficiency(EQE)of 7.8%and a maximum brightness of 39,472 cd m^(−2).The patterned red devices achieve a peak EQE of 18%and a maximum brightness of 103,022 cd m^(−2).By integrating a dual-color red and green QDCC arrays on the top of the blue Micro-QLED,a prototype full-color Micro-QLED panel was fabricated,achieving a resolution up to 1184 pixels per inch with a peak EQE 4.8%,and a maximum brightness of 10065 cd m^(−2).The photolithographic fabrication of color-converted Micro-QLED provides an easy-operated method for achieving cost-effective microdisplay panels.展开更多
Block copolymer(BCP) nanolithography offers potential beyond traditional photolithographic limits, yet reliably producing low-defect, perpendicular domains remains challenging. We introduce a microenvironmentdriven is...Block copolymer(BCP) nanolithography offers potential beyond traditional photolithographic limits, yet reliably producing low-defect, perpendicular domains remains challenging. We introduce a microenvironmentdriven isothermal annealing method for directed self-assembly of BCP thin films. By annealing films at stable temperature in a quasi-sealed, inert-gas chamber, our approach promotes highly uniform perpendicular lamellar nanopatterns over large areas, effectively mitigating environmental fluctuations and emulating solvent-vapor annealing without solvent exposure. Resulting BCP structures demonstrate enhanced spatial coherence and notably low defect density. Furthermore, we successfully transfer these nanopatterns into precise metal nano-line arrays,confirming the method's capability for high-fidelity pattern replication. This scalable, solvent-free technique provides a robust, reliable route for high-resolution nanopatterning in advanced semiconductor manufacturing.展开更多
A new method has been developed for fabrication of copper micro-pattern by selective chemical copper deposition based on photolithographed (3-mercaptopropyl)-trimethoxysilane (MPTS) self-assembly monolayers (SAMs). A...A new method has been developed for fabrication of copper micro-pattern by selective chemical copper deposition based on photolithographed (3-mercaptopropyl)-trimethoxysilane (MPTS) self-assembly monolayers (SAMs). As confirmed by scanning electron microscopy (SEM), Cu closely replicated the mask features. The present approach makes this technic to be cheap and may be applicable to assembly of microelectronic circuits.展开更多
As transparent electrodes,patterned silver nanowire(AgNW)networks suffer from noticeable pattern visibility,which is an unsettled issue for practical applications such as display.Here,we introduce a Gibbs-Thomson effe...As transparent electrodes,patterned silver nanowire(AgNW)networks suffer from noticeable pattern visibility,which is an unsettled issue for practical applications such as display.Here,we introduce a Gibbs-Thomson effect(GTE)-based patterning method to effectively reduce pattern visibility.Unlike conventional top-down and bottom-up strategies that rely on selective etching,removal,or deposition of AgNWs,our approach focuses on fragmenting nanowires primarily at the junctions through the GTE.This is realized by modifying AgNWs with a compound of diphenyliodonium nitrate and silver nitrate,which aggregates into nanoparticles at the junctions of AgNWs.These nanoparticles can boost the fragmentation of nanowires at the junctions under an ultralow temperature(75℃),allow pattern transfer through a photolithographic masking operation,and enhance plasmonic welding during UV exposure.The resultant patterned electrodes have trivial differences in transmittance(ΔT=1.4%)and haze(ΔH=0.3%)between conductive and insulative regions,with high-resolution patterning size down to 10μm.To demonstrate the practicality of this novel method,we constructed a highly transparent,optoelectrical interactive tactile e-skin using the patterned AgNW electrodes.展开更多
基金Project supported by the National Basic Research Program of China (Grant Nos. 2011CB808404 and 2009CB939703)the National Natural Science Foundation of China (Grant Nos. 10974074,90607022,60676001,60676008,and 60825403)
文摘This paper proposes an effective method of fabricating top contact organic field effect transistors by using a pho- tolithographic process. The semiconductor layer is protected by a passivation layer. Through photolithographic and etching processes, parts of the passivation layer are etched off to form source/drain electrode patterns. Combined with conventional evaporation and lift-off techniques, organic field effect transistors with a top contact are fabricated suc- cessfully, whose properties are comparable to those prepared with the shadow mask method and one order of magnitude higher than the bottom contact devices fabricated by using a photolithographic process.
基金supported by the National Natural Science Foundation of China(U23A20683,H.Z.)the Natural Science Foundation of Beijing Municipality(No.Z210018)+2 种基金Beijing Municipal Science&Technology Commission,Administrative Commission of Zhongguancun Science under Park No.Z231100006023018the National Natural Science Foundation of China(62422501)the National Natural Science Foundation of China(No.52203321)。
文摘Microdisplay panels are critical components for metaverse technology.Aiming to achieve high-resolution and full-color microdisplay,we report the photolithographic fabrication of color-converted Micro-quantum dot light emitting diodes(QLED)panel by combining blue Micro-QLED electroluminescence(EL)device and red-green quantum dot color converter(QDCC).Pre-patterned templates were firstly photolithographically fabricated and then applied as substrate to fabricate patterned blue Micro-QLED device,achieving an ultra-high pixel resolution up to 6350 pixels per inch(pixel size ranging from 20μm×20μm to 2μm×2μm).Notably,the patterned blue devices achieve a peak external quantum efficiency(EQE)of 7.8%and a maximum brightness of 39,472 cd m^(−2).The patterned red devices achieve a peak EQE of 18%and a maximum brightness of 103,022 cd m^(−2).By integrating a dual-color red and green QDCC arrays on the top of the blue Micro-QLED,a prototype full-color Micro-QLED panel was fabricated,achieving a resolution up to 1184 pixels per inch with a peak EQE 4.8%,and a maximum brightness of 10065 cd m^(−2).The photolithographic fabrication of color-converted Micro-QLED provides an easy-operated method for achieving cost-effective microdisplay panels.
基金supported by the National Natural Science Foundation of China (Grant Nos.U20A20168 and 62404120)the National Key R&D Program (Grant No.2022YFB3204100)+2 种基金the Postdoctoral Fellowship Program of CPSF (Grant Nos.GZB20240335 and GZC20231216)the China Postdoctoral Science Foundation (Grant No.2025T180151)the Initiative Scientific Research Program of the School of Integrated Circuits,Tsinghua University。
文摘Block copolymer(BCP) nanolithography offers potential beyond traditional photolithographic limits, yet reliably producing low-defect, perpendicular domains remains challenging. We introduce a microenvironmentdriven isothermal annealing method for directed self-assembly of BCP thin films. By annealing films at stable temperature in a quasi-sealed, inert-gas chamber, our approach promotes highly uniform perpendicular lamellar nanopatterns over large areas, effectively mitigating environmental fluctuations and emulating solvent-vapor annealing without solvent exposure. Resulting BCP structures demonstrate enhanced spatial coherence and notably low defect density. Furthermore, we successfully transfer these nanopatterns into precise metal nano-line arrays,confirming the method's capability for high-fidelity pattern replication. This scalable, solvent-free technique provides a robust, reliable route for high-resolution nanopatterning in advanced semiconductor manufacturing.
基金This work was supported by the National Natural Science Foundation of the Peoples Republic of China (No. 69890220).
文摘A new method has been developed for fabrication of copper micro-pattern by selective chemical copper deposition based on photolithographed (3-mercaptopropyl)-trimethoxysilane (MPTS) self-assembly monolayers (SAMs). As confirmed by scanning electron microscopy (SEM), Cu closely replicated the mask features. The present approach makes this technic to be cheap and may be applicable to assembly of microelectronic circuits.
基金supported by the Basic and Applied Basic Research Foundation of Guangdong Province(2024A1515030155,2022A1515010272,2024A1515012609,2023A1515011459)National Natural Science Foundation of China(61904067,62475101,62175094,62275109)+2 种基金open funding from the State Key Laboratory of Optoelectronic Materials and Technologies(Sun Yat-Sen University,OEMT-2022-KF-08)National Innovation and Entrepreneurship Training Program For Undergraduate(202410559004)Fundamental Research Funds for the Central Universities(11621405).
文摘As transparent electrodes,patterned silver nanowire(AgNW)networks suffer from noticeable pattern visibility,which is an unsettled issue for practical applications such as display.Here,we introduce a Gibbs-Thomson effect(GTE)-based patterning method to effectively reduce pattern visibility.Unlike conventional top-down and bottom-up strategies that rely on selective etching,removal,or deposition of AgNWs,our approach focuses on fragmenting nanowires primarily at the junctions through the GTE.This is realized by modifying AgNWs with a compound of diphenyliodonium nitrate and silver nitrate,which aggregates into nanoparticles at the junctions of AgNWs.These nanoparticles can boost the fragmentation of nanowires at the junctions under an ultralow temperature(75℃),allow pattern transfer through a photolithographic masking operation,and enhance plasmonic welding during UV exposure.The resultant patterned electrodes have trivial differences in transmittance(ΔT=1.4%)and haze(ΔH=0.3%)between conductive and insulative regions,with high-resolution patterning size down to 10μm.To demonstrate the practicality of this novel method,we constructed a highly transparent,optoelectrical interactive tactile e-skin using the patterned AgNW electrodes.
