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Interstitial Oxygen Determination in Heavily Doped Silicon with "Peak-height" Method by FT-IR Spectra
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作者 何秀坤 王琴 李光平 《Rare Metals》 SCIE EI CAS CSCD 1993年第1期39-42,共4页
Due to ineffectiveness of routine IR-absorption method for determinahon of intershtial oxygen in heavily doped silicon, a 'peak-height' method has been dcveloped. The phosphorus-doped CZ-Si with n=(7.l~l2)... Due to ineffectiveness of routine IR-absorption method for determinahon of intershtial oxygen in heavily doped silicon, a 'peak-height' method has been dcveloped. The phosphorus-doped CZ-Si with n=(7.l~l2)× 10~17cm^(-3) was taken as sample for characterization. The calculation results at 300 K and 10 K were ptesented in detail. The'peak-height' method is much simpler than 'short-baseline' and 'curved-baseline' methods. 展开更多
关键词 Interstitial oxygen Heavily doped Si FT-IR measurement ' peakheight' method.
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