目的:优化芍药甘草汤治疗高泌乳素血症(HPRL)的组方,并对其疗效机制进行初步探讨。方法:60只雌性NIH小鼠,随机分为6组,每组10只。除10只为空白组、仅进行生理盐水灌胃外,其他5组均经甲氧氯普胺连续皮下注射50天获得HPRL小鼠动物模型,随...目的:优化芍药甘草汤治疗高泌乳素血症(HPRL)的组方,并对其疗效机制进行初步探讨。方法:60只雌性NIH小鼠,随机分为6组,每组10只。除10只为空白组、仅进行生理盐水灌胃外,其他5组均经甲氧氯普胺连续皮下注射50天获得HPRL小鼠动物模型,随后再随机分配治疗方案:芍药甘草汤-1、2、3组(SG-1、2、3),分别给予1∶3、1∶1及3∶1芍药/甘草配比的芍药甘草汤,阳性对照组给予溴隐亭,模型组给予生理盐水;均连续灌胃30天。以ELISA法比较不同药物对血清泌乳素(PRL)水平的影响;同时观察血清卵泡刺激素(FSH)、促黄体生成素(LH)、睾酮(T)、雌二醇(E2)水平的改变;并以定量PCR法检测垂体表达泌乳素(Prl)m RNA、泌乳素调节元件结合蛋白(Preb)m RNA的改变。结果:造模后50只小鼠的PRL明显升高,FSH、LH、T和E2均明显降低(均P<0.01)。阳性对照组经溴隐亭治疗后,PRL明显降低,FSH、LH和E2均明显提高(均P<0.05)。SG-1、2、3组的PRL均较模型组有明显降低(均P<0.05),但仅SG-3组与阳性对照组的差异无统计学意义(P>0.05)。此外,SG-2、SG-3组治疗后血清FSH升高(P<0.05)、而T、LH、E2的改变不明显。SG-1、2、3组均可使垂体Prl m RNA显著降低(均为P<0.01)。SG-2、3组还可见Preb m RNA显著降低(分别为P<0.05和P<0.01)。结论:芍药甘草汤能有效降低甲氧氯普胺注射小鼠的血清泌乳素的水平,且重用芍药效果最明显;其机制可能与升高FSH、抑制垂体Prl、Preb m RNA的表达有关。展开更多
The introduction of high-k/metal gate(HK/MG)technology enables independent tuning of N-type metal-oxide-semi-conductor(NMOS)and P-type metal-oxide-semiconductor(PMOS)threshold voltages,facilitating advanced nodes and ...The introduction of high-k/metal gate(HK/MG)technology enables independent tuning of N-type metal-oxide-semi-conductor(NMOS)and P-type metal-oxide-semiconductor(PMOS)threshold voltages,facilitating advanced nodes and improv-ing overall chip performance.However,severe pattern loading effects during PMOS device fabrication pose challenges in dummy poly removal.This work reports the optimization of the photoresist etch back(PREB)process,providing a wider pro-cess window for subsequent AL CMP.By tuning the PR coating uniformity to 1.6%and applying four-zone electrostatic chuck(ESC)temperature control,the wafer-level uniformities of PR,SiN,and SiO_(2)were reduced to 6.3%,2.3%,and 5.1%,respectively.An optimized over etch(OE)recipe with a high selectivity of PR:SiN:SiO_(2)≈1:1:6 effectively balanced gate height loading between N-and PMOS regions.Furthermore,precise EB1 time tuning enabled defect removal,while advanced KLA inspection ensured early detection of critical failure modes.Collectively,these measures establish a robust and stable PREB process for advanced logic device fabrication.展开更多
文摘目的:优化芍药甘草汤治疗高泌乳素血症(HPRL)的组方,并对其疗效机制进行初步探讨。方法:60只雌性NIH小鼠,随机分为6组,每组10只。除10只为空白组、仅进行生理盐水灌胃外,其他5组均经甲氧氯普胺连续皮下注射50天获得HPRL小鼠动物模型,随后再随机分配治疗方案:芍药甘草汤-1、2、3组(SG-1、2、3),分别给予1∶3、1∶1及3∶1芍药/甘草配比的芍药甘草汤,阳性对照组给予溴隐亭,模型组给予生理盐水;均连续灌胃30天。以ELISA法比较不同药物对血清泌乳素(PRL)水平的影响;同时观察血清卵泡刺激素(FSH)、促黄体生成素(LH)、睾酮(T)、雌二醇(E2)水平的改变;并以定量PCR法检测垂体表达泌乳素(Prl)m RNA、泌乳素调节元件结合蛋白(Preb)m RNA的改变。结果:造模后50只小鼠的PRL明显升高,FSH、LH、T和E2均明显降低(均P<0.01)。阳性对照组经溴隐亭治疗后,PRL明显降低,FSH、LH和E2均明显提高(均P<0.05)。SG-1、2、3组的PRL均较模型组有明显降低(均P<0.05),但仅SG-3组与阳性对照组的差异无统计学意义(P>0.05)。此外,SG-2、SG-3组治疗后血清FSH升高(P<0.05)、而T、LH、E2的改变不明显。SG-1、2、3组均可使垂体Prl m RNA显著降低(均为P<0.01)。SG-2、3组还可见Preb m RNA显著降低(分别为P<0.05和P<0.01)。结论:芍药甘草汤能有效降低甲氧氯普胺注射小鼠的血清泌乳素的水平,且重用芍药效果最明显;其机制可能与升高FSH、抑制垂体Prl、Preb m RNA的表达有关。
文摘The introduction of high-k/metal gate(HK/MG)technology enables independent tuning of N-type metal-oxide-semi-conductor(NMOS)and P-type metal-oxide-semiconductor(PMOS)threshold voltages,facilitating advanced nodes and improv-ing overall chip performance.However,severe pattern loading effects during PMOS device fabrication pose challenges in dummy poly removal.This work reports the optimization of the photoresist etch back(PREB)process,providing a wider pro-cess window for subsequent AL CMP.By tuning the PR coating uniformity to 1.6%and applying four-zone electrostatic chuck(ESC)temperature control,the wafer-level uniformities of PR,SiN,and SiO_(2)were reduced to 6.3%,2.3%,and 5.1%,respectively.An optimized over etch(OE)recipe with a high selectivity of PR:SiN:SiO_(2)≈1:1:6 effectively balanced gate height loading between N-and PMOS regions.Furthermore,precise EB1 time tuning enabled defect removal,while advanced KLA inspection ensured early detection of critical failure modes.Collectively,these measures establish a robust and stable PREB process for advanced logic device fabrication.
