Atomic surfaces are strictly required by high-performance devices of diamond.Nevertheless,diamond is the hardest material in nature,leading to the low material removal rate(MRR)and high surface roughness during machin...Atomic surfaces are strictly required by high-performance devices of diamond.Nevertheless,diamond is the hardest material in nature,leading to the low material removal rate(MRR)and high surface roughness during machining.Noxious slurries are widely used in conventional chemical mechanical polishing(CMP),resulting in the possible pollution to the environment.Moreover,the traditional slurries normally contain more than four ingredients,causing difficulties to control the process and quality of CMP.To solve these challenges,a novel green CMP for single crystal diamond was developed,consisting of only hydrogen peroxide,diamond abrasive and Prussian blue(PB)/titania catalyst.After CMP,atomic surface is achieved with surface roughness Sa of 0.079 nm,and the MRR is 1168 nm·h^(-1).Thickness of damaged layer is merely 0.66 nm confirmed by transmission electron microscopy(TEM).X-ray photoelectron spectroscopy,electron paramagnetic resonance and TEM reveal that·OH radicals form under ultraviolet irradiation on PB/titania catalyst.The·OH radicals oxidize diamond,transforming it from monocrystalline to amorphous atomic structure,generating a soft amorphous layer.This contributes the high MRR and formation of atomic surface on diamond.The developed novel green CMP offers new insights to achieve atomic surface of diamond for potential use in their high-performance devices.展开更多
A novel method employing magnetic compound fluid(MCF)wheel was proposed for polishing the outer surface of stainless steel tube.Firstly,a polishing apparatus was constructed.In addition,the distribution of the magneti...A novel method employing magnetic compound fluid(MCF)wheel was proposed for polishing the outer surface of stainless steel tube.Firstly,a polishing apparatus was constructed.In addition,the distribution of the magnetic field of MCF wheel on the workpiece surface was explored by Maxwell software and Tesla meter,and the relationship between magnetic field distribution and material removal(MR)on the workpiece surface was investigated.Then,MR model was established and proved by the experiment results under specific experiment conditions.Finally,the influence laws of carbonyl iron powder particle size d_(CIP),abrasive particle size d_(AP),magnet speed n_(m),workpiece speed n_(c),and MCF supply amount V on surface roughness R_(a) and reduction rate were investigated through experiments,and the mechanisms of different parameters on surface quality were explored.Results show that the magnetic induction intensity during polishing is positively correlated with the polished profile of the workpiece.The trend of MR simulation is consistent with that of the experiment value,which proves the accuracy of MR model.When the revolution speeds of magnet and workpiece are 200 and 5000 r/min,respectively,and 2 mL MCF slurry containing 50wt%carbonyl iron powder(15μm),12wt%abrasive particle(7μm),3wt%α-cellulose,and 35wt%magnetic fluid was used,the final surface roughness decreases from 0.411μm to 0.007μm.After polishing for 100 min,the reduction rate is 98.297%,demonstrating that this method is appropriate for polishing the outer surface of tube.展开更多
The Fenton-like reaction between Cu^(2+)and H_(2)O_(2)was employed in chemical mechanical polishing to achieve efficient and high-quality processing of tungsten.The microstructure evolution and material removal rate o...The Fenton-like reaction between Cu^(2+)and H_(2)O_(2)was employed in chemical mechanical polishing to achieve efficient and high-quality processing of tungsten.The microstructure evolution and material removal rate of tungsten during polishing process were investigated via scanning electron microscopy,X-ray photoelectron spectroscopy,ultraviolet−visible spectrophotometry,and electrochemical experiments.The passivation behavior and material removal mechanism were discussed.Results show that the use of mixed H_(2)O_(2)+Cu(NO_(3))_(2)oxidant can achieve higher polishing efficiency and surface quality compared with the single oxidant Cu(NO_(3))_(2)or H_(2)O_(2).The increase in material removal rate is attributed to the rapid oxidation of W into WO_(3)via the chemical reaction between the substrate and hydroxyl radicals produced by the Fenton-like reaction.In addition,material removal rate and static etch rate exhibit significantly different dependencies on the concentration of Cu(NO_(3))_(2),while the superior oxidant for achieving the balance between polishing efficiency and surface quality is 0.5 wt.%H_(2)O_(2)+1.0 wt.%Cu(NO_(3))_(2).展开更多
CeO_(2)is increasingly recognized as a viable polishing abrasive for SiO_(2)-based substrates,such as K9 glass,leveraging its intrinsic chemical mechanical polishing property.Although LaOF can improve the performance ...CeO_(2)is increasingly recognized as a viable polishing abrasive for SiO_(2)-based substrates,such as K9 glass,leveraging its intrinsic chemical mechanical polishing property.Although LaOF can improve the performance of CeO_(2)abrasive,the specific mechanism underlying this enhancement remains elusive.Herein,LaOF-CeO_(2)composite abrasive was prepared by co-precipitation method,aiming to elaborate on the influence of LaOF on the abrasive's polishing efficiency.It is found that the integration of LaOF results in the formation of LaOF-CeO_(2)composite characterized by a remarkably reduced primary particle size of approximately 41 nm,which primarily accounts for the improvement in polishing performance.Furthermore,the increasement in Ce^(3+)content and the Zeta potential both contribute to the superior function of the composite abrasive.Notably,the synergistic effect of these parameters is manifested in an elevated material removal rate reaching 1091.197 nm/min,coupled with a minimized surface roughness of as low as 0.546 nm when applied to K9 glass surface.The findings of this work offer novel insights into the role of LaOF in facilitating the performance of Ce-based abrasives,potentially influencing future advancements in the field of precision surface processing.展开更多
Rare earth carbonates are essential precursors for the synthesis of oxide materials.In this study,we utilized in situ monitoring equipment to explore the alterations in the crystallization during the coprecipitation s...Rare earth carbonates are essential precursors for the synthesis of oxide materials.In this study,we utilized in situ monitoring equipment to explore the alterations in the crystallization during the coprecipitation synthesis of cerium carbonate.By controlling the crystallization pathway and in the absence of any te mplating agents,we successfully synthesized a unique sphe rical self-assembled cerium oxide particle(Ceria-S).The Ceria-S exhibits excellent polishing performance.The crystallization process of cerium carbonate at 50℃persists for roughly 50 min.During the initial stages of crystallization from 0 to t_(3),the precipitated particles are amorphous.This is followed by a plateau phase of crystal growth from t_(3)to t_(5).Subsequently,during the burst crystallization phase from t_(5)to t_(6),Ce_(2)(CO_(3))_(3)·6H_(2)O and Ce_(2)O(CO_(3))_(2)·nH2O are formed,exhibiting a rod-like crystal morphology.By rapidly drying the precipitated particles at 60℃for 10 min and calcining,Ceria-S is obtained.The Ceria-S,with an average diameter of 180 nm,is assembled from primary cerium oxide nanoparticles of approximately 15 nm.Owing to the self-assembly structure of cerium oxide spherical nanoparticles,they exhibit a significantly larger specific surface area,resulting in an elevated concentration of Ce^(3+)as high as 35.5%.The Ceria-S exhibits a polishing removal rate of 420 nm/min,effectively decreasing the surface roughness(S_(a))of K9 glass from 1.605 to 0.404 nm.展开更多
The lanthanum-cerium-based slurry(LC-slurry)is extensively utilized in the chemical mechanical polishing(CMP)of TFT-LCD glass substrates,optical lenses,and other glass products.Sodium hexametaphosphate(SHMP),as a disp...The lanthanum-cerium-based slurry(LC-slurry)is extensively utilized in the chemical mechanical polishing(CMP)of TFT-LCD glass substrates,optical lenses,and other glass products.Sodium hexametaphosphate(SHMP),as a dispersant,is commonly employed to enhance the dispersion properties of LCslurry for improved polishing performance.However,the tendency of sedimentation to form a compacted sediment layer,which is challenging to redisperse,increases storage difficulty and polishing equipment failure risk,thereby limiting its utilization in CMP.In the present study,sodium carboxymethylcellulose(CMC-Na),a long-chain organic polymer,was employed to enhance the redispersibility of LC-slurry containing SHMP.A comprehensive investigation was conducted on the influence of CMC-Na dosage and slurry pH on dispersibility,redispersibility and polishing performance.Additionally,an analysis was carried out to elucidate the underlying mechanism behind the effect of CMC-Na.The study demonstrates that the LC-slurry,containing 250 ppm SHMP and 500 ppm CMC-Na,exhibits excellent dispersibility and redispersibility.Further polishing tests demonstrate that compared to the LC-slurry containing only SHMP,utilizing the slurry containing both SHMP and CMC-Na at various pH for polishing thin film transistor liquid crystal display(TFT-LCD)glass substrates results in a reduction of both material removal rate(MRR)and surface roughness(Sa).Specifically,when adjusting the slurry to a pH range of 5-6,the MRR can reach up to 330 nm/min,which closely approximates the MRR achieved by LC-slurry containing only 250 ppm SHMP at corresponding pH values.Meanwhile,after polishing,the surface roughness of the glass substrate measures approximately 0.47 nm.展开更多
The textured roll and polished roll were applied instead of the ground roll in a 20-high mill to conduct two-pass rolling of 316L stainless steel strip with thickness of 0.027 mm.After the two-pass rolling with the te...The textured roll and polished roll were applied instead of the ground roll in a 20-high mill to conduct two-pass rolling of 316L stainless steel strip with thickness of 0.027 mm.After the two-pass rolling with the textured roll and polished roll(TPR),the surface roughness of the strip is dramatically reduced,and the surface topographical anisotropy index is diminished to 30.9%of the initial strip.Comparing with the strip rolled using the ground roll in both passes(GGR),the elongation of TPR rolled strip is obviously improved,and the mechanical property anisotropy is greatly weakened.The anisotropy index of tensile strength and elongation are 42.58%and 52.59%of that of GGR rolled strip,which is mainly attributed to the significant decrease of the texture intensity of the strip by TPR process.The results indicate that TPR process can obtain the stainless steel ultra-thin strip with smooth and uniform surface topography and good mechanical properties.展开更多
In the field of flexible polishing,the accuracy of contact force control directly affects processing quality and material removal uniformity.However,the complex dynamic contact model and inherent strong hysteresis of ...In the field of flexible polishing,the accuracy of contact force control directly affects processing quality and material removal uniformity.However,the complex dynamic contact model and inherent strong hysteresis of pneumatic systems can significantly impact the force control accuracy of pneumatic polishing system end-effectors.To enhance responsiveness and control precision during the flexible polishing process,this study proposes an observer-based fuzzy adaptive control(OBFAC)scheme.To ensure control accuracy under an uncertain dynamic contact model,a fuzzy state observer is designed to estimate unmeasured states,while fuzzy logic approximates the uncertain nonlinear functions in the model to improve control performance.Additionally,the integral barrier Lyapunov function is employed to ensure that all states remain within predefined constraints.The stability of the proposed control scheme is analyzed using the Lyapunov function,and a pneumatic polishing experimental platform is constructed to conduct polishing contact force control experiments under multiple scenarios.Experimental results demonstrate that the proposed OBFAC scheme achieves superior tracking control performance compared to existing control schemes.展开更多
On March 19,CIIS President Chen Bo met with Wojciech Zajączkowski,Director of the Asia-Pacific Department of the Ministry of Foreign Affairs of Poland.CIIS Vice President Liu Feitao moderated a discussion with the del...On March 19,CIIS President Chen Bo met with Wojciech Zajączkowski,Director of the Asia-Pacific Department of the Ministry of Foreign Affairs of Poland.CIIS Vice President Liu Feitao moderated a discussion with the delegation led by Director Zajączkowski.The two sides exchanged in-depth views on the current China-Europe relations,China-Poland relations,and the Ukraine crisis.展开更多
We present an improved angle polishing method in which the end of the cover slice near the glue layer is beveled into a thin,defect-free wedge,the straight edge of which is used as the datum for measuring the depth of...We present an improved angle polishing method in which the end of the cover slice near the glue layer is beveled into a thin,defect-free wedge,the straight edge of which is used as the datum for measuring the depth of subsurface damage. The bevel angle can be calculated from the interference fringes formed in the wedge. The minimum depth of the subsurface damage that can be measured by this method is a few hundred nanometers. Our results show that the method is straightforward, accurate, and convenient.展开更多
The granule shape and crystal structure of the the ceria-based rare earth oxide which were roasted at 600～1050 ℃ for 2～6 h and then cooled in furnace, cooled out of furnace or cooled in water were studied by means ...The granule shape and crystal structure of the the ceria-based rare earth oxide which were roasted at 600～1050 ℃ for 2～6 h and then cooled in furnace, cooled out of furnace or cooled in water were studied by means of XRD and SEM. The results revealed that the rich cerium rare earth carbonate could be changed into the rare earth oxide which was a kind of sandwich made of globose granule whose diameter was between 0.5～3.0 μm after being roasted in 900 ℃ for 2 h. This kind of crystal lattice in rare earth oxide belonged to face-centered cubic lattice and its space between crystal surface {111} and {200} (viz. L111 and L200) would enlarge as the roasting temperature increasing. With increasing roasting temperature, L111 would rise straightly upward, and L200 would rise straightly upward when roasting time was 2～4 h but changed little when roasting time was 4～6 h. The glass-polishing experiments found that the polishing ability of the ceria-based rare earth oxide was the best as L111 was 43～53 nm and the L200 was 43～56 nm.展开更多
In order to improve the polishing ability of polishing pads, a kind of polishing pad with the tin fixed abrasive blocks, which are arranged based on the phyllotaxis theory of biology, was designed and fabricated by th...In order to improve the polishing ability of polishing pads, a kind of polishing pad with the tin fixed abrasive blocks, which are arranged based on the phyllotaxis theory of biology, was designed and fabricated by the use of electroplating technology, and also its polishing ability for JGS-2 wafer was investigated by polishing experiments. The research results show that the phyllotactic parameters of the polishing pad influence the arrangement density of the tin fixed abrasive blocks, the polishing pad with phyllotactic pattern is feasibly fabricated by the use of electroplating technology, and the good polishing result can be obtained by using the polishing pad with phyllotactic pattern to polish a wafer when the diameter D of the tin fixed abrasive block is between Φ1.3 mm and Φ1.4 mm, and the phyllotactic coefficient k between 1.0 and 1.1,respectively.展开更多
Surface defects introduced by conventional mechanical processing methods can induce irreversible damage and reduce the service life of optics applied in high-power lasers.Compared to mechanical processing,laser polish...Surface defects introduced by conventional mechanical processing methods can induce irreversible damage and reduce the service life of optics applied in high-power lasers.Compared to mechanical processing,laser polishing with moving beam spot is a noncontact processing method,which is able to form a defect-free surface.This work aims to explore the mechanism of forming a smooth,defect-free fused silica surface by high-power density laser polishing with coupled multiple beams.The underlying mechanisms of laser polishing was revealed by numerical simulations and the theoretical results were verified by experiments.The simulated polishing depth and machined surface morphology were in close agreement with the experimental results.To obtain the optimized polishing quality,the effects of laser polishing parameters(e.g.overlap rate,pulse width and polishing times)on the polishing quality were experimentally investigated.It was found that the processing efficiency of fused silica materials by carbon dioxide(CO2)laser polishing could reach 8.68 mm2 s−1,and the surface roughness(Ra)was better than 25 nm.Besides,the cracks on pristine fused silica surfaces introduced by initial grinding process were completely removed by laser polishing to achieve a defect-free surface.The maximum laser polishing rate can reach 3.88μm s−1,much higher than that of the traditional mechanical polishing methods.The rapid CO2 laser polishing can effectively achieve smooth,defect-free surface,which is of great significance to improve the surface quality of fused silica optics applied in high-power laser facilities.展开更多
In the light of some assumptions that are very close to the practical working conditions,a very complicated polishing process of optical element can be simplified as a linear and shift invariant system that is relatd ...In the light of some assumptions that are very close to the practical working conditions,a very complicated polishing process of optical element can be simplified as a linear and shift invariant system that is relatd only to the speed,pres- sure and time of processing.In polishing,the removed material can be represented and entreated by the convolution of the removal function of polishing head and the dwell function.The properties of removal function are presented.The assumptions and methods given by the author have been shown to be correct and applicable by experiments using a ring lap to polish the optical surfac.展开更多
Describes a computer controlled polishing machine utilizing a small polisher with specified movement to figure optical surfces having strict dimensional requirements. The system is especially applicable in figuring as...Describes a computer controlled polishing machine utilizing a small polisher with specified movement to figure optical surfces having strict dimensional requirements. The system is especially applicable in figuring aspherical surfaces, beginning with the best fit sphere if the departure from the desired surface is not large. An interferometric measuring system is desiigned to form a closed loop control during processing.展开更多
基金financial support from the National Key Research and Development Program of China(2018YFA0703400)the Fundamental Research Funds for the Provincial Universities of Zhejiang(GK239909299001021)+1 种基金the Ninth China Association for Science and Technology Youth Talent Lift Project Support Plan(KYZ015324002)the Changjiang Scholars Program of Chinese Ministry of Education。
文摘Atomic surfaces are strictly required by high-performance devices of diamond.Nevertheless,diamond is the hardest material in nature,leading to the low material removal rate(MRR)and high surface roughness during machining.Noxious slurries are widely used in conventional chemical mechanical polishing(CMP),resulting in the possible pollution to the environment.Moreover,the traditional slurries normally contain more than four ingredients,causing difficulties to control the process and quality of CMP.To solve these challenges,a novel green CMP for single crystal diamond was developed,consisting of only hydrogen peroxide,diamond abrasive and Prussian blue(PB)/titania catalyst.After CMP,atomic surface is achieved with surface roughness Sa of 0.079 nm,and the MRR is 1168 nm·h^(-1).Thickness of damaged layer is merely 0.66 nm confirmed by transmission electron microscopy(TEM).X-ray photoelectron spectroscopy,electron paramagnetic resonance and TEM reveal that·OH radicals form under ultraviolet irradiation on PB/titania catalyst.The·OH radicals oxidize diamond,transforming it from monocrystalline to amorphous atomic structure,generating a soft amorphous layer.This contributes the high MRR and formation of atomic surface on diamond.The developed novel green CMP offers new insights to achieve atomic surface of diamond for potential use in their high-performance devices.
基金National Natural Science Foundation of China(52265056,52262013)Lanzhou Young Talent Program(2023-QN-38)Natural Science Foundation of Gansu Province(23JRRA776)。
文摘A novel method employing magnetic compound fluid(MCF)wheel was proposed for polishing the outer surface of stainless steel tube.Firstly,a polishing apparatus was constructed.In addition,the distribution of the magnetic field of MCF wheel on the workpiece surface was explored by Maxwell software and Tesla meter,and the relationship between magnetic field distribution and material removal(MR)on the workpiece surface was investigated.Then,MR model was established and proved by the experiment results under specific experiment conditions.Finally,the influence laws of carbonyl iron powder particle size d_(CIP),abrasive particle size d_(AP),magnet speed n_(m),workpiece speed n_(c),and MCF supply amount V on surface roughness R_(a) and reduction rate were investigated through experiments,and the mechanisms of different parameters on surface quality were explored.Results show that the magnetic induction intensity during polishing is positively correlated with the polished profile of the workpiece.The trend of MR simulation is consistent with that of the experiment value,which proves the accuracy of MR model.When the revolution speeds of magnet and workpiece are 200 and 5000 r/min,respectively,and 2 mL MCF slurry containing 50wt%carbonyl iron powder(15μm),12wt%abrasive particle(7μm),3wt%α-cellulose,and 35wt%magnetic fluid was used,the final surface roughness decreases from 0.411μm to 0.007μm.After polishing for 100 min,the reduction rate is 98.297%,demonstrating that this method is appropriate for polishing the outer surface of tube.
文摘The Fenton-like reaction between Cu^(2+)and H_(2)O_(2)was employed in chemical mechanical polishing to achieve efficient and high-quality processing of tungsten.The microstructure evolution and material removal rate of tungsten during polishing process were investigated via scanning electron microscopy,X-ray photoelectron spectroscopy,ultraviolet−visible spectrophotometry,and electrochemical experiments.The passivation behavior and material removal mechanism were discussed.Results show that the use of mixed H_(2)O_(2)+Cu(NO_(3))_(2)oxidant can achieve higher polishing efficiency and surface quality compared with the single oxidant Cu(NO_(3))_(2)or H_(2)O_(2).The increase in material removal rate is attributed to the rapid oxidation of W into WO_(3)via the chemical reaction between the substrate and hydroxyl radicals produced by the Fenton-like reaction.In addition,material removal rate and static etch rate exhibit significantly different dependencies on the concentration of Cu(NO_(3))_(2),while the superior oxidant for achieving the balance between polishing efficiency and surface quality is 0.5 wt.%H_(2)O_(2)+1.0 wt.%Cu(NO_(3))_(2).
基金Project supported by the National Natural Science Foundation of China (21971129, 21961022, 21661023)the Inner Mongolia Autonomous Region 2022 Leading Talent Team of Science and Technology (2022LJRC0008)+6 种基金the Natural Science Foundation of Inner Mongolia Autonomous Region of China(2022MS02014, 2021BS02007)the Program for Innovative Research Team in Universities of Inner Mongolia Autonomous Region (NJYT23031)the 111 Project(D20033)the “Grassland Leading Talent” Program of Inner Mongoliathe “Grassland-Talent” Innovation Team of Inner Mongoliathe “Science and Technology for a Better Development of Inner Mongolia” Program (2020XM03)the Science and Technology Project of Ordos (2021 ZDI 11-14)。
文摘CeO_(2)is increasingly recognized as a viable polishing abrasive for SiO_(2)-based substrates,such as K9 glass,leveraging its intrinsic chemical mechanical polishing property.Although LaOF can improve the performance of CeO_(2)abrasive,the specific mechanism underlying this enhancement remains elusive.Herein,LaOF-CeO_(2)composite abrasive was prepared by co-precipitation method,aiming to elaborate on the influence of LaOF on the abrasive's polishing efficiency.It is found that the integration of LaOF results in the formation of LaOF-CeO_(2)composite characterized by a remarkably reduced primary particle size of approximately 41 nm,which primarily accounts for the improvement in polishing performance.Furthermore,the increasement in Ce^(3+)content and the Zeta potential both contribute to the superior function of the composite abrasive.Notably,the synergistic effect of these parameters is manifested in an elevated material removal rate reaching 1091.197 nm/min,coupled with a minimized surface roughness of as low as 0.546 nm when applied to K9 glass surface.The findings of this work offer novel insights into the role of LaOF in facilitating the performance of Ce-based abrasives,potentially influencing future advancements in the field of precision surface processing.
基金Project supported by the National Key Research and Development Program(2021YFB3501101)Beijing Nova Program(20220484827)+2 种基金National Natural Science Foundation of China(52304370)Central Government Guidance Local Science and Technology Development Fund Project of Hebei Province(236Z4102G)Natural Science Foundation of Hebei Province(E2022103012)。
文摘Rare earth carbonates are essential precursors for the synthesis of oxide materials.In this study,we utilized in situ monitoring equipment to explore the alterations in the crystallization during the coprecipitation synthesis of cerium carbonate.By controlling the crystallization pathway and in the absence of any te mplating agents,we successfully synthesized a unique sphe rical self-assembled cerium oxide particle(Ceria-S).The Ceria-S exhibits excellent polishing performance.The crystallization process of cerium carbonate at 50℃persists for roughly 50 min.During the initial stages of crystallization from 0 to t_(3),the precipitated particles are amorphous.This is followed by a plateau phase of crystal growth from t_(3)to t_(5).Subsequently,during the burst crystallization phase from t_(5)to t_(6),Ce_(2)(CO_(3))_(3)·6H_(2)O and Ce_(2)O(CO_(3))_(2)·nH2O are formed,exhibiting a rod-like crystal morphology.By rapidly drying the precipitated particles at 60℃for 10 min and calcining,Ceria-S is obtained.The Ceria-S,with an average diameter of 180 nm,is assembled from primary cerium oxide nanoparticles of approximately 15 nm.Owing to the self-assembly structure of cerium oxide spherical nanoparticles,they exhibit a significantly larger specific surface area,resulting in an elevated concentration of Ce^(3+)as high as 35.5%.The Ceria-S exhibits a polishing removal rate of 420 nm/min,effectively decreasing the surface roughness(S_(a))of K9 glass from 1.605 to 0.404 nm.
基金supported by the National Key Research and Development Program(2021YFB3501103)Guiding Local Funding Projects for Scientific and Technological Development by Central Government in Hebei(216Z1402G)Youth Fund of GRINM Group Co.,Ltd.
文摘The lanthanum-cerium-based slurry(LC-slurry)is extensively utilized in the chemical mechanical polishing(CMP)of TFT-LCD glass substrates,optical lenses,and other glass products.Sodium hexametaphosphate(SHMP),as a dispersant,is commonly employed to enhance the dispersion properties of LCslurry for improved polishing performance.However,the tendency of sedimentation to form a compacted sediment layer,which is challenging to redisperse,increases storage difficulty and polishing equipment failure risk,thereby limiting its utilization in CMP.In the present study,sodium carboxymethylcellulose(CMC-Na),a long-chain organic polymer,was employed to enhance the redispersibility of LC-slurry containing SHMP.A comprehensive investigation was conducted on the influence of CMC-Na dosage and slurry pH on dispersibility,redispersibility and polishing performance.Additionally,an analysis was carried out to elucidate the underlying mechanism behind the effect of CMC-Na.The study demonstrates that the LC-slurry,containing 250 ppm SHMP and 500 ppm CMC-Na,exhibits excellent dispersibility and redispersibility.Further polishing tests demonstrate that compared to the LC-slurry containing only SHMP,utilizing the slurry containing both SHMP and CMC-Na at various pH for polishing thin film transistor liquid crystal display(TFT-LCD)glass substrates results in a reduction of both material removal rate(MRR)and surface roughness(Sa).Specifically,when adjusting the slurry to a pH range of 5-6,the MRR can reach up to 330 nm/min,which closely approximates the MRR achieved by LC-slurry containing only 250 ppm SHMP at corresponding pH values.Meanwhile,after polishing,the surface roughness of the glass substrate measures approximately 0.47 nm.
基金supported by the National Natural Science Foundation of China(Nos.51974196,52275361,and 52305406)the Key Projects of the National Natural Science Foundation of China(No.U22A20188)the Special Projects of the Central Government in Guidance of Local Science and Technology Development(YDZX20191400002149).
文摘The textured roll and polished roll were applied instead of the ground roll in a 20-high mill to conduct two-pass rolling of 316L stainless steel strip with thickness of 0.027 mm.After the two-pass rolling with the textured roll and polished roll(TPR),the surface roughness of the strip is dramatically reduced,and the surface topographical anisotropy index is diminished to 30.9%of the initial strip.Comparing with the strip rolled using the ground roll in both passes(GGR),the elongation of TPR rolled strip is obviously improved,and the mechanical property anisotropy is greatly weakened.The anisotropy index of tensile strength and elongation are 42.58%and 52.59%of that of GGR rolled strip,which is mainly attributed to the significant decrease of the texture intensity of the strip by TPR process.The results indicate that TPR process can obtain the stainless steel ultra-thin strip with smooth and uniform surface topography and good mechanical properties.
基金Supported by National Key Research and Development Program of China(Grant No.2022YFB3403402)National Natural Science Foundation of China Basic Research Programme for PhD Students(Grant No.524B2049)。
文摘In the field of flexible polishing,the accuracy of contact force control directly affects processing quality and material removal uniformity.However,the complex dynamic contact model and inherent strong hysteresis of pneumatic systems can significantly impact the force control accuracy of pneumatic polishing system end-effectors.To enhance responsiveness and control precision during the flexible polishing process,this study proposes an observer-based fuzzy adaptive control(OBFAC)scheme.To ensure control accuracy under an uncertain dynamic contact model,a fuzzy state observer is designed to estimate unmeasured states,while fuzzy logic approximates the uncertain nonlinear functions in the model to improve control performance.Additionally,the integral barrier Lyapunov function is employed to ensure that all states remain within predefined constraints.The stability of the proposed control scheme is analyzed using the Lyapunov function,and a pneumatic polishing experimental platform is constructed to conduct polishing contact force control experiments under multiple scenarios.Experimental results demonstrate that the proposed OBFAC scheme achieves superior tracking control performance compared to existing control schemes.
文摘On March 19,CIIS President Chen Bo met with Wojciech Zajączkowski,Director of the Asia-Pacific Department of the Ministry of Foreign Affairs of Poland.CIIS Vice President Liu Feitao moderated a discussion with the delegation led by Director Zajączkowski.The two sides exchanged in-depth views on the current China-Europe relations,China-Poland relations,and the Ukraine crisis.
文摘We present an improved angle polishing method in which the end of the cover slice near the glue layer is beveled into a thin,defect-free wedge,the straight edge of which is used as the datum for measuring the depth of subsurface damage. The bevel angle can be calculated from the interference fringes formed in the wedge. The minimum depth of the subsurface damage that can be measured by this method is a few hundred nanometers. Our results show that the method is straightforward, accurate, and convenient.
文摘The granule shape and crystal structure of the the ceria-based rare earth oxide which were roasted at 600～1050 ℃ for 2～6 h and then cooled in furnace, cooled out of furnace or cooled in water were studied by means of XRD and SEM. The results revealed that the rich cerium rare earth carbonate could be changed into the rare earth oxide which was a kind of sandwich made of globose granule whose diameter was between 0.5～3.0 μm after being roasted in 900 ℃ for 2 h. This kind of crystal lattice in rare earth oxide belonged to face-centered cubic lattice and its space between crystal surface {111} and {200} (viz. L111 and L200) would enlarge as the roasting temperature increasing. With increasing roasting temperature, L111 would rise straightly upward, and L200 would rise straightly upward when roasting time was 2～4 h but changed little when roasting time was 4～6 h. The glass-polishing experiments found that the polishing ability of the ceria-based rare earth oxide was the best as L111 was 43～53 nm and the L200 was 43～56 nm.
基金Sponsored by the National Nature Science Foundation of China (50875179)
文摘In order to improve the polishing ability of polishing pads, a kind of polishing pad with the tin fixed abrasive blocks, which are arranged based on the phyllotaxis theory of biology, was designed and fabricated by the use of electroplating technology, and also its polishing ability for JGS-2 wafer was investigated by polishing experiments. The research results show that the phyllotactic parameters of the polishing pad influence the arrangement density of the tin fixed abrasive blocks, the polishing pad with phyllotactic pattern is feasibly fabricated by the use of electroplating technology, and the good polishing result can be obtained by using the polishing pad with phyllotactic pattern to polish a wafer when the diameter D of the tin fixed abrasive block is between Φ1.3 mm and Φ1.4 mm, and the phyllotactic coefficient k between 1.0 and 1.1,respectively.
基金supported by the National Natural Science Foundation of China(Grant Nos.51775147,51705105)Science Challenge Project(Grant No.TZ2016006-0503-01)+3 种基金Young Elite Scientists Sponsorship Program by CAST(Grant No.2018QNRC001)China Postdoctoral Science Foundation funded project(Grant Nos.2018T110288,2017M621260)Self-Planned Task(Grant Nos.SKLRS201718A,SKLRS201803B)of State Key Laboratory of Robotics and System(HIT)Fundamental Research Funds for the Central Universities(Grant No.HIT.NSRIF.2019053).
文摘Surface defects introduced by conventional mechanical processing methods can induce irreversible damage and reduce the service life of optics applied in high-power lasers.Compared to mechanical processing,laser polishing with moving beam spot is a noncontact processing method,which is able to form a defect-free surface.This work aims to explore the mechanism of forming a smooth,defect-free fused silica surface by high-power density laser polishing with coupled multiple beams.The underlying mechanisms of laser polishing was revealed by numerical simulations and the theoretical results were verified by experiments.The simulated polishing depth and machined surface morphology were in close agreement with the experimental results.To obtain the optimized polishing quality,the effects of laser polishing parameters(e.g.overlap rate,pulse width and polishing times)on the polishing quality were experimentally investigated.It was found that the processing efficiency of fused silica materials by carbon dioxide(CO2)laser polishing could reach 8.68 mm2 s−1,and the surface roughness(Ra)was better than 25 nm.Besides,the cracks on pristine fused silica surfaces introduced by initial grinding process were completely removed by laser polishing to achieve a defect-free surface.The maximum laser polishing rate can reach 3.88μm s−1,much higher than that of the traditional mechanical polishing methods.The rapid CO2 laser polishing can effectively achieve smooth,defect-free surface,which is of great significance to improve the surface quality of fused silica optics applied in high-power laser facilities.
文摘In the light of some assumptions that are very close to the practical working conditions,a very complicated polishing process of optical element can be simplified as a linear and shift invariant system that is relatd only to the speed,pres- sure and time of processing.In polishing,the removed material can be represented and entreated by the convolution of the removal function of polishing head and the dwell function.The properties of removal function are presented.The assumptions and methods given by the author have been shown to be correct and applicable by experiments using a ring lap to polish the optical surfac.
文摘Describes a computer controlled polishing machine utilizing a small polisher with specified movement to figure optical surfces having strict dimensional requirements. The system is especially applicable in figuring aspherical surfaces, beginning with the best fit sphere if the departure from the desired surface is not large. An interferometric measuring system is desiigned to form a closed loop control during processing.
