High-resolution non-emissive displays based on electrochromic tungsten oxides(WOx)are crucial for future near-eye virtual/augmented reality interactions,given their impressive attributes such as high environmental sta...High-resolution non-emissive displays based on electrochromic tungsten oxides(WOx)are crucial for future near-eye virtual/augmented reality interactions,given their impressive attributes such as high environmental stability,ideal outdoor readability,and low energy consumption.However,the limited intrinsic structure of inorganic materials has presented a significant challenge in achieving precise patterning/pixelation at the micron scale.Here,we successfully developed the direct photolithography for WOx nanoparticles based on in situ photo-induced ligand exchange.This strategy enabled us to achieve ultra-high resolution efficiently(line width<4μm,the best resolution for reported inorganic electrochromic materials).Additionally,the resulting device exhibited impressive electrochromic performance,such as fast response(<1 s at 0 V),high coloration efficiency(119.5 cm^(2) C^(−1)),good optical modulation(55.9%),and durability(>3600 cycles),as well as promising applications in electronic logos,pixelated displays,flexible electronics,etc.The success and advancements presented here are expected to inspire and accelerate research and development(R&D)in high-resolution non-emissive displays and other ultra-fine micro-electronics.展开更多
Ultraviolet nanoimprint lithography(UV-NIL)is a versatile and cost-effective technique for the fabrication of micro-and nanostructures by copying master patterns in a planar or a roll-to-roll process through curing of...Ultraviolet nanoimprint lithography(UV-NIL)is a versatile and cost-effective technique for the fabrication of micro-and nanostructures by copying master patterns in a planar or a roll-to-roll process through curing of a liquid UV-sensitive precursor.For applications with a high pattern complexity,new UV-NIL process chains must be specified.Master fabrication is a challenging part of the development and often cannot be accomplished using a single master fabrication technique.Therefore,an approach combining different patterning fabrication techniques is developed here for polymer masters using laser direct writing and photolithography.The polymer masters produced in this way are molded into inverse silicone stamps that are used for roll-to-roll replication into an acrylate formulation.To fit the required roller size for large-area UV-NIL,several submasters with micrometer-sized dot and line gratings and prism arrays,which have been patterned by these different techniques,are assembled to final size of ~200×600 mm^(2) with an absolute precision of better than 50μm.The size of the submasters allows the use of standard laboratory equipment for patterning and direct writing,thus enabling the fabrication of micro-and even nanostructures when electron-beam writing is utilized.In this way,the effort,time,and costs for the fabrication of masters for UV-NIL processes are reduced,enabling further development for particular structures and applications.Using this approach,patterns fabricated with different laboratory tools are finally replicated by UV-NIL in an acrylate formulation,demonstrating the high quality of the whole process chain.展开更多
The preparation of red,green,and blue quantum dot(QD)pixelated arrays with high precision,resolution,and brightness poses a significant challenge on the development of advanced micro-displays for virtual,augmented,and...The preparation of red,green,and blue quantum dot(QD)pixelated arrays with high precision,resolution,and brightness poses a significant challenge on the development of advanced micro-displays for virtual,augmented,and mixed reality applications.Alongside the controlled synthesis of high-performance QDs,a reliable QD patterning technology is crucial in overcoming this challenge.Among the various methods available,photolithography-based patterning technologies show great potentials in producing ultra-fine QD patterns at micron scale.This review article presents the recent advancements in the field of QD patterning using photolithography techniques and explores their applications in micro-display technology.Firstly,we discuss QD patterning through photolithography techniques employing photoresist(PR),which falls into two categories:PRassisted photolithography and photolithography of QDPR.Subsequently,direct photolithography techniques based on photo-induced crosslinking of photosensitive groups and photo-induced ligand cleavage mechanisms are thoroughly reviewed.Meanwhile,we assess the performance of QD arrays fabricated using these photolithography techniques and their integration into QD light emitting diode display devices as well as color conversionbased micro light emitting diode display devices.Lastly,we summarize the most recent developments in this field and outline future prospects.展开更多
Micro light sources are crucial tools for studying the interactions between light and matter at the micro/nanoscale,encompassing diverse applications across multiple disciplines.Despite numerous studies on reducing th...Micro light sources are crucial tools for studying the interactions between light and matter at the micro/nanoscale,encompassing diverse applications across multiple disciplines.Despite numerous studies on reducing the size of micro light sources and enhancing optical resolution,the efficient and simple fabrication of ultra-high-resolution micro light sources remains challenging due to its reliance on precise micro-nano processing technology and advanced processing equipment.In this study,a simple approach for the efficient fabrication of submicron light sources is proposed,namely shadow-assisted sidewall emission(SASE)technology.The SASE utilizes the widely adopted UV photolithography process,employing metal shadow modulation to precisely control the emission of light from polymer sidewalls,thereby obtaining photoluminescent light sources with submicron line widths.The SASE eliminates the need for complex and cumbersome manufacturing procedures.The effects of process parameters,including exposure dose,development time,and metal film thickness,on the linewidth of sources are investigated on detail.It is successfully demonstrated red,green,and blue submicron light sources.Finally,their potential application in the field of optical anti-counterfeiting is also demonstrated.We believe that the SASE proposed in this work provides a novel approach for the preparation and application of micro light sources.展开更多
Simulations of photoresist etching,aerial image,exposure,and post-bake processes are integrated to obtain a photolithography process simulation for microelectromechanical system（MEMS） and integrated circuit（IC） fa...Simulations of photoresist etching,aerial image,exposure,and post-bake processes are integrated to obtain a photolithography process simulation for microelectromechanical system（MEMS） and integrated circuit（IC） fabrication based on three-dimensional （3D） cellular automata（CA）. The simulation results agree well with available experimental results. This indicates that the 3D dynamic CA model for the photoresist etching simulation and the 3D CA model for the post-bake simulation could be useful for the monolithic simulation of various lithography processes. This is determined to be useful for the device-sized fabrication process simulation of IC and MEMS.展开更多
A compact multi-throttle aerostatic guideway is the preferred structure for high precision and acceleration motion in the variable-slit system(VS)of photolithography.The presence of microstructure,such as recesses and...A compact multi-throttle aerostatic guideway is the preferred structure for high precision and acceleration motion in the variable-slit system(VS)of photolithography.The presence of microstructure,such as recesses and grooves,on the guideway working surface has been found to improve the loading performance.Nevertheless,the effects on the guideway performance of changing the microstructure on the micron level are not yet clear.The mesh adaptation method,which was proposed by the authors,is employed in this paper to quantitatively study the influences of four microstructure parameters.The effect of tuning these parameters on the loading performance is revealed.The level of impact determines the proposed design process of the parameters.The characteristic feature of the proposed design process is that the working points of carrying capacity,stiffness,and rotational stiffness are unified under twoway adjusting by means of recess parameters.According to the proposed design process and tuning method,the restriction of supply pressure is lifted to a certain extent and the mutual tradeoff among the loading performances is relieved.The experimental results show that the rotational stiffness of the designed guideway,based on the tuned parameters,reached 2.14×10^(4) Nmrad1 and increased by 69.8%.In a scanning test of the applied VS on argon fluoride laser(ArF)photolithography,the average scanning acceleration reached 67.5 m·s^(-2),meeting the design specification.展开更多
To describe a semiconductor wafer fabrication flow availably, a new modeling method of extended hybrid Petri nets （EHPNs） was proposed. To model the discrete part and continuous part of a complex photolithography pr...To describe a semiconductor wafer fabrication flow availably, a new modeling method of extended hybrid Petri nets （EHPNs） was proposed. To model the discrete part and continuous part of a complex photolithography process, hybrid Petri nets （HPNs） were introduced. To cope with the complexity of a photolithography process, object-oriented methods such as encapsulation and classifications were integrated with HPN models. EHPN definitions were presented on the basis of HPN models and object-oriented methods. Object-oriented hybrid Petri subnet models were developed for each typical physical object and an EHPN modeling procedure steps were structured. To demonstrate the feasibility and validity of the proposed modeling method, a real wafer photolithography case was used to illustrate the modeling procedure. dynamic modeling of a complex photolithography process effectively The modeling results indicate that the EHPNs can deal with the dynamic modeling of a complex photolithography process effectively.展开更多
In this study,the authors have shown the power conversion efficiency of flexible organic solar cells.The structure of the device is PET/ITO/PEDOT:PSS/P3HT:PCBM/AI.P3HT(poly-3-hexylthiophene).It was used as an electron...In this study,the authors have shown the power conversion efficiency of flexible organic solar cells.The structure of the device is PET/ITO/PEDOT:PSS/P3HT:PCBM/AI.P3HT(poly-3-hexylthiophene).It was used as an electron donor,PCBM([6,6]-phenyl C6 l-butyric acid methyl ester)as an electron acceptor and PEDOT:PSS used as a HIL(hole injection layer).These materials were deposited by spin coating method on the flexible substrates.Photolithography method is used to etch ITO.The electrical parameters of the fabricated cells were investigated by means of J(V),FF(fill factor),the efficiency(r/),photocurrent and IPCE measurement.It was observed that 45%of the absorbed photons are converted into current.The results obtained using etching technology by photolithography is better than that obtained in the clean room.展开更多
2D-material-based photodetectors enhanced by plasmonic nanostructures can support responsivity/detectivity several orders higher than commercial photodetectors,drawing extensive attention as promising candidates for t...2D-material-based photodetectors enhanced by plasmonic nanostructures can support responsivity/detectivity several orders higher than commercial photodetectors,drawing extensive attention as promising candidates for the next-generation photodetectors.However,to boost the nanostructure-enhanced 2D photodetectors into real-world applications,crucial challenges lie in the design of broadband enhancing nanostructures and their scalable and position-controllable fabrication.Here,based on a broadband resonant plasmonic disk array fabricated by a scalable and position-controllable technique(direct writing photolithography),we present a visible-near infrared(405-1310 nm)2D WS_(2) photodetector,whose detectivity is up to 3.9×10^(14)Jones,a value exceeding that of the previous plasmon-enhanced 2D photodetectors.The broadened spectral response range and the high detectivity originate from the hot electron injection,optical absorption enhancement,and strain effect supported by the plasmonic array.Furthermore,the designed plasmonic 2D photodetector supports self-powered photodetection,indicating promising potential in energy-free and portable optoelectronic systems.Our results demonstrate an effective method to construct high-performance broadband photodetectors,which can facilitate the development of 2D photodetectors in commercial applications.展开更多
Quantum-dot light-emitting diodes(QLEDs)promise a new generation of low-cost,efficient,bright,and stable light sources.Achieving large-area patterning of high-resolution QLED arrays is essential for display applicatio...Quantum-dot light-emitting diodes(QLEDs)promise a new generation of low-cost,efficient,bright,and stable light sources.Achieving large-area patterning of high-resolution QLED arrays is essential for display applications.However,patterning of micro-QLEDs arrays via conventional photolithography,the most established and scalable technique capable of producing micrometer-scale patterns,poses challenges because the chemicals and solvents used can damage quantum dot emissive layers and charge transport layers(CTLs)during ultraviolet(UV)exposure and development.Here,we address these challenges by designing a novel hole transport layer(HTL),poly((9,9-dioctylfluorenyl-2,7-diyl)-co-(9-(2-ethylhexyl)-carbazole-3,6-diyl)-co-(9-(4-(4-vinylphenoxy)butyl)-carbazole-3,6-diyl))(PF8Cz-X),which replaces reactive triphenylamine(TPA)units with chemically stable carbazole derivatives and introduces vinylphenoxy groups that crosslink upon annealing,enhancing solvent resistance.Utilizing PF8Cz-X,we fabricated efficient and high-resolution micro-QLEDs arrays with pixel sizes down to~2μm,achieving resolutions up to 6000 pixels per inch.The red,green,and blue micro-QLEDs demonstrate peak external quantum efficiencies(EQEs)of 16.5%,20.1%,and 12.7%,respectively,matching those of un-patterned devices.Our work reveals that conventional photolithography can be effectively employed for the fabrication of high-resolution micro-QLEDs array,paving the way towards advanced display applications in augmented reality(AR)and virtual reality(VR)technologies.展开更多
Quantum dot light-emitting diodes(QLEDs)have emerged as a leading platform for next-generation display technologies,gaining substantial research attention in recent years.Among various patterning strategies,direct pho...Quantum dot light-emitting diodes(QLEDs)have emerged as a leading platform for next-generation display technologies,gaining substantial research attention in recent years.Among various patterning strategies,direct photolithography offers distinct advantages through its high resolution,throughput,and process simplicity.However,current direct photolithography approaches face critical limitations in resolution and device performance,primarily arising from surface defect generation and photodamage of quantum dots(QDs)caused by deep-ultraviolet exposure and photochemical byproducts.To overcome these challenges,we present a novel benzophenone-derived photosensitive crosslinker featuring a byproduct-free C–H insertion mechanism with native ligands of QDs.Through precise structure design,the photo-absorption of the crosslinker extends to 365 nm,allowing the long-awaited QD patterning under standard i-line photolithography conditions.The developed crosslinker achieves unprecedented patterning resolution(pixel size≈500 nm)with preserved photoluminescent characteristics.Corresponding QLED devices demonstrate remarkable performance enhancements,including a maximum external quantum efficiency(EQE)of 16.48%and a T95 operational lifetime of 2258.3 h(approximately 2.1 times longer than pristine devices).These advancements establish a promising pathway toward high-resolution and high-performance QLEDs,thereby accelerating the commercialization of high-end optoelectronic devices.展开更多
For the new display technology based on quantum dots(QDs),realizing high-precision arrays of red,green,and blue(RGB)pixels has been a significant research focus at present,aimed at achieving high-quality and high-reso...For the new display technology based on quantum dots(QDs),realizing high-precision arrays of red,green,and blue(RGB)pixels has been a significant research focus at present,aimed at achieving high-quality and high-resolution image displays.However,challenges such as material stability and the variability of process environments complicate the assurance of quality in high-precision patterns.The novel optical patterning technology,exemplified by direct photolithography,is considered a highly promising approach for achieving submicron-level,hyperfine patterning.On the technological level,this method produces patterned quantum dot light-emitting films through a photochemical reaction.Here,we provide a comprehensive review of various methods of QD photolithography patterning,including traditional photolithography,lift off,and direct photolithography,which mainly focused on direct photolithography.This review covers the classification of direct photolithography technologies,summarizes the latest research progress,and discusses future perspectives on the advancement of photolithography technology de-masking.展开更多
Microbatteries(MBs)are crucial to power miniaturized devices for the Internet of Things.In the evolutionary journey of MBs,fabrication technology emerges as the cornerstone,guiding the intricacies of their configurati...Microbatteries(MBs)are crucial to power miniaturized devices for the Internet of Things.In the evolutionary journey of MBs,fabrication technology emerges as the cornerstone,guiding the intricacies of their configuration designs,ensuring precision,and facilitating scalability for mass production.Photolithography stands out as an ideal technology,leveraging its unparalleled resolution,exceptional design flexibility,and entrenched position within the mature semiconductor industry.However,comprehensive reviews on its application in MB development remain scarce.This review aims to bridge that gap by thoroughly assessing the recent status and promising prospects of photolithographic microfabrication for MBs.Firstly,we delve into the fundamental principles and step-by-step procedures of photolithography,offering a nuanced understanding of its operational mechanisms and the criteria for photoresist selection.Subsequently,we highlighted the specific roles of photolithography in the fabrication of MBs,including its utilization as a template for creating miniaturized micropatterns,a protective layer during the etching process,a mold for soft lithography,a constituent of MB active component,and a sacrificial layer in the construction of micro-Swiss-roll structure.Finally,the review concludes with a summary of the key challenges and future perspectives of MBs fabricated by photolithography,providing comprehensive insights and sparking research inspiration in this field.展开更多
Displays play an extremely important role in modern information society,which creates a never-ending demand for the new and better products and technologies.The latest requirements for novel display technologies focus...Displays play an extremely important role in modern information society,which creates a never-ending demand for the new and better products and technologies.The latest requirements for novel display technologies focus on high resolution and high color gamut.Among emerging technologies that include organic light-emitting diode(OL ED),micro light-emiting diode(micro-LED),quantum dot light-emitting diode(QLED),laser display,holographic display and others,QLED is promising owing to its intrinsic high color gamut and the possibility to achieve high resolution with photolithography approach.However,previously demonstrated photolthography techniques suffer from reduced device performance and color Impurities in subpixels from the process.In this study,we demonstrated a sacrificial layer assisted patterming(SLAP)approach,which can be applied in conjunction with photolithography to fabricate high-resolution,full-colo quantum dot(QD)patterns.In this approach,the negative photoresist(PR)and sacrificial layer(SL)were uilized to determine the pixels for QD deposition,while at the same time the SL helps protect the QD layer and keep it intact(named PR-SL approach).To prove this method's viability for QLED display manufacture,a 500-ppi,full-color passive matrix(PM)-QLED prototype was fabricated via this process.Results show that there were no color impurities in the subpixels,and the PM-QL ED has a high color gamut of 114%National Television Standards Committee(NTSC).To the best of our knowledge,this is the first ull-olor QLED prototype with such a high resolution.We anticipate that this innovative patteming technique will open a new horizon for future display technologies and may lead to a disruptive and innovative change in display industry.展开更多
Bone tissue engineering(BTE)has been proven to be an effective method for the treatment of bone defects caused by different musculoskeletal disorders.Photocrosslinkable hydrogels(PCHs)with good biocompatibility and bi...Bone tissue engineering(BTE)has been proven to be an effective method for the treatment of bone defects caused by different musculoskeletal disorders.Photocrosslinkable hydrogels(PCHs)with good biocompatibility and biodegradability can significantly promote the migration,proliferation and differentiation of cells and have been widely used in BTE.Moreover,photolithography 3D bioprinting technology can notably help PCHs-based scaffolds possess a biomimetic structure of natural bone,meeting the structural requirements of bone regeneration.Nanomaterials,cells,drugs and cytokines added into bioinks can enable different functionalization strategies for scaffolds to achieve the desired properties required for BTE.In this review,we demonstrate a brief introduction of the advantages of PCHs and photolithography-based 3D bioprinting technology and summarize their applications in BTE.Finally,the challenges and potential future approaches for bone defects are outlined.展开更多
A novel microfabrication process based on optimized photolithography combined with pyrolysis-reduction is proposed to fabricate interdigital porous carbon/tin quantum dots （C/Sn QDs） microelectrodes.C/Sn QDs active ...A novel microfabrication process based on optimized photolithography combined with pyrolysis-reduction is proposed to fabricate interdigital porous carbon/tin quantum dots （C/Sn QDs） microelectrodes.C/Sn QDs active microelectrodes are also employed as current collectors of a micro-supercapacitor （MSC）.A uniform dispersion of Sn QDs （diameter of ～3 nm） in the carbon matrix is achieved using our facile and controllable microfabrication process.The as-fabricated C/Sn QDs MSC obtained by carbonization at 900 ℃ exhibits a higher areal specific capacitance （5.79 mF＆#183;cm-2） than that of the pyrolyzed carbonbased MSC （1.67 mF＆#183;cm-2） and desirable cycling stability （93.3% capacitance retention after 5,000 cyclic voltammetry cycles）.This novel microfabrication process is fully compatible with micromachining technologies,showing great potential for large-scale fine micropatterning of carbon-based composites for applications in micro/nano devices.展开更多
We report a new method for the fabrication of two-dimensional photonic crystal （PhC） hole arrays to improve the light extraction of GaN-based light-emitting diodes （LEDs）. The PhC structures were realized using na...We report a new method for the fabrication of two-dimensional photonic crystal （PhC） hole arrays to improve the light extraction of GaN-based light-emitting diodes （LEDs）. The PhC structures were realized using nanospherical-lens photolithography and the selective-area epitaxy method, which ensured the electrical properties of the LEDs through leaving the p-GaN damage-free. At a current of 350 mA, the light output power of LEDs with PhC hole arrays of 450 nm and 600 nm in diameter with the same lattice period of 900 nm were enhanced by 49.3% and 72.2%, respectively, compared to LEDs without a PhC. Furthermore, the LEDs with PhC hole structures showed an obviously smaller divergent angle compared with conventional LEDs, which is consistent with the results of finite-difference time-domain simulation.展开更多
As a wide band gap semiconductor material,tin oxide(SnO_(2))has been widely used in gas sensing,optoelectronics and catalysis.The complex micro and nanoscale threedimensional(3D)geometric structures endow the conventi...As a wide band gap semiconductor material,tin oxide(SnO_(2))has been widely used in gas sensing,optoelectronics and catalysis.The complex micro and nanoscale threedimensional(3D)geometric structures endow the conventional SnO_(2)ceramics with novel properties and functionalities.Nevertheless,ceramics cannot be cast or machined easily due to their high mechanical toughness and resistance.The additive manufacturing opens a great opportunity for flexibly geometrical shaping,while the arbitrary shaping of SnO_(2)ceramics at micro and nanoscale is always a challenge.Herein,preceramic monomers which can be polymerized under ultrafast laser irradiation,were utilized to form complex and arbitrary 3D preceramic polymer structures.After calcination treatment,these green-body structures could be converted into pure high-dense SnO_(2)ceramics with uniform shrinkage,and the feature size was down to submicron.Transmission electron microscopy(TEM)analysis displays that the printed SnO_(2)ceramic nanostructures can be nanocrystallized with grain sizes of 2.5±0.4 nm.This work provides the possibility of manufacturing 3D SnO_(2)ceramic nanostructures arbitrarily with sub-100 nm resolution,thus making it promising for the applications of SnO_(2)in different fields.展开更多
As one of the most advanced and precise equipment in the world,a photo-lithography scanner is able to fabricate nanometer‐scale devices on a chip.To realize such a small dimension,the optical system is the fundamenta...As one of the most advanced and precise equipment in the world,a photo-lithography scanner is able to fabricate nanometer‐scale devices on a chip.To realize such a small dimension,the optical system is the fundamental,but the me-chanical system often becomes the bottleneck.In the photolithography,the ex-posure is a dynamic process.The accuracy and precision of the movement are determined by the mechanical system,which is even more difficult to control compared with the optical system.In the mechanical system,there are four crucial components:the reticle and wafer stages,the linear motor,the metrology system,and the control system.They work together to secure the reticle and substrate locating at the correct position,which determines the overlay and alignment per-formance in the lithography.In this paper,the principles of these components are reviewed,and the development history of the mechanical system is introduced.展开更多
The authors present a polymethyl methacrylate(PMMA)-based,reusable microsphere mask used in the laser sub-wavelength photolithography.In order to overcome the diffraction limit to achieve nano-structuring using l-|im ...The authors present a polymethyl methacrylate(PMMA)-based,reusable microsphere mask used in the laser sub-wavelength photolithography.In order to overcome the diffraction limit to achieve nano-structuring using l-|im laser wavelength,the photolithography technique was conventionally characterized by applying a one-off monolayer of silica microspheres serving as Mie scatterers.Addressing the major limitation of this technique,which was that the monolayer of microspheres must be prepared on the sample surface prior to fabrication,the proposed hot press approach could firmly fuse the 1silica microspheres to the PMMA base without the use of adhesives.The PMMA-based microsphere mask could hence reduce the amount of work for the monolayer preparation and was proven reusable for at least 20 times without damage to top or bottom surfaces.Using the mask,dimples that were 0.7 pm in diameter and 40 nm in depth were produced on tool steel by a single pulse of picosecond laser irradiation.展开更多
基金supported by the National Key R&D Program of China(2022YFB3606501,2022YFB3602902)the Key projects of National Natural Science Foundation of China(62234004)+8 种基金the National Natural Science Foundation of China(U23A2092)Pioneer and Leading Goose R&D Program of Zhejiang(2024C01191,2024C01092)Innovation and Entrepreneurship Team of Zhejiang Province(2021R01003)Ningbo Key Technologies R&D Program(2022Z085),Ningbo 3315 Programme(2020A-01-B)YONGJIANG Talent Introduction Programme(2021A-038-B,2021A-159-G)“Innovation Yongjiang 2035”Key R&D Programme(2024Z146)Ningbo JiangBei District public welfare science and technology project(2022C07)the China National Postdoctoral Program for Innovative Talents(grant no.BX20240391)the China Postdoctoral Science Foundation(grant no.2023M743623).
文摘High-resolution non-emissive displays based on electrochromic tungsten oxides(WOx)are crucial for future near-eye virtual/augmented reality interactions,given their impressive attributes such as high environmental stability,ideal outdoor readability,and low energy consumption.However,the limited intrinsic structure of inorganic materials has presented a significant challenge in achieving precise patterning/pixelation at the micron scale.Here,we successfully developed the direct photolithography for WOx nanoparticles based on in situ photo-induced ligand exchange.This strategy enabled us to achieve ultra-high resolution efficiently(line width<4μm,the best resolution for reported inorganic electrochromic materials).Additionally,the resulting device exhibited impressive electrochromic performance,such as fast response(<1 s at 0 V),high coloration efficiency(119.5 cm^(2) C^(−1)),good optical modulation(55.9%),and durability(>3600 cycles),as well as promising applications in electronic logos,pixelated displays,flexible electronics,etc.The success and advancements presented here are expected to inspire and accelerate research and development(R&D)in high-resolution non-emissive displays and other ultra-fine micro-electronics.
文摘Ultraviolet nanoimprint lithography(UV-NIL)is a versatile and cost-effective technique for the fabrication of micro-and nanostructures by copying master patterns in a planar or a roll-to-roll process through curing of a liquid UV-sensitive precursor.For applications with a high pattern complexity,new UV-NIL process chains must be specified.Master fabrication is a challenging part of the development and often cannot be accomplished using a single master fabrication technique.Therefore,an approach combining different patterning fabrication techniques is developed here for polymer masters using laser direct writing and photolithography.The polymer masters produced in this way are molded into inverse silicone stamps that are used for roll-to-roll replication into an acrylate formulation.To fit the required roller size for large-area UV-NIL,several submasters with micrometer-sized dot and line gratings and prism arrays,which have been patterned by these different techniques,are assembled to final size of ~200×600 mm^(2) with an absolute precision of better than 50μm.The size of the submasters allows the use of standard laboratory equipment for patterning and direct writing,thus enabling the fabrication of micro-and even nanostructures when electron-beam writing is utilized.In this way,the effort,time,and costs for the fabrication of masters for UV-NIL processes are reduced,enabling further development for particular structures and applications.Using this approach,patterns fabricated with different laboratory tools are finally replicated by UV-NIL in an acrylate formulation,demonstrating the high quality of the whole process chain.
基金supported by the National Natural Science Foundation of China(62374142,12175189 and 11904302)External Cooperation Program of Fujian(2022I0004)+1 种基金Fundamental Research Funds for the Central Universities(20720190005 and 20720220085)Major Science and Technology Project of Xiamen in China(3502Z20191015).
文摘The preparation of red,green,and blue quantum dot(QD)pixelated arrays with high precision,resolution,and brightness poses a significant challenge on the development of advanced micro-displays for virtual,augmented,and mixed reality applications.Alongside the controlled synthesis of high-performance QDs,a reliable QD patterning technology is crucial in overcoming this challenge.Among the various methods available,photolithography-based patterning technologies show great potentials in producing ultra-fine QD patterns at micron scale.This review article presents the recent advancements in the field of QD patterning using photolithography techniques and explores their applications in micro-display technology.Firstly,we discuss QD patterning through photolithography techniques employing photoresist(PR),which falls into two categories:PRassisted photolithography and photolithography of QDPR.Subsequently,direct photolithography techniques based on photo-induced crosslinking of photosensitive groups and photo-induced ligand cleavage mechanisms are thoroughly reviewed.Meanwhile,we assess the performance of QD arrays fabricated using these photolithography techniques and their integration into QD light emitting diode display devices as well as color conversionbased micro light emitting diode display devices.Lastly,we summarize the most recent developments in this field and outline future prospects.
基金supported by Natural Science Foundation of the Fujian Province,China(2024J010016)the National Key R&D Program of China(2021YFB3600400)Fujian Science&Technology Innovation Laboratory for Optoelectronic Information of China Project(2020ZZ113,2021ZZ130)。
文摘Micro light sources are crucial tools for studying the interactions between light and matter at the micro/nanoscale,encompassing diverse applications across multiple disciplines.Despite numerous studies on reducing the size of micro light sources and enhancing optical resolution,the efficient and simple fabrication of ultra-high-resolution micro light sources remains challenging due to its reliance on precise micro-nano processing technology and advanced processing equipment.In this study,a simple approach for the efficient fabrication of submicron light sources is proposed,namely shadow-assisted sidewall emission(SASE)technology.The SASE utilizes the widely adopted UV photolithography process,employing metal shadow modulation to precisely control the emission of light from polymer sidewalls,thereby obtaining photoluminescent light sources with submicron line widths.The SASE eliminates the need for complex and cumbersome manufacturing procedures.The effects of process parameters,including exposure dose,development time,and metal film thickness,on the linewidth of sources are investigated on detail.It is successfully demonstrated red,green,and blue submicron light sources.Finally,their potential application in the field of optical anti-counterfeiting is also demonstrated.We believe that the SASE proposed in this work provides a novel approach for the preparation and application of micro light sources.
文摘Simulations of photoresist etching,aerial image,exposure,and post-bake processes are integrated to obtain a photolithography process simulation for microelectromechanical system（MEMS） and integrated circuit（IC） fabrication based on three-dimensional （3D） cellular automata（CA）. The simulation results agree well with available experimental results. This indicates that the 3D dynamic CA model for the photoresist etching simulation and the 3D CA model for the post-bake simulation could be useful for the monolithic simulation of various lithography processes. This is determined to be useful for the device-sized fabrication process simulation of IC and MEMS.
基金This work was funded by the National Natural Science Foundation of China(51675136)the National Science and Technology Major Project(2017ZX02101006-005)the Heilongjiang Natural Science Foundation(E2017032).
文摘A compact multi-throttle aerostatic guideway is the preferred structure for high precision and acceleration motion in the variable-slit system(VS)of photolithography.The presence of microstructure,such as recesses and grooves,on the guideway working surface has been found to improve the loading performance.Nevertheless,the effects on the guideway performance of changing the microstructure on the micron level are not yet clear.The mesh adaptation method,which was proposed by the authors,is employed in this paper to quantitatively study the influences of four microstructure parameters.The effect of tuning these parameters on the loading performance is revealed.The level of impact determines the proposed design process of the parameters.The characteristic feature of the proposed design process is that the working points of carrying capacity,stiffness,and rotational stiffness are unified under twoway adjusting by means of recess parameters.According to the proposed design process and tuning method,the restriction of supply pressure is lifted to a certain extent and the mutual tradeoff among the loading performances is relieved.The experimental results show that the rotational stiffness of the designed guideway,based on the tuned parameters,reached 2.14×10^(4) Nmrad1 and increased by 69.8%.In a scanning test of the applied VS on argon fluoride laser(ArF)photolithography,the average scanning acceleration reached 67.5 m·s^(-2),meeting the design specification.
基金Project(60574054) supported by the National Natural Science Foundation of China
文摘To describe a semiconductor wafer fabrication flow availably, a new modeling method of extended hybrid Petri nets （EHPNs） was proposed. To model the discrete part and continuous part of a complex photolithography process, hybrid Petri nets （HPNs） were introduced. To cope with the complexity of a photolithography process, object-oriented methods such as encapsulation and classifications were integrated with HPN models. EHPN definitions were presented on the basis of HPN models and object-oriented methods. Object-oriented hybrid Petri subnet models were developed for each typical physical object and an EHPN modeling procedure steps were structured. To demonstrate the feasibility and validity of the proposed modeling method, a real wafer photolithography case was used to illustrate the modeling procedure. dynamic modeling of a complex photolithography process effectively The modeling results indicate that the EHPNs can deal with the dynamic modeling of a complex photolithography process effectively.
文摘In this study,the authors have shown the power conversion efficiency of flexible organic solar cells.The structure of the device is PET/ITO/PEDOT:PSS/P3HT:PCBM/AI.P3HT(poly-3-hexylthiophene).It was used as an electron donor,PCBM([6,6]-phenyl C6 l-butyric acid methyl ester)as an electron acceptor and PEDOT:PSS used as a HIL(hole injection layer).These materials were deposited by spin coating method on the flexible substrates.Photolithography method is used to etch ITO.The electrical parameters of the fabricated cells were investigated by means of J(V),FF(fill factor),the efficiency(r/),photocurrent and IPCE measurement.It was observed that 45%of the absorbed photons are converted into current.The results obtained using etching technology by photolithography is better than that obtained in the clean room.
基金National Natural Science Foundation of China(62131018,12104100)Natural Science Foundation of Guangdong Province(2022A1515010027)+1 种基金Guangzhou Municipal Science and Technology Project(SL2022A04J01205)Nanovision Technology(Beijing)Co.,Ltd.(607230264)。
文摘2D-material-based photodetectors enhanced by plasmonic nanostructures can support responsivity/detectivity several orders higher than commercial photodetectors,drawing extensive attention as promising candidates for the next-generation photodetectors.However,to boost the nanostructure-enhanced 2D photodetectors into real-world applications,crucial challenges lie in the design of broadband enhancing nanostructures and their scalable and position-controllable fabrication.Here,based on a broadband resonant plasmonic disk array fabricated by a scalable and position-controllable technique(direct writing photolithography),we present a visible-near infrared(405-1310 nm)2D WS_(2) photodetector,whose detectivity is up to 3.9×10^(14)Jones,a value exceeding that of the previous plasmon-enhanced 2D photodetectors.The broadened spectral response range and the high detectivity originate from the hot electron injection,optical absorption enhancement,and strain effect supported by the plasmonic array.Furthermore,the designed plasmonic 2D photodetector supports self-powered photodetection,indicating promising potential in energy-free and portable optoelectronic systems.Our results demonstrate an effective method to construct high-performance broadband photodetectors,which can facilitate the development of 2D photodetectors in commercial applications.
基金supported by the National Key Research and Development Program of China(No.2022YFB3606503)the National Natural Science Foundation of China(No.22405233)+1 种基金the China Postdoctoral Science Foundation(No.2023M733019)the Zhejiang Student Technology and Innovation Program(No.2024R401174(X.M.)).
文摘Quantum-dot light-emitting diodes(QLEDs)promise a new generation of low-cost,efficient,bright,and stable light sources.Achieving large-area patterning of high-resolution QLED arrays is essential for display applications.However,patterning of micro-QLEDs arrays via conventional photolithography,the most established and scalable technique capable of producing micrometer-scale patterns,poses challenges because the chemicals and solvents used can damage quantum dot emissive layers and charge transport layers(CTLs)during ultraviolet(UV)exposure and development.Here,we address these challenges by designing a novel hole transport layer(HTL),poly((9,9-dioctylfluorenyl-2,7-diyl)-co-(9-(2-ethylhexyl)-carbazole-3,6-diyl)-co-(9-(4-(4-vinylphenoxy)butyl)-carbazole-3,6-diyl))(PF8Cz-X),which replaces reactive triphenylamine(TPA)units with chemically stable carbazole derivatives and introduces vinylphenoxy groups that crosslink upon annealing,enhancing solvent resistance.Utilizing PF8Cz-X,we fabricated efficient and high-resolution micro-QLEDs arrays with pixel sizes down to~2μm,achieving resolutions up to 6000 pixels per inch.The red,green,and blue micro-QLEDs demonstrate peak external quantum efficiencies(EQEs)of 16.5%,20.1%,and 12.7%,respectively,matching those of un-patterned devices.Our work reveals that conventional photolithography can be effectively employed for the fabrication of high-resolution micro-QLEDs array,paving the way towards advanced display applications in augmented reality(AR)and virtual reality(VR)technologies.
基金supported by the National Key R&D Program of China(Nos.2022YFB3606501,2022YFB3602902)the National Natural Science Foundation of China(Nos.62404227 and U23A2092)+7 种基金the China National Postdoctoral Program for Innovative Talents(No.BX20240391)the China Postdoctoral Science Foundation(No.2023M743623)the Key projects of National Natural Science Foundation of China(No.62234004)“Pioneer”and“Leading Goose”R&D Program of Zhejiang(Nos.2024C01191,2024C01092)Ningbo Key Technologies R&D Program(No.2022Z085)Ningbo 3315 Programme(No.2020A-01-B)YONGJIANG Talent Introduction Programme(No.2021A-038-B,2021A-159-G)Ningbo Science and Technology Yongjiang 2035 Key Technology Breakthrough Plan Project(Nos.2025Z079,2024Z146).
文摘Quantum dot light-emitting diodes(QLEDs)have emerged as a leading platform for next-generation display technologies,gaining substantial research attention in recent years.Among various patterning strategies,direct photolithography offers distinct advantages through its high resolution,throughput,and process simplicity.However,current direct photolithography approaches face critical limitations in resolution and device performance,primarily arising from surface defect generation and photodamage of quantum dots(QDs)caused by deep-ultraviolet exposure and photochemical byproducts.To overcome these challenges,we present a novel benzophenone-derived photosensitive crosslinker featuring a byproduct-free C–H insertion mechanism with native ligands of QDs.Through precise structure design,the photo-absorption of the crosslinker extends to 365 nm,allowing the long-awaited QD patterning under standard i-line photolithography conditions.The developed crosslinker achieves unprecedented patterning resolution(pixel size≈500 nm)with preserved photoluminescent characteristics.Corresponding QLED devices demonstrate remarkable performance enhancements,including a maximum external quantum efficiency(EQE)of 16.48%and a T95 operational lifetime of 2258.3 h(approximately 2.1 times longer than pristine devices).These advancements establish a promising pathway toward high-resolution and high-performance QLEDs,thereby accelerating the commercialization of high-end optoelectronic devices.
基金supported by the National Natural Science Foundation of China(No.12274021)the Beijing Natural Science Foundation(No.Z220007)the Talent Fund of Beijing Jiaotong University(No.KVXKRC24004532).
文摘For the new display technology based on quantum dots(QDs),realizing high-precision arrays of red,green,and blue(RGB)pixels has been a significant research focus at present,aimed at achieving high-quality and high-resolution image displays.However,challenges such as material stability and the variability of process environments complicate the assurance of quality in high-precision patterns.The novel optical patterning technology,exemplified by direct photolithography,is considered a highly promising approach for achieving submicron-level,hyperfine patterning.On the technological level,this method produces patterned quantum dot light-emitting films through a photochemical reaction.Here,we provide a comprehensive review of various methods of QD photolithography patterning,including traditional photolithography,lift off,and direct photolithography,which mainly focused on direct photolithography.This review covers the classification of direct photolithography technologies,summarizes the latest research progress,and discusses future perspectives on the advancement of photolithography technology de-masking.
基金supported by the National Natural Science Foundation of China(22125903,22439003,22209175)the National Key R&D Program of China(Grant 2022YFA1504100,2023YFB4005204)+1 种基金the Energy Revolution S&T Program of Yulin Innovation Institute of Clean Energy(Grant E412010508)the State Key Laboratory of Catalysis(No:2024SKL-A-001)。
文摘Microbatteries(MBs)are crucial to power miniaturized devices for the Internet of Things.In the evolutionary journey of MBs,fabrication technology emerges as the cornerstone,guiding the intricacies of their configuration designs,ensuring precision,and facilitating scalability for mass production.Photolithography stands out as an ideal technology,leveraging its unparalleled resolution,exceptional design flexibility,and entrenched position within the mature semiconductor industry.However,comprehensive reviews on its application in MB development remain scarce.This review aims to bridge that gap by thoroughly assessing the recent status and promising prospects of photolithographic microfabrication for MBs.Firstly,we delve into the fundamental principles and step-by-step procedures of photolithography,offering a nuanced understanding of its operational mechanisms and the criteria for photoresist selection.Subsequently,we highlighted the specific roles of photolithography in the fabrication of MBs,including its utilization as a template for creating miniaturized micropatterns,a protective layer during the etching process,a mold for soft lithography,a constituent of MB active component,and a sacrificial layer in the construction of micro-Swiss-roll structure.Finally,the review concludes with a summary of the key challenges and future perspectives of MBs fabricated by photolithography,providing comprehensive insights and sparking research inspiration in this field.
基金This work was supported by the National Key R&D Program of China(No.2016YFB0401700).
文摘Displays play an extremely important role in modern information society,which creates a never-ending demand for the new and better products and technologies.The latest requirements for novel display technologies focus on high resolution and high color gamut.Among emerging technologies that include organic light-emitting diode(OL ED),micro light-emiting diode(micro-LED),quantum dot light-emitting diode(QLED),laser display,holographic display and others,QLED is promising owing to its intrinsic high color gamut and the possibility to achieve high resolution with photolithography approach.However,previously demonstrated photolthography techniques suffer from reduced device performance and color Impurities in subpixels from the process.In this study,we demonstrated a sacrificial layer assisted patterming(SLAP)approach,which can be applied in conjunction with photolithography to fabricate high-resolution,full-colo quantum dot(QD)patterns.In this approach,the negative photoresist(PR)and sacrificial layer(SL)were uilized to determine the pixels for QD deposition,while at the same time the SL helps protect the QD layer and keep it intact(named PR-SL approach).To prove this method's viability for QLED display manufacture,a 500-ppi,full-color passive matrix(PM)-QLED prototype was fabricated via this process.Results show that there were no color impurities in the subpixels,and the PM-QL ED has a high color gamut of 114%National Television Standards Committee(NTSC).To the best of our knowledge,this is the first ull-olor QLED prototype with such a high resolution.We anticipate that this innovative patteming technique will open a new horizon for future display technologies and may lead to a disruptive and innovative change in display industry.
基金supported by Beijing Natural Science Foundation(Grant No.L202033)the Key Program of National Natural Science Foundation of China(Grant No.21935011)+2 种基金the Military Medical Science and Technology Youth Training Program(Grant No.19QNP052)the Basic Strengthening Research Program(2020-JCJQ-ZD-264-3-2)the Military training injury prevention and treatment research(21XLS29).
文摘Bone tissue engineering(BTE)has been proven to be an effective method for the treatment of bone defects caused by different musculoskeletal disorders.Photocrosslinkable hydrogels(PCHs)with good biocompatibility and biodegradability can significantly promote the migration,proliferation and differentiation of cells and have been widely used in BTE.Moreover,photolithography 3D bioprinting technology can notably help PCHs-based scaffolds possess a biomimetic structure of natural bone,meeting the structural requirements of bone regeneration.Nanomaterials,cells,drugs and cytokines added into bioinks can enable different functionalization strategies for scaffolds to achieve the desired properties required for BTE.In this review,we demonstrate a brief introduction of the advantages of PCHs and photolithography-based 3D bioprinting technology and summarize their applications in BTE.Finally,the challenges and potential future approaches for bone defects are outlined.
基金This work was supported by the National Key Research and Development Program of China （Nos. 2016YFA0202603 and 2016YFA0202604）, the National Basic Research Program of China （No. 2013CB934103）,the Programme of Introducing Talents of Discipline to Universities （No. B17034）, the National Natural Science Foundation of China （Nos. 51502227, 51579198 and 51521001）, the National Natural Science Fund for Distinguished Young Scholars （No. 51425204）, the China Postdoctoral Science Foundation （No. 2015T80845）, the Hubei Province Natural Science Fund （No. 2016CFB582）, the Fundamental Research Funds for the Central Universities （WUT： 2016III001 and 2016III005）. Prof. Liang He and Prof. Liqiang Mai gratefully acknowledged fi~andal support from China Scholarship Council （Nos. 201606955094 and 201606955096）.
文摘A novel microfabrication process based on optimized photolithography combined with pyrolysis-reduction is proposed to fabricate interdigital porous carbon/tin quantum dots （C/Sn QDs） microelectrodes.C/Sn QDs active microelectrodes are also employed as current collectors of a micro-supercapacitor （MSC）.A uniform dispersion of Sn QDs （diameter of ～3 nm） in the carbon matrix is achieved using our facile and controllable microfabrication process.The as-fabricated C/Sn QDs MSC obtained by carbonization at 900 ℃ exhibits a higher areal specific capacitance （5.79 mF＆#183;cm-2） than that of the pyrolyzed carbonbased MSC （1.67 mF＆#183;cm-2） and desirable cycling stability （93.3% capacitance retention after 5,000 cyclic voltammetry cycles）.This novel microfabrication process is fully compatible with micromachining technologies,showing great potential for large-scale fine micropatterning of carbon-based composites for applications in micro/nano devices.
基金supported by the National Natural Science Foundation of China(No.61274040)the National Basic Research Program of China(No.2011CB301902)the National High Technology R&D Program of China(Nos.2011AA03A105,2011AA03A103)
文摘We report a new method for the fabrication of two-dimensional photonic crystal （PhC） hole arrays to improve the light extraction of GaN-based light-emitting diodes （LEDs）. The PhC structures were realized using nanospherical-lens photolithography and the selective-area epitaxy method, which ensured the electrical properties of the LEDs through leaving the p-GaN damage-free. At a current of 350 mA, the light output power of LEDs with PhC hole arrays of 450 nm and 600 nm in diameter with the same lattice period of 900 nm were enhanced by 49.3% and 72.2%, respectively, compared to LEDs without a PhC. Furthermore, the LEDs with PhC hole structures showed an obviously smaller divergent angle compared with conventional LEDs, which is consistent with the results of finite-difference time-domain simulation.
基金supported by Foshan Xianhu Laboratory of the Advanced Energy Science and Technology Guangdong Laboratory (XHT2020-003 and XHT2020-005)the Fundamental Research Funds for the Central Universities (2020IVA068)+1 种基金the Creative Research Group Project of Natural Science Foundation of China (61821003)the National Natural Science Foundation of China (61775068 and 51802239)
文摘As a wide band gap semiconductor material,tin oxide(SnO_(2))has been widely used in gas sensing,optoelectronics and catalysis.The complex micro and nanoscale threedimensional(3D)geometric structures endow the conventional SnO_(2)ceramics with novel properties and functionalities.Nevertheless,ceramics cannot be cast or machined easily due to their high mechanical toughness and resistance.The additive manufacturing opens a great opportunity for flexibly geometrical shaping,while the arbitrary shaping of SnO_(2)ceramics at micro and nanoscale is always a challenge.Herein,preceramic monomers which can be polymerized under ultrafast laser irradiation,were utilized to form complex and arbitrary 3D preceramic polymer structures.After calcination treatment,these green-body structures could be converted into pure high-dense SnO_(2)ceramics with uniform shrinkage,and the feature size was down to submicron.Transmission electron microscopy(TEM)analysis displays that the printed SnO_(2)ceramic nanostructures can be nanocrystallized with grain sizes of 2.5±0.4 nm.This work provides the possibility of manufacturing 3D SnO_(2)ceramic nanostructures arbitrarily with sub-100 nm resolution,thus making it promising for the applications of SnO_(2)in different fields.
基金National Key R&D Program of China,Grant/Award Number:2019YFB1704600National Natural Science Foundation of China(NSFC),Grant/Award Number:U20A6004。
文摘As one of the most advanced and precise equipment in the world,a photo-lithography scanner is able to fabricate nanometer‐scale devices on a chip.To realize such a small dimension,the optical system is the fundamental,but the me-chanical system often becomes the bottleneck.In the photolithography,the ex-posure is a dynamic process.The accuracy and precision of the movement are determined by the mechanical system,which is even more difficult to control compared with the optical system.In the mechanical system,there are four crucial components:the reticle and wafer stages,the linear motor,the metrology system,and the control system.They work together to secure the reticle and substrate locating at the correct position,which determines the overlay and alignment per-formance in the lithography.In this paper,the principles of these components are reviewed,and the development history of the mechanical system is introduced.
基金a core-funded project(No.C16-M-034)of SIMTech,A*STAR Research Entities.
文摘The authors present a polymethyl methacrylate(PMMA)-based,reusable microsphere mask used in the laser sub-wavelength photolithography.In order to overcome the diffraction limit to achieve nano-structuring using l-|im laser wavelength,the photolithography technique was conventionally characterized by applying a one-off monolayer of silica microspheres serving as Mie scatterers.Addressing the major limitation of this technique,which was that the monolayer of microspheres must be prepared on the sample surface prior to fabrication,the proposed hot press approach could firmly fuse the 1silica microspheres to the PMMA base without the use of adhesives.The PMMA-based microsphere mask could hence reduce the amount of work for the monolayer preparation and was proven reusable for at least 20 times without damage to top or bottom surfaces.Using the mask,dimples that were 0.7 pm in diameter and 40 nm in depth were produced on tool steel by a single pulse of picosecond laser irradiation.
