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Research on Efficient Storage Consistency Verification Technology for On-Chain and Off-Chain Data
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作者 Wei Lin Yi Sun 《Computers, Materials & Continua》 2025年第12期5117-5134,共18页
To enable efficient sharing of unbounded streaming data,this paper introduces blockchain technology into traditional cloud data,proposing a hybrid on-chain/off-chain storage model.We design a real-time verifiable data... To enable efficient sharing of unbounded streaming data,this paper introduces blockchain technology into traditional cloud data,proposing a hybrid on-chain/off-chain storage model.We design a real-time verifiable data structure that is more suitable for streaming data to achieve efficient real-time verifiability for streaming data.Based on the notch gate hash function and vector commitment,an adaptive notch gate hash tree structure is constructed,and an efficient real-time verifiable data structure for on-chain and off-chain stream data is proposed.The structure binds dynamic root nodes sequentially to ordered leaf nodes in its child nodes.Only the vector commitment of the dynamic root node is stored on the chain,and the complete data structure is stored off-chain.This structure ensures tamperproofing against malicious off-chain cloud servers of off-chain cloud servers.Preserves storage scalability space,realizes the immediate verification of stream data upon arrival,and the computational overhead of on-chain and off-chain hybrid storage verification is only related to the current data volume,which is more practical when dealing with stream data with unpredictable data volume.We formalize this as an efficient real-time verification scheme for stream data in on-chain and off-chain hybrid storage.Finally,the technology’s security and performance were empirically validated through rigorous analysis. 展开更多
关键词 On-chain and off-chain hybrid storage verifiable technology slot gate hash function vector commitment
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Performance of Double-Pole Four-Throw Double-Gate RF CMOS Switch in 45-nm Technology
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作者 Viranjay M. Srivastava 《Wireless Engineering and Technology》 2010年第2期47-54,共8页
In this paper, we have investigated the design parameters of RF CMOS switch, which will be used for the wireless tele-communication systems. A double-pole four-throw double-gate radio-frequency complementary-metal-oxi... In this paper, we have investigated the design parameters of RF CMOS switch, which will be used for the wireless tele-communication systems. A double-pole four-throw double-gate radio-frequency complementary-metal-oxide-semicon- ductor (DP4T DG RF CMOS) switch for operating at the 1 GHz is implemented with 45-nm CMOS process technology. This proposed RF switch is capable to select the data streams from the two antennas for both the transmitting and receiving processes. For the development of this DP4T DG RF CMOS switch we have explored the basic concept of the proposed switch circuit elements required for the radio frequency systems such as drain current, threshold voltage, resonant frequency, return loss, transmission loss, VSWR, resistances, capacitances, and switching speed. 展开更多
关键词 45-nm technology Capacitance of DOUBLE-gate MOSFET DG MOSFET DP4T SWITCH Radio Frequency RF SWITCH Resistance of DOUBLE-gate MOSFET VLSI
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Challenges of Process Technology in 32nm Technology Node 被引量:1
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作者 吴汉明 王国华 +1 位作者 黄如 王阳元 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2008年第9期1637-1653,共17页
According to the international technology roadmap for semiconductors (ITRS),32nm technology node will be introduced around 2009. Scaling of CMOS logic devices from 45 to 32nm node has come across significant barrier... According to the international technology roadmap for semiconductors (ITRS),32nm technology node will be introduced around 2009. Scaling of CMOS logic devices from 45 to 32nm node has come across significant barriers. Overcoming these pitch-scaling induced barriers requires integrating the most advanced process technologies into product manufacturing. This paper reviews and discusses new technology applications that could be potentially integrated into 32nm node in the following areas:extension of immersion lithography,mobility enhancement substrate technology,metal/ high-k (MHK) gate stack, ultra-shallow junction (USJ) and other strain enhancement engineering methods, including stress proximity effect (SPT), dual stress liner (DSL), stress memorization technique (SMT), high aspect ratio process (HARP) for STI and PMD,embedded SiGe (for pFET) and SiC (for nFET) source/drain (S/D) using selective epitaxial growth (SEG) method,metallization for middle of line (MOL) and back-end of line (BEOL) ,and ultra low-k (ULK) integration. 展开更多
关键词 CMOS technology 32nm technology node mobility enhancement metal gate/high k dielectrics ultra low k dielectrics
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Effect of X-ray irradiation on threshold voltage of AlGaN/GaN HEMTs with p-GaN and MIS Gates 被引量:3
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作者 Yongle Qi Denggui Wang +4 位作者 Jianjun Zhou Kai Zhang Yuechan Kong Suzhen Wu Tangsheng Chen 《Nanotechnology and Precision Engineering》 CAS CSCD 2020年第4期241-243,共3页
Commercially available AlGaN/GaN high-electron-mobility transistors(HEMTs)are beginning to enter the public scene froma range of suppliers.Based on previous studies,commercial GaN-based electronics are expected to be ... Commercially available AlGaN/GaN high-electron-mobility transistors(HEMTs)are beginning to enter the public scene froma range of suppliers.Based on previous studies,commercial GaN-based electronics are expected to be tolerant to different types of irradiation in space.To test this assumption,we compared the characteristic electrical curves obtained at different X-ray irradiation doses for GaN HEMT devices manufactured by Infineon and Transphorm.The p-GaN-based device was found to be more robust with a stable threshold voltage,whereas the threshold voltage of the device with ametal-insulator-semiconductor gatewas found to shift first in the negative and then the positive direction.This dynamic phenomenon is caused by the releasing and trapping effects of radiation-induced charges in the dielectric layer and at the interface of irradiated devices.As such,the p-GaNgate-based GaN HEMT provides a promising solution for use as an electric source in space. 展开更多
关键词 p-gan gate GaN HEMTs X-ray irradiation Threshold voltage
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Research and test of the adaptive quadrature demodulation technology for silicon micro-machined gyroscope 被引量:3
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作者 王玉良 《Journal of Harbin Institute of Technology(New Series)》 EI CAS 2012年第5期118-122,共5页
A program of adaptive quadrature demodulation is proposed to supply the gaps in the traditional analog detection technology of a silicon micro-machined gyroscope (SMG). This program is suitable for digital phase locke... A program of adaptive quadrature demodulation is proposed to supply the gaps in the traditional analog detection technology of a silicon micro-machined gyroscope (SMG). This program is suitable for digital phase locked loop (DPLL) drive technology that proposed in other papers. In addition the program adopts an adaptive filtering algorithm, which selects the in-phase and quadrature components that are outputs of the DPLL of the SMG's drive mode as reference signals to update the amplitude of the in-phase and quadrature components of the input signal by iteratively. An objective of the program is to minimize the mean square error of the accurate amplitudes and the estimated amplitudes of SMG's detection mode. The simulation and test results prove the feasibility of the program that lays the foundation for the further improvement of the SMG's system performance and the implementation of the SMG system's self-calibration and self-demarcation in future. 展开更多
关键词 Silicon Micro-machined Gyroscope (SMG) adaptive filtering technology quadrature demodulation Field Programmable gate Array(FPGA)
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An Improved SOI CMOS Technology Based Circuit Technique for Effective Reduction of Standby Subthreshold Leakage 被引量:1
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作者 Manish Kumar Md. Anwar Hussain Sajal K. Paul 《Circuits and Systems》 2013年第6期431-437,共7页
Silicon-on-insulator (SOI) CMOS technology is a very attractive option for implementing digital integrated circuits for low power applications. This paper presents migration of standby subthreshold leakage control tec... Silicon-on-insulator (SOI) CMOS technology is a very attractive option for implementing digital integrated circuits for low power applications. This paper presents migration of standby subthreshold leakage control technique from a bulk CMOS to SOI CMOS technology. An improved SOI CMOS technology based circuit technique for effective reduction of standby subthreshold leakage power dissipation is proposed in this paper. The proposed technique is validated through design and simulation of a one-bit full adder circuit at a temperature of 27℃, supply voltage, VDD of 0.90 V in 120 nm SOI CMOS technology. Existing standby subthreshold leakage control techniques in CMOS bulk technology are compared with the proposed technique in SOI CMOS technology. Both the proposed and existing techniques are also implemented in SOI CMOS technology and compared. Reduction in standby subthreshold leakage power dissipation by reduction factors of 54x and 45x foraone-bit full adder circuit was achieved using our proposed SOI CMOS technology based circuit technique in comparison with existing techniques such as MTCMOS technique and SCCMOS technique respectively in CMOS bulk technology. Dynamic power dissipation was also reduced significantly by using this proposed SOI CMOS technology based circuit technique. Standby subthreshold leakage power dissipation and dynamic power dissipation were also reduced significantly using the proposed circuit technique in comparison with other existing techniques, when all circuit techniques were implemented in SOI CMOS technology. All simulations were performed using Microwindver 3.1 EDA tool. 展开更多
关键词 STANDBY SUBTHRESHOLD LEAKAGE SOI technology Low Power MULTI-THRESHOLD VOLTAGE STACK Effect Reverse gate VOLTAGE
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Fin Field Effect Transistor with Active 4-Bit Arithmetic Operations in 22 nm Technology
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作者 S.Senthilmurugan K.Gunaseelan 《Intelligent Automation & Soft Computing》 SCIE 2023年第2期1323-1336,共14页
A design of a high-speed multi-core processor with compact size is a trending approach in the Integrated Circuits(ICs)fabrication industries.Because whenever device size comes down into narrow,designers facing many po... A design of a high-speed multi-core processor with compact size is a trending approach in the Integrated Circuits(ICs)fabrication industries.Because whenever device size comes down into narrow,designers facing many power den-sity issues should be reduced by scaling threshold voltage and supply voltage.Initially,Complementary Metal Oxide Semiconductor(CMOS)technology sup-ports power saving up to 32 nm gate length,but further scaling causes short severe channel effects such as threshold voltage swing,mobility degradation,and more leakage power(less than 32)at gate length.Hence,it directly affects the arithmetic logic unit(ALU),which suffers a significant power density of the scaled multi-core architecture.Therefore,it losses reliability features to get overheating and increased temperature.This paper presents a novel power mini-mization technique for active 4-bit ALU operations using Fin Field Effect Tran-sistor(FinFET)at 22 nm technology.Based on this,a diode is directly connected to the load transistor,and it is active only at the saturation region as a function.Thereby,the access transistor can cutoff of the leakage current,and sleep transis-tors control theflow of leakage current corresponding to each instant ALU opera-tion.The combination of transistors(access and sleep)reduces the leakage current from micro to nano-ampere.Further,the power minimization is achieved by con-necting the number of transistors(6T and 10T)of the FinFET structure to ALU with 22 nm technology.For simulation concerns,a Tanner(T-Spice)with 22 nm technology implements the proposed design,which reduces threshold vol-tage swing,supply power,leakage current,gate length delay,etc.As a result,it is quite suitable for the ALU architecture of a high-speed multi-core processor. 展开更多
关键词 FinFET(22 nm)technology diode connection arithmetic logic unit reduce threshold voltage swing gate length delay leakage power
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Comparative Analysis of Golden Gate and ClassicalCloning Techniques in E.coli:A Study in Molecular Cloning Efficiency
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作者 Ziyao Liu 《Asia Pacific Journal of Clinical Medical Research》 2025年第2期29-38,共10页
Molecular cloning remains a cornerstone technique in genetic engineering and synthetic biology.In this study,we conducted a systematic comparative analysis between the classical cloning method and the Golden Gate asse... Molecular cloning remains a cornerstone technique in genetic engineering and synthetic biology.In this study,we conducted a systematic comparative analysis between the classical cloning method and the Golden Gate assembly technique,utilizing Escherichia coli as the model organism.Through polymerase chain reaction(PCR)amplification,restriction enzyme digestion,ligation,transformation,and Sanger sequencing,we assessed the operational efficiency and cloning fidelity of both strategies.Our results demonstrated that Golden Gate assembly,leveraging type IIS restriction enzymes and simultaneous ligation,significantly enhanced cloning efficiency and precision,particularly for seamless multi-fragment assembly.In contrast,the classical cloning approach maintained certain advantages in simplicity and robustness for specific experimental conditions.Challenges encountered during transformation and sequencing highlighted the critical impact of technical accuracy on experimental outcomes.This study underscores the importance of selecting appropriate cloning methodologies tailored to experimental objectives and laboratory capabilities,providing a foundation for optimized molecular cloning workflows in future synthetic biology and biotechnology applications. 展开更多
关键词 Golden gate Assembly Classical Cloning Escherichia Coli Molecular Cloning DNA Assembly Recombinant DNA technology Transformation Effi ciency Synthetic Biology
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P-GaN栅结构GaN基HEMT器件研究进展 被引量:4
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作者 朱彦旭 宋潇萌 +3 位作者 李建伟 谭张杨 李锜轩 李晋恒 《北京工业大学学报》 CAS CSCD 北大核心 2023年第8期926-936,共11页
增强型氮化镓(GaN)基高电子迁移率晶体管(high electron mobility transistor,HEMT)是高频高功率器件与开关器件领域的研究热点,P-GaN栅技术因具备制备工艺简单、可控且工艺重复性好等优势而成为目前最常用且唯一实现商用的GaN基增强型... 增强型氮化镓(GaN)基高电子迁移率晶体管(high electron mobility transistor,HEMT)是高频高功率器件与开关器件领域的研究热点,P-GaN栅技术因具备制备工艺简单、可控且工艺重复性好等优势而成为目前最常用且唯一实现商用的GaN基增强型器件制备方法。首先,概述了当前制约P-GaN栅结构GaN基HEMT器件发展的首要问题,从器件结构与器件制备工艺这2个角度,综述了其性能优化举措方面的最新研究进展。然后,通过对研究进展的分析,总结了当前研究工作面临的挑战以及解决方法。最后,对未来的发展前景、发展方向进行了展望。 展开更多
关键词 氮化镓(GaN) p-gan栅技术 高电子迁移率晶体管(high electron mobility transistor HEMT) 增强型器件 结构优化 制备工艺优化
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Qt协调国产FPGA的逻辑层动态调度图像系统
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作者 谢家兴 李东峻 +3 位作者 周欣红 莫汉东 罗洋 刘洪山 《电子测量技术》 北大核心 2026年第1期207-215,共9页
针对图像处理系统灵活性不足与智能化水平待提升的问题,本研究致力于克服国产FPGA动态重构领域存在的技术瓶颈,提出了一个逻辑层动态调度图像系统。该系统基于上海安路科技公司PH1A90 FPGA芯片与Qt框架进行开发,基于逻辑层动态调度原理... 针对图像处理系统灵活性不足与智能化水平待提升的问题,本研究致力于克服国产FPGA动态重构领域存在的技术瓶颈,提出了一个逻辑层动态调度图像系统。该系统基于上海安路科技公司PH1A90 FPGA芯片与Qt框架进行开发,基于逻辑层动态调度原理通过智能上位机控制模块可实现近似于DPR的全链路动态调度行为。实验结果表明,本研究实现了Qt上位机与PH1A90 FPGA的软硬件协同,完成了四接口异构输入、双传感器协同成像、算法处理链配置与22种ISP动态处理算法,并通过HDMI输出1080P@60 fps视频流,验证了接口、流程以及算法上的逻辑层动态调度能力与国产芯片的工业级可靠性,推动我国智能安防、工业检测等领域的自主可控进程。 展开更多
关键词 现场可编程门阵列 Qt框架 图像处理技术 逻辑层动态调度 软硬件协同 人机交互
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BIM技术在闸墩施工进度管理中的应用
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作者 王琪 《云南水力发电》 2026年第2期164-167,共4页
闸墩施工是水利工程项目建设中的关键部分,其进度管理直接影响到整个工程的工期、成本和质量。传统的进度管理方法在面对闸墩施工这样复杂的工程任务时,往往存在诸多局限性。而BIM(建筑信息模型)技术的出现为闸墩施工进度管理带来了新... 闸墩施工是水利工程项目建设中的关键部分,其进度管理直接影响到整个工程的工期、成本和质量。传统的进度管理方法在面对闸墩施工这样复杂的工程任务时,往往存在诸多局限性。而BIM(建筑信息模型)技术的出现为闸墩施工进度管理带来了新的思路和方法。BIM技术在进度计划优化、动态调整和资源协调中的有效性,有效地提高进度管理的效率和准确性。 展开更多
关键词 BIM技术 闸墩施工 进度管理 施工协同
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基于水利工程的闸门防腐施工安装验收要点探讨
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作者 孙伟 《粘接》 2026年第1期254-257,共4页
以某地独立供水水库水利工程为例,系统分析闸门制造、运输、吊装、防腐和安装等各个环节的验收要点,实现施工工艺优化和验收标准一体化,然后进行实际应用实践。结果表明,与设计标准值相比,该验收要点体系让安装阶段的平面偏差实测平均... 以某地独立供水水库水利工程为例,系统分析闸门制造、运输、吊装、防腐和安装等各个环节的验收要点,实现施工工艺优化和验收标准一体化,然后进行实际应用实践。结果表明,与设计标准值相比,该验收要点体系让安装阶段的平面偏差实测平均值提高了38.3%,高度偏差测试平均值提升了44%,焊接质量一次合格率达到98.7%,超标缺陷率降低至0.8%,返修合格率达到100%,密封性能渗漏量控制在0.12 L/min,压力保持率达到93.5%,防腐涂层厚度偏差控制在±9.5,附着力等级达到0.8级,预期使用寿命提高了21.3%。 展开更多
关键词 施工工艺 闸门安装 工程验收 安装精度 验收标准
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除险加固工程中水闸结构防渗技术的应用研究
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作者 陶媛媛 付雨晨 梁红雯 《中国科技纵横》 2026年第2期114-116,共3页
水闸作为水利工程中的关键设施,在防洪、灌溉、供水等方面发挥着不可替代的作用,其安全稳定运行直接关系到周边地区的经济社会发展和人民群众生命财产安全。然而,受长期运行、自然环境侵蚀以及设计施工缺陷等因素影响,许多水闸出现不同... 水闸作为水利工程中的关键设施,在防洪、灌溉、供水等方面发挥着不可替代的作用,其安全稳定运行直接关系到周边地区的经济社会发展和人民群众生命财产安全。然而,受长期运行、自然环境侵蚀以及设计施工缺陷等因素影响,许多水闸出现不同程度的病害。其中,结构渗水问题尤为突出,严重威胁水闸安全。基于此,本文以水闸除险加固为研究对象,着重分析水闸结构防渗的技术要点。以新河北闸工程为实例,采用理论分析与工程案例相结合的方法,总结项目适用的防渗技术及施工要点,阐明防渗技术在水闸除险加固中的重要作用,以期为同类型项目提供参考与借鉴。 展开更多
关键词 除险加固 水闸结构 防渗技术
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3S技术在黄河口拦门沙测验及数据分析中的应用研究
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作者 边聪聪 金冠 《科技创新与应用》 2026年第3期193-196,共4页
随着信息技术的发展,3S技术(遥感RS、地理信息系统GIS和全球定位系统GPS)在水利工程、河口地貌演变监测等领域应用日益广泛。该文以黄河口拦门沙区域为研究对象,结合遥感影像、实时定位与三维建模等技术,研究3S技术在黄河口拦门沙测验... 随着信息技术的发展,3S技术(遥感RS、地理信息系统GIS和全球定位系统GPS)在水利工程、河口地貌演变监测等领域应用日益广泛。该文以黄河口拦门沙区域为研究对象,结合遥感影像、实时定位与三维建模等技术,研究3S技术在黄河口拦门沙测验及数据分析中的应用路径。研究发现,采用3S技术可显著提升黄河口拦门沙测验精度和数据分析效率,大幅减少外业作业量,提升黄河口拦门沙测验的安全性。 展开更多
关键词 黄河口 拦门沙 3S技术 遥感 GPS GIS
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水闸施工中结构安全监测技术研究
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作者 夏炎 《科技资讯》 2026年第5期132-134,共3页
受内部人员技术操作状态或外部环境影响,水闸施工中极易出现结构失稳等不良现象,影响水闸在防水中的作用,给人民群众的生命财产安全带来较大损失。本文先介绍水闸施工中结构安全监测重点,再以某区域水闸建设为例,充分展现安全监测技术... 受内部人员技术操作状态或外部环境影响,水闸施工中极易出现结构失稳等不良现象,影响水闸在防水中的作用,给人民群众的生命财产安全带来较大损失。本文先介绍水闸施工中结构安全监测重点,再以某区域水闸建设为例,充分展现安全监测技术在水闸结构施工中的运用过程,包含设置监测点、准备监测设备、采集处理数据、确保安全预警标准、调整监测指标,展现监测结果,明确安全监测技术的有效作用等,使水闸整体结构变得更为稳定。 展开更多
关键词 安全监测技术 安全预警 监测点 水闸结构
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传感器技术用于水闸电气设备安装状态监测实现路径研究
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作者 赵阳冬 姜凤群 张海亮 《仪器仪表用户》 2026年第1期64-66,共3页
水闸电气设备的安装状态直接影响其运行安全性与可靠性,传统人工巡检方式存在滞后性强、精度不足等问题。本文研究了一种基于传感器技术的安装状态监测实现路径,通过对水闸电气系统关键部件安装状态进行需求分析,构建由多类传感器组成... 水闸电气设备的安装状态直接影响其运行安全性与可靠性,传统人工巡检方式存在滞后性强、精度不足等问题。本文研究了一种基于传感器技术的安装状态监测实现路径,通过对水闸电气系统关键部件安装状态进行需求分析,构建由多类传感器组成的监测网络,设计布局优化、数据采集与无线传输的集成方案。该方案在数据处理层结合特征提取算法与机器学习模型,实现了对安装偏移、松动、倾斜、导通异常等状态的实时识别与报警,以期为水利行业设备状态感知与运维提供参考。 展开更多
关键词 传感器技术 水闸电气设备 状态监测 数据采集 故障诊断
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水闸混凝土结构防裂关键技术及其应用研究
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作者 张理军 朱闰夫 +1 位作者 汤建国 徐黎 《科技资讯》 2026年第5期135-137,共3页
水闸作为水利工程核心构筑物,其混凝土结构易因设计、材料、施工等因素开裂,威胁工程安全与使用寿命。本文聚焦这一难题,从设计优化、材料改良、施工管控三大维度,提出配筋与构件形态改进、低收缩混凝土配制、全过程温控养护等防裂关键... 水闸作为水利工程核心构筑物,其混凝土结构易因设计、材料、施工等因素开裂,威胁工程安全与使用寿命。本文聚焦这一难题,从设计优化、材料改良、施工管控三大维度,提出配筋与构件形态改进、低收缩混凝土配制、全过程温控养护等防裂关键技术。结合工程实践,通过设计阶段制订专项方案、施工阶段严格落实技术、完工后建立长期监测体系,验证了技术应用效果。结果表明,该技术可以显著降低裂缝发生率、提升结构的耐久性与稳定性、节约运维成本,为水利工程混凝土结构防裂提供可靠的技术支撑,具备重要应用价值。 展开更多
关键词 水闸混凝土结构 防裂关键技术 裂缝监测 结构耐久性 工程应用
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水利水电工程中水闸设计问题及对策研究
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作者 李侃 《中国科技纵横》 2026年第1期135-137,共3页
在水利水电工程建设持续推进过程中,水闸作为保障工程安全与功能实现的关键枢纽,其设计水平的重要性愈发凸显。这不仅关乎工程能否抵御自然灾害的侵袭,确保周边地区人民群众生命财产安全,还直接影响水资源的合理调配与高效利用,对区域... 在水利水电工程建设持续推进过程中,水闸作为保障工程安全与功能实现的关键枢纽,其设计水平的重要性愈发凸显。这不仅关乎工程能否抵御自然灾害的侵袭,确保周边地区人民群众生命财产安全,还直接影响水资源的合理调配与高效利用,对区域经济发展和生态环境保护都有着深远意义。基于此,本文聚焦水闸设计,阐述闸门分类及基本构成,剖析水闸设计中结构安全与水力计算等关键问题,并提出针对性的优化对策,以期为水利工程的设计、建设及运营管理提供参考。 展开更多
关键词 水闸设计 结构安全 水力计算 优化对策 BIM技术 数字孪生 安全监测
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功率VDMOS器件抗辐射技术研究进展
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作者 郑莹 吴博琦 《微纳电子技术》 2026年第4期108-118,共11页
在空间及核辐射等复杂的恶劣环境中,功率垂直双扩散金属-氧化物-半导体(VDMOS)器件受到高能粒子轰击会导致器件电性能退化或者永久性失效,因此对功率VDMOS器件抗辐射技术的研究具有至关重要的现实意义和工程价值。从功率VDMOS器件在辐... 在空间及核辐射等复杂的恶劣环境中,功率垂直双扩散金属-氧化物-半导体(VDMOS)器件受到高能粒子轰击会导致器件电性能退化或者永久性失效,因此对功率VDMOS器件抗辐射技术的研究具有至关重要的现实意义和工程价值。从功率VDMOS器件在辐射环境中产生的辐射效应出发,系统介绍了电离总剂量(TID)效应、单粒子烧毁(SEB)及单粒子栅穿(SEGR)的辐射机理及损伤机制,重点阐述了针对这三种辐射效应的抗辐射技术研究进展,总结了器件工艺改进与结构优化等典型加固技术,概述了目前功率VDMOS器件抗辐射技术研究中存在的问题,最后对功率VDMOS器件抗辐射技术的未来发展方向进行了展望。 展开更多
关键词 功率垂直双扩散金属-氧化物-半导体(VDMOS) 电离总剂量(TID) 单粒子烧毁(SEB) 单粒子栅穿(SEGR) 加固技术
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Research on Night Vision System Based on Range-Gated Imaging 被引量:1
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作者 刘宇 范燕平 +3 位作者 茹志兵 郭城 周新妮 张保民 《Defence Technology(防务技术)》 SCIE EI CAS 2009年第4期287-291,共5页
A design of low-light-level night vision system is described,which can image objects selectively in the specific space. The system can selectively image some objects in specific distances,meanwhile ignore those shelte... A design of low-light-level night vision system is described,which can image objects selectively in the specific space. The system can selectively image some objects in specific distances,meanwhile ignore those shelters on the way of observation by combining an intensifying charge coupled device(ICCD) with a near infrared laser assisted in vision,whose operation wavelength matches with the photocathode of the image tube,and adopting the gated mode and adjustable time-delay. A semiconductor laser diode of 100 W in peak power is chosen for illumination. The laser and the image tube operate in 150 ns pulse width and 2 kHz repeat frequency. Some images of different objects at the different distances within 100 m can be obtained clearly,and even behind a grove by using a sampling circuit and a delay control device at 100 W in peak power of semiconductor laser diode,150 ns in pulse width of laser and image tube,2 kHz in repeat frequency. 展开更多
关键词 electron technology low-light-level night vision ICCD spatial gated range gated
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