To counter the mass reproduction and penetration of crustacean zooplankton in Biological Activated Carbon(BAC)filters which may result in the presence of organisms in potable water and water pollution,this paper analy...To counter the mass reproduction and penetration of crustacean zooplankton in Biological Activated Carbon(BAC)filters which may result in the presence of organisms in potable water and water pollution,this paper analyzed the factors affecting organisms' reproduction in BAC filters.A comparative study was performed on the density and composition of crustacean zooplankton of the concerned water treatment units of two advanced water plants(Plant A and B)which with the same raw water and the same treatment technique in southern China.The results obtained show that the crustaceans' density and composition was very different between the sand filtered water of Plant A and Plant B.which Harpacticoida bred sharply in the sediment tanks and penetrated sand filter into BAC filters was the primary reason of crustaceans reproduce in BAC filters of Plant A.For prevention of the organisms reproduction in BAC,some strengthen measures was taken including pre-chlorination,cleaning coagulation tanks and sediment tanks completely,increasing sludge disposal frequency to stop organisms enter BAC filters,and the finished water quality was improved and enhanced.展开更多
5 nm logic process is the current leading-edge technology which is under development in world-wide leading foundries.In a typical 5 nm logic process,the Fin pitch is 22~27 nm,the contact-poly pitch(CPP)is 48?55 nm,and...5 nm logic process is the current leading-edge technology which is under development in world-wide leading foundries.In a typical 5 nm logic process,the Fin pitch is 22~27 nm,the contact-poly pitch(CPP)is 48?55 nm,and the minimum metal pitch(MPP)is around 30~36 nm.Due to the fact that these pitches are much smaller than the resolution capability of 193 nm immersion lithography,it is also the first generation which adopts EUV photolithography technology on a large-scale where the process flow can be simplified by single exposure method from more than 10 layers.Relentless scaling brings big challenges to process integration and pushes each process module to the physical and material limit.Therefore,the success of process development will largely depend on careful balance the pros and cons to achieve both performance and yield targets.In the paper,we discussed the advantages and disadvantages of different process approaches for key process loops for 5 nm logic process flow,including dummy poly cut versus metal gate cut approaches in the metal gate loops,self-aligned contact(SAC)versus brutally aligned contact(BAC)approaches,and also introduced the self-aligned double patterning approach in the lower metal processes.Based on the above evaluation,we will provide a recommendation for module's process development.展开更多
基金Sponsored by the Major National S&T Program-Water Pollution and Governance(Grant No.2009ZX07423-003)
文摘To counter the mass reproduction and penetration of crustacean zooplankton in Biological Activated Carbon(BAC)filters which may result in the presence of organisms in potable water and water pollution,this paper analyzed the factors affecting organisms' reproduction in BAC filters.A comparative study was performed on the density and composition of crustacean zooplankton of the concerned water treatment units of two advanced water plants(Plant A and B)which with the same raw water and the same treatment technique in southern China.The results obtained show that the crustaceans' density and composition was very different between the sand filtered water of Plant A and Plant B.which Harpacticoida bred sharply in the sediment tanks and penetrated sand filter into BAC filters was the primary reason of crustaceans reproduce in BAC filters of Plant A.For prevention of the organisms reproduction in BAC,some strengthen measures was taken including pre-chlorination,cleaning coagulation tanks and sediment tanks completely,increasing sludge disposal frequency to stop organisms enter BAC filters,and the finished water quality was improved and enhanced.
基金I thank the higher management team from Shanghai IC R&D Company for the support of this work.
文摘5 nm logic process is the current leading-edge technology which is under development in world-wide leading foundries.In a typical 5 nm logic process,the Fin pitch is 22~27 nm,the contact-poly pitch(CPP)is 48?55 nm,and the minimum metal pitch(MPP)is around 30~36 nm.Due to the fact that these pitches are much smaller than the resolution capability of 193 nm immersion lithography,it is also the first generation which adopts EUV photolithography technology on a large-scale where the process flow can be simplified by single exposure method from more than 10 layers.Relentless scaling brings big challenges to process integration and pushes each process module to the physical and material limit.Therefore,the success of process development will largely depend on careful balance the pros and cons to achieve both performance and yield targets.In the paper,we discussed the advantages and disadvantages of different process approaches for key process loops for 5 nm logic process flow,including dummy poly cut versus metal gate cut approaches in the metal gate loops,self-aligned contact(SAC)versus brutally aligned contact(BAC)approaches,and also introduced the self-aligned double patterning approach in the lower metal processes.Based on the above evaluation,we will provide a recommendation for module's process development.
