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Photoluminescence Spectra of Disordered and Ordered Ga_(0.52)In_(0.48)P 被引量:1
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作者 LUYi-jun YURong-wen 《Semiconductor Photonics and Technology》 CAS 1999年第3期139-142,151,共5页
Temperature-dependence and excitation-intensity-dependence of photoluminescence spectra for both disordered and ordered Ga 0.52 In 0.48 P are measured. The disordered sample is characterized by its single peak photolu... Temperature-dependence and excitation-intensity-dependence of photoluminescence spectra for both disordered and ordered Ga 0.52 In 0.48 P are measured. The disordered sample is characterized by its single peak photoluminescence spectrum which is excitation-intensity independent and has different activation energy at different temperature region. The ordered sample shows double peaks, the intensity of the high-energy peak has an anomalous increase firstly and quenches afterwards. The relative phenomena are reasonably explained in terms of lattice ordering and orientation superlattice model. 展开更多
关键词 PHOTOLUMINESCENCE Semiconductor Materials Spectra CLC number:o472.3 Document code:A
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AlGaN/GaN异质结构的X射线衍射研究
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作者 谭伟石 徐金 +5 位作者 蔡宏灵 沈波 吴小山 蒋树声 郑文莉 贾全杰 《核技术》 CAS CSCD 北大核心 2004年第6期413-416,共4页
在(0001)取向的蓝宝石(α-Al2O3)基片上用金属有机物化学气相沉积(MOCVD)方法生长了势垒层厚度为1000?的Al0.22Ga0.78N/GaN异质结构;;利用高分辨X射线衍射(HRXRD)技术测量了样品的对称反射(0002)和非对称反射(1014)的倒易空间Mapping(R... 在(0001)取向的蓝宝石(α-Al2O3)基片上用金属有机物化学气相沉积(MOCVD)方法生长了势垒层厚度为1000?的Al0.22Ga0.78N/GaN异质结构;;利用高分辨X射线衍射(HRXRD)技术测量了样品的对称反射(0002)和非对称反射(1014)的倒易空间Mapping(RSM)。结果表明;;样品势垒层的内部微结构与应变状态和下层i-GaN的微结构与应变状态互相关联。样品势垒层的微应变已经发生弛豫;;而且具有一种“非常规”应变弛豫状态;;这种弛豫状态的来源可能与n-AlGaN的内部缺陷以及i-GaN/α-Al2O3界面应变弛豫状态有关。掠入射X射线衍射研究表明样品内部的应变是不均匀的;;由表层的横向压应变状态过渡到下层的张应变状态;;与根据倒易空间Mapping分析得到的结果一致。 展开更多
关键词 AIGaN/GaN异质结构 倒易空间Mapping 应变弛豫 掠入射X射线衍射
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(Al_xGa_(1-x))_yIn_(1-y)P Films and Its Optical Constants on the Surface
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作者 ZHANGShu-zhi HUANGBo-biao 《Semiconductor Photonics and Technology》 CAS 1999年第2期86-91,共6页
The optical parameters for three samples of intrinsic, doped Si and doped Mg (Al x Ga 1- x ) y In 1- y P prepared by the MOCVD on GaAs substrate were measured by using ellipsometry and were calc... The optical parameters for three samples of intrinsic, doped Si and doped Mg (Al x Ga 1- x ) y In 1- y P prepared by the MOCVD on GaAs substrate were measured by using ellipsometry and were calculated by the two-layer absorption film model. The results obtained were discussed. The grown rates and thickness of oxidic layer on the intrinsic (Al x Ga 1- x ) y In 1- y P surface exposed in the atmosphere were studied. A linear dependence of oxidic layer thickness on the time was obtained. 展开更多
关键词 Ellipsometry Optical Parameters Oxidic Layer Two-layer Absorption Film Model CLC number:TN304.23 o472.3 Document code:A
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