Nano-ring-type magnetic tunnel junctions （NR-MTJs） with the layer structure of Ta（5）/Ir22Mn78（10）/ Co75Fe25（2）/Ru（0.75）/CoooFe20B20（3）/Al（0.6）-oxide/Co60Fe20B20（2.5）/Ta（3）/Ru（5） （thickness unit：...Nano-ring-type magnetic tunnel junctions （NR-MTJs） with the layer structure of Ta（5）/Ir22Mn78（10）/ Co75Fe25（2）/Ru（0.75）/CoooFe20B20（3）/Al（0.6）-oxide/Co60Fe20B20（2.5）/Ta（3）/Ru（5） （thickness unit： nm） were nano-fabricated on the Si（100）/SiO2 substrate using magnetron sputtering deposition combined with the optical lithography, electron beam lithography （EBL） and Ar ion-beam etching techniques. The smaller NR-MTJs with the inner- and outer-diameter of around 50 and 100 nm and also their corresponding NR-MTJ arrays were nano-patterned. The tunnelling magnetoresistance （TMR ＆ R） versus driving current （I） loops for a spin-polarized current switching were measured, and the TMR ratio of around 35% at room temperature were observed. The critical values of switching current for the free Co60Fe20B20 layer relative to the reference Co6oFe2oB2o layer between parallel and anti-parallel magnetization states were between 0.50 and 0.75 mA in such NR-MTJs. It is suggested that the applicable MRAM fabrication with the density and capacity higher than 256 Mbit/inch2 even 6 Gbite/inch2 are possible using both I NR-MTJ＋1 transistor structure and current switching mechanism based on based on our fabricated 4×4 MRAM demo devices.展开更多
基金the State Key Project of Fundamental Research of Ministry of Science and Technology （No. 2006CB932200） the National Natural Science Foundation of China （NSFC, No. 10574156）+2 种基金 the Knowledge Innovation Program of Chinese Aca.demy of Sciencesthe protial support of 0utstanding Young Researcher Foundation （Nos. 50325104 and 50528101） K.C.Wong Education Foundation, Hong Kong.
文摘Nano-ring-type magnetic tunnel junctions （NR-MTJs） with the layer structure of Ta（5）/Ir22Mn78（10）/ Co75Fe25（2）/Ru（0.75）/CoooFe20B20（3）/Al（0.6）-oxide/Co60Fe20B20（2.5）/Ta（3）/Ru（5） （thickness unit： nm） were nano-fabricated on the Si（100）/SiO2 substrate using magnetron sputtering deposition combined with the optical lithography, electron beam lithography （EBL） and Ar ion-beam etching techniques. The smaller NR-MTJs with the inner- and outer-diameter of around 50 and 100 nm and also their corresponding NR-MTJ arrays were nano-patterned. The tunnelling magnetoresistance （TMR ＆ R） versus driving current （I） loops for a spin-polarized current switching were measured, and the TMR ratio of around 35% at room temperature were observed. The critical values of switching current for the free Co60Fe20B20 layer relative to the reference Co6oFe2oB2o layer between parallel and anti-parallel magnetization states were between 0.50 and 0.75 mA in such NR-MTJs. It is suggested that the applicable MRAM fabrication with the density and capacity higher than 256 Mbit/inch2 even 6 Gbite/inch2 are possible using both I NR-MTJ＋1 transistor structure and current switching mechanism based on based on our fabricated 4×4 MRAM demo devices.
