The 193 nm deep-ultraviolet(DUV)laser plays a critical role in advanced semiconductor chip manufacturing[1,2],micro-nano material characterization[3,4]and biomedical analysis[5,6],due to its high spatial resolution an...The 193 nm deep-ultraviolet(DUV)laser plays a critical role in advanced semiconductor chip manufacturing[1,2],micro-nano material characterization[3,4]and biomedical analysis[5,6],due to its high spatial resolution and short wavelength.Efficient and compact 193 nm DUV laser source thus becomes a hot research area.Currently,193 nm Ar F excimer gas laser is widely employed in DUV lithography systems and serves as the enabling technology for 7 and 5 nm semiconductor fabrication.展开更多
目的:观察黄褐斑患者采用694 nm调Q激光联合氨甲环酸皮内注射治疗的美学效果。方法:将2020年1月-2023年4月就诊于笔者医院门诊的黄褐斑患者98例,按照随机数字表法分成实验组(694 nm调Q激光与氨甲环酸皮内注射治疗,n=49)和对照组(氨甲环...目的:观察黄褐斑患者采用694 nm调Q激光联合氨甲环酸皮内注射治疗的美学效果。方法:将2020年1月-2023年4月就诊于笔者医院门诊的黄褐斑患者98例,按照随机数字表法分成实验组(694 nm调Q激光与氨甲环酸皮内注射治疗,n=49)和对照组(氨甲环酸皮内注射治疗,n=49),比较两组总有效率、黄褐斑面积及严重程度(Melasma Area and Severity Index,MASI)评分,色素斑、皱纹、纹理、毛孔评分,美学改善效果,不良反应和复发情况。结果:相较于对照组,经6个月治疗后实验组总有效率更高(P<0.05),MASI评分更低;实验组VISIA皮肤检测(色素斑、皱纹、纹理、毛孔)评分较对照组低,实验组美学改善效果评分较对照组高(P<0.05);两组均未发生严重不良反应,两组不良反应发生率比较差异无统计学意义,实验组1年后复发率较对照组低(P<0.05)。结论:对黄褐斑患者采用694 nm调Q激光与氨甲环酸皮内注射联合治疗,其临床效果显著,可降低患者MASI评分、改善皮肤状态,提高美学效果、降低复发率,且安全性良好。展开更多
基金supported by the National Natural Science Foundation of China(Grant Nos.62450006,62304217,62274157,62127807,62234011,62034008,62074142,62074140)Tianshan Innovation Team Program(Grant No.2022TSYCTD0005)+1 种基金Strategic Priority Research Program of the Chinese Academy of Sciences(Grant No.XDB0880000)Youth Innovation Promotion Association of the Chinese Academy of Sciences(Grant Nos.2023124,Y2023032)。
文摘The 193 nm deep-ultraviolet(DUV)laser plays a critical role in advanced semiconductor chip manufacturing[1,2],micro-nano material characterization[3,4]and biomedical analysis[5,6],due to its high spatial resolution and short wavelength.Efficient and compact 193 nm DUV laser source thus becomes a hot research area.Currently,193 nm Ar F excimer gas laser is widely employed in DUV lithography systems and serves as the enabling technology for 7 and 5 nm semiconductor fabrication.
文摘目的:观察黄褐斑患者采用694 nm调Q激光联合氨甲环酸皮内注射治疗的美学效果。方法:将2020年1月-2023年4月就诊于笔者医院门诊的黄褐斑患者98例,按照随机数字表法分成实验组(694 nm调Q激光与氨甲环酸皮内注射治疗,n=49)和对照组(氨甲环酸皮内注射治疗,n=49),比较两组总有效率、黄褐斑面积及严重程度(Melasma Area and Severity Index,MASI)评分,色素斑、皱纹、纹理、毛孔评分,美学改善效果,不良反应和复发情况。结果:相较于对照组,经6个月治疗后实验组总有效率更高(P<0.05),MASI评分更低;实验组VISIA皮肤检测(色素斑、皱纹、纹理、毛孔)评分较对照组低,实验组美学改善效果评分较对照组高(P<0.05);两组均未发生严重不良反应,两组不良反应发生率比较差异无统计学意义,实验组1年后复发率较对照组低(P<0.05)。结论:对黄褐斑患者采用694 nm调Q激光与氨甲环酸皮内注射联合治疗,其临床效果显著,可降低患者MASI评分、改善皮肤状态,提高美学效果、降低复发率,且安全性良好。
