Transmission of N-atoms (T N ) through small diameters tubes (1.5 and 3 mm internal diameter (i.d) and 9, 50 and 80 cm length for silicone tubes, 1.5 mm i.d and 6.5 cm length for stainless steel tubes) has been measur...Transmission of N-atoms (T N ) through small diameters tubes (1.5 and 3 mm internal diameter (i.d) and 9, 50 and 80 cm length for silicone tubes, 1.5 mm i.d and 6.5 cm length for stainless steel tubes) has been measured in late N2 and Ar-N2 flowing afterglows of microwave plasmas in continuous and pulsed gas injection at a flow rate of 1 and 3 Standard liter by minute (Slm), a gas pressure from 2 to 4 Torr for N2 and 20 Torr for Ar-1%N2 and a plasma power from 150 to 300 Watt. From the experimental TN values, it is deduced the γ-destruction probability inside the tube walls as being y = (1-1.6)×10-3 for the silicon tubes and y = (1.6-2)×10-2 for the stainless steel tubes.展开更多
Early afterglows of Ar-N2 flowing microwave discharges are characterized by optical emission spectroscopy. The N and O atoms, the N2(A) and N2(X, v > 13) metastable molecules and N2+ ion densities are determined by...Early afterglows of Ar-N2 flowing microwave discharges are characterized by optical emission spectroscopy. The N and O atoms, the N2(A) and N2(X, v > 13) metastable molecules and N2+ ion densities are determined by optical emission spectroscopy after calibration by NO titration for N and O-atoms and measurements of NO and N2 band intensities. For an Ar-xN2 gas mixture with × increasing from 2 to 100% at 4 Torr, 100 Watt and an afterglow time of 3 × 10- 3 s at the 5 liter reactor inlet, it is found densities in the ranges of (2 - 6) × 1014 cm- 3 for N-atoms, one order of magnitude lower for N2(X, v > 13) and for O-atoms (coming from air impurity), of 1010 - 1011 cm- 3 for N2(A) and of 108 - 109 cm- 3 for N2+.展开更多
The reaction of Os^＋ （^6D, ^4F） with N20 has been investigated at B3LYP/TZVP and CCSD（T）/6-311＋G^＊ levels of theory. The mechanisms corresponding to O-atom and N-atom transfer reactions have been revealed. It w...The reaction of Os^＋ （^6D, ^4F） with N20 has been investigated at B3LYP/TZVP and CCSD（T）/6-311＋G^＊ levels of theory. The mechanisms corresponding to O-atom and N-atom transfer reactions have been revealed. It was found that on the sextet reaction surface both the O-atom and N-atom transfer reactions undergo through direct-abstraction mechanism, leading to the formation of OsO^＋ and OsN^＋, whereas on quartet surface the two reactions undergo through O-N bond or N-N bond insertion mechanism. The calculated energetics shows that the reactions on the sextet surface have notable energy barriers, whereas the reactions on quartet surface are barrierless. ？2009 Xiao Guang Xie. Published by Elsevier B.V. on behalf of Chinese Chemical Society. All rights reserved.展开更多
文摘Transmission of N-atoms (T N ) through small diameters tubes (1.5 and 3 mm internal diameter (i.d) and 9, 50 and 80 cm length for silicone tubes, 1.5 mm i.d and 6.5 cm length for stainless steel tubes) has been measured in late N2 and Ar-N2 flowing afterglows of microwave plasmas in continuous and pulsed gas injection at a flow rate of 1 and 3 Standard liter by minute (Slm), a gas pressure from 2 to 4 Torr for N2 and 20 Torr for Ar-1%N2 and a plasma power from 150 to 300 Watt. From the experimental TN values, it is deduced the γ-destruction probability inside the tube walls as being y = (1-1.6)×10-3 for the silicon tubes and y = (1.6-2)×10-2 for the stainless steel tubes.
文摘Early afterglows of Ar-N2 flowing microwave discharges are characterized by optical emission spectroscopy. The N and O atoms, the N2(A) and N2(X, v > 13) metastable molecules and N2+ ion densities are determined by optical emission spectroscopy after calibration by NO titration for N and O-atoms and measurements of NO and N2 band intensities. For an Ar-xN2 gas mixture with × increasing from 2 to 100% at 4 Torr, 100 Watt and an afterglow time of 3 × 10- 3 s at the 5 liter reactor inlet, it is found densities in the ranges of (2 - 6) × 1014 cm- 3 for N-atoms, one order of magnitude lower for N2(X, v > 13) and for O-atoms (coming from air impurity), of 1010 - 1011 cm- 3 for N2(A) and of 108 - 109 cm- 3 for N2+.
基金supported by the Key Laboratory of Forest Resources Conservation and Use in the Southwest Mountains of China(Southwest Forestry University)the National Natural Science Foundation of China(No.20563005)the General Program of the Applied Basic Research of Science and Technology Department of Yunnan Province.
文摘The reaction of Os^＋ （^6D, ^4F） with N20 has been investigated at B3LYP/TZVP and CCSD（T）/6-311＋G^＊ levels of theory. The mechanisms corresponding to O-atom and N-atom transfer reactions have been revealed. It was found that on the sextet reaction surface both the O-atom and N-atom transfer reactions undergo through direct-abstraction mechanism, leading to the formation of OsO^＋ and OsN^＋, whereas on quartet surface the two reactions undergo through O-N bond or N-N bond insertion mechanism. The calculated energetics shows that the reactions on the sextet surface have notable energy barriers, whereas the reactions on quartet surface are barrierless. ？2009 Xiao Guang Xie. Published by Elsevier B.V. on behalf of Chinese Chemical Society. All rights reserved.
