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Recent Progress on Flexible Room-Temperature Gas Sensors Based on Metal Oxide Semiconductor 被引量:14
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作者 Lang-Xi Ou Meng-Yang Liu +2 位作者 Li-Yuan Zhu David Wei Zhang Hong-Liang Lu 《Nano-Micro Letters》 SCIE EI CAS CSCD 2022年第12期310-351,共42页
With the rapid development of the Internet of Things,there is a great demand for portable gas sensors.Metal oxide semiconductors(MOS)are one of the most traditional and well-studied gas sensing materials and have been... With the rapid development of the Internet of Things,there is a great demand for portable gas sensors.Metal oxide semiconductors(MOS)are one of the most traditional and well-studied gas sensing materials and have been widely used to prepare various commercial gas sensors.However,it is limited by high operating temperature.The current research works are directed towards fabricating high-performance flexible room-temperature(FRT)gas sensors,which are effective in simplifying the structure of MOS-based sensors,reducing power consumption,and expanding the application of portable devices.This article presents the recent research progress of MOS-based FRT gas sensors in terms of sensing mechanism,performance,flexibility characteristics,and applications.This review comprehensively summarizes and discusses five types of MOS-based FRT gas sensors,including pristine MOS,noble metal nanoparticles modified MOS,organic polymers modified MOS,carbon-based materials(carbon nanotubes and graphene derivatives)modified MOS,and two-dimensional transition metal dichalcogenides materials modified MOS.The effect of light-illuminated to improve gas sensing performance is further discussed.Furthermore,the applications and future perspectives of FRT gas sensors are also discussed. 展开更多
关键词 metal oxide semiconductor Flexible gas sensor Room temperature NANOMATERIALS
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Structural evolution of low-dimensional metal oxide semiconductors under external stress 被引量:2
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作者 Peili Zhao Lei Li +9 位作者 Guoxujia Chen Xiaoxi Guan Ying Zhang Weiwei Meng Ligong Zhao Kaixuan Li Renhui Jiang Shuangfeng Jia He Zheng Jianbo Wang 《Journal of Semiconductors》 EI CAS CSCD 2022年第4期60-66,共7页
Metal oxide semiconductors(MOSs) are attractive candidates as functional parts and connections in nanodevices.Upon spatial dimensionality reduction, the ubiquitous strain encountered in physical reality may result in ... Metal oxide semiconductors(MOSs) are attractive candidates as functional parts and connections in nanodevices.Upon spatial dimensionality reduction, the ubiquitous strain encountered in physical reality may result in structural instability and thus degrade the performance of MOS. Hence, the basic insight into the structural evolutions of low-dimensional MOS is a prerequisite for extensive applications, which unfortunately remains largely unexplored. Herein, we review the recent progress regarding the mechanical deformation mechanisms in MOSs, such as CuO and ZnO nanowires(NWs). We report the phase transformation of CuO NWs resulting from oxygen vacancy migration under compressive stress and the tensile strain-induced phase transition in ZnO NWs. Moreover, the influence of electron beam irradiation on interpreting the mechanical behaviors is discussed. 展开更多
关键词 metal oxide semiconductor phase transition STRAIN NANOWIRE in-situ transmission electron microscopy
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Improved interfacial and electrical properties of GaSb metal oxide semiconductor devices passivated with acidic(NH_4)_2S solution
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作者 赵连锋 谭桢 +1 位作者 王敬 许军 《Chinese Physics B》 SCIE EI CAS CSCD 2014年第7期744-747,共4页
Surface passivation with acidic (NH4)2S solution is shown to be effective in improving the interfacial and electrical properties of HfOE/GaSb metal oxide semiconductor devices. Compared with control samples, the sam... Surface passivation with acidic (NH4)2S solution is shown to be effective in improving the interfacial and electrical properties of HfOE/GaSb metal oxide semiconductor devices. Compared with control samples, the samples treated with acidic (NH4)2S solution show great improvements in gate leakage current, frequency dispersion, border trap density, and interface trap density. These improvements are attributed to the enhancing passivation of the substrates, according to analysis from the perspective of chemical mechanism, X-ray photoelectron spectroscopy, and high-resolution cross-sectional transmission electron microscopy. 展开更多
关键词 GASB metal oxide semiconductor sulfur passivation
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X-ray irradiation-induced degradation in Hf_(0.5)Zr_(0.5)O_(2) fully depleted silicon-on-insulator n-type metal oxide semiconductor field-effect transistors 被引量:1
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作者 Yu-Dong Li Qing-Zhu Zhang +5 位作者 Fan-Yu Liu Zhao-Hao Zhang Feng-Yuan Zhang Hong-Bin Zhao Bo Li Jiang Yan 《Rare Metals》 SCIE EI CAS CSCD 2021年第11期3299-3307,共9页
The n-type ultrathin fully depleted silicon-on-insulator(FDSOI) metal-oxide-semiconductor field-effect transistors(MOSFETs),with a Hf_(0.5)Zr_(0.5)O_(2) high dielectric permittivity(high-k) dielectric as gate insulato... The n-type ultrathin fully depleted silicon-on-insulator(FDSOI) metal-oxide-semiconductor field-effect transistors(MOSFETs),with a Hf_(0.5)Zr_(0.5)O_(2) high dielectric permittivity(high-k) dielectric as gate insulator,were fabricated.The total ionizing dose effects were investigated,and an X-ray radiation dose up to 1500 krad(Si) was applied for both long-and short-channel devices.The short-channel devices(0.025-0.100 μm) exhibited less irradiation sensitivity compared with the long-channel devices(0.35-16 μm),leading to a 71% reduction in the irradiation-induced drain current growth and a 26% decrease in the shift of the threshold voltage.It was experimentally demonstrated that the OFF mode is the worst case among the three working conditions(OFF,ON and A110) for short-channel devices.Also,the determined effective electron mobility was enhanced by 38% after X-ray irradiation,attributed to the different compensations for charges triggered by radiation between the highk dielectric and buried oxide.By extracting the carrier mobility,gate length modulation,and source/drain(S/D)parasitic resistance,the degradation mechanism on X-ray irradiation was revealed.Finally,the split capacitance-voltage measurements were used to validate the analysis. 展开更多
关键词 Total ionizing dose Fully depleted silicon-on-insulator(FDSOI) metaloxidesemiconductor field-effect transistor(MOSFET) HIGH-K Hf_(0.5)Zr_(0.5)O_(2)
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Evaluation of the applicability of a metal oxide semiconductor gas sensor for methane emissions from agriculture 被引量:1
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作者 Bastiaan Molleman Enrico Alessi +1 位作者 Fabio Passaniti Karen Daly 《Information Processing in Agriculture》 CSCD 2024年第4期573-580,共8页
This work investigated the potential of metal oxide semiconductor(MOS)gas sensors for environmental monitoring of methane.Calibrations were performed under controlled conditions in the lab,and under semi-controlled co... This work investigated the potential of metal oxide semiconductor(MOS)gas sensors for environmental monitoring of methane.Calibrations were performed under controlled conditions in the lab,and under semi-controlled conditions in the field,using a modified head space chamber set-up.Concentrations up to±300 ppm methane were tested.The relationship between sensor conductance and methane concentrations could be very well described using principles from adsorption theory.The adjustable parameters were background conductance G_(0),a sensitivity constant S and a non-ideality coefficient n,where n has a non-rational value between 0 and 1.Sensor behaviour was very different in dry air than in humid air,with the background conductance increasing approximately tenfold and sensitivity decreasing between 20 fold and 80 fold,while the non-ideality coefficient increased from±0.4 to±0.6.Nevertheless,at high methane concentrations comparable conductance values were recorded in dry and humid air.The standard deviation of predicted values was 1.6μS.for the least well described dataset.Using the corresponding calibration curve,a detection limit of 11 ppm is calculated for humid ambient air.This values suggests that MOS sensor are adequately sensitive to be used for methane detection in an agricultural context. 展开更多
关键词 environmental monitoring adjustable parameters metal oxide semiconductor adsorption theory humidity effect sensor behavior methane detection sensor conductance
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Photoelectrocatalytic hydrogen peroxide production based on transition‐metal‐oxide semiconductors 被引量:4
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作者 Haijiao Lu Xianlong Li +2 位作者 Sabiha Akter Monny Zhiliang Wang Lianzhou Wang 《Chinese Journal of Catalysis》 SCIE EI CAS CSCD 2022年第5期1204-1215,共12页
As a kind of valuable chemicals,hydrogen peroxide(H2O2)has aroused growing attention in many fields.However,H2O2 production via traditional anthraquinone process suffers from challenges of large energy consumption and... As a kind of valuable chemicals,hydrogen peroxide(H2O2)has aroused growing attention in many fields.However,H2O2 production via traditional anthraquinone process suffers from challenges of large energy consumption and heavy carbon footprint.Alternatively,photoelectrocatalytic(PEC)production of H2O2 has shown great promises to make H2O2 a renewable fuel to store solar energy.Transition‐metal‐oxide(TMO)semiconductor based photoelectrocatalysts are among the most promising candidates for PEC H2O2 production.In this work,the fundamentals of H2O2 synthesis through PEC process are briefly introduced,followed by the state‐of‐the‐art of TMO semiconductor based photoelectrocatalysts for PEC production H2O2.Then,the progress on H2O2 fuel cells from on‐site PEC production is presented.Furthermore,the challenges and future perspectives of PEC H2O2 production are discussed.This review aims to provide inspiration for the PEC production of H2O2 as a renewable solar fuel. 展开更多
关键词 Hydrogen peroxide Solar fuel PHOTOELECTROCATALYSIS Transition‐metaloxide semiconductor Fuel cell
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Effect of NO annealing on charge traps in oxide insulator and transition layer for 4H-SiC metal–oxide–semiconductor devices 被引量:1
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作者 贾一凡 吕红亮 +10 位作者 钮应喜 李玲 宋庆文 汤晓燕 李诚瞻 赵艳黎 肖莉 王梁永 唐光明 张义门 张玉明 《Chinese Physics B》 SCIE EI CAS CSCD 2016年第9期484-488,共5页
The effect of nitric oxide(NO) annealing on charge traps in the oxide insulator and transition layer in n-type4H–Si C metal–oxide–semiconductor(MOS) devices has been investigated using the time-dependent bias s... The effect of nitric oxide(NO) annealing on charge traps in the oxide insulator and transition layer in n-type4H–Si C metal–oxide–semiconductor(MOS) devices has been investigated using the time-dependent bias stress(TDBS),capacitance–voltage(C–V),and secondary ion mass spectroscopy(SIMS).It is revealed that two main categories of charge traps,near interface oxide traps(Nniot) and oxide traps(Not),have different responses to the TDBS and C–V characteristics in NO-annealed and Ar-annealed samples.The Nniotare mainly responsible for the hysteresis occurring in the bidirectional C–V characteristics,which are very close to the semiconductor interface and can readily exchange charges with the inner semiconductor.However,Not is mainly responsible for the TDBS induced C–V shifts.Electrons tunneling into the Not are hardly released quickly when suffering TDBS,resulting in the problem of the threshold voltage stability.Compared with the Ar-annealed sample,Nniotcan be significantly suppressed by the NO annealing,but there is little improvement of Not.SIMS results demonstrate that the Nniotare distributed within the transition layer,which correlated with the existence of the excess silicon.During the NO annealing process,the excess Si atoms incorporate into nitrogen in the transition layer,allowing better relaxation of the interface strain and effectively reducing the width of the transition layer and the density of Nniot. 展开更多
关键词 4H–SiC metaloxidesemiconductor devices NO annealing near interface oxide traps oxide traps
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Investigation of trap states in Al_2O_3 InAlN/GaN metal–oxide–semiconductor high-electron-mobility transistors
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作者 张鹏 赵胜雷 +4 位作者 薛军帅 祝杰杰 马晓华 张进成 郝跃 《Chinese Physics B》 SCIE EI CAS CSCD 2015年第12期503-506,共4页
In this paper the trapping effects in Al2O3/In0.17Al0.83N/GaN MOS-HEMT(here, HEMT stands for high electron mobility transistor) are investigated by frequency-dependent capacitance and conductance analysis. The trap ... In this paper the trapping effects in Al2O3/In0.17Al0.83N/GaN MOS-HEMT(here, HEMT stands for high electron mobility transistor) are investigated by frequency-dependent capacitance and conductance analysis. The trap states are found at both the Al2O3/In AlN and InAlN/GaN interface. Trap states in InAlN/GaN heterostructure are determined to have mixed de-trapping mechanisms, emission, and tunneling. Part of the electrons captured in the trap states are likely to tunnel into the two-dimensional electron gas(2DEG) channel under serious band bending and stronger electric field peak caused by high Al content in the In AlN barrier, which explains the opposite voltage dependence of time constant and relation between the time constant and energy of the trap states. 展开更多
关键词 INALN TRAPPING frequency-dependent conductance metaloxidesemiconductor high-electronmobility transistors
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Emerging horizons in chemiresistive gas sensing:when polyoxometalates meet mesoporous metal oxides
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作者 TENG Yingmin TAN Huaqiao +1 位作者 ZHAO Zhao LI Yangguang 《分子科学学报》 2024年第5期389-395,共7页
Creating gas sensors that are highly selective and function at low temperatures based on semiconductor metal oxides(SMOs)is considered a difficult endeavor,and these sensors are extensively applied in medical diagnosi... Creating gas sensors that are highly selective and function at low temperatures based on semiconductor metal oxides(SMOs)is considered a difficult endeavor,and these sensors are extensively applied in medical diagnosis,industrial manufacturing,and in spacecraft within the aerospace sector.This review article delves into the emerging horizons of chemiresistive gas sensing,particularly focusing on the synergy between polyoxometalates(POMs)and block copolymers in self-assembly for the construction of ordered mesoporous metal oxides(MMOs).It highlights the advancements in gas sensing technology,emphasizing the role of POMs as precursors for MMOs,which offer high sensitivity and selectivity due to their unique physicochemical properties.The review covers various synthetic strategies and their impact on sensor performance,including low-temperature operation,high sensitivity,and selectivity towards specific gases.It also underscores the importance of nanostructure control,heteroatom doping,and the integration of noble metal catalysts in enhancing sensor capabilities.The article concludes with future research directions,suggesting the exploration of a broader range of detectable compounds and the integration of these materials into practical devices for real-world applications. 展开更多
关键词 chemiresistive gas sensors semiconductor metal oxides POMS MMOs
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High-performance InAlGaN/GaN enhancement-mode MOS-HEMTs grown by pulsed metal organic chemical vapor deposition
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作者 Ya-Chao Zhang Zhi-Zhe Wang +4 位作者 Rui Guo Ge Liu Wei-Min Bao Jin-Cheng Zhang Yue Hao 《Chinese Physics B》 SCIE EI CAS CSCD 2019年第1期634-638,共5页
Pulsed metal organic chemical vapor deposition was employed to grow nearly polarization matched InAlGaN/GaN heterostructures.A relatively low sheet carrier density of 1.8×10^(12)cm^(-2),together with a high elect... Pulsed metal organic chemical vapor deposition was employed to grow nearly polarization matched InAlGaN/GaN heterostructures.A relatively low sheet carrier density of 1.8×10^(12)cm^(-2),together with a high electron mobility of 1229.5 cm^2/V·s,was obtained for the prepared heterostructures.The surface morphology of the heterostructures was also significantly improved,i.e.,with a root mean square roughness of 0.29 nm in a 2μm×2μm scan area.In addition to the improved properties,the enhancement-mode metal–oxide–semiconductor high electron mobility transistors(MOSHEMTs)processed on the heterostructures not only exhibited a high threshold voltage(VTH)of 3.1 V,but also demonstrated a significantly enhanced drain output current density of 669 m A/mm.These values probably represent the largest values obtained from the InAlGaN based enhancement-mode devices to the best of our knowledge.This study strongly indicates that the InAlGaN/GaN heterostructures grown by pulsed metal organic chemical vapor deposition could be promising for the applications of novel nitride-based electronic devices. 展开更多
关键词 InAlGaN ENHANCEMENT-MODE metaloxidesemiconductor high electron mobility TRANSISTOR THRESHOLD voltage
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Contact planarization and passivation lift tungsten diselenide PMOS performance
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作者 Haoyu Peng Ping-Heng Tan Jiangbin Wu 《Journal of Semiconductors》 2025年第11期2-5,共4页
Two-dimensional(2D)transition metal dichalcogenides(TMDs),which allow atomic-scale manipulation,have supe-rior electrical and optical properties that challenge the limits of traditional bulk semiconductors like silico... Two-dimensional(2D)transition metal dichalcogenides(TMDs),which allow atomic-scale manipulation,have supe-rior electrical and optical properties that challenge the limits of traditional bulk semiconductors like silicon^([1,2]).As a repre-sentative TMD and a promising 2D channel material for high-performance,scalable p-type transistors,tungsten diselenide(WSe_(2))has attracted considerable academic and industrial interest for its potential in advanced complementary metal−oxide−semiconductor(CMOS)logic technology and in extending Moore’s Law^([3−7]). 展开更多
关键词 contact planarization metal dichalcogenides tmds which PASSIVATION pmos performance advanced complementary metal oxide semiconductor cmos logic tungsten diselenide two dimensional materials transition metal dichalcogenides
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Semiconductor metal oxide compounds based gas sensors: A literature review 被引量:6
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作者 Sunil Jagannath PATIL Arun Vithal PATIL +5 位作者 Chandrakant Govindrao DIGHAVKAR Kashinath Shravan THAKARE Ratan Yadav BORASE Sachin Jayaram NANDRE Nishad Gopal DESHPANDE Rajendra Ramdas AHIRE 《Frontiers of Materials Science》 SCIE CSCD 2015年第1期14-37,共24页
This paper gives a statistical view about important contributions and advances on semiconductor metal oxide (SMO) compounds based gas sensors developed to detect the air pollutants such as liquefied petroleum gas (... This paper gives a statistical view about important contributions and advances on semiconductor metal oxide (SMO) compounds based gas sensors developed to detect the air pollutants such as liquefied petroleum gas (LPG), H2S, NH3, CO2, acetone, ethanol, other volatile compounds and hazardous gases. Moreover, it is revealed that the alloy/composite made up of SMO gas sensors show better gas response than their counterpart single component gas sensors, i.e., they are found to enhance the 4S characteristics namely speed, sensitivity, selectivity and stability. Improvement of such types of sensors used for detection of various air pollutants, which are reported in last two decades, is highlighted herein. 展开更多
关键词 gas sensor semiconductor metal oxide (SMO) sensitivity air pollutant gas response
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A low-phase-noise and low-power crystal oscillator for RF tuner 被引量:4
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作者 唐路 王志功 +1 位作者 曾贤文 徐建 《Journal of Southeast University(English Edition)》 EI CAS 2012年第1期21-24,共4页
A 37. 5 MHz differential complementary metal oxide semiconductor (CMOS) crystal oscillator with low power and low phase noise for the radio frequency tuner of digital radio broadcasting digital radio mondiale (DRAM... A 37. 5 MHz differential complementary metal oxide semiconductor (CMOS) crystal oscillator with low power and low phase noise for the radio frequency tuner of digital radio broadcasting digital radio mondiale (DRAM) and digital audio broadcasting (DAB) systems is realized and characterized. The conventional cross-coupled n-type metal oxide semiconductor (NMOS) transistors are replaced by p-type metal oxide semiconductor (PMOS) transistors to decrease the phase noise in the core part of the crystal oscillator. A symmetry structure of the current mirror is adopted to increase the stability of direct current. The amplitude detecting circuit made up of a single- stage CMOS operational transconductance amplifier (OTA) and a simple amplitude detector is used to improve the current accuracy of the output signals. The chip is fabricated in a 0. 18- pxn CMOS process, and the total chip size is 0. 35 mm x 0. 3 mm. Under a supply voltage of 1.8 V, the measured power consumption is 3.6 mW including the output buffer for 50 testing loads. The proposed crystal oscillator exhibits a low phase noise of - 134. 7 dBc/Hz at 1-kHz offset from the center frequency of 37. 5 MHz. 展开更多
关键词 complementary metal oxide semiconductor(CMOS) crystal oscillator phase noise power consumption
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A CMOS high-IF down-conversion mixer for WLAN 802.11a applications
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作者 张浩 李智群 王志功 《Journal of Southeast University(English Edition)》 EI CAS 2010年第1期11-16,共6页
A low noise, high conversion gain down-conversion mixer for WLAN 802.11a applications, which adopts the high intermediate frequency (IF) topology, is presented. The input radio frequency (RF)band, local oscillator... A low noise, high conversion gain down-conversion mixer for WLAN 802.11a applications, which adopts the high intermediate frequency (IF) topology, is presented. The input radio frequency (RF)band, local oscillator(LO)frequency band and output IF are 5.15 to 5.35, 4.15 to 4.35 and 1 GHz, respectively. Source resistive degeneration technique and pseudo-differential Gilbert topology are used to achieve high linearity, and, current bleeding technique and LC resonant loads are used to acquire a low noise figure. In addition, the mixer adopts a common-source transistor pair cross-stacked with a source follow pair(CSSF)circuit as an output buffer to enhance the mixer's conversion gain but not deteriorate the other performances. The mixer is implemented in 0.18 μm RF CMOS(complementary metal oxide semiconductor transistor)technology and the chip area of the mixer including all bonding pads is 580 μm×1 185 μm. The measured results show that under a 1.8 V supply, the conversion gain is 10.1 dB; the input 1 dB compression point and the input-referred third-order intercept point are-3.5 and 5.3 dBm, respectively; the single side band (SSB)noise figure (NF)is 8.65 dB, and the core current consumption is 3.8 mA. 展开更多
关键词 high intermediate frequency MIXER high linearity WLAN 802.11a BUFFER complementary metal oxide semiconductor transistor(CMOS)
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Al-doped ZnO/WO_(3) heterostructure films prepared by magnetron sputtering for isopropanol sensors 被引量:3
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作者 Wei-Xiang Gao Xue-Ting Chang +5 位作者 Xiao-Jie Zhu Jun-Feng Li Ying-Chang Jiang Dong-Sheng Wang Chuan-Xiao Yang Shi-Bin Sun 《Rare Metals》 SCIE EI CAS CSCD 2024年第1期247-256,共10页
Metal oxide semiconductors(MOSs) are ideal sensing materials for detecting volatile organic compounds due to their low cost, diversity, high stability, and ease of production. However, it remains a grand challenge to ... Metal oxide semiconductors(MOSs) are ideal sensing materials for detecting volatile organic compounds due to their low cost, diversity, high stability, and ease of production. However, it remains a grand challenge to develop the MOSs-based gas sensors for sensing isopropanol with desired performance via a simple, effective,and controllable method. Herein, we reported the preparation of the Al-doped Zn O(AZO)/WO_(3) heterostructure films by directly depositing the AZO coating onto the WO_(3) coating using a strategy of magnetron sputtering. The AZO/WO_(3) heterostructure films were constructed by numbers of irregular nanoparticles that were interconnected with each other. The AZO/WO_(3) heterostructure films-based gas sensors exhibited excellent isopropanolsensing performance with high response, promising selectivity, low detection limit, fast response rate, wide detection range, and ideal reproducibility. The promising isopropanol-sensing performance of the AZO/WO_(3) heterostructure films arises mainly from their high uniformity, unique microstructures with high surface roughness,and the construction of the heterostructure between the AZO and WO_(3) coatings. This work provides a versatile approach to prepare the MOSs-based heterostructure films for assembling the gas sensors. 展开更多
关键词 metal oxide semiconductors Gas sensors Aldoped ZnO/WO_(3) Heterostructure films ISOPROPANOL Magnetron sputtering
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Metal oxide ion gated transistors based sensors 被引量:1
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作者 LI Yang YAO Yu +6 位作者 WANG LeLe WANG LiWei PANG YunCong LUO ZhongZhong ARUNPRABAHARAN Subramanian LIU ShuJuan ZHAO Qiang 《Science China(Technological Sciences)》 SCIE EI CAS CSCD 2024年第4期1040-1060,共21页
Metal oxide ion-gated transistors(MOIGTs)have garnered significant attention within the sensing domain due to their potential for achieving heightened sensitivity while consuming minimal energy across diverse scenario... Metal oxide ion-gated transistors(MOIGTs)have garnered significant attention within the sensing domain due to their potential for achieving heightened sensitivity while consuming minimal energy across diverse scenarios.By harnessing the advantageous combination of metal oxides'high carrier mobility and facile surface customization,coupled with the potent signal amplification capabilities of ion-gated transistors,MOIGTs offer a promising avenue for discerning biomolecules,overseeing chemical reactions,p H levels,as well as facilitating gas or light determination.Over the past few decades,the MOIGT field has made remarkable strides in refining device physics,enhancing material properties,showcasing robust sensing capabilities,and broadening its application spectrum.These advancements have simultaneously unveiled new challenges and opportunities,necessitating interdisciplinary expertise to fully unlock the commercial potential of MOIGTs.In this comprehensive review,we offer a snapshot of this swiftly evolving technology,delve into its current applications,and provide insightful recommendations for future directions in the coming decade. 展开更多
关键词 SENSORS ion gated transistors metal oxide semiconductors biosensors CHEMOSENSORS pH sensors
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Investigation of Gate Defects in Ultrathin MOS Structures Using DTRS Technique
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作者 霍宗亮 杨国勇 +2 位作者 许铭真 谭长华 段小蓉 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2002年第11期1146-1153,共8页
s:A detailed description of relaxation spectroscopy technique under direct tunneling stress is given.A double peak phenomena by applied relaxation spectroscopy on ultra thin (<3nm) gate oxide is found.It suggests ... s:A detailed description of relaxation spectroscopy technique under direct tunneling stress is given.A double peak phenomena by applied relaxation spectroscopy on ultra thin (<3nm) gate oxide is found.It suggests that two kinds of traps exist in the degradation of gate oxide.It is also observed that both the trap density and the generation/capture cross section of oxide trap and interface trap are smaller in ultra thin gate oxide (<3nm) under DT stress than those in the thicker oxide (>4nm) under FN stress,and the centroid of oxide trap is closer to anode interface than in the center of oxide. 展开更多
关键词 TUNNELING metal oxide semiconductor device proportional difference operator
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Simple point contact WO_3 sensor for NO_2 sensing and relevant impedance analysis
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作者 Wu-bin Gao Yun-han Ling +1 位作者 Xu Liu Jia-lin Sun 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 2012年第12期1142-1148,共7页
A simple and new point contact tungsten trioxide (WO3) sensor, which can be prepared by the oxidation of tungsten filaments via in-situ induction heating, likely detects low concentration (ppm level) environmental... A simple and new point contact tungsten trioxide (WO3) sensor, which can be prepared by the oxidation of tungsten filaments via in-situ induction heating, likely detects low concentration (ppm level) environmental pollutants such as NO2. X-ray diffraction (XRD) and field emission scanning electron microscopy (FE-SEM) were applied to characterize the phase and the microstructure of the samples, respec-tively. It was found that the synthesized WO3 films exhibited a monoclinic phase and were composed of hierarchical microcrystals and nanocrystals. The point contact WO3 sensor (W-WO3-W) showed rectifying characteristics and an ideal sensing performance of about 110 C. A single semicircle in Nyquist plots was recorded by electrochemical impedance spectroscopy (EIS) at a relatively low temperature of 150 C but faded away above 200 C, which revealed that the sensing process was governed by a determining factor, i.e., grain boundaries at the contact site. 展开更多
关键词 gas sensors tungsten trioxide metal oxide semiconductors thin fills MICROCRYSTALS NANOCRYSTALS electrochemical impedancespectroscopy (EIS)
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Design of Power Amplifier for mm Wave 5G and Beyond
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作者 LI Lianming SI Jiachen CHEN Linhui 《Transactions of Nanjing University of Aeronautics and Astronautics》 EI CSCD 2019年第4期579-588,共10页
With targets of cost reduction per bit and high energy efficiency,5G and beyond call for innovation in the mmWave transmitter architecture and the power amplifier(PA)circuit.To illustrate these points,this paper first... With targets of cost reduction per bit and high energy efficiency,5G and beyond call for innovation in the mmWave transmitter architecture and the power amplifier(PA)circuit.To illustrate these points,this paper firstly explains the benefits and design implications of the hybrid beamforming structure in terms of the mmWave spectrum characteristics,energy efficiency,data rate,communication capacity,coverage and implementation technology choices.Then after reviewing the techniques to improve the power amplifier(PA)output power and efficiency,the design considerations and test results of 60 GHz and 90 GHz mmWave PAs in bulk complementary metal oxide semiconductor(CMOS)process are shown. 展开更多
关键词 5G and beyond 6G BEAMFORMING complementary metal oxide semiconductor(CMOS) mmWave multiple⁃input multiple⁃output(MIMO) power amplifier TRANSMITTER
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A 60 GHz Phased Array System Analysis and Its Phase Shifter in a 40 nm CMOS Technology
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作者 GAO Hao YING Kuangyuan BALTUS Peter 《Transactions of Nanjing University of Aeronautics and Astronautics》 EI CSCD 2019年第4期566-578,共13页
A 60 GHz phased array system for mm wave frequency in 5G is introduced and a 5 bit digitally controlled phase shifter in 40 nm CMOS technology is presented.In a phased array system,the signal to noise ratio(SNR)of the... A 60 GHz phased array system for mm wave frequency in 5G is introduced and a 5 bit digitally controlled phase shifter in 40 nm CMOS technology is presented.In a phased array system,the signal to noise ratio(SNR)of the receiver is improved with the beaming forming function.Therefore,the communication data rate and distance are improved accordingly.The phase shifter is the key component for achieving the beam forming function,and its resolution and power consumption are also very critical.In the second half of this paper,an analysis of phase shifter is introduced,and a 60 GHz 5 bit digitally controlled phase shifter in 40 nm complementary metal oxide semiconductor(CMOS)technology is presented.In this presented phase shifter,a hybrid structure is implemented for its advantage on lower phase deviation while keeping comparable loss.Meanwhile,this digitally controlled phase shifter is much more compact than other works.For all 32 states,the minimum phase error is 1.5°,and the maximum phase error is 6.8°.The measured insertion loss is-20.9±1 dB including pad loss at 60 GHz and the return loss is more than 10 dB over 57-64 GHz.The total chip size is 0.24 mm^2 with 0 mW DC power consumption. 展开更多
关键词 5G 60 GHz complementary metal oxide semiconductor(CMOS) millimeter wave phased array phase shifter
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