The p-n junction is the foundation building structure for manufacturing various electronic and optoelec-tronic devices.Ultrawide bandgap semiconductors are expected to overcome the limited power capability of Si-based...The p-n junction is the foundation building structure for manufacturing various electronic and optoelec-tronic devices.Ultrawide bandgap semiconductors are expected to overcome the limited power capability of Si-based electronic device,however,it is very difficult to achieve efficient bipolar doping due to the asymmetric doping effect,thereby impeding the development of p-n homojunction and related bipolar devices,especially for the Ga_(2)O_(3)-based materials and devices.Here,we demonstrate a unique one-step integrated growth of p-type N-doped(201)β-Ga_(2)O_(3)/n-type Si-doped(¯201)β-Ga_(2)O_(3)films by phase tran-sition and in-situ pre-doping of dopants,and fabrication of fullβ-Ga_(2)O_(3)linearly-graded p-n homojunc-tion diode from them.The fullβ-Ga_(2)O_(3)p-n homojunction diode possesses a large built-in potential of 4.52 eV,a high operation electric field>2.90 MV/cm in the reverse-bias regime,good longtime-stable rectifying behaviors with a rectification ratio of 104,and a high-speed switching and good surge robust-ness with a weak minority-carrier charge storage.Our work opens the way to the fabrication of Ga_(2)O_(3)-based p-n homojunction,lays the foundation for fullβ-Ga_(2)O_(3)-based bipolar devices,and paves the way for the novel fabrication of p-n homojunction for wide-bandgap oxides.展开更多
基金supported by the National Key R&D Program of China(Grant Nos.2022YFB3605500 and 2022YFB3605503).
文摘The p-n junction is the foundation building structure for manufacturing various electronic and optoelec-tronic devices.Ultrawide bandgap semiconductors are expected to overcome the limited power capability of Si-based electronic device,however,it is very difficult to achieve efficient bipolar doping due to the asymmetric doping effect,thereby impeding the development of p-n homojunction and related bipolar devices,especially for the Ga_(2)O_(3)-based materials and devices.Here,we demonstrate a unique one-step integrated growth of p-type N-doped(201)β-Ga_(2)O_(3)/n-type Si-doped(¯201)β-Ga_(2)O_(3)films by phase tran-sition and in-situ pre-doping of dopants,and fabrication of fullβ-Ga_(2)O_(3)linearly-graded p-n homojunc-tion diode from them.The fullβ-Ga_(2)O_(3)p-n homojunction diode possesses a large built-in potential of 4.52 eV,a high operation electric field>2.90 MV/cm in the reverse-bias regime,good longtime-stable rectifying behaviors with a rectification ratio of 104,and a high-speed switching and good surge robust-ness with a weak minority-carrier charge storage.Our work opens the way to the fabrication of Ga_(2)O_(3)-based p-n homojunction,lays the foundation for fullβ-Ga_(2)O_(3)-based bipolar devices,and paves the way for the novel fabrication of p-n homojunction for wide-bandgap oxides.
