In photolithography,shortening the exposure wavelength from ultraviolet to extreme ultraviolet(EUV,13.5 nm)and soft X-ray region in terms of beyond EUV(BEUV,6.X nm)and water window X-ray(WWX,2.2–4.4 nm)is expected to...In photolithography,shortening the exposure wavelength from ultraviolet to extreme ultraviolet(EUV,13.5 nm)and soft X-ray region in terms of beyond EUV(BEUV,6.X nm)and water window X-ray(WWX,2.2–4.4 nm)is expected to further miniaturize the technology node down to sub-5 nm level.However,the absorption ability of molecules in these ranges,especially WWX region,is unknown,which should be very important for the utilization of energy.Herein,the molar absorption cross sections of different elements at 2.4 nm of WWX were firstly calculated and compared with the wavelengths of 13.5 nm and 6.7 nm.Based on the absorption cross sections in these ranges and density estimation results from the density-functional theory calculation,the linear absorption coefficients of typical resist materials,including metal-oxy clusters,organic small molecules,polymers,and photoacid generators(PAGs),are evaluated.The analysis suggests that the Zn cluster has higher absorption in BEUV,whereas the Sn cluster has higher absorption in WWX.Doping PAGs with high EUV absorption atoms improves chemically amplified photoresist(CAR)polymer absorption performance.However,for WWX,it is necessary to introduce an absorption layer containing high WWX absorption elements such as Zr,Sn,and Hf to increase the WWX absorption.展开更多
Based on the Schr ¨odinger equation for envelope function in the effective mass approximation, linear and nonlinear optical absorption coefficients in a multi-subband lens quantum dot are investigated. The effect...Based on the Schr ¨odinger equation for envelope function in the effective mass approximation, linear and nonlinear optical absorption coefficients in a multi-subband lens quantum dot are investigated. The effects of quantum dot size on the interband and intraband transitions energy are also analyzed. The finite element method is used to calculate the eigenvalues and eigenfunctions. Strain and In-mole-fraction effects are also studied, and the results reveal that with the decrease of the In-mole fraction, the amplitudes of linear and nonlinear absorption coefficients increase. The present computed results show that the absorption coefficients of transitions between the first excited states are stronger than those of the ground states. In addition, it has been found that the quantum dot size affects the amplitudes and peak positions of linear and nonlinear absorption coefficients while the incident optical intensity strongly affects the nonlinear absorption coefficients.展开更多
基金supported by the National Natural Science Foundation of China(22090011,22378052)the Fundamental Research Funds for China Central Universities(DUT22LAB608 and DUT20RC(3)030)+1 种基金Liaoning Binhai Laboratory(LBLB-2023-03)Key R&D Program of Shandong Province(2021CXGC010308).
文摘In photolithography,shortening the exposure wavelength from ultraviolet to extreme ultraviolet(EUV,13.5 nm)and soft X-ray region in terms of beyond EUV(BEUV,6.X nm)and water window X-ray(WWX,2.2–4.4 nm)is expected to further miniaturize the technology node down to sub-5 nm level.However,the absorption ability of molecules in these ranges,especially WWX region,is unknown,which should be very important for the utilization of energy.Herein,the molar absorption cross sections of different elements at 2.4 nm of WWX were firstly calculated and compared with the wavelengths of 13.5 nm and 6.7 nm.Based on the absorption cross sections in these ranges and density estimation results from the density-functional theory calculation,the linear absorption coefficients of typical resist materials,including metal-oxy clusters,organic small molecules,polymers,and photoacid generators(PAGs),are evaluated.The analysis suggests that the Zn cluster has higher absorption in BEUV,whereas the Sn cluster has higher absorption in WWX.Doping PAGs with high EUV absorption atoms improves chemically amplified photoresist(CAR)polymer absorption performance.However,for WWX,it is necessary to introduce an absorption layer containing high WWX absorption elements such as Zr,Sn,and Hf to increase the WWX absorption.
基金Project supported by the Ministry of Higher Education and Scientific Research in Iraq,Ibnu Sina Institute and Physics Department of Universiti Teknologi Malaysia(UTM RUG Vote No.06-H14)
文摘Based on the Schr ¨odinger equation for envelope function in the effective mass approximation, linear and nonlinear optical absorption coefficients in a multi-subband lens quantum dot are investigated. The effects of quantum dot size on the interband and intraband transitions energy are also analyzed. The finite element method is used to calculate the eigenvalues and eigenfunctions. Strain and In-mole-fraction effects are also studied, and the results reveal that with the decrease of the In-mole fraction, the amplitudes of linear and nonlinear absorption coefficients increase. The present computed results show that the absorption coefficients of transitions between the first excited states are stronger than those of the ground states. In addition, it has been found that the quantum dot size affects the amplitudes and peak positions of linear and nonlinear absorption coefficients while the incident optical intensity strongly affects the nonlinear absorption coefficients.
