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Microstructure and Dielectric Property of 3D BNf/Si3N4 Fabricated by CVI Process 被引量:1
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作者 LI Jianping CHENG Laifei 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2019年第4期818-823,共6页
As potential wave-transparent materials applied at high temperatures, 3D BNf/Si3N4 ceramic matrix composites were prepared by low pressure chemical vapor infiltration or deposition(LPCVI/CVD) process from SiCl4-NH3-... As potential wave-transparent materials applied at high temperatures, 3D BNf/Si3N4 ceramic matrix composites were prepared by low pressure chemical vapor infiltration or deposition(LPCVI/CVD) process from SiCl4-NH3-H2-Ar gas precursor at 800 oC. The densification process, microstructure and dielectric properties of 3D BNf/Si3N4 composites were investigated. The results indicated that 3D BNf/Si3N4 was successfully fabricated by LPCVI/CVD, with final open porosity of 2.37% and density of 1.89 g/cm3. Densification kinetics of 3D BNf/Si3N4 is a typical exponential pattern. The Si3N4 matrix was uniformly infiltrated into porous BNf preform. The deposited Si3N4 matrix was amorphous by XRD analysis. Introduction of BN fiber into Si3N4 ceramic lowered the permittivity of Si3N4. The fabricated BNf/Si3N4 composites possess low permittivity of 3.68 and low dielectric loss of lower than 0.01, which are independent of temperature below400 oC. Transmission coefficient of BNf/Si3N4 composite is 0.57 and keeps stable below 400 oC. BNf/Si3N4 can be fabricated at low temperature and may be candidates for the microwave transparent materials. 展开更多
关键词 BNf/Si3N4 lpcvi DIELECTRIC PROPERTY high temperature stability
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LPCVD制备多晶Si薄膜的工艺和性能分析 被引量:1
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作者 胡佳宝 何晓雄 杨旭 《合肥工业大学学报(自然科学版)》 CAS CSCD 北大核心 2012年第11期1496-1499,1540,共5页
文章利用低压化学气相沉积法(LPCVD),在单晶Si衬底上制备多晶Si薄膜。利用原子力显微镜观察薄膜厚度和镀膜温度对多晶Si薄膜表面形貌的影响,并利用XRD研究退火温度对多晶Si薄膜结晶性能的影响。结果表明:镀膜温度越高、薄膜越厚,薄膜的... 文章利用低压化学气相沉积法(LPCVD),在单晶Si衬底上制备多晶Si薄膜。利用原子力显微镜观察薄膜厚度和镀膜温度对多晶Si薄膜表面形貌的影响,并利用XRD研究退火温度对多晶Si薄膜结晶性能的影响。结果表明:镀膜温度越高、薄膜越厚,薄膜的晶粒尺寸越大;退火温度越高,薄膜的结晶越好。 展开更多
关键词 多晶硅薄膜 低压化学气相沉积 表面形貌 X射线衍射
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