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Theoretical and Experimental Investigations on Thickness Uniformity in Double-sided Lapping
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作者 Zhuolin Cai Zhe Yang +4 位作者 Bo Pan Jiale Lian Lianlin Wang Sergei Pronkevich Jiang Guo 《Chinese Journal of Mechanical Engineering》 2025年第3期151-163,共13页
The double-sided lapping process is extensively employed in the manufacturing of wafers,optical windows,and seal rings due to its high efficiency and ability to achieve precise flatness.However,limited research has ex... The double-sided lapping process is extensively employed in the manufacturing of wafers,optical windows,and seal rings due to its high efficiency and ability to achieve precise flatness.However,limited research has explored the thickness uniformity among different workpieces after double-sided lapping,and the underlying mechanism remains unclear.To address the demand for higher precision,this paper first analyzed the relative kinematic model between the workpiece and the lapping plate to clarify the causes of thickness variations among workpieces after double-sided lapping.Subsequently,a finite element method(FEM)model was developed to account for the pressure distribution on the workpiece surfaces at the initial stage of the process.The results indicate that the number of workpieces influences the final thickness variation.Then,various sets of thin copper plates with different thicknesses were lapped,and the findings revealed that five copper plates processed simultaneously exhibited more uniform thickness compared to the three plates.The experimental results align well with the theoretical analysis.Ultimately,a thickness variation of less than 6μm was achieved on five copper plates measuringΦ100×2.9 mm.This study presents a comprehensive analysis of the mechanisms influencing thickness uniformity in the double-sided lapping process and provides practical guidelines for optimizing the process to achieve stringent precision standards in industrial applications. 展开更多
关键词 Double-sided lapping Thickness uniformity Theoretical analysis FEM Thin copper plate
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Optimization experiment on eccentric lapping of cylindrical rollers 被引量:2
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作者 Jia Su Julong Yuan +1 位作者 Sen Zhang Binghai Lv 《Nanotechnology and Precision Engineering》 EI CAS CSCD 2018年第3期197-204,共8页
Cylindrical rollers are important elements of bearings,and their machining accuracy and consistency affect the bearing quality.Using a GCr15 cylindrical roller ofФ11×12 as the processing object in this study,the... Cylindrical rollers are important elements of bearings,and their machining accuracy and consistency affect the bearing quality.Using a GCr15 cylindrical roller ofФ11×12 as the processing object in this study,the effects of loading pressure,abrasive concentration,and speed combination on cylindrical roller machining precision were investigated using the orthogonal experimental design method on a double-side eccentric pendulum lapping and polishing machine.The machining parameters of the lapping stage were optimized,and the lapping optimal process parameters were determined by S/N response analysis and analysis of variance(ANOVA).The results show that when the experiment was optimized using loading pressure of 10 N/roller,abrasive concentrationof 20.0 wt%,and rotational speed combination,the material removal rate(MRR)of cylindrical roller reached 0.0896μm/min;the average roughness of the batch decreased from 0.056μm to 0.027μm,51.8%lower than the original batch average roughness,and the deviation decreased from the initial 0.022μm to 0.014μm;the batch average roundness error decreased from 0.47μm to 0.28μm,40.4%lower than the original batch average roundness error,and the deviation decreased from the initial 0.19μm to 0.038μm;and the batch average diameter variation decreased from 4.5μm to about 3.6μm,20%lower than the original batch average diameter variation.The double-side eccentric lapping of cylinder rollers does not only lead to improvement in the surface quality and shape accuracy of rollers,but also improvement in the batch consistency. 展开更多
关键词 Cylindrical ROLLER ECCENTRIC PENDULUM type Orthogonal EXPERIMENT lapping BATCH consistency
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Damage mechanisms during lapping and mechanical polishing CdZnTe wafers 被引量:2
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作者 LI Yan,KANG Renke,GAO Hang,and WU Dongjiang Key Laboratory for Precision and Non-Traditional Machining Technology (Ministry of Education),Dalian University of Technology,Dalian 116024,China 《Rare Metals》 SCIE EI CAS CSCD 2010年第3期276-279,共4页
CdZnTe wafers were machined by lapping and mechanical polishing processes,and their surface and subsurface damages were investigated.The surface damages are mainly induced by three-body abrasive wear and embedded abra... CdZnTe wafers were machined by lapping and mechanical polishing processes,and their surface and subsurface damages were investigated.The surface damages are mainly induced by three-body abrasive wear and embedded abrasive wear during lapping process.A new damage type,which is induced by the indentation of embedded abrasives,is found in the subsurface.When a floss pad is used to replace the lapping plate during machining,the surface damage is mainly induced by two-body abrasive and three-body abrasive wear,and the effect of embedded abrasives on the surface is greatly weakened.Moreover,this new damage type nearly disappears on the subsurface. 展开更多
关键词 lapping mechanical polishing WAFERS SURFACE SUBSURFACE ABRASIVE
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Modeling and Validation of Indentation Depth of Abrasive Grain into Lithium Niobate Wafer by Fixed-Abrasive Lapping 被引量:2
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作者 Zhu Nannan Zhu Yongwei +3 位作者 Xu Jun Wang Zhankui Xu Sheng Zuo Dunwen 《Transactions of Nanjing University of Aeronautics and Astronautics》 EI CSCD 2017年第1期97-104,共8页
The prediction of indentation depth of abrasive grain in hydrophilic fixed-abrasive(FA)lapping is crucial for controlling material removal rate and surface quality of the work-piece being machined.By applying the theo... The prediction of indentation depth of abrasive grain in hydrophilic fixed-abrasive(FA)lapping is crucial for controlling material removal rate and surface quality of the work-piece being machined.By applying the theory of contact mechanics,a theoretical model of the indentation depth of abrasive grain was developed and the relationships between indentation depth and properties of contact pairs and abrasive back-off were studied.Also,the average surface roughness(Ra)of lapped wafer was approximately calculated according to the obtained indentation depth.To verify the rationality of the proposed model,a series of lapping experiments on lithium niobate(LN)wafers were carried out,whose average surface roughness Ra was measured by atomic force microscope(AFM).The experimental results were coincided with the theoretical predictions,verifying the rationality of the proposed model.It is concluded that the indentation depth of the fixed abrasive was primarily affected by the applied load,wafer micro hardness and pad Young′s modulus and so on.Moreover,the larger the applied load,the more significant the back-off of the abrasive grain.The model established in this paper is helpful to the design of FA pad and its machining parameters,and the prediction of Ra as well. 展开更多
关键词 fixed-abrasive lapping INDENTATION DEPTH ABRASIVE back-off lithium NIOBATE WAFER average surface roughness
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High Speed Lapping of SiC Ceramic Material with Solid (Fixed) Abrasives 被引量:1
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作者 张伟 杨鑫宏 +2 位作者 尚春民 胡孝勇 胡忠辉 《Defence Technology(防务技术)》 SCIE EI CAS 2005年第2期225-228,共4页
An experimental investigation is carried out to machine SiC ceramic material through the method of high speed plane lapping with solid(fixed) abrasives after the critical condition of brittle-ductile transition is the... An experimental investigation is carried out to machine SiC ceramic material through the method of high speed plane lapping with solid(fixed) abrasives after the critical condition of brittle-ductile transition is theoretically analyzed. The results show that the material removal mechanism and the surface roughness are chiefly related to the granularity of abrasives for brittle materials such as SiC ceramic. It is easily realized to machine SiC ceramic in the ductile mode using W3.5 grit and a high efficiency, low cost and smooth surface with a surface roughness of R_a 2.4?nm can be achieved. 展开更多
关键词 SiC ceramic MATERIAL high speed lapping with SOLID ABRASIVE machining in DUCTILE mode surface roughness
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Stress-Induced Deformation of Thin Copper Substrate in Double-Sided Lapping 被引量:1
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作者 Jiang Guo Zengxu He +4 位作者 Bo Pan Bin Wang Qian Bai Jinxing Kong Renke Kang 《Chinese Journal of Mechanical Engineering》 SCIE EI CAS CSCD 2023年第1期80-89,共10页
Double-sided lapping is an precision machining method capable of obtaining high-precision surface.However,during the lapping process of thin pure copper substrate,the workpiece will be warped due to the influence of r... Double-sided lapping is an precision machining method capable of obtaining high-precision surface.However,during the lapping process of thin pure copper substrate,the workpiece will be warped due to the influence of residual stress,including the machining stress and initial residual stress,which will deteriorate the flatness of the workpiece and ultimately affect the performance of components.In this study,finite element method(FEM)was adopted to study the effect of residual stress-related on the deformation of pure copper substrate during double-sided lapping.Considering the initial residual stress of the workpiece,the stress caused by the lapping and their distribution characteristics,a prediction model was proposed for simulating workpiece machining deformation in lapping process by measuring the material removal rate of the upper and lower surfaces of the workpiece under the corresponding parameters.The results showed that the primary cause of the warping deformation of the workpiece in the doublesided lapping is the redistribution of initial residual stress caused by uneven material removal on the both surfaces.The finite element simulation results were in good agreement with the experimental results. 展开更多
关键词 Machining deformation Double-sided lapping Residual stress Finite element simulation
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MINITYPE MACHINING SYSTEM FOR DIAMOND LAPPING & POLISHING BY USING BRUSHLESS DIRECT CURRENT MOTOR AS PRECISE SPINDLE 被引量:1
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作者 FU Huinan CHEN Dongsheng ZHAO Yong LIN Binquan 《Chinese Journal of Mechanical Engineering》 SCIE EI CAS CSCD 2008年第2期27-30,共4页
A minitype precise spindle system which can machine precisely and stably in the process of diamond lapping and polishing is designed. In such minitype spindle system, the brushless DC spindle motor is used to drive th... A minitype precise spindle system which can machine precisely and stably in the process of diamond lapping and polishing is designed. In such minitype spindle system, the brushless DC spindle motor is used to drive the lapping finish table, which is built with fluid dynamic bearings. Some measures have been taken to make the lapping system dynamic balance, and a servo controller which can adjust the speed of motor from 1200 r/min to 5400 r/min is designed. Experiments show that the spindle system is reliable and stable for diamond polishing, and the detection results by atomic force microscope(AFM) show that the surfaces of diamond edge's Ra is 6.725 nm and whole diamond average Ra is 3.25 nm. 展开更多
关键词 DIAMOND lapping polishing Spindle system
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Subsurface Damage of Monocrystalline Germanium Wafers by Fixed and Free Abrasive Lappings 被引量:1
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作者 Tang Suyang Sun Yuli +5 位作者 Wang gong Li Jun Xu gang Liu Zhigang Zhu Yongwei Zuo Dunwen 《Transactions of Nanjing University of Aeronautics and Astronautics》 EI CSCD 2017年第5期496-503,共8页
The subsurface damage(SSD)layers of monocrystalline germanium wafers lapped by three different ways were measured and compared by the method of nanoindentation and micro morphology.Three ways such as ice-fixed abrasiv... The subsurface damage(SSD)layers of monocrystalline germanium wafers lapped by three different ways were measured and compared by the method of nanoindentation and micro morphology.Three ways such as ice-fixed abrasive,thermosetting fixed abrasive and free abrasive lappings are adopted to lap monocrystalline germanium wafers.The SSD depth was measured by a nanoindenter,and the morphology of SSD layer was observed by an atomic force microscopy(AFM).The results show that the SSD layer of monocrystalline germanium wafer is mainly composed of soft corrosion layer and plastic scratch and crack growth layer.Compared with thermosetting fixed abrasive and free abrasive lappings,the SSD depth lapped with ice-fixed abrasive is shallower.Moreover,the SSD morphology of monocrystalline germanium wafer lapped with ice-fixed abrasive is superior to those of two other processing ways. 展开更多
关键词 subsurface damage(SSD) NANOINDENTATION fixed abrasive lapping monocrystalline germanium wafer
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CVD Micro-diamond Coated Tool Lapping with Sapphire Wafer
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作者 Feng Wei Lu Wenzhuang +2 位作者 Yu Yaping Yang Bin Zuo Dunvuen 《Transactions of Nanjing University of Aeronautics and Astronautics》 EI CSCD 2017年第1期81-88,共8页
Micro-diamond films were prepared on YG6 substrate by hot filament chemical vapor deposition method.An innovative micro-diamond coated tool was used to the lap sapphire wafer.The effect of load,rotating speed,and lapp... Micro-diamond films were prepared on YG6 substrate by hot filament chemical vapor deposition method.An innovative micro-diamond coated tool was used to the lap sapphire wafer.The effect of load,rotating speed,and lapping time on material removal rate(MRR)and surface roughness was investigated.The results showed that the best process parameters were 3N,100r/min and 15 min.The surface quality of sapphire improved significantly after lapping.The coating after lapping adhered well and did not show any peeling.The innovative micro-diamond coated tool was feasible and suitable for the lapping of the single crystal sapphire wafer. 展开更多
关键词 micro-diamond film SAPPHIRE surface ROUGHNESS lapping
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Finite Element Analysis for Grinding and Lapping of Wire-sawn Silicon Wafers
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作者 Z J PEI X J XIN 《厦门大学学报(自然科学版)》 CAS CSCD 北大核心 2002年第S1期10-,共1页
Silicon wafers are the most widely used substrates for semiconductors. The falling price of silicon wafers has created tremendous pressure on silicon wafer manufacturers to develop cost-effective manufacturing process... Silicon wafers are the most widely used substrates for semiconductors. The falling price of silicon wafers has created tremendous pressure on silicon wafer manufacturers to develop cost-effective manufacturing processes. A critical issue in wafer production is the waviness induced by wire sawing. If this waviness is not removed, it will affect wafer flatness and semiconductor performance. In practice, both lapping and grinding have been used to flatten wire-sawn wafers. Although grinding is not as effective as lapping in removing waviness, it has many other advantages over lapping (such as higher throughput, fully automatic, and more benign to environment) and has great potential to reduce manufacturing cost of silicon wafers. This paper presents a finite element analysis (FEA) study on grinding and lapping of wire-sawn silicon wafers. An FEA model is first developed to simulate the waviness deformation of wire-sawn wafers in grinding and lapping processes. It is then used to explain how the waviness is removed or reduced by lapping and grinding and why the effectiveness of grinding in removing waviness is different from that of lapping. Furthermore, the model is used to study the effects of various parameters including active-grinding-zone orientation, grinding force, waviness wavelength, and waviness height on the reduction and elimination of waviness. Finally, the results of pilot experiments to verify the model are discussed. 展开更多
关键词 finite element analysis GRINDING lapping silicon wafer waviness removal
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Correlation between the Surface Quality and the Lapping Parameters in Loose Abrasive Lapping
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作者 原一高 骆祎岚 朱世根 《Journal of Donghua University(English Edition)》 EI CAS 2011年第1期71-74,共4页
As one of the basic finishing operations,loose abrasive lapping is widely used in the surface finishing on metallic parts,non-metallic components,and engineering ceramics.During lapping,lapping parameters have a great... As one of the basic finishing operations,loose abrasive lapping is widely used in the surface finishing on metallic parts,non-metallic components,and engineering ceramics.During lapping,lapping parameters have a great influence on surface quality of machined workpiece.In order to provide an experimental basis for the selection of lapping parameters,effects of some important variables such as abrasive size,lapping load,and lapping speed,on surface roughness and residual surface stress of high speed steel workpiece via loose abrasive lapping were discussed in this paper.The results show that the work surface roughness increases with the increasing of abrasives size or decreasing lapping load,and does not change obviously with the lapping speed.Lapping can cause residual compressive stress in the surface layer of lapped workpiece,and the magnitude of residual surface stress becomes larger with increasing abrasive size,lapping load,and lapping speed. 展开更多
关键词 loose abrasive lapping surface roughness residual stress high speed steel
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ANALYSIS ON LAPPING AND POLISHING PRESSURE DISTRIBUTION OF HARD MAGNETIC DISK SUBSTRATE 被引量:10
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作者 Cai, Guangqi Cai, Rui +1 位作者 Lu, Yushan Min, Xinli 《Chinese Journal of Mechanical Engineering》 SCIE EI CAS CSCD 1998年第4期53-57,共5页
The contact model of lapping and polishing for magnetic disk substrate is presented. Based on elastic contact theory, pressure distribution for this model are analyzed. Further, the effects of various parameters, such... The contact model of lapping and polishing for magnetic disk substrate is presented. Based on elastic contact theory, pressure distribution for this model are analyzed. Further, the effects of various parameters, such as the material properties of the PVA(polyvinyl acetate),grinding stone, the polishing pad and the base plate, the thickness of the pad or the stone on the pressure distribution have been discussed. 展开更多
关键词 lapping POLISHING Magnetic disk substrate
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DISCUSSING ON SOLID ABRASIVE LAPPING PATH 被引量:11
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作者 Yang Jiandong ,Wen XuehengChangchun Institute of Optics and Fine MechanicsZhu Yanqiu, Wang Lijiang Jilin University of Technology 《Chinese Journal of Mechanical Engineering》 SCIE EI CAS CSCD 1997年第2期101-105,140,共3页
Relative motion path between lapping tool and workpiece in plane solid abrasive lapping is dis- cussed and its path model is set up. The paths simulate. by this model are compared with the one got in experiments. The ... Relative motion path between lapping tool and workpiece in plane solid abrasive lapping is dis- cussed and its path model is set up. The paths simulate. by this model are compared with the one got in experiments. The changing relationship of workpiece rotating speed with the main spindle rotating speed and eccentricity is also discussed. 展开更多
关键词 lapping Path Solid abrasive
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ECCENTRIC CIRCULAR GROOVE LAPPING TECHNIQUE FOR CERAMIC BALLS 被引量:1
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作者 Ren Chengzu Xu Yanshan +2 位作者 Lin Bin Guo Hongqi Peng Zemin 《Chinese Journal of Mechanical Engineering》 SCIE EI CAS CSCD 1996年第1期45-48,62,共3页
A new ball lapping method i s presented.By using the method , there is a distance be- tween the centre Iine of cireular groove and the rotating axis of lapping plate。 The proper dis-tance can make the lapped probabil... A new ball lapping method i s presented.By using the method , there is a distance be- tween the centre Iine of cireular groove and the rotating axis of lapping plate。 The proper dis-tance can make the lapped probability of each point on ball surfaee as consistent as possible。 This method is especially adapted for lapping high hardness ceramic balls due to its high material re- moval rate。 展开更多
关键词 Eccentric lapping Ceramic ball
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RESEARCH ON AMAGNETIC FIELD IN ELECTROLYTIC LAPPING
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作者 Chen Yuquan Li ZhenjiaDept.of Mechanical Engineering, Harbin University of Science & TechnologyLi WeigangHarbin Institute of Science & Technology 《Chinese Journal of Mechanical Engineering》 SCIE EI CAS CSCD 1999年第1期64-70,共7页
Taking electrolytic lapping stainless steel for example, the principle of electrolytic lapping with a magnetic field is described, the movement of charged particles in the magnetic field is analyzed in tems of theory.... Taking electrolytic lapping stainless steel for example, the principle of electrolytic lapping with a magnetic field is described, the movement of charged particles in the magnetic field is analyzed in tems of theory. Using a computer, the motion loci of the charged particles in the magnetic field are simulated. The theory and the experiment show that the magnetic field can accelerate the diffusion and mobility of the charged particles, accelerate the electrochemical reaction and reduce the surface roughness of the work more quickly, which improves the lapping efficiency. 展开更多
关键词 Magnetic field Electrolytic lapping CHARGED PARTICLES Computer simulation
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EFFICIENCY IN LAPPING FERRITE
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作者 Zuo Dunwen Wang Min(Nanjing University of Aeronautics and Astronautics)Matsuo Tetsuo Touge Mutsumi(Kumamoto University, Japan) 《Chinese Journal of Mechanical Engineering》 SCIE EI CAS CSCD 1995年第1期42-46,共17页
The present work has studied the effect of various parameters on the efficiency when lap-ping Mn-Zn ferrite material with fine diamond grains. The main factors affecting the efficiencywere made clear and the optimum l... The present work has studied the effect of various parameters on the efficiency when lap-ping Mn-Zn ferrite material with fine diamond grains. The main factors affecting the efficiencywere made clear and the optimum lapping condition was discussed. It was found that the efficiencycan be affected greatly by the parameters in terms of the number of active grains per time. while thesurface roughness finally obtained is generally almost the same for a given grain size. 展开更多
关键词 FERRITE lapping EFFICIENCY ROUGHNESS
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淫羊藿苷调控LAP自噬促进酒精抑制的MC3T3-E1细胞成骨分化 被引量:2
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作者 曾麒 陈跃平 +2 位作者 宋世雷 赖渝 吴华华 《中国中药杂志》 北大核心 2025年第3期590-599,共10页
研究细胞自噬在MC3T3-E1细胞成骨诱导(生理)、酒精(alcohol,AL)干预(病理)分化过程中的影响机制,以及淫羊藿苷(icariin,ICA)对AL干预病理状态下MC3T3-E1细胞成骨分化的作用机制。成骨矿化结节染色鉴定该细胞可分化为成骨细胞。CCK-8实... 研究细胞自噬在MC3T3-E1细胞成骨诱导(生理)、酒精(alcohol,AL)干预(病理)分化过程中的影响机制,以及淫羊藿苷(icariin,ICA)对AL干预病理状态下MC3T3-E1细胞成骨分化的作用机制。成骨矿化结节染色鉴定该细胞可分化为成骨细胞。CCK-8实验筛选合适的AL和ICA浓度后,实验分为7组:完全培养基(complete medium,CM)组,成骨诱导培养基(osteogenic induction medium,OIM)组,OIM+0.25 mol·L^(-1)AL组,OIM+0.25 mol·L^(-1)AL+1×10^(-8)mol·L^(-1)ICA组,OIM+0.25 mol·L^(-1)AL+1×10^(-7)mol·L^(-1)ICA组,OIM+0.25 mol·L^(-1)AL+1×10^(-6)mol·L^(-1)ICA组,OIM+0.25 mol·L^(-1)AL+1×10^(-5)mol·L^(-1)ICA组,培养7 d。碱性磷酸酶(alkaline phosphatase,ALP)染色检测ALP相对面积,Western blot、RT-qPCR检测成骨、自噬相关蛋白及mRNA表达情况,活性氧(reactive oxygen species,ROS)染色检测ROS水平,细胞凋亡线粒体膜电位实验检测细胞凋亡情况。结果显示,ICA可上调AL干预后下调的ALP相对面积;AL下调成骨相关蛋白Wnt家族成员1(Wnt family member 1 gene,Wnt1)及成骨相关基因Wnt1、β-连环蛋白(β-catenin)、核心结合因子2(Runt-related transcription factor 2,Runx2)、骨保护素(osteoprotegerin,OPG)、ALP的表达水平,抑制细胞成骨分化,ICA可上调AL抑制的成骨相关蛋白及mRNA的表达水平,促进细胞成骨分化;AL抑制典型自噬,ICA调控Rubicon抑制LC3相关吞噬作用(LC3-associated phagocytosis,LAP)促进典型自噬;ICA下调AL诱导后上升的ROS水平;ICA下调AL干预后导致的成骨细胞凋亡。综上,ICA可调控Rubicon抑制LAP促进典型自噬,清除ROS减少细胞凋亡,最终通过调控Wnt/β-catenin信号通路促进AL干预病理状态下MC3T3-E1细胞的成骨分化。 展开更多
关键词 淫羊藿苷 酒精 成骨细胞 MC3T3-E1细胞 Wnt1/β-catenin通路 成骨分化 骨代谢失衡 自噬 LAP
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肥胖指标对痰湿型多囊卵巢综合征患者代谢综合征的诊断价值分析 被引量:2
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作者 向蓉 李欣萌 +2 位作者 雷凯凯 徐芳 孙淼 《现代中医药》 2025年第1期77-82,共6页
目的不同肥胖指标与痰湿型多囊卵巢综合征患者代谢综合征的相关性。方法回顾360例痰湿型多囊卵巢综合征(Polycystic ovary syndrome,PCOS)患者,根据是否符合代谢综合征(metabolic syndrome,MS)诊断标准,将研究对象分为非MS组216例、MS组... 目的不同肥胖指标与痰湿型多囊卵巢综合征患者代谢综合征的相关性。方法回顾360例痰湿型多囊卵巢综合征(Polycystic ovary syndrome,PCOS)患者,根据是否符合代谢综合征(metabolic syndrome,MS)诊断标准,将研究对象分为非MS组216例、MS组144例;比较组内性激素水平及临床特征差异,评估各肥胖指标对痰湿型PCOS患者合并MS的预测价值。结果MS组患者性激素LH、SHBG、P、DHEAS、LH/FSH低于非MS组(P<0.05);MS组BH、BW、WC、HC、BMI、WHR、BRI、ABSI、CI、BAI、AVI、LAP、VAI均高于非MS组(P<0.05);采用受试者工作曲线评估肥胖指标在诊断痰湿型PCOS合并MS时均有预测价值(P<0.05)。结论不同肥胖指标对痰湿型PCOS患者合并MS具有较好的预测价值,其中LAP、VAI、AVI对痰湿型PCOS患者合并MS的预测价值最佳。 展开更多
关键词 多囊卵巢综合征 代谢综合征 肥胖指标 LAP VAI
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一种多房棘球绦虫亮氨酸氨基肽酶体外荧光底物酶活性检测方法
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作者 陈嘉瑀 戴瑶 +7 位作者 王顺娟 肖杨 闫鑫宗 刘通 袁智浩 史凯丽 李润乐 汤锋 《中国人兽共患病学报》 北大核心 2025年第1期23-31,共9页
目的构建多房棘球绦虫亮氨酸氨基肽酶(leucyl aminopeptidase,LAP)体外荧光酶活性检测方法,并与化学发色底物酶活性检测方法进行对比。方法确立荧光底物体外酶活性检测方法的反应条件,并通过分子对接、抑制率、精密度对比荧光底物L-亮氨... 目的构建多房棘球绦虫亮氨酸氨基肽酶(leucyl aminopeptidase,LAP)体外荧光酶活性检测方法,并与化学发色底物酶活性检测方法进行对比。方法确立荧光底物体外酶活性检测方法的反应条件,并通过分子对接、抑制率、精密度对比荧光底物L-亮氨酸-7-氨基-4-甲基香豆素盐酸盐(Leu-AMC)与化学发色底物L-亮氨酸-4-硝基苯氨(Leu-pNA)之间的差异。结果分子对接结果显示荧光底物Leu-AMC与蛋白的亲和力大于化学发色底物Leu-pNA。通过观察改变反应条件对荧光强度的影响,确立荧光酶活性检测方法在反应温度为37℃、反应pH为9.0、蛋白浓度为800 nmol/L、反应时长60 min的情况下该检测方法反应效果明显。Leu-AMC在5μmol/L的底物浓度和底物浓度变化的情况下有明显的反应效果和反应差异,通过加入不同抑制剂,荧光底物检测方法相较于化学发色底物检测方法存在组间差异。结论本研究构建了以Leu-AMC为底物的多房棘球蚴亮氨酸氨基肽酶体外荧光酶活性检测方法,与化学发色底物相比该方法灵敏度更高。 展开更多
关键词 多房棘球蚴 LAP Leu-AMC 酶活性
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Nanometer lapping technology at high speed 被引量:7
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作者 YANG JianDong TIAN ChunLin WANG ChangXing 《Science China(Technological Sciences)》 SCIE EI CAS 2007年第1期27-38,共12页
In floating lapping with solid abrasives, the workpiece is taken as an isolated body. The forces that act on it are analyzed. A differential equation about the forces that act on it is set up, so the forces that act o... In floating lapping with solid abrasives, the workpiece is taken as an isolated body. The forces that act on it are analyzed. A differential equation about the forces that act on it is set up, so the forces that act on it and its motion rule are received. Combining it with known lapping tool motion, the relative motion rule between the lapping tool and workpiece is determined too. According to the relative motion, the distribution of abrasives density is designed reasonably, which makes the lapping tool wear uniformly, which, in turn, avoids redressing the lapping tool, saves abra-sives, and increases machining accuracy. Combining it with advantages in high speed lapping with solid abrasives, the low cost, high efficiency nanometer lapping at high speed is realized. 展开更多
关键词 NANOMETER MACHINING high SPEED lapping solid ABRASIVES force ANALYZING
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