The epitaxial growth of novel GaN-based light-emitting diode(LED) on Si(100) substrate has proved challenging.Here in this work, we investigate a monolithic phosphor-free semi-polar InGaN/GaN near white light-emitting...The epitaxial growth of novel GaN-based light-emitting diode(LED) on Si(100) substrate has proved challenging.Here in this work, we investigate a monolithic phosphor-free semi-polar InGaN/GaN near white light-emitting diode, which is formed on a micro-striped Si(100) substrate by metal organic chemical vapor deposition. By controlling the size of micro-stripe, InGaN/GaN multiple quantum wells(MQWs) with different well widths are grown on semi-polar(1■01)planes. Besides, indium-rich quantum dots are observed in InGaN wells by transmission electron microscopy, which is caused by indium phase separation. Due to the different widths of MQWs and indium phase separation, the indium content changes from the center to the side of the micro-stripe. Various indium content provides the wideband emission. This unique property allows the semipolar InGaN/GaN MQWs to emit wideband light, leading to the near white light emission.展开更多
Influences of the Si doping on the structural and optical properties of the InGaN epilayers are investigated in detail by means of high-resolution X-ray diffraction （HRXRD）, photolumimescence （PL）, scanning electr...Influences of the Si doping on the structural and optical properties of the InGaN epilayers are investigated in detail by means of high-resolution X-ray diffraction （HRXRD）, photolumimescence （PL）, scanning electron microscope （SEM）, and atomic force microscopy （AFM）. It is found that the Si doping may improve the surface morphology and crystal quality of the InGaN film and meanwhile it can also enhance the emission efficiency by increasing the electron concentration in the InGaN and suppressing tile formation of V-defects, which act as nonradiative recombination centers in the InGaN, and it is proposed that the former plays a more important role in enhancing the emission efficiency in the InGaN.展开更多
A theoretical study of polar and semi/non-polar InGaN/GaN light-emitting diodes（LEDs） with different internal surface polarization charges, which can be grown on Si substrates, is conducted by using APSYS software. ...A theoretical study of polar and semi/non-polar InGaN/GaN light-emitting diodes（LEDs） with different internal surface polarization charges, which can be grown on Si substrates, is conducted by using APSYS software. In comparison with polar structure LEDs, the semi-polar structure exhibits a higher concentration of electrons and holes and radiative recombination rate, and its reduced built-in polarization field weakens the extent of band bending which causes the shift of peak emission wavelength. So the efficiency droop of semi-polar InGaN/GaN LEDs declines obviously and the optical power is significantly improved. In comparison with non-polar structure LEDs, although the concentration of holes and electrons as well as the radiative recombination rate of the semi-polar structure are better in the last two quantum wells（QWs） approaching the p-Ga N side, the uniformity of distribution of carriers and radiative recombination rate for the nonpolar structure is better. So the theoretical analysis indicates that the removal of the internal polarization field in the MQWs active regions for non-polar structure LEDs contributes to the uniform distribution of electrons and holes, and decreases the electron leakage. Thus it enhances the radiative recombination rate, and further improves the IQEs and optical powers, and shows the best photoelectric properties among these three structures.展开更多
分别在Si(110)和Si(111)衬底上制备了In Ga N/Ga N多量子阱结构蓝光发光二极管(LED)器件.利用高分辨X射线衍射、原子力显微镜、室温拉曼光谱和变温光致发光谱对生长的LED结构进行了结构表征.结果表明,相对于Si(111)上生长LED样品,Si(110...分别在Si(110)和Si(111)衬底上制备了In Ga N/Ga N多量子阱结构蓝光发光二极管(LED)器件.利用高分辨X射线衍射、原子力显微镜、室温拉曼光谱和变温光致发光谱对生长的LED结构进行了结构表征.结果表明,相对于Si(111)上生长LED样品,Si(110)上生长的LED结构晶体质量较好,样品中存在较小的张应力,具有较高的内量子效率.对制备的LED芯片进行光电特性分析测试表明,两种衬底上制备的LED芯片等效串联电阻相差不大,在大电流注入下内量子效率下降较小;但是,相比于Si(111)上制备LED芯片,Si(110)上LED芯片具有较小的开启电压和更优异的发光特性.对LED器件电致发光(EL)发光峰随驱动电流的变化研究发现,由于Si(110)衬底上LED结构中阱层和垒层存在较小的应力/应变而在器件中产生较弱的量子限制斯塔克效应,致使Si(110)上LED芯片EL发光峰随驱动电流的蓝移量更小.展开更多
A comprehensive study of high efficiency In（0.46）Ga（0.54）N/Si tandem solar cell is presented.A tunnel junction（TJ） was needed to interconnect the top and bottom sub-cells.Two TJ designs,integrated within this ta...A comprehensive study of high efficiency In（0.46）Ga（0.54）N/Si tandem solar cell is presented.A tunnel junction（TJ） was needed to interconnect the top and bottom sub-cells.Two TJ designs,integrated within this tandem：GaAs（n^＋）/GaAs（p^＋） and In（0.5）Ga（0.5）N（n^＋）/Si（p^＋） were considered.Simulations of GaAs（n^＋）/GaAs（p^＋）and In（0.5）Ga（0.5）N（n^＋）/Si（p^＋） TJ I-V characteristics were studied for integration into the proposed tandem solar cell.A comparison of the simulated solar cell I-V characteristics under 1 sun AM1.5 spectrum was discussed in terms of short circuit current density（J（SC））,open circuit voltage（V（OC））,fill factor（FF） and efficiency（η） for both tunnel junction designs.Using GaAs（n^＋）/GaAs（p^＋） tunnel junction,the obtained values of J（SC） = 21.74 mA/cm-2,V（OC）= 1,81 V,FF = 0.87 and η=34.28%,whereas the solar cell with the In（0.5）Ga（0.5）N/Si tunnel junction reported values of J（SC）= 21.92 mA/cm-2,V（OC）= 1.81 V,FF = 0.88 and η= 35.01%.The results found that required thicknesses for GaAs（n^＋）/GaAs（p^＋） and In（0.5）Ga（0.5）N（n^＋）/Si（p^＋） tunnel junctions are around 20 nm,the total thickness of the top InGaN can be very small due to its high optical absorption coefficient and the use of a relatively thick bottom cell is necessary to increase the conversion efficiency.展开更多
基金Project supported by the National Natural Science Foundation of China(Grant Nos.51472229,61422405,and 11574301)the Natural Science Foundation of Tianjin(Grant No.14JCQNJC01000)the National Science Foundation for Post-doctoral Scientists of China(Grant No.2016M600231)
文摘The epitaxial growth of novel GaN-based light-emitting diode(LED) on Si(100) substrate has proved challenging.Here in this work, we investigate a monolithic phosphor-free semi-polar InGaN/GaN near white light-emitting diode, which is formed on a micro-striped Si(100) substrate by metal organic chemical vapor deposition. By controlling the size of micro-stripe, InGaN/GaN multiple quantum wells(MQWs) with different well widths are grown on semi-polar(1■01)planes. Besides, indium-rich quantum dots are observed in InGaN wells by transmission electron microscopy, which is caused by indium phase separation. Due to the different widths of MQWs and indium phase separation, the indium content changes from the center to the side of the micro-stripe. Various indium content provides the wideband emission. This unique property allows the semipolar InGaN/GaN MQWs to emit wideband light, leading to the near white light emission.
基金Project supported by the National High Technology Research and Development Program of China (Grant Nos.2011AA03A112,2011AA03A106,and 2013AA03A101)the National Natural Science Foundation of China (Grant Nos.11204360,61210014,and 61078046)+2 种基金the Science & Technology Innovation Program of Department of Education of Guangdong Province,China (Grant No.2012CXZD0017)the Industry–Academia Research Union Special Fund of Guangdong Province,China (Grant No.2012B091000169)the Science & Technology Innovation Platform of Industry–Academia Research Union of Guangdong Province–Ministry Cooperation Special Fund,China (Grant No.2012B090600038)
文摘Influences of the Si doping on the structural and optical properties of the InGaN epilayers are investigated in detail by means of high-resolution X-ray diffraction （HRXRD）, photolumimescence （PL）, scanning electron microscope （SEM）, and atomic force microscopy （AFM）. It is found that the Si doping may improve the surface morphology and crystal quality of the InGaN film and meanwhile it can also enhance the emission efficiency by increasing the electron concentration in the InGaN and suppressing tile formation of V-defects, which act as nonradiative recombination centers in the InGaN, and it is proposed that the former plays a more important role in enhancing the emission efficiency in the InGaN.
基金Project supported by the National Natural Science Foundation of China(Grant No.51172079)the Science and Technology Program of Guangdong Province,China(Grant Nos.2010B090400456 and 2010A081002002)+1 种基金the Science and Technology Program of Guangzhou,China(Grant No.2011J4300018)the Program for Changjiang Scholars and Innovative Research Team in Universities of China(Grant No.IRT13064)
文摘A theoretical study of polar and semi/non-polar InGaN/GaN light-emitting diodes（LEDs） with different internal surface polarization charges, which can be grown on Si substrates, is conducted by using APSYS software. In comparison with polar structure LEDs, the semi-polar structure exhibits a higher concentration of electrons and holes and radiative recombination rate, and its reduced built-in polarization field weakens the extent of band bending which causes the shift of peak emission wavelength. So the efficiency droop of semi-polar InGaN/GaN LEDs declines obviously and the optical power is significantly improved. In comparison with non-polar structure LEDs, although the concentration of holes and electrons as well as the radiative recombination rate of the semi-polar structure are better in the last two quantum wells（QWs） approaching the p-Ga N side, the uniformity of distribution of carriers and radiative recombination rate for the nonpolar structure is better. So the theoretical analysis indicates that the removal of the internal polarization field in the MQWs active regions for non-polar structure LEDs contributes to the uniform distribution of electrons and holes, and decreases the electron leakage. Thus it enhances the radiative recombination rate, and further improves the IQEs and optical powers, and shows the best photoelectric properties among these three structures.
文摘分别在Si(110)和Si(111)衬底上制备了In Ga N/Ga N多量子阱结构蓝光发光二极管(LED)器件.利用高分辨X射线衍射、原子力显微镜、室温拉曼光谱和变温光致发光谱对生长的LED结构进行了结构表征.结果表明,相对于Si(111)上生长LED样品,Si(110)上生长的LED结构晶体质量较好,样品中存在较小的张应力,具有较高的内量子效率.对制备的LED芯片进行光电特性分析测试表明,两种衬底上制备的LED芯片等效串联电阻相差不大,在大电流注入下内量子效率下降较小;但是,相比于Si(111)上制备LED芯片,Si(110)上LED芯片具有较小的开启电压和更优异的发光特性.对LED器件电致发光(EL)发光峰随驱动电流的变化研究发现,由于Si(110)衬底上LED结构中阱层和垒层存在较小的应力/应变而在器件中产生较弱的量子限制斯塔克效应,致使Si(110)上LED芯片EL发光峰随驱动电流的蓝移量更小.
文摘A comprehensive study of high efficiency In（0.46）Ga（0.54）N/Si tandem solar cell is presented.A tunnel junction（TJ） was needed to interconnect the top and bottom sub-cells.Two TJ designs,integrated within this tandem：GaAs（n^＋）/GaAs（p^＋） and In（0.5）Ga（0.5）N（n^＋）/Si（p^＋） were considered.Simulations of GaAs（n^＋）/GaAs（p^＋）and In（0.5）Ga（0.5）N（n^＋）/Si（p^＋） TJ I-V characteristics were studied for integration into the proposed tandem solar cell.A comparison of the simulated solar cell I-V characteristics under 1 sun AM1.5 spectrum was discussed in terms of short circuit current density（J（SC））,open circuit voltage（V（OC））,fill factor（FF） and efficiency（η） for both tunnel junction designs.Using GaAs（n^＋）/GaAs（p^＋） tunnel junction,the obtained values of J（SC） = 21.74 mA/cm-2,V（OC）= 1,81 V,FF = 0.87 and η=34.28%,whereas the solar cell with the In（0.5）Ga（0.5）N/Si tunnel junction reported values of J（SC）= 21.92 mA/cm-2,V（OC）= 1.81 V,FF = 0.88 and η= 35.01%.The results found that required thicknesses for GaAs（n^＋）/GaAs（p^＋） and In（0.5）Ga（0.5）N（n^＋）/Si（p^＋） tunnel junctions are around 20 nm,the total thickness of the top InGaN can be very small due to its high optical absorption coefficient and the use of a relatively thick bottom cell is necessary to increase the conversion efficiency.
