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InAs/AlSb异质结的Pd/Ti/Pt/Au合金化欧姆接触(英文)
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作者 张静 吕红亮 +3 位作者 倪海桥 牛智川 张义门 张玉明 《红外与毫米波学报》 SCIE EI CAS CSCD 北大核心 2018年第6期679-682,687,共5页
为了得到较低的接触电阻,研究了帽层未掺杂的InAs/AlSb异质结的Pd/Ti/Pt/Au合金化欧姆接触.利用传输线模型(TLM)测量了接触电阻Rc.在最佳的快速热退火条件为275℃和20s时,InAs/AlSb异质结的Pd/Ti/Pt/Au接触电阻值为0.128Ω·mm.TEM... 为了得到较低的接触电阻,研究了帽层未掺杂的InAs/AlSb异质结的Pd/Ti/Pt/Au合金化欧姆接触.利用传输线模型(TLM)测量了接触电阻Rc.在最佳的快速热退火条件为275℃和20s时,InAs/AlSb异质结的Pd/Ti/Pt/Au接触电阻值为0.128Ω·mm.TEM观察发现经过快速热退火后Pd已经扩散到半导体中有利于高质量欧姆接触的形成.研究表明经过Pd/Ti/Pt/Au合金化欧姆接触后Rc有明显减小,适用于InAs/AlSb异质结的应用. 展开更多
关键词 欧姆接触 快速热退火 inas/alsb异质结
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InAs/AlSb/GaSb量子阱中的双色光吸收 被引量:1
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作者 张仲义 秦素英 魏相飞 《发光学报》 EI CAS CSCD 北大核心 2017年第7期930-935,共6页
为了降低噪声对InAs/GaSb量子阱作为双色电探测器性能的影响,设计性能优良的光电探测器,在InAs/GaSb量子阱中加入AlSb夹层,以减少电子和空穴在界面处的复合,从而抑制由于电子和空穴复合引起的噪声。首先应用转移矩阵方法求解薛定谔方程... 为了降低噪声对InAs/GaSb量子阱作为双色电探测器性能的影响,设计性能优良的光电探测器,在InAs/GaSb量子阱中加入AlSb夹层,以减少电子和空穴在界面处的复合,从而抑制由于电子和空穴复合引起的噪声。首先应用转移矩阵方法求解薛定谔方程得到量子阱中电子和空穴的能级和波函数,研究AlSb夹层对电子和空穴波函数的影响。应用平衡方程方法求解外加光场条件下的玻尔兹曼方程,研究所有电子和空穴跃迁通道对光吸收系数的贡献,重点研究了AlSb夹层厚度对光吸收系数的影响。结果表明:基于In As/GaSb的量子阱体系可以实现双色光吸收,加入AlSb夹层可以有效抑制电子和空穴在界面处的隧穿,从而降低复合噪声,同时AlSb夹层的加入也对吸收峰有影响。AlSb夹层的厚度达到2 nm即可有效降低电子和空穴复合噪声,双色光吸收峰在中远红外波段,为该量子阱作为性能良好的中远红外光电探测器提供理论支撑。 展开更多
关键词 双色光吸收 inas/alsb/GaSb量子阱 平衡方程方法 电子空穴复合噪声
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InAs/AlSb HEMTs的单粒子效应模拟研究
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作者 曲狄 陈世彬 《科技信息》 2012年第7期78-79,共2页
本文单粒子效应的研究目的,旨在研究异质结器件InAs/AlSb HEMTs在重离子辐照下失效的概率。文中研究了InAs/AlSb HEMTs的I-V特性对沿45度方向入射、线性能量传输因子0.2,作用时间0.1ps,重离子轨迹0.1um的重离子辐照的响应规律。结果表明... 本文单粒子效应的研究目的,旨在研究异质结器件InAs/AlSb HEMTs在重离子辐照下失效的概率。文中研究了InAs/AlSb HEMTs的I-V特性对沿45度方向入射、线性能量传输因子0.2,作用时间0.1ps,重离子轨迹0.1um的重离子辐照的响应规律。结果表明:随着栅极偏压由负到正的改变,InAs/AlSb HEMTs器件由不能工作到能够正常工作,所以在重离子辐射条件下栅极偏压影响着InAs/AlSb HEMTs器件能否正常工作。 展开更多
关键词 inas/alsb HEMTS 异质结 单粒子效应 I-V特性
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Temperature dependence on the electrical and physical performance of InAs/AlSb heterojunction and high electron mobility transistors
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作者 Jing Zhang Hongliang Lv +2 位作者 Haiqiao Ni Zhichuan Niu Yuming Zhang 《Chinese Physics B》 SCIE EI CAS CSCD 2018年第9期489-494,共6页
In this report, the effect of temperature on the In As/Al Sb heterojunction and high-electron-mobility transistors(HEMTs) with a gate length of 2 μm are discussed comprehensively. The results indicate that device p... In this report, the effect of temperature on the In As/Al Sb heterojunction and high-electron-mobility transistors(HEMTs) with a gate length of 2 μm are discussed comprehensively. The results indicate that device performance is greatly improved at cryogenic temperatures. It is also observed that the device performance at 90 K is significantly improved with 27% lower gate leakage current, 12% higher maximum drain current, and 22.5% higher peak transconductance compared to 300 K. The temperature dependence of mobility and the two-dimensional electron gas concentration in the In As/Al Sb heterojunction for the temperature range 90 K-300 K is also investigated. The electron mobility at 90 K(42560 cm2/V·s)is 2.5 times higher than its value at 300 K(16911 cm^2/V·s) because of the weaker lattice vibration and the impurity ionization at cryogenic temperatures, which corresponds to a reduced scattering rate and higher mobility. We also noted that the two-dimensional electron gas concentration decreases slightly from 1.99 × 10^(12) cm^(-2) at 300 K to 1.7 × 10^(12) cm^(-2) at 90 K with a decrease in temperature due to the lower ionization at cryogenic temperature and the nearly constant ?Ec. 展开更多
关键词 TEMPERATURE MOBILITY two-dimensional electron gas inas/alsb HEMT
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扩展短波红外InAs/AlSb型超晶格光致发光光谱
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作者 喻靖 付跃刚 +3 位作者 鹿利单 陈伟强 潘雨婷 祝连庆 《光学学报》 北大核心 2025年第9期218-226,共9页
在GaSb衬底上生长高质量的扩展短波红外InAs/AlSb超晶格(SL)材料。采用高分辨X射线衍射(HRXRD)、原子力显微镜和傅里叶变换红外光谱仪研究SL在不同生长温度下的性能。SL的HRXRD半峰全宽具有最低的数值,为50.7 arcsec,且应力失配为+0.03... 在GaSb衬底上生长高质量的扩展短波红外InAs/AlSb超晶格(SL)材料。采用高分辨X射线衍射(HRXRD)、原子力显微镜和傅里叶变换红外光谱仪研究SL在不同生长温度下的性能。SL的HRXRD半峰全宽具有最低的数值,为50.7 arcsec,且应力失配为+0.03%。表面(50μm×50μm区域)均方根粗糙度约为0.2 nm。因此T_(c) -15℃(T_(c) 为基准温度)下生长的InAs/AlSb SL具有良好的晶体质量。与温度相关的光致发光(PL)光谱表明,温度敏感系数α低至0.108 meV/K。结果表明:T_(c) -15℃下生长的InAs/AlSb SL具有最佳的光学质量;T_(c) -15℃为生长InAs/AlSb SL的最佳外延温度。此外,研究发现,AlSb层生长过程中的砷背景会导致低温下与温度相关的PL峰值能量发生蓝移。温度依赖和激发功率依赖的PL光谱揭示载流子局域化的证据。实验结果表明:InAs/AlSb SL的局域化深度随砷背景的增大而增大。 展开更多
关键词 材料 inas/alsb超晶格 生长温度 光致发光光谱 砷背景 载流子局域化
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InAs-based interband cascade lasers at 4.0 μm operating at room temperature 被引量:4
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作者 Tian Yu Shuman Liu +9 位作者 Jinchuan Zhang Bo Xu Lijun Wang Junqi Liu Ning Zhuo Shenqiang Zhai Xiaoling Ye Yonghai Chen Fengqi Liu Zhanguo Wang 《Journal of Semiconductors》 EI CAS CSCD 2018年第11期36-39,共4页
InAs-based interband cascade lasers(ICLs) with InAs plasmon waveguides or InAs/AlSb superlattice(SL) waveguides were demonstrated at emission wavelengths below 4.1 μm. The threshold current densities of the laser... InAs-based interband cascade lasers(ICLs) with InAs plasmon waveguides or InAs/AlSb superlattice(SL) waveguides were demonstrated at emission wavelengths below 4.1 μm. The threshold current densities of the lasers with SL waveguides were 37 A/cm;at 77 K in continuous wave mode. The operation temperature of these lasers reached room temperature in pulsed mode. Compared with the thick InAs n++ plasmon cladding layer, the InAs/AlSb superlattice cladding layers have greater advantages for ICLs with wavelengths less than 4 μm even in InAs based ICLs because in the short-wavelength region they have a higher confinement factor than InAs plasmon waveguides. 展开更多
关键词 interband cascade laser inas-based inas/alsb superlattice
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Wet etching and passivation of GaSb-based very long wavelength infrared detectors 被引量:1
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作者 Xue-Yue Xu Jun-Kai Jiang +10 位作者 Wei-Qiang Chen Su-Ning Cui Wen-Guang Zhou Nong Li Fa-Ran Chang Guo-Wei Wang Ying-Qiang Xu Dong-Wei Jiang Dong-Hai Wu Hong-Yue Hao Zhi-Chuan Niu 《Chinese Physics B》 SCIE EI CAS CSCD 2022年第6期132-136,共5页
The etching and passivation processes of very long wavelength infrared(VLWIR)detector based on the InAs/GaSb/AlSb type-II superlattice have been studied.By studying the effect of each component in the citric acid solu... The etching and passivation processes of very long wavelength infrared(VLWIR)detector based on the InAs/GaSb/AlSb type-II superlattice have been studied.By studying the effect of each component in the citric acid solution(citric acid,phosphoric acid,hydrogen peroxide,deionized water),the best solution ratio is obtained.After comparing different passivation materials such as sulfide+SiO_(2),Al_(2)O_(3),Si_(3)N_(4) and SU8,it is found that SU8 passivation can reduce the dark current of the device to a greater degree.Combining this wet etching and SU8 passivation,the of VLWIR detector with a mesa diameter of 500μm is about 3.6Ω·cm^(2) at 77 K. 展开更多
关键词 inas/GaSb/alsb superlattice very long wavelength infrared(VLWIR)detector wet etching PASSIVATION
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