Semiconductor quantum dots have been intensively investigated because of their fundamental role in solid-state quan- tum information processing. The energy levels of quantum dots are quantized and can be tuned by exte...Semiconductor quantum dots have been intensively investigated because of their fundamental role in solid-state quan- tum information processing. The energy levels of quantum dots are quantized and can be tuned by external field such as optical, electric, and magnetic field. In this review, we focus on the development of magneto-optical properties of single InAs quantum dots embedded in GaAs matrix, including charge injection, relaxation, tunneling, wavefunction distribution, and coupling between different dimensional materials. Finally, the perspective of coherent manipulation of quantum state of single self-assembled quantum dots by photocurrent spectroscopy with an applied magnetic field is discussed.展开更多
The effcts of various InGaAs layers on the structural and optical properties of InAs self-assembled quantum dots（ QDs ） grown by molecular-beam epitaxy （MBE） were investigated. The emission wavelength of 1317 nm ...The effcts of various InGaAs layers on the structural and optical properties of InAs self-assembled quantum dots（ QDs ） grown by molecular-beam epitaxy （MBE） were investigated. The emission wavelength of 1317 nm was obtained by embedding InAs QDs in InGaAs / GaAs quantum well. The temperature-dependent and time-resolved photoluminescence （ TDPL and TRPL ） were used to study the dynomic characteristics of carriers. InGaAs cap layer may improve the quality of quantum dots for the strain relaxation around QDs, which results in a stronger PL inteasity and an increase of PL peak lifetime up to 170 K. We found that InGaAs buffer layer may reduce the PL peak lifetime of InAs QDs, which is due to the buffer layer accelerating the carrier migration. The results also show that InGaAs cap layer can increase the temperature point when the thermal reemission and nonradiative recombination contribute significantly to the carrier dynamics.展开更多
WT8.BZ]The effects of postgrowth rapid thermal annealing have been studied on the optical properties of 3-nm-height InAs/GaAs quantum dots covered by 3-nm-thick In xGa 1-x As (x=0,0 1 and 0 2) overgrowth layer...WT8.BZ]The effects of postgrowth rapid thermal annealing have been studied on the optical properties of 3-nm-height InAs/GaAs quantum dots covered by 3-nm-thick In xGa 1-x As (x=0,0 1 and 0 2) overgrowth layer.At a higher annealing temperature (T≥750℃),the photoluminescence peak of InGaAs layer has been observed at the lower-energy side of InAs quantum-dot peak.In addition,a similar blueshift in photoluminescence (PL) emission energy is observed for all samples when the annealing temperature increases from 650 to 850℃.However,the trend of photoluminescence linewidth towards narrowing is totally different for InAs quantum dots with different In mole fraction in InGaAs overgrowth layer.The results suggest that the intermixing in the lateral direction plays an important role in obtaining a better understanding of the modification of optical properties induced by the rapid thermal annealing.展开更多
The growth parameters affecting the deposition of self-assembled InAs quantum dots （QDs） on GaAs substrate by low-pressure metal-organic chemical vapor deposition （MOCVD） are reported. The low-density InAs QDs （-...The growth parameters affecting the deposition of self-assembled InAs quantum dots （QDs） on GaAs substrate by low-pressure metal-organic chemical vapor deposition （MOCVD） are reported. The low-density InAs QDs （- 5 × 10^8cm^-2） are achieved using high growth temperature and low InAs coverage. Photoluminescence （PL） measurements show the good optical quality of low-density QDs. At room temperature, the ground state peak wavelength of PL spectrum and full-width at half-maximum （FWHM） are 1361 nm and 23 meV （35 nm）, respectively, which are obtained as the GaAs capping layer grown using triethylgallium （TEG） and tertiallybutylarsine （TBA）. The PL spectra exhibit three emission peaks at 1361, 1280, and 1204 nm, which correspond to the ground state, the first excited state, and the second excited state of the ODs, respectively.展开更多
Currently, the nature of self-assembly of three-dimensional epitaxial islands or quantum dots （QDs） in a lattice-mismatched heteroepitaxial growth system, such as InAs/GaAs（001） and Ge/Si（001） as fabricated by m...Currently, the nature of self-assembly of three-dimensional epitaxial islands or quantum dots （QDs） in a lattice-mismatched heteroepitaxial growth system, such as InAs/GaAs（001） and Ge/Si（001） as fabricated by molecular beam epitaxy （MBE）, is still puzzling. The purpose of this article is to discuss how the self-assembly of InAs QDs in MBE InAs/GaAs（001） should be properly understood in atomic scale. First, the conventional kinetic theories that have traditionally been used to interpret QD self-assembly in heteroepitaxial growth with a significant lattice mismatch are reviewed briefly by examining the literature of the past two decades. Second, based on their own experimental data, the authors point out that InAs QD self-assembly can proceed in distinctly different kinetic ways depending on the growth conditions and so cannot be framed within a universal kinetic theory, and, furthermore, that the process may be transient, or the time required for a QD to grow to maturity may be significantly short, which is obviously inconsistent with conventional kinetic the- ories. Third, the authors point out that, in all of these conventional theories, two well-established experimental observations have been overlooked： i） A large number of ＂floating＂ indium atoms are present on the growing surface in MBE InAs/GaAs（001）; ii） an elastically strained InAs film on the GaAs（001） substrate should be mechanically unstable. These two well-established experimental facts may be highly relevant and should be taken into account in interpreting InAs QD formation. Finally, the authors speculate that the formation of an InAs QD is more likely to be a collective event involving a large number of both indium and arsenic atoms simultaneously or, alternatively, a morphological/structural transformation in which a single atomic InAs sheet is transformed into a three-dimensional InAs island, accompanied by the rehybridization from the sp2-bonded to sp3- bonded atomic configuration of both indium and arsenic elements in the heteroepitaxial growth system.展开更多
The first operation of an electrically pumped 1.3μm InAs/GaAs quantum-dot laser was previously reported epitaxially grown on Si （100） substrate. Here the direct epitaxial growth condition of 1.3μm InAs/OaAs quantu...The first operation of an electrically pumped 1.3μm InAs/GaAs quantum-dot laser was previously reported epitaxially grown on Si （100） substrate. Here the direct epitaxial growth condition of 1.3μm InAs/OaAs quantum on a Si substrate is further investigated using atomic force microscopy, etch pit density and temperature-dependent photoluminescence （PL） measurements. The PL for Si-based InAs/GaAs quantum dots appears to be very sensitive to the initial OaAs nucleation temperature and thickness with strongest room-temperature emission at 40000 （17Onto nucleation layer thickness）, due to the lower density of defects generated under this growth condition, and stronger carrier confinement within the quantum dots.展开更多
The threading dislocations(TDs)in GaAs/Si epitaxial layers due to the lattice mismatch seriously degrade the performance of the lasers grown on silicon.The insertion of InAs quantum dots(QDs)acting as dislocation filt...The threading dislocations(TDs)in GaAs/Si epitaxial layers due to the lattice mismatch seriously degrade the performance of the lasers grown on silicon.The insertion of InAs quantum dots(QDs)acting as dislocation filters is a pretty good alternative to solving this problem.In this paper,a finite element method(FEM)is proposed to calculate the critical condition for InAs/GaAs QDs bending TDs into interfacial misfit dislocations(MDs).Making a comparison of elastic strain energy between the two isolated systems,a reasonable result is obtained.The effect of the cap layer thickness and the base width of QDs on TD bending are studied,and the results show that the bending area ratio of single QD(the bending area divided by the area of the QD base)is evidently affected by the two factors.Moreover,we present a method to evaluate the bending capability of single-layer QDs and multi-layer QDs.For the QD with 24-nm base width and 5-nm cap layer thickness,taking the QD density of 10^(11) cm^(-2) into account,the bending area ratio of single-layer QDs(the area of bending TD divided by the area of QD layer)is about 38.71%.With inserting five-layer InAs QDs,the TD density decreases by 91.35%.The results offer the guidelines for designing the QD dislocation filters and provide an important step towards realizing the photonic integration circuits on silicon.展开更多
Photoluminescence （PL） and lasing properties of InAs/GaAs quantum dots （QDs） with different growth procedures prepared by metalorganic chemical vapour deposition are studied. PL measurements show that the low grow...Photoluminescence （PL） and lasing properties of InAs/GaAs quantum dots （QDs） with different growth procedures prepared by metalorganic chemical vapour deposition are studied. PL measurements show that the low growth rate QD sample has a larger PL intensity and a narrower PL line width than the high growth rate sample. During rapid thermal annealing, however, the low growth rate sample shows a greater blueshift of PL peak wavelength. This is caused by the larger InAs layer thickness which results from the larger 2-3 dimensional transition critical layer thickness for the QDs in the low-growth-rate sample. A growth technique including growth interruption and in-situ annealing, named indium flush method, is used during the growth of GaAs cap layer, which can flatten the GaAs surface effectively. Though the method results in a blueshift of PL peak wavelength and a broadening of PL line width, it is essential for the fabrication of room temperature working QD lasers.展开更多
The time-resolved photoluminescence and steady photoluminescence (TRPL and PL) spectra on self-assembled InAs/GaAs quantum dots (QDs) are investigated. By depositing GaAs/InAs short period superlattices (SLs), 1.48μm...The time-resolved photoluminescence and steady photoluminescence (TRPL and PL) spectra on self-assembled InAs/GaAs quantum dots (QDs) are investigated. By depositing GaAs/InAs short period superlattices (SLs), 1.48μm emission is obtained at room temperature. Temperature dependent PL measurements show that the PL intensity of the emission is very steady. It decays only to half as the temperature increases from 15K to room temperature, while at the same time, the intensity of the other emission decreases by a factor of 5 orders of magnitude. These two emissions are attributed to large-size QDs and short period superlattices (SLs), respectively. Large-size QDs are easier to capture and confine carriers, which benefits the lifetime of PL, and therefore makes the emission intensity insensitive to the temperature.展开更多
The self-assembled growth of InAs/GaAs quantum dots by molecular beam epitaxy is conducted by optimizing several growth parameters, using a one-step interruption method after island formation. The dependence of photol...The self-assembled growth of InAs/GaAs quantum dots by molecular beam epitaxy is conducted by optimizing several growth parameters, using a one-step interruption method after island formation. The dependence of photoluminescence on areal quantum-dot density is systematically investigated as a function of InAs deposition, growth temperature and arsenic pressure. The results of this investigation along with time-resolved photoluminescence measurements show that the com- bination of a growth temperature of 490℃, with a deposition rate of 0.02 ML/s, under an arsenic pressure of 1×10^-6 Torr （1 Torr = 1.33322×10^2 Pa）, provides the best compromise between high density and the photoluminescence of quantum dot structure, with a radiative lifetime of 780 ps. The applicability of this 5-layer quantum dot structure to high-repetition-rate pulsed lasers is demonstrated with the fabrication and characterization of a monolithic InAs/GaAs quantum-dot passively mode-locked laser operating at nearly 1300 nm. Picosecond pulse generation is achieved from a two-section laser, with a 19.7-GHz repetition rate.展开更多
We demonstrate high-performance broadband tunable external-cavity lasers(ECLs) with the metal-organic chemical vapor deposition(MOCVD) grown In As/In P quantum dots(QDs) structures. Without cavity facet coatings, the ...We demonstrate high-performance broadband tunable external-cavity lasers(ECLs) with the metal-organic chemical vapor deposition(MOCVD) grown In As/In P quantum dots(QDs) structures. Without cavity facet coatings, the 3-d B spectral bandwidth of the Fabry–Perot(FP) laser is approximately 10.8 nm, while the tuning bandwidth of ECLs is 45 nm.Combined with the anti-reflection(AR)/high-reflection(HR) facet coating, a 92 nm bandwidth tuning range has been obtained with the wavelength covering from 1414 nm to 1506 nm. In most of the tuning range, the threshold current density is lower than 1.5 k A/cm2. The maximum output power of 6.5 m W was achieved under a 500 m A injection current.All achievements mentioned above were obtained under continuous-wave(CW) mode at room temperature(RT).展开更多
Here we report 1.3μm electrical injection lasers based on InAs/GaAs quantum dots(QDs)grown on a GaAs substrate,which can steadily work at 110-℃without visible degradation.The QD structure is designed by applying the...Here we report 1.3μm electrical injection lasers based on InAs/GaAs quantum dots(QDs)grown on a GaAs substrate,which can steadily work at 110-℃without visible degradation.The QD structure is designed by applying the Stranski-Krastanow growth mode in solid source molecular beam epitaxy.The density of InAs QDs in the active region is increased from 3.8×10^(10)cm^(-2)to 5.9×10^(10)cm^(-2).As regards laser performance,the maximum output power of devices with lowdensity QDs as the active region is 65 m W at room temperature,and that of devices with the high-density QDs is 103 mW.Meanwhile the output power of high-density devices is 131 mW under an injection current of 4 A at 110-℃.展开更多
Silicon photonics(SiPh)technology has become a key platform for developing photonic integrated circuits due to its CMOS compatibility and scalable manufacturing.However,integrating efficient on-chip optical sources an...Silicon photonics(SiPh)technology has become a key platform for developing photonic integrated circuits due to its CMOS compatibility and scalable manufacturing.However,integrating efficient on-chip optical sources and in-line amplifiers remains challenging due to silicon’s indirect bandgap.In this study,we developed prefabricated standardized InAs/GaAs quantum-dot(QD)active devices optimized for micro-transfer printing and successfully integrated them on SiPh integrated circuits.By transfer-printing standardized QD devices onto specific regions of the SiPh chip,we realized O-band semiconductor optical amplifiers(SOAs),distributed feedback(DFB)lasers,and widely tunable lasers(TLs).The SOAs reached an on-chip gain of 7.5 dB at 1299 nm and maintained stable performance across a wide input power range.The integrated DFB lasers achieved waveguide(WG)-coupled output powers of up to 19.7 mW,with a side-mode suppression ratio(SMSR)of 33.3 dB,and demonstrated notable robustness against optical feedback,supporting error-free data rates of 30 Gbps without additional isolators.Meanwhile,the TLs demonstrated a wavelength tuning range exceeding 35 nm,and a WG-coupled output power greater than 3 m W.The micro-transfer printing approach effectively decouples the fabrication of non-native devices from the SiPh process,allowing back-end integration of the Ⅲ–Ⅴ devices.Our approach offers a viable path toward fully integrated Ⅲ–Ⅴ/ SiPh platforms capable of supporting high-speed,high-capacity communication.展开更多
Molecular beam epitaxy growth of a bilayer stacked InAs/GaAs quantum dot structure on a pure GaAs matrix has been systemically investigated.The influence of growth temperature and the InAs deposition of both layers on...Molecular beam epitaxy growth of a bilayer stacked InAs/GaAs quantum dot structure on a pure GaAs matrix has been systemically investigated.The influence of growth temperature and the InAs deposition of both layers on the optical properties and morphologies of the bilayer quantum dot（BQD） structures is discussed.By optimizing the growth parameters,InAs BQD emission at 1.436μm at room temperature with a narrower FWHM of 27 meV was demonstrated.The density of QDs in the second layer is around 9×10~9 to 1.4×10^（10） cm^（-2）. The BQD structure provides a useful way to extend the emission wavelength of GaAs-based material for quantum functional devices.展开更多
The self-assembled InAs/GaAs quantum dots （QDs） with extremely low density of 8× 10^6 cm^-2 are achieved using higher growth temperature and lower InAs coverage by low-pressure metal-organic chemical vapour dep...The self-assembled InAs/GaAs quantum dots （QDs） with extremely low density of 8× 10^6 cm^-2 are achieved using higher growth temperature and lower InAs coverage by low-pressure metal-organic chemical vapour deposition （MOVCD）. As a result of micro-photoluminescence （micro-PL）, for extremely low density of 8 × 10^6 cm^-2 InAs QDs in the micro-PL measurements at 10 K, only one emission peak has been achieved. It is believed that the InAs QDs have a good potential to realize single photon sources.展开更多
We investigate InAs/GaAs quantum dot （QD） lasers grown by gas source molecular beam epitaxy with different growth temperatures for InAs dot layers. The same laser structures are grown, but the growth temperatures of...We investigate InAs/GaAs quantum dot （QD） lasers grown by gas source molecular beam epitaxy with different growth temperatures for InAs dot layers. The same laser structures are grown, but the growth temperatures of InAs dot layers are set as 425 and 500℃, respectively. Ridge waveguide laser diodes are fabricated, and the characteristics of the QD lasers are systematically studied. The laser diodes with QDs grown at 425 ~C show better performance, such as threshold current density, output power, internal quantum efficiency, and characteristic temperature, than those with QDs grown at 500℃. This finding is ascribed to the higher QD density and more uniform size distribution of QDs achieved at 425℃.展开更多
We report the direct observation of coupling between a single self-assembled InAs quantum dot and a wetting layer, based on strong diamagnetic shifts of many-body exciton states using magneto-photoluminescence spectro...We report the direct observation of coupling between a single self-assembled InAs quantum dot and a wetting layer, based on strong diamagnetic shifts of many-body exciton states using magneto-photoluminescence spectroscopy. An extremely large positive diamagnetic coefficient is observed when an electron in the wetting layer combines with a hole in the quantum dot; the coefficient is nearly one order of magnitude larger than that of the exciton states confined in the quantum dots. Recombination of electrons with holes in a quantum dot of the coupled system leads to an unusual negative diamagnetic effect, which is five times stronger than that in a pure quantum dot system. This effect can be attributed to the expansion of the wavefunction of remaining electrons in the wetting layer or the spread of electrons in the excited states of the quantum dot to the wetting layer after recombination. In this case, the wavefunction extent of the final states in the quantum dot plane is much larger than that of the initial states because of the absence of holes in the quantum dot to attract electrons. The properties of emitted photons that depend on the large electron wavefunction extents in the wetting layer indicate that the coupling occurs between systems of different dimensionality, which is also verified from the results obtained by applying a magnetic field in different configurations. This study paves a new way to observe hybrid states with zero- and two-dimensional structures, which could be useful for investigating the Kondo physics and implementing spin-based solid-state quantum information processing.展开更多
基金Project supported by the National Basic Research Program of China(Grant No.2014CB921003)the National Natural Science Foundation of China(Grant Nos.11721404,51761145104,and 61675228)+1 种基金the Strategic Priority Research Program of the Chinese Academy of Sciences(Grant Nos.XDB07030200 and XDPB0803)the CAS Interdisciplinary Innovation Team
文摘Semiconductor quantum dots have been intensively investigated because of their fundamental role in solid-state quan- tum information processing. The energy levels of quantum dots are quantized and can be tuned by external field such as optical, electric, and magnetic field. In this review, we focus on the development of magneto-optical properties of single InAs quantum dots embedded in GaAs matrix, including charge injection, relaxation, tunneling, wavefunction distribution, and coupling between different dimensional materials. Finally, the perspective of coherent manipulation of quantum state of single self-assembled quantum dots by photocurrent spectroscopy with an applied magnetic field is discussed.
文摘The effcts of various InGaAs layers on the structural and optical properties of InAs self-assembled quantum dots（ QDs ） grown by molecular-beam epitaxy （MBE） were investigated. The emission wavelength of 1317 nm was obtained by embedding InAs QDs in InGaAs / GaAs quantum well. The temperature-dependent and time-resolved photoluminescence （ TDPL and TRPL ） were used to study the dynomic characteristics of carriers. InGaAs cap layer may improve the quality of quantum dots for the strain relaxation around QDs, which results in a stronger PL inteasity and an increase of PL peak lifetime up to 170 K. We found that InGaAs buffer layer may reduce the PL peak lifetime of InAs QDs, which is due to the buffer layer accelerating the carrier migration. The results also show that InGaAs cap layer can increase the temperature point when the thermal reemission and nonradiative recombination contribute significantly to the carrier dynamics.
文摘WT8.BZ]The effects of postgrowth rapid thermal annealing have been studied on the optical properties of 3-nm-height InAs/GaAs quantum dots covered by 3-nm-thick In xGa 1-x As (x=0,0 1 and 0 2) overgrowth layer.At a higher annealing temperature (T≥750℃),the photoluminescence peak of InGaAs layer has been observed at the lower-energy side of InAs quantum-dot peak.In addition,a similar blueshift in photoluminescence (PL) emission energy is observed for all samples when the annealing temperature increases from 650 to 850℃.However,the trend of photoluminescence linewidth towards narrowing is totally different for InAs quantum dots with different In mole fraction in InGaAs overgrowth layer.The results suggest that the intermixing in the lateral direction plays an important role in obtaining a better understanding of the modification of optical properties induced by the rapid thermal annealing.
文摘The growth parameters affecting the deposition of self-assembled InAs quantum dots （QDs） on GaAs substrate by low-pressure metal-organic chemical vapor deposition （MOCVD） are reported. The low-density InAs QDs （- 5 × 10^8cm^-2） are achieved using high growth temperature and low InAs coverage. Photoluminescence （PL） measurements show the good optical quality of low-density QDs. At room temperature, the ground state peak wavelength of PL spectrum and full-width at half-maximum （FWHM） are 1361 nm and 23 meV （35 nm）, respectively, which are obtained as the GaAs capping layer grown using triethylgallium （TEG） and tertiallybutylarsine （TBA）. The PL spectra exhibit three emission peaks at 1361, 1280, and 1204 nm, which correspond to the ground state, the first excited state, and the second excited state of the ODs, respectively.
基金The work was supported by the National Basic Research Program of China （Grant No. 2006CB604904） and the National Natural Science Foundation of China （Grant Nos. 61274072, 60976057, 60876086 and 60776037）.
文摘Currently, the nature of self-assembly of three-dimensional epitaxial islands or quantum dots （QDs） in a lattice-mismatched heteroepitaxial growth system, such as InAs/GaAs（001） and Ge/Si（001） as fabricated by molecular beam epitaxy （MBE）, is still puzzling. The purpose of this article is to discuss how the self-assembly of InAs QDs in MBE InAs/GaAs（001） should be properly understood in atomic scale. First, the conventional kinetic theories that have traditionally been used to interpret QD self-assembly in heteroepitaxial growth with a significant lattice mismatch are reviewed briefly by examining the literature of the past two decades. Second, based on their own experimental data, the authors point out that InAs QD self-assembly can proceed in distinctly different kinetic ways depending on the growth conditions and so cannot be framed within a universal kinetic theory, and, furthermore, that the process may be transient, or the time required for a QD to grow to maturity may be significantly short, which is obviously inconsistent with conventional kinetic the- ories. Third, the authors point out that, in all of these conventional theories, two well-established experimental observations have been overlooked： i） A large number of ＂floating＂ indium atoms are present on the growing surface in MBE InAs/GaAs（001）; ii） an elastically strained InAs film on the GaAs（001） substrate should be mechanically unstable. These two well-established experimental facts may be highly relevant and should be taken into account in interpreting InAs QD formation. Finally, the authors speculate that the formation of an InAs QD is more likely to be a collective event involving a large number of both indium and arsenic atoms simultaneously or, alternatively, a morphological/structural transformation in which a single atomic InAs sheet is transformed into a three-dimensional InAs island, accompanied by the rehybridization from the sp2-bonded to sp3- bonded atomic configuration of both indium and arsenic elements in the heteroepitaxial growth system.
基金Supported by the National Natural Science Foundation of China under Grant Nos 11434010,11574356 and 11504415the Funds from the Royal Society,the Defense Science Technology Laboratory and UK Engineering and Physics Research Council
文摘The first operation of an electrically pumped 1.3μm InAs/GaAs quantum-dot laser was previously reported epitaxially grown on Si （100） substrate. Here the direct epitaxial growth condition of 1.3μm InAs/OaAs quantum on a Si substrate is further investigated using atomic force microscopy, etch pit density and temperature-dependent photoluminescence （PL） measurements. The PL for Si-based InAs/GaAs quantum dots appears to be very sensitive to the initial OaAs nucleation temperature and thickness with strongest room-temperature emission at 40000 （17Onto nucleation layer thickness）, due to the lower density of defects generated under this growth condition, and stronger carrier confinement within the quantum dots.
基金Project supported by the National Natural Science Foundation of China(Grant Nos.61874148,61974141,and 61674020)the Beijing Natural Science Foundation,China(Grant No.4192043)+3 种基金the National Key Research and Development Program of China(Grant No.2018YFB2200104)the Fund from the Beijing Municipal Science&Technology Commission,China(Grant No.Z191100004819012)the Project of the State Key Laboratory of Information Photonics and Optical Communications,Beijing University of Posts and Telecommunications,China(Grant No.IPOC2018ZT01)the 111 Project of China(Grant No.B07005).
文摘The threading dislocations(TDs)in GaAs/Si epitaxial layers due to the lattice mismatch seriously degrade the performance of the lasers grown on silicon.The insertion of InAs quantum dots(QDs)acting as dislocation filters is a pretty good alternative to solving this problem.In this paper,a finite element method(FEM)is proposed to calculate the critical condition for InAs/GaAs QDs bending TDs into interfacial misfit dislocations(MDs).Making a comparison of elastic strain energy between the two isolated systems,a reasonable result is obtained.The effect of the cap layer thickness and the base width of QDs on TD bending are studied,and the results show that the bending area ratio of single QD(the bending area divided by the area of the QD base)is evidently affected by the two factors.Moreover,we present a method to evaluate the bending capability of single-layer QDs and multi-layer QDs.For the QD with 24-nm base width and 5-nm cap layer thickness,taking the QD density of 10^(11) cm^(-2) into account,the bending area ratio of single-layer QDs(the area of bending TD divided by the area of QD layer)is about 38.71%.With inserting five-layer InAs QDs,the TD density decreases by 91.35%.The results offer the guidelines for designing the QD dislocation filters and provide an important step towards realizing the photonic integration circuits on silicon.
基金Project supported by the National Natural Science Foundation of China (Grant Nos 60706009, 90401025, 60736036, 60777021 and60476009)the National Key Basic Research Program of China (Grant Nos 2006CB604901 and 2006CB604902)the National High Technology Research and Development Program of China (Grant Nos 2006AA01Z256, 2007AA03Z419 and 2007AA03Z417)
文摘Photoluminescence （PL） and lasing properties of InAs/GaAs quantum dots （QDs） with different growth procedures prepared by metalorganic chemical vapour deposition are studied. PL measurements show that the low growth rate QD sample has a larger PL intensity and a narrower PL line width than the high growth rate sample. During rapid thermal annealing, however, the low growth rate sample shows a greater blueshift of PL peak wavelength. This is caused by the larger InAs layer thickness which results from the larger 2-3 dimensional transition critical layer thickness for the QDs in the low-growth-rate sample. A growth technique including growth interruption and in-situ annealing, named indium flush method, is used during the growth of GaAs cap layer, which can flatten the GaAs surface effectively. Though the method results in a blueshift of PL peak wavelength and a broadening of PL line width, it is essential for the fabrication of room temperature working QD lasers.
基金Natural Science Foundation of Fujian Province(A992001)
文摘The time-resolved photoluminescence and steady photoluminescence (TRPL and PL) spectra on self-assembled InAs/GaAs quantum dots (QDs) are investigated. By depositing GaAs/InAs short period superlattices (SLs), 1.48μm emission is obtained at room temperature. Temperature dependent PL measurements show that the PL intensity of the emission is very steady. It decays only to half as the temperature increases from 15K to room temperature, while at the same time, the intensity of the other emission decreases by a factor of 5 orders of magnitude. These two emissions are attributed to large-size QDs and short period superlattices (SLs), respectively. Large-size QDs are easier to capture and confine carriers, which benefits the lifetime of PL, and therefore makes the emission intensity insensitive to the temperature.
基金Project supported by the Natural Science Foundation of Beijing,China (Grant No.4112060)the Special Foundation for National Key Scientific Instrument,China (Grant No.2012YQ140005)+5 种基金the Open Fund of High Power Laser Laboratory,China Academy of Engineering Physics (Grant No.2013HEL03)the National Natural Science Foundation of China (Grant No.61274125)the National Basic Research Program,China (Grant No.2010CB327601)the State Key Laboratory on Integrated Optoelectronics Open Project,China (Grant No.2011KFB002)financially supported by a Marie Curie International Incoming Fellowship within the 7th European Community Framework Programmethe financial support through a Royal Academy of Engineering/EPSRC Research Fellowship
文摘The self-assembled growth of InAs/GaAs quantum dots by molecular beam epitaxy is conducted by optimizing several growth parameters, using a one-step interruption method after island formation. The dependence of photoluminescence on areal quantum-dot density is systematically investigated as a function of InAs deposition, growth temperature and arsenic pressure. The results of this investigation along with time-resolved photoluminescence measurements show that the com- bination of a growth temperature of 490℃, with a deposition rate of 0.02 ML/s, under an arsenic pressure of 1×10^-6 Torr （1 Torr = 1.33322×10^2 Pa）, provides the best compromise between high density and the photoluminescence of quantum dot structure, with a radiative lifetime of 780 ps. The applicability of this 5-layer quantum dot structure to high-repetition-rate pulsed lasers is demonstrated with the fabrication and characterization of a monolithic InAs/GaAs quantum-dot passively mode-locked laser operating at nearly 1300 nm. Picosecond pulse generation is achieved from a two-section laser, with a 19.7-GHz repetition rate.
基金Project supported by the National Natural Science Foundation of China(Grant No.61974141)Tianjin Municipal Science and Technology BureauScience and Technology Innovation Bureau of China-Singapore Tianjin Eco-City。
文摘We demonstrate high-performance broadband tunable external-cavity lasers(ECLs) with the metal-organic chemical vapor deposition(MOCVD) grown In As/In P quantum dots(QDs) structures. Without cavity facet coatings, the 3-d B spectral bandwidth of the Fabry–Perot(FP) laser is approximately 10.8 nm, while the tuning bandwidth of ECLs is 45 nm.Combined with the anti-reflection(AR)/high-reflection(HR) facet coating, a 92 nm bandwidth tuning range has been obtained with the wavelength covering from 1414 nm to 1506 nm. In most of the tuning range, the threshold current density is lower than 1.5 k A/cm2. The maximum output power of 6.5 m W was achieved under a 500 m A injection current.All achievements mentioned above were obtained under continuous-wave(CW) mode at room temperature(RT).
基金the Science and Technology Program of Guangzhou(Grant No.202103030001)the KeyArea Research and Development Program of Guangdong Province(Grant No.2018B030329001)+8 种基金the National Natural Science Foundation of China(Grant Nos.62035017,61505196,and 62204238)the Scientific Instrument Developing Project of the Chinese Academy of Sciences(Grant No.YJKYYQ20170032)the Major Program of the National Natural Science Foundation of China(Grant Nos.61790580 and 61790581)the Chinese Academy of Sciences and Changchun City Science and Technology Innovation Cooperation Project(Grant No.21SH06)Jincheng Key Research and Development Project(Grant No.20210209)the Key R&D Program of Shanxi Province(Grant No.202102030201004)the R&D Program of Guangdong Province(Grant Nos.2018B030329001 and2020B0303020001)Shenzhen Technology Research Project(Grant No.JSGG20201102145200001)the National Key Technologies R&D Program of China(Grant No.2018YFA0306100)。
文摘Here we report 1.3μm electrical injection lasers based on InAs/GaAs quantum dots(QDs)grown on a GaAs substrate,which can steadily work at 110-℃without visible degradation.The QD structure is designed by applying the Stranski-Krastanow growth mode in solid source molecular beam epitaxy.The density of InAs QDs in the active region is increased from 3.8×10^(10)cm^(-2)to 5.9×10^(10)cm^(-2).As regards laser performance,the maximum output power of devices with lowdensity QDs as the active region is 65 m W at room temperature,and that of devices with the high-density QDs is 103 mW.Meanwhile the output power of high-density devices is 131 mW under an injection current of 4 A at 110-℃.
基金European Union(CALADAN)(825453)Dutch Growth Fund PhotonDelta project。
文摘Silicon photonics(SiPh)technology has become a key platform for developing photonic integrated circuits due to its CMOS compatibility and scalable manufacturing.However,integrating efficient on-chip optical sources and in-line amplifiers remains challenging due to silicon’s indirect bandgap.In this study,we developed prefabricated standardized InAs/GaAs quantum-dot(QD)active devices optimized for micro-transfer printing and successfully integrated them on SiPh integrated circuits.By transfer-printing standardized QD devices onto specific regions of the SiPh chip,we realized O-band semiconductor optical amplifiers(SOAs),distributed feedback(DFB)lasers,and widely tunable lasers(TLs).The SOAs reached an on-chip gain of 7.5 dB at 1299 nm and maintained stable performance across a wide input power range.The integrated DFB lasers achieved waveguide(WG)-coupled output powers of up to 19.7 mW,with a side-mode suppression ratio(SMSR)of 33.3 dB,and demonstrated notable robustness against optical feedback,supporting error-free data rates of 30 Gbps without additional isolators.Meanwhile,the TLs demonstrated a wavelength tuning range exceeding 35 nm,and a WG-coupled output power greater than 3 m W.The micro-transfer printing approach effectively decouples the fabrication of non-native devices from the SiPh process,allowing back-end integration of the Ⅲ–Ⅴ devices.Our approach offers a viable path toward fully integrated Ⅲ–Ⅴ/ SiPh platforms capable of supporting high-speed,high-capacity communication.
基金Project supported by the National Natural Science Foundation of China(Nos.10734060,90921015)the National Basic Research Program of China(Nos.2007CB936304,2010CB327601)
文摘Molecular beam epitaxy growth of a bilayer stacked InAs/GaAs quantum dot structure on a pure GaAs matrix has been systemically investigated.The influence of growth temperature and the InAs deposition of both layers on the optical properties and morphologies of the bilayer quantum dot（BQD） structures is discussed.By optimizing the growth parameters,InAs BQD emission at 1.436μm at room temperature with a narrower FWHM of 27 meV was demonstrated.The density of QDs in the second layer is around 9×10~9 to 1.4×10^（10） cm^（-2）. The BQD structure provides a useful way to extend the emission wavelength of GaAs-based material for quantum functional devices.
文摘The self-assembled InAs/GaAs quantum dots （QDs） with extremely low density of 8× 10^6 cm^-2 are achieved using higher growth temperature and lower InAs coverage by low-pressure metal-organic chemical vapour deposition （MOVCD）. As a result of micro-photoluminescence （micro-PL）, for extremely low density of 8 × 10^6 cm^-2 InAs QDs in the micro-PL measurements at 10 K, only one emission peak has been achieved. It is believed that the InAs QDs have a good potential to realize single photon sources.
基金supported by the National Natural Foundation of China (Nos. 61021064,61176065,10990103,and 61204058)the National Basic Research Program of China (No. 2011CB921201)
文摘We investigate InAs/GaAs quantum dot （QD） lasers grown by gas source molecular beam epitaxy with different growth temperatures for InAs dot layers. The same laser structures are grown, but the growth temperatures of InAs dot layers are set as 425 and 500℃, respectively. Ridge waveguide laser diodes are fabricated, and the characteristics of the QD lasers are systematically studied. The laser diodes with QDs grown at 425 ~C show better performance, such as threshold current density, output power, internal quantum efficiency, and characteristic temperature, than those with QDs grown at 500℃. This finding is ascribed to the higher QD density and more uniform size distribution of QDs achieved at 425℃.
基金This work was supported by the National Basic Research Program of China （Nos. 2013CB328706 and 2014CB921003）, the National Natural Science Foundation of China （Nos. 91436101, 11174356, and 61275060）, the Strategic Priority Research Program of the Chinese Academy of Sciences （No. XDB07030200）, and the 100 Talents Program of Chinese Academy of Sciences. We thank Jean-Pierre Leburton for helpful discussions.
文摘We report the direct observation of coupling between a single self-assembled InAs quantum dot and a wetting layer, based on strong diamagnetic shifts of many-body exciton states using magneto-photoluminescence spectroscopy. An extremely large positive diamagnetic coefficient is observed when an electron in the wetting layer combines with a hole in the quantum dot; the coefficient is nearly one order of magnitude larger than that of the exciton states confined in the quantum dots. Recombination of electrons with holes in a quantum dot of the coupled system leads to an unusual negative diamagnetic effect, which is five times stronger than that in a pure quantum dot system. This effect can be attributed to the expansion of the wavefunction of remaining electrons in the wetting layer or the spread of electrons in the excited states of the quantum dot to the wetting layer after recombination. In this case, the wavefunction extent of the final states in the quantum dot plane is much larger than that of the initial states because of the absence of holes in the quantum dot to attract electrons. The properties of emitted photons that depend on the large electron wavefunction extents in the wetting layer indicate that the coupling occurs between systems of different dimensionality, which is also verified from the results obtained by applying a magnetic field in different configurations. This study paves a new way to observe hybrid states with zero- and two-dimensional structures, which could be useful for investigating the Kondo physics and implementing spin-based solid-state quantum information processing.
