The in-plane optical anisotropy(IPOA) of c-plane In Ga N/Ga N quantum disks(Qdisks) in nanowires grown on MoS_(2)/Mo and Ti/Mo substrates is investigated using reflectance difference spectroscopy(RDS) at room temperat...The in-plane optical anisotropy(IPOA) of c-plane In Ga N/Ga N quantum disks(Qdisks) in nanowires grown on MoS_(2)/Mo and Ti/Mo substrates is investigated using reflectance difference spectroscopy(RDS) at room temperature. A large IPOA related to defect or impurity states is observed. The IPOA of samples grown on MoS_(2)/Mo is approximately one order of magnitude larger than that of samples grown on Ti/Mo substrates. Numerical calculations based on the envelope function approximation have been performed to analyze the origin of the IPOA. It is found that the IPOA primarily results from the segregation of indium atoms in the In Ga N/Ga N Qdisks. This work highlights the significant influence of substrate materials on the IPOA of semiconductor heterostructures.展开更多
利用 LP- MOCVD技术在 Ga As( 0 0 1 )衬底上生长了高质量的立方相 In Ga N外延层 .研究了生长速率对 In Ga N质量的影响 ,提出一个简单模型解释了在改变 TEGa流量条件下出现的In组分的变化规律 ,实验结果与模型的一次项拟合结果较为吻...利用 LP- MOCVD技术在 Ga As( 0 0 1 )衬底上生长了高质量的立方相 In Ga N外延层 .研究了生长速率对 In Ga N质量的影响 ,提出一个简单模型解释了在改变 TEGa流量条件下出现的In组分的变化规律 ,实验结果与模型的一次项拟合结果较为吻合 ,由此推断 ,在现在的生长条件下 ,表面单个 Ga原子作为临界晶核吸附 Ga或 In原子实现生长的模型与实际情况较为接近 .对于晶体质量的变化也给予了说明 .得到的高质量立方相 In Ga N室温下有很强的发光峰 ,光致发光峰半高宽为 1 2 8me V左右 .展开更多
基金Project supported by the National Natural Science Foundation of China (Grant Nos. 62074036, 61674038, and 11574302)Foreign Cooperation Project of Fujian Province (Grant No. 2023I0005)+2 种基金Open Research Fund Program of the State Key Laboratory of Low-Dimensional Quantum Physics (Grant No. KF202108)the National Key Research and Development Program (Grant No. 2016YFB0402303)the Foundation of Fujian Provincial Department of Industry and Information Technology of China (Grant No. 82318075)。
文摘The in-plane optical anisotropy(IPOA) of c-plane In Ga N/Ga N quantum disks(Qdisks) in nanowires grown on MoS_(2)/Mo and Ti/Mo substrates is investigated using reflectance difference spectroscopy(RDS) at room temperature. A large IPOA related to defect or impurity states is observed. The IPOA of samples grown on MoS_(2)/Mo is approximately one order of magnitude larger than that of samples grown on Ti/Mo substrates. Numerical calculations based on the envelope function approximation have been performed to analyze the origin of the IPOA. It is found that the IPOA primarily results from the segregation of indium atoms in the In Ga N/Ga N Qdisks. This work highlights the significant influence of substrate materials on the IPOA of semiconductor heterostructures.
文摘为了得到高性能的 Ga N基发光器件 ,有源层采用 MOCVD技术和表面应力的不均匀性诱导方法生长了 In-Ga N量子点 ,并通过原子力显微镜 (AFM)、透射电子显微镜 (TEM)和光致发光 (PL )谱对其微观形貌和光学性质进行了观察和研究 .AFM和 TEM观察结果表明 :In Ga N/ Ga N为平均直径约 30 nm,高度约 2 5 nm的圆锥 ;In Ga N量子点主要集中在圆锥形的顶部 ,其密度达到 5 .6× 10 1 0 cm- 2 .室温下 ,In Ga N量子点材料 PL谱强度大大超出相同生长时间的 In Ga N薄膜材料 ,这说明 In Ga N量子点有望作为高性能有源层材料应用于 Ga N基发光器件 .
