Experiment on quantum well intermixing (QWI) of InGaAsP QWs by impurity free vacancy diffusion (IFVD) using SiO 2 encapsulation is reported.A maximum band gap wavelength blue shift as large as 200nm is realized.Furt...Experiment on quantum well intermixing (QWI) of InGaAsP QWs by impurity free vacancy diffusion (IFVD) using SiO 2 encapsulation is reported.A maximum band gap wavelength blue shift as large as 200nm is realized.Furthermore,an FP laser blue shifted 21nm by QWI is fabricated with characteristics comparable with the as grown one.展开更多
报道了采用不同的电介质薄膜 Si O2 、Si Ox Ny、Si3N4 和 Si Ox Py Nz 及其组合用于 In Ga As P/In P多量子阱材料的包封源 .在高纯氮气保护下经 85 0℃、7s的快速退火处理 ,结果发现 :含磷组分 Si Ox Py Nz 电介质薄膜包封下的 In-Ga ...报道了采用不同的电介质薄膜 Si O2 、Si Ox Ny、Si3N4 和 Si Ox Py Nz 及其组合用于 In Ga As P/In P多量子阱材料的包封源 .在高纯氮气保护下经 85 0℃、7s的快速退火处理 ,结果发现 :含磷组分 Si Ox Py Nz 电介质薄膜包封下的 In-Ga As P/In P量子阱带隙展宽十分显著 ,高达 2 2 4 me V ,PL谱峰值波长蓝移 342 nm ,半宽较窄仅为 2 5 nm ,说明量子阱性能保持十分良好 。展开更多
文摘Experiment on quantum well intermixing (QWI) of InGaAsP QWs by impurity free vacancy diffusion (IFVD) using SiO 2 encapsulation is reported.A maximum band gap wavelength blue shift as large as 200nm is realized.Furthermore,an FP laser blue shifted 21nm by QWI is fabricated with characteristics comparable with the as grown one.