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3~10GHz SiGe HBTs超宽带低噪声放大器的设计 被引量:3
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作者 李佳 张万荣 +3 位作者 谢红云 金冬月 沈珮 甘军宁 《电子器件》 CAS 2009年第2期311-314,共4页
根据UWB(Ultra-wideband)无线通信标准,提出了一款超宽带低噪声放大器并进行了设计。该放大器选用高性能的SiGe HBTs,同时采用并联和串联多重反馈的两级结构,以达到超宽频带、高增益、低噪声系数以及良好的输入输出匹配的目的。仿真... 根据UWB(Ultra-wideband)无线通信标准,提出了一款超宽带低噪声放大器并进行了设计。该放大器选用高性能的SiGe HBTs,同时采用并联和串联多重反馈的两级结构,以达到超宽频带、高增益、低噪声系数以及良好的输入输出匹配的目的。仿真结果表明,放大器在3-10 GHz带宽内,增益S21高达21 dB,增益平坦度小于1.5 dB,噪声系数在2.4~3.3 dB之间,输入输出反射系数(S11和S22)均小于-9 dB,并且在整个频带内无条件稳定。所有结果表明该LNA性能良好。 展开更多
关键词 射频放大器 低噪声放大器 电路设计 超宽带 SIGE hbts
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AlGaN/GaN基HBTs的高频特性模拟
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作者 冉军学 王晓亮 +3 位作者 王翠梅 王军喜 曾一平 李晋闽 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2005年第z1期147-150,共4页
对n-p-n型AlGaN/GaN基HBTs的高频特性进行了模拟计算,分析了发射区、基区、集电区的一些材料参数对n-p-n型AlGaN/GaN基HBTs的高频特性的影响.发现基区的设计对频率性能影响很大,减小基区厚度、增大空穴浓度和迁移率将有效提高HBTs的频... 对n-p-n型AlGaN/GaN基HBTs的高频特性进行了模拟计算,分析了发射区、基区、集电区的一些材料参数对n-p-n型AlGaN/GaN基HBTs的高频特性的影响.发现基区的设计对频率性能影响很大,减小基区厚度、增大空穴浓度和迁移率将有效提高HBTs的频率性能. 展开更多
关键词 hbts ALGAN/GAN 截止频率 最高振荡频率
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SiGe HBTs高频特性模拟分析 被引量:5
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作者 赵立新 沈光地 《Journal of Semiconductors》 EI CAS CSCD 北大核心 1999年第6期468-475,共8页
本文详细分析了下述问题:(1)在基区厚度减薄到几十纳米后,发射区时间常数、集电区时间常数对SiGeHBTs的高频特性的影响;(2)低掺杂浓度发射区层对发射区渡越时间的影响;(3)在发射结耗尽层中,除了固定电荷因素引起... 本文详细分析了下述问题:(1)在基区厚度减薄到几十纳米后,发射区时间常数、集电区时间常数对SiGeHBTs的高频特性的影响;(2)低掺杂浓度发射区层对发射区渡越时间的影响;(3)在发射结耗尽层中,除了固定电荷因素引起的电容外,发射结正常工作加正向偏压时,由于自由载流子注入引起的EB结电容.由以上物理分析可以得出器件的有关参数,并由器件的等效电路,对器件的高频特性进行分析和模拟,对影响器件高频特性的参数进行优化. 展开更多
关键词 锗化硅 hbts 外延生长 高频特性 模拟分析
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Self-Aligned InGaP/GaAs Power HBTswith a Low Bias Voltage
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作者 郑丽萍 孙海锋 +4 位作者 狄浩成 樊宇伟 王素琴 刘新宇 吴德馨 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2004年第8期908-912,共5页
A self aligned InGaP/GaAs power HBTs for L band power amplifier with low bias voltage are described.Base emitter metal self aligning,air bridge,and wafer thinning are used to improve microwave power performance.A... A self aligned InGaP/GaAs power HBTs for L band power amplifier with low bias voltage are described.Base emitter metal self aligning,air bridge,and wafer thinning are used to improve microwave power performance.A power HBT with double size of emitter of (3μm×15μm)×12 is fabricated.When the packaged HBT operates in class AB at a collector bias of 3V,a maximum 23dBm output power with 45% power added efficiency is achieved at 2GHz.The results show that the InGaP/GaAs power HBTs have great potential in mobile communication systems operating at low bias voltage. 展开更多
关键词 self aligned INGAP power hbts low bias voltage
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Ultra High-Speed InP/InGaAs SHBTs with f_t of 210GHz 被引量:1
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作者 程伟 金智 +3 位作者 刘新宇 于进勇 徐安怀 齐鸣 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2008年第3期414-417,共4页
PolYimide passivation and planarization process techniques for high speed InP/InGaAs single heterojunction bipolar transistors (SHBTS) are developed. A maximum extrapolated ft of 210GHz is achieved for the SHBT with... PolYimide passivation and planarization process techniques for high speed InP/InGaAs single heterojunction bipolar transistors (SHBTS) are developed. A maximum extrapolated ft of 210GHz is achieved for the SHBT with 1.4μm × 15μm emitter area at VCE = 1. 1V and Ic = 33.5mA. This device is suitable for high speed and low power applications,such as ultra high speed mixed signal circuits and optoelectronic communication ICs. 展开更多
关键词 INP HBT POLYIMIDE PLANARIZATION
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Thermal resistance matrix representation of thermal effects and thermal design of microwave power HBTs with two-dimensional array layout 被引量:2
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作者 Rui Chen Dong-Yue Jin +5 位作者 Wan-Rong Zhang Li-Fan Wang Bin Guo Hu Chen Ling-Han Yin Xiao-Xue Jia 《Chinese Physics B》 SCIE EI CAS CSCD 2019年第9期373-380,共8页
Based on the thermal network of the two-dimensional heterojunction bipolar transistors(HBTs) array, the thermal resistance matrix is presented, including the self-heating thermal resistance and thermal coupling resist... Based on the thermal network of the two-dimensional heterojunction bipolar transistors(HBTs) array, the thermal resistance matrix is presented, including the self-heating thermal resistance and thermal coupling resistance to describe the self-heating and thermal coupling effects, respectively.For HBT cells along the emitter length direction, the thermal coupling resistance is far smaller than the self-heating thermal resistance, and the peak junction temperature is mainly determined by the self-heating thermal resistance.However, the thermal coupling resistance is in the same order with the self-heating thermal resistance for HBT cells along the emitter width direction.Furthermore, the dependence of the thermal resistance matrix on cell spacing along the emitter length direction and cell spacing along the emitter width direction is also investigated, respectively.It is shown that the moderate increase of cell spacings along the emitter length direction and the emitter width direction could effectively lower the self-heating thermal resistance and thermal coupling resistance,and hence the peak junction temperature is decreased, which sheds light on adopting a two-dimensional non-uniform cell spacing layout to improve the uneven temperature distribution.By taking a 2 × 6 HBTs array for example, a twodimensional non-uniform cell spacing layout is designed, which can effectively lower the peak junction temperature and reduce the non-uniformity of the dissipated power.For the HBTs array with optimized layout, the high power-handling capability and thermal dissipation capability are kept when the bias voltage increases. 展开更多
关键词 HETEROJUNCTION BIPOLAR transistors(hbts) array THERMAL effects THERMAL resistance MATRIX THERMAL design
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10Gbps Transimpedance Amplifier for Optoelectronic Receivers Based on InGaP/GaAs HBTs
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作者 袁志鹏 孙海锋 +1 位作者 刘新宇 吴德馨 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2004年第12期1591-1594,共4页
A transimpedance amplifier based on InGaP/GaAs HBTs,which is applicable for 10Gbps bit rate,is developed and realized.Compact chip layout guarantees good flat gain,linear phase,and small group delay time variation.Mea... A transimpedance amplifier based on InGaP/GaAs HBTs,which is applicable for 10Gbps bit rate,is developed and realized.Compact chip layout guarantees good flat gain,linear phase,and small group delay time variation.Measured transimpedance gain is 40 dB·Ω and 3dB bandwidth is 10GHz. 展开更多
关键词 TIA HBT 10Gbps INGAP
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Low Voltage Class C SiGe Microwave Power HBTs
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作者 贾宏勇 陈培毅 +4 位作者 钱佩信 潘宏菽 黄杰 杨增敏 李明月 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2001年第9期1188-1190,共3页
The structure and microwave characteristics of low-voltage SiGe power HBTs are given.With this structure,the device can operate in a low-voltage and high-current state.By using an interdigital emitter strip layout and... The structure and microwave characteristics of low-voltage SiGe power HBTs are given.With this structure,the device can operate in a low-voltage and high-current state.By using an interdigital emitter strip layout and the operating voltage ranging from 3 to 4V,the output power in Class C operation can reach 1 65W at 1GHz,with the gain of 8dB.The highest collector efficiency is 67 8% under 3V. 展开更多
关键词 SIGE HBT microwave power transistor
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改善多指功率SiGe HBTs热稳定性的版图设计(英文)
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作者 金冬月 张万荣 +4 位作者 谢红云 沈珮 胡宁 甘军宁 李佳 《功能材料与器件学报》 CAS CSCD 北大核心 2009年第5期511-515,共5页
提出非均匀指间距结构功率SiGe HBTs的版图设计用以改善热稳定性。模拟和实验结果均表明,与传统的均匀指间距结构相比,非均匀指间距结构HBT的峰值结温和温度分布非均匀性均得到显著改善。上述改善归功于非均匀指间距结构HBT中心指间距... 提出非均匀指间距结构功率SiGe HBTs的版图设计用以改善热稳定性。模拟和实验结果均表明,与传统的均匀指间距结构相比,非均匀指间距结构HBT的峰值结温和温度分布非均匀性均得到显著改善。上述改善归功于非均匀指间距结构HBT中心指间距的增加,从而有效阻止热流由外侧指流向中心指处。此外,与均匀指间距结构器件相比,其热阻改善13.71%,热退化功率水平提高22.8%。因此,模拟和实验均证明采用非均匀指间距结构HBT的版图设计可有效改善功率HBTs热稳定性。 展开更多
关键词 SIGE HBT 热稳定性
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Source of Low Frequency Noise in SiGe HBTs
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作者 王凯 刘远 邓婉玲 《Journal of Donghua University(English Edition)》 EI CAS 2015年第6期1052-1054,共3页
The performance of low frequency noise(LFN)in SiGe heterojunction bipolar transistors(HBTs)is presented.The experimental results indicate that the performance of LFN in SiGe HBTs agrees with classical LFN theory.Based... The performance of low frequency noise(LFN)in SiGe heterojunction bipolar transistors(HBTs)is presented.The experimental results indicate that the performance of LFN in SiGe HBTs agrees with classical LFN theory.Based on classical LFN theory,the source of LFN in SiGe HBTs is confirmed from Hooge modal and McWhorter model simultaneously.Furthermore,according to this results,the base current coefficient α is extracted and the relationship between current noise power spectral density and base current is also shown. 展开更多
关键词 SIGE HETEROJUNCTION BIPOLAR transistors(hbts) low frequency noise
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HBTS60—11—102型混凝土泵
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作者 周新 《建设机械技术与管理》 2003年第2期47-48,共2页
关键词 hbts60-11-102型混凝土泵
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Influence of Heterojunction Position on SiGe HBTs with Graded BC Junctions
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作者 雒睿 张伟 +2 位作者 付军 刘道广 严利人 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2008年第8期1491-1495,共5页
The influence of a heterojunction in the vicinity of a graded BC junction on the performance of npn SiGe HBTs is studied. SiGe HBTs differing only in heterojunction position in the vicinity of a graded BC junction are... The influence of a heterojunction in the vicinity of a graded BC junction on the performance of npn SiGe HBTs is studied. SiGe HBTs differing only in heterojunction position in the vicinity of a graded BC junction are simulated by means of 2D Medici software for DC current gain and frequency characteristics. In addition, the simulated DC current gains and cut-off frequencies are compared at different collector-emitter bias voltages. Through the simulation results, both DC and HF device performance are found to be strongly impacted by degree of confinement of the neutral base in the SiGe layer, even in the absence of a conduction band barrier. This conclusion is of significance for designing and analyzing SiGe HBTs. 展开更多
关键词 SiGe HBT BC junction HBE relative position device performance
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Research on SEE mitigation techniques using back junction and p^+ buffer layer in domestic non-DTI SiGe HBTs by TCAD 被引量:1
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作者 Jia-Nan Wei Chao-Hui He +1 位作者 Pei Li Yong-Hong Li 《Chinese Physics B》 SCIE EI CAS CSCD 2019年第6期465-471,共7页
In this paper we investigate two techniques for single event effect(SEE) mitigation by using back junction and p^+buffer layer in non-deep trench isolation(DTI) domestic silicon–germanium heterojunction bipolar trans... In this paper we investigate two techniques for single event effect(SEE) mitigation by using back junction and p^+buffer layer in non-deep trench isolation(DTI) domestic silicon–germanium heterojunction bipolar transistors(SiGe HBTs)based on technology computer aided design(TCAD) simulation. The effectiveness of the two mitigation techniques and the influence of various structure parameters are investigated. Simulation results indicate that the two techniques are more effective in reducing collector charge collection induced by heavy ions striking at positions outside the collector–substrate(C–S) junction where charge collection is dominated by diffusion. By properly adjusting the parameters, charge collection of events outside the C–S junction can be reduced by more than an order of magnitude, while charge collection of events in the device center is halved without affecting the direct current(DC) and alternating current(AC) characteristics of the SiGe HBTs. 展开更多
关键词 silicon–germanium HBT single event effect mitigation technique TCAD simulation
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Effect of lateral structure parameters of SiGe HBTs on synthesized active inductors
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作者 赵彦晓 张万荣 +3 位作者 黄鑫 谢红云 金冬月 付强 《Chinese Physics B》 SCIE EI CAS CSCD 2016年第3期434-439,共6页
The effect of lateral structure parameters of transistors including emitter width, emitter length, and emitter stripe number on the performance parameters of the active inductor (AI), such as the effective inductanc... The effect of lateral structure parameters of transistors including emitter width, emitter length, and emitter stripe number on the performance parameters of the active inductor (AI), such as the effective inductance Ls, quality factor Q, and self-resonant frequency too is analyzed based on 0.35%tm SiGe BiCMOS process. The simulation results show that for AI operated under fixed current density Jc, the HBT lateral structure parameters have significant effect on Ls but little influence on Q and 090, and the larger Ls can be realized by the narrow, short emitter stripe and few emitter stripes of SiGe HBTs. On the other hand, for AI with fixed HBT size, smaller Jc is beneficial for AI to obtain larger Ls, but with a cost of smaller Q and 090. In addition, under the fixed collector current Ic, the larger the size of HBT is, the larger Ls becomes, but the smaller Q and ab become. The obtained results provide a reference for selecting geometry of transistors and operational condition in the design of active inductors. 展开更多
关键词 SiGe HBT lateral structure parameters active inductor
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Analytical Modeling of Base Transit Time of SiGe HBTS Including Concentration Dependent Bandgap Narrowing Effect
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作者 Sukla Basu 《Journal of Electronic Science and Technology》 CAS 2010年第2期140-143,共4页
Heterojunction Bipolar Transistors with SiGe base and Si emitter and collector have increasingly become important in high speed applications in electronics due to better performance of these devices with a modest incr... Heterojunction Bipolar Transistors with SiGe base and Si emitter and collector have increasingly become important in high speed applications in electronics due to better performance of these devices with a modest increase in complexity of fabrication process. Speed of these devices is mainly determined by transit time of minority carriers across the device. Base transit time is the most important component of the total transit time. An analytical model is developed here to predict the variation of base transit time with Ge content, base doping concentration, temperature, and other device parameters. Studies have been made for both uniform and exponential doping distributions with different Ge profiles in the base region. Band gap narrowing effect due to high doping concentration is also taken into account in the model. 展开更多
关键词 Index Terms---Base transit time bipolar transistor (HBT) SiGe heterojunction.
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Improved high-frequency equivalent circuit model based on distributed effects for SiGe HBTs with CBE layout
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作者 孙亚宾 李小进 +1 位作者 张金中 石艳玲 《Chinese Physics B》 SCIE EI CAS CSCD 2017年第9期502-508,共7页
In this paper, we present an improved high-frequency equivalent circuit for SiGe heterojunction bipolar transistors(HBTs) with a CBE layout, where we consider the distributed effects along the base region. The actua... In this paper, we present an improved high-frequency equivalent circuit for SiGe heterojunction bipolar transistors(HBTs) with a CBE layout, where we consider the distributed effects along the base region. The actual device structure is divided into three parts: a link base region under a spacer oxide, an intrinsic transistor region under the emitter window,and an extrinsic base region. Each region is considered as a two-port network, and is composed of a distributed resistance and capacitance. We solve the admittance parameters by solving the transmission-line equation. Then, we obtain the smallsignal equivalent circuit depending on the reasonable approximations. Unlike previous compact models, in our proposed model, we introduce an additional internal base node, and the intrinsic base resistance is shifted into this internal base node,which can theoretically explain the anomalous change in the intrinsic bias-dependent collector resistance in the conventional compact model. 展开更多
关键词 SiGe heterojunction bipolar transistors(HBT) small-signal equivalent circuit distributed effects CBE layout
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基区Ge组分分布对SiGe HBTs热学特性的影响 被引量:4
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作者 赵昕 张万荣 +4 位作者 金冬月 付强 陈亮 谢红云 张瑜洁 《物理学报》 SCIE EI CAS CSCD 北大核心 2012年第13期259-265,共7页
基区Ge组分的加入可以改善SiGe HBT的直流特性、频率特性和噪声特性,但Ge组分及其分布对HBT热学特性的影响报道还很少.本文利用SILVACO半导体器件仿真工具,建立了多指SiGe HBT模型,对基区具有不同Ge组分梯度结构的SiGe HBTs的热学特性... 基区Ge组分的加入可以改善SiGe HBT的直流特性、频率特性和噪声特性,但Ge组分及其分布对HBT热学特性的影响报道还很少.本文利用SILVACO半导体器件仿真工具,建立了多指SiGe HBT模型,对基区具有不同Ge组分梯度结构的SiGe HBTs的热学特性和电学特性的热稳定性进行了研究.研究发现,在Ge组分总量一定的条件下,随着Ge组分梯度的增大,器件的特征频率明显提高,增益β和特征频率fΤ随温度变化变弱,器件温度分布的均匀性变好,但增益变小;而基区均匀Ge组分(Ge组分梯度为零)的HBT的增益较大,但随温度的变化较大,器件温度分布的均匀性也较差.在此基础上,将基区Ge组分均匀分布和Ge组分缓变分布相结合,提出了兼顾器件热学特性、增益特性和频率特性的新型基区Ge组分分布-分段分布结构.结果表明,相比于基区Ge组分均匀分布的器件,新器件温度明显降低;β和fΤ保持了较高的值,且随温度的变化也较小,显示了新结构器件的优越性.这些结果对HBT的热学设计具有重要的参考意义,是对SiGe HBT性能研究的一个补充. 展开更多
关键词 SiGe异质结双极晶体管(HBT) 热学特性 GE组分分布 SILVACO
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重离子导致的SOI SiGe HBT的SET效应数值模拟研究
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作者 李府唐 郭刚 +4 位作者 张峥 孙浩瀚 刘翠翠 史慧琳 欧阳晓平 《半导体技术》 北大核心 2025年第7期714-722,共9页
锗硅异质结双极晶体管(SiGe HBT)具有优异的低温性能以及抗总剂量效应和位移损伤的能力,但是其对单粒子效应(SEE)较敏感。利用计算机辅助设计技术(TCAD)构建了SiGe HBT模型,研究了衬底类型、重离子入射位置、器件温度和重离子线性能量转... 锗硅异质结双极晶体管(SiGe HBT)具有优异的低温性能以及抗总剂量效应和位移损伤的能力,但是其对单粒子效应(SEE)较敏感。利用计算机辅助设计技术(TCAD)构建了SiGe HBT模型,研究了衬底类型、重离子入射位置、器件温度和重离子线性能量转移(LET)值对SiGe HBT单粒子瞬态(SET)效应的影响。研究结果表明,集电极/衬底结及其附近是器件的SET效应敏感区域,绝缘体上硅(SOI)工艺的引入有助于提高SiGe HBT的抗SEE能力。此外,载流子迁移率与自由载流子浓度是影响器件SET温度依赖性的最主要因素,随着温度进一步降低至极端低温,杂质不完全电离的影响也愈发凸显。随着LET值升高,SOI SiGe HBT的SET效应显著增强。尤其在低温与高LET耦合作用下,器件的SET电流峰值和电荷收集量远超在其他辐照条件下的。 展开更多
关键词 锗硅异质结双极晶体管(SiGe HBT) 绝缘体上硅(SOI)工艺 单粒子瞬态(SET) 单粒子效应(SEE) 计算机辅助设计技术(TCAD)
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Considerations of dopant-dependent bandgap narrowing for accurate device simulation in abrupt HBTs 被引量:1
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作者 周守利 熊德平 覃亚丽 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2009年第4期30-33,共4页
Heavy doping of the base in HBTs brings about a bandgap narrowing (BGN) effect, which modifies the intrinsic carrier density and disturbs the band offset, and thus leads to the change of the currents. Based on a the... Heavy doping of the base in HBTs brings about a bandgap narrowing (BGN) effect, which modifies the intrinsic carrier density and disturbs the band offset, and thus leads to the change of the currents. Based on a thermionic-field-diffusion model that is used to the analyze the performance of an abrupt HBT with a heavydoped base, the conclusion is made that, although the BGN effect makes the currents obviously change due to the modification of the intrinsic carrier density, the band offsets disturbed by the BGN effect should also be taken into account in the analysis of the electrical characteristics of abrupt HBTs. In addition, the BGN effect changes the bias voltage for the onset of Kirk effects. 展开更多
关键词 hbts bandgap narrowing intrinsic carrier density band offsets Kirk effects
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