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溅射功率对GdTbFeCo薄膜磁光性能的影响
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作者 郭继花 黄致新 +2 位作者 崔增丽 杨磊 邵剑波 《华中师范大学学报(自然科学版)》 CAS CSCD 北大核心 2009年第3期413-415,共3页
采用射频磁控溅射法在玻璃基片上成功制得了GdTbFeCo非晶垂直磁化膜,研究了溅射功率对GdTbFeCo薄膜磁光性能的影响.测量结果表明:基片与靶间距为72 mm,溅射功率为75 W,溅射气压为0.5 Pa,薄膜厚度为120 nm时,GdTbFeCo薄膜垂直方向矫顽力... 采用射频磁控溅射法在玻璃基片上成功制得了GdTbFeCo非晶垂直磁化膜,研究了溅射功率对GdTbFeCo薄膜磁光性能的影响.测量结果表明:基片与靶间距为72 mm,溅射功率为75 W,溅射气压为0.5 Pa,薄膜厚度为120 nm时,GdTbFeCo薄膜垂直方向矫顽力达到5966 Oe,克尔角为0.413°. 展开更多
关键词 射频磁控溅射 gdtbfeco 磁光性能 溅射功率
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溅射工艺对GdTbFeCo薄膜磁光性能的影响
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作者 郭继花 黄致新 +4 位作者 崔增丽 杨磊 邵剑波 朱宏生 章平 《功能材料》 EI CAS CSCD 北大核心 2009年第11期1802-1804,共3页
采用射频磁控溅射法在玻璃基片上成功制得了GdTbFeCo非晶垂直磁化膜,研究了溅射工艺对GdTbFeCo薄膜磁光性能的影响。测量结果表明,基片与靶间距为72mm,溅射功率为75W,溅射气压为0.5Pa,薄膜厚度为120nm时,GdTbFeCo薄膜垂直方向矫顽力为47... 采用射频磁控溅射法在玻璃基片上成功制得了GdTbFeCo非晶垂直磁化膜,研究了溅射工艺对GdTbFeCo薄膜磁光性能的影响。测量结果表明,基片与靶间距为72mm,溅射功率为75W,溅射气压为0.5Pa,薄膜厚度为120nm时,GdTbFeCo薄膜垂直方向矫顽力为477.6kA/m,克尔角为0.413°。 展开更多
关键词 射频磁控溅射 gdtbfeco 磁光性能 溅射工艺
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Sputtering Preparation and Magneto-optical Properties of GdTbFeCo Thin Films
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作者 黄致新 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2012年第2期195-198,共4页
Amorphous GdTbFeCo magnetic thin films were successfully prepared on glass substrates by RF magnetron sputtering system from a mosaic target. The influences of sputtering parameters on the magneto- optical properties ... Amorphous GdTbFeCo magnetic thin films were successfully prepared on glass substrates by RF magnetron sputtering system from a mosaic target. The influences of sputtering parameters on the magneto- optical properties GdTbFeCo thin film were investigated by the variable control method. And the influence mechanism was analyzed in detail. After the sputtering parameters were optimized, it was found that when the distance between target and substrate was 72 ram, the thin film thickness was 120 nm, and the sputtering power, sputtering pressure and sputtering time was 75 W, 0.5 Pa and 613 s, respectively, the coercivity with perpendicular anisotropy could be as high as 6735 Oe, and the squareness ratio of the hysteresis loop was almost equal to 1. 展开更多
关键词 influence magnetron sputtering parameters gdtbfeco thin film magnetoopticalproperty variable control method
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