The controllable growth of large area band gap engineered-semiconductor nanowires(NWs) with precise orientation and position is of immense significance in the development of integrated optoelectronic devices. In this ...The controllable growth of large area band gap engineered-semiconductor nanowires(NWs) with precise orientation and position is of immense significance in the development of integrated optoelectronic devices. In this study, we have achieved large area in-plane-aligned CdS_xSe_(1-x) nanowires via chemical vapor deposition method. The orientation and position of the alloyed CdS_xSe_(1-x)NWs could be controlled well by the graphoepitaxial effect and the patterns of Au catalyst. Microstructure characterizations of these as-grown samples reveal that the aligned CdS_xSe_(1-x)NWs possess smooth surface and uniform diameter. The aligned CdS_xSe_(1-x)NWs have strong photoluminescence and high-quality optical waveguide emission covering almost the entire visible wavelength range. Furthermore, photodetectors were constructed based on individual alloyed CdS_xSe_(1-x)NWs. These devices exhibit high performance and fast response speed with photoresponsivity ～670 A W^(-1) and photoresponse time ～76 ms. Present work provides a straightforward way to realize in-plane aligned bandgap engineering in semiconductor NWs for the development of large area NW arrays,which exhibit promising applications in future optoelectronic integrated circuits.展开更多
1 Results Imprint lithography[1] has attracted considerable attention from the viewpoint of low cost fabrication,because light exposure systems are not required. Up to now,polymethylmethacrylate (PMMA) films and hard ...1 Results Imprint lithography[1] has attracted considerable attention from the viewpoint of low cost fabrication,because light exposure systems are not required. Up to now,polymethylmethacrylate (PMMA) films and hard molds were often used in imprint lithography.In this paper,we report on the successful demonstration of imprint lithography using novolak resin (OFPR-800),which is more suitable than PMMA for dry etching,and a soft mold such as a soft polyester sheet,which has a two-dimensional (2D) square ...展开更多
基金the NSF of China (Nos.51525202,61574054,61635001,61505051,and 51772088)the Hunan province science and technology plan (Nos.2014FJ2001 and 2014TT1004)+1 种基金the Aid program for Science and Technology Innovative Research Team in Higher Educational Institutions of Hunan Provincethe Fundamental Research Funds for the Central Universities
文摘The controllable growth of large area band gap engineered-semiconductor nanowires(NWs) with precise orientation and position is of immense significance in the development of integrated optoelectronic devices. In this study, we have achieved large area in-plane-aligned CdS_xSe_(1-x) nanowires via chemical vapor deposition method. The orientation and position of the alloyed CdS_xSe_(1-x)NWs could be controlled well by the graphoepitaxial effect and the patterns of Au catalyst. Microstructure characterizations of these as-grown samples reveal that the aligned CdS_xSe_(1-x)NWs possess smooth surface and uniform diameter. The aligned CdS_xSe_(1-x)NWs have strong photoluminescence and high-quality optical waveguide emission covering almost the entire visible wavelength range. Furthermore, photodetectors were constructed based on individual alloyed CdS_xSe_(1-x)NWs. These devices exhibit high performance and fast response speed with photoresponsivity ～670 A W^(-1) and photoresponse time ～76 ms. Present work provides a straightforward way to realize in-plane aligned bandgap engineering in semiconductor NWs for the development of large area NW arrays,which exhibit promising applications in future optoelectronic integrated circuits.
文摘1 Results Imprint lithography[1] has attracted considerable attention from the viewpoint of low cost fabrication,because light exposure systems are not required. Up to now,polymethylmethacrylate (PMMA) films and hard molds were often used in imprint lithography.In this paper,we report on the successful demonstration of imprint lithography using novolak resin (OFPR-800),which is more suitable than PMMA for dry etching,and a soft mold such as a soft polyester sheet,which has a two-dimensional (2D) square ...
