In order to study the atomic oxygen corrosion of spacecraft materials in low earth orbit environment, an atomic oxygen simulator was established. In the simulator, a 2.45 GHz microwave source with maximum power of 600...In order to study the atomic oxygen corrosion of spacecraft materials in low earth orbit environment, an atomic oxygen simulator was established. In the simulator, a 2.45 GHz microwave source with maximum power of 600 W was launched into the circular cavity to generate ECR (electron cyclotron resonance) plasma. The oxygen ion beam moved onto a negatively biased Mo plate under the condition of symmetry magnetic mirror field confine, then was neutralized and reflected to form oxygen atom beam. The properties of plasma density, electron temperature, plasma space potential and ion incident energy were characterized. The atomic oxygen beam flux was calibrated by measuring the mass loss rate of Kapton during the atomic oxygen exposure. The test results show that the atomic oxygen beam with flux of 1016-1017 atoms-cm-2·s-1 and energy of 5-30 eV and a cross section of φ80 mm could be obtained under the operating pressure of 10-1-10-3 Pa. Such a high flux source can provide accelerated simulation tests of materials and coatings for space applications.展开更多
The spatial distribution of Electron Cyclotron Resonance （ECR） plasma in the ECRPlasma Enhanced Metalorganic Chemical Vapour Deposition （ECR-PECVD） reaction chamber is diagnosed by a Langmuir probe. The uniformity...The spatial distribution of Electron Cyclotron Resonance （ECR） plasma in the ECRPlasma Enhanced Metalorganic Chemical Vapour Deposition （ECR-PECVD） reaction chamber is diagnosed by a Langmuir probe. The uniformity is also investigated. The results show that the ECR plasma in the upper region of the reaction chamber under the influence of magnetic field has poor radial and axial uniformity. However, the plasma in the downstream region of the reaction chamber has fine radial uniformity. This excellent uniform plasma in the downstream has extensive application in plasma process.展开更多
Electron cyclotron resonance （ECR） plasma was applied to enhance the direct current magnetron sputtering to prepare hydrogenated diamond-like carbon （H-DLC） films. For different microwave powers, both argon and hy...Electron cyclotron resonance （ECR） plasma was applied to enhance the direct current magnetron sputtering to prepare hydrogenated diamond-like carbon （H-DLC） films. For different microwave powers, both argon and hydrogen gas are introduced separately as the ECR working gas to investigate the influence of microwave power on the microstructure and electrical property of the H-DLC films deposited on P-type silicon substrates. A series of characterization methods including the Raman spectrum and atomic force microscopy are used. Results show that, within a certain range, the increase in microwave power affects the properties of the thin films, namely the sp3 ratio, the hardness, the nanoparticle size and the resistivity all increase while the roughness decreases with the increase in microwave power. The maximum of resistivity amounts to 1.1×10^9 Ω.cm. At the same time it is found that the influence of microwave power on the properties of H-DLC films is more pronounced when argon gas is applied as the ECR working gas, compared to hydrogen gas.展开更多
Ion parameters in electron cyclotron resonance （ECR） microwave plasma were measured by ion sensitive probe and were compared with the electron parameters obtained by double Langmuir probe. The effects of gas pressur...Ion parameters in electron cyclotron resonance （ECR） microwave plasma were measured by ion sensitive probe and were compared with the electron parameters obtained by double Langmuir probe. The effects of gas pressure and microwave power on the ion temperature and density were analyzed. The spatial distribution of the ion parameters was also investigated by the ion sensitive probes with a tunable radial depth installed on different probe windows along the chamber axis. Results showed that the ion density measured by the ion sensitive probe was in good agreement with the electron density measured by the double Langmuir probe. The influ- ence of gas pressure on the ion parameters was stronger than that of microwave power. With the increase in working pressure, the ion temperature decreased monotonously with a decreasing rate larger than that at higher pressure. The ion density first increased to a peak （42.3~ 101~ cm-3） at 1 Pa and then decreased. The ion temperature and density increased little with the increase in the microwave power from 400 W to 800 W, The plasma far away from the resonant point is found to be radially uniform.展开更多
Nitrogen ion was implanted into the nano-TiO2 film surfaces by electron cyclotron resonance （ECR） plasma modification to improve the optical reactivity in visible-light region for nano-TiO2. Diagnosing the N2 plasma...Nitrogen ion was implanted into the nano-TiO2 film surfaces by electron cyclotron resonance （ECR） plasma modification to improve the optical reactivity in visible-light region for nano-TiO2. Diagnosing the N2 plasma by optical emission spectroscopy （OES） was applied to the process of plasma modification. X-ray photoelectron spectroscopy （XPS） was used for analysis of the binding of element after plasma modification. It is shown that the surface modification was caused by excitated N. The injecting of N2 and N＋ leads to the increase in the dissociative interstitial state N in the films. The doped N makes for TiO2-xNx appearing in the TiO2 films. TiO2-xNx forms the impurity energy state in the TiO2 energy band gap and reduces the energy band gap. This is the main reason leading to the red shift of absorption edge.展开更多
Application of the Langmuir probe in plasma circumstance for deposition of diamond-like carbon （DLC） thin films usually faces the problem of rapid failure of the probe due to surface insulative coating. In this pape...Application of the Langmuir probe in plasma circumstance for deposition of diamond-like carbon （DLC） thin films usually faces the problem of rapid failure of the probe due to surface insulative coating. In this paper, we circumvent the problem by using the floating harmonic probe technique. In the real circumstance of DLC film deposition, the floating harmonic probe worked reliably over 3 hours, correctly indicating the ion density and electron temperature. The technique was practically used to measure the ion density and electron temperature in DLC film deposition processes using the microwave ECR plasma enhanced sputtering. Combined with the Raman spectroscopic characterization of the films, the conditions for deposition of DLC films were investigated.展开更多
Magnetoelectric heating was used to heat ions in an ECR plasma with a magnetic mirror field.The temperature and density of ions were measured by an ion sensitive probe（ISP） before and after magnetoelectric heating i...Magnetoelectric heating was used to heat ions in an ECR plasma with a magnetic mirror field.The temperature and density of ions were measured by an ion sensitive probe（ISP） before and after magnetoelectric heating in order to investigate the influence of the anode ring’s radius,axial position and working pressure on magnetoelectric heating.Results showed that a suitable radius of the anode ring could improve the ion temperature effectively and the optimal size of the anode ring depended on the cyclotron radius of ions.The radial uniformity of the ion density was improved by increasing the radius of the anode ring after heating.The magnetic mirror field could reduce the loss of ions caused by collision with the wall of the chamber and it was beneficial to increase the ion temperature and the ion density.It was suitable to heat the ions when the anode ring was set at the center of the magnetic mirror field where there was a weaker magnetic field strength.Lower pressure contributed to the increase in the ion temperature and efficiency of magnetoelectric heating.展开更多
An atomic-oxygen beam source with compact ECR plasma was successfully investigated. The microwave was produced and transmitted in a coaxial mode, and coupled with the loop. The plasma was produced at a higher asymmetr...An atomic-oxygen beam source with compact ECR plasma was successfully investigated. The microwave was produced and transmitted in a coaxial mode, and coupled with the loop. The plasma was produced at a higher asymmetry magnetic mirror field, and neutralized with the molybdenum target at a lower asymmetry magnetic mirror field. The magnetic field was constituted with permanent magnets. This source has a higher flux density of atom beam, a lower operating pressure, a smaller power consumption and low-cost. When it was installed at the equipment to study the interaction of the beam with the surface, the operation was carried out very easily and with a good stability.展开更多
A compact mirror-like ECR (electron cyclotron resonance) Plasma source for the ionosphere environment simulator was described for the fort time in China. The Overall sources system was composed of a 200 W 2.45 GHz mic...A compact mirror-like ECR (electron cyclotron resonance) Plasma source for the ionosphere environment simulator was described for the fort time in China. The Overall sources system was composed of a 200 W 2.45 GHz microwave source, a coastal 3A./4 TEM-mode microwave resonance applicator, column and cylindrical Nd-Fe-P magnets, a quartz bell-shaped discharge chamber, a gas inlet system and a plasma-diffusing bore. The preliminary experiment demonstrated that ambi-polar diffusion plasma stream into the simulator (-500 mm long) formed an environment with following parameters: a plasma density ne of 104 cm-3 - 106 cm-3, an electron temperature Te < 5 eV at a pressure P of 10-1 Pa-10-3 Pa, a Plasma uniformity of > 80% over the experimental target with a 160-mm-in-diameter, satisfying primarily the requirement of simulating in a severe ionosphere environment.展开更多
Using a Monte Carlo method and resonable data in our experiment device, we simulate the plasma stream of ECR plasma source on condition that the plasma is collisionless. We can get the distribution of ion density and ...Using a Monte Carlo method and resonable data in our experiment device, we simulate the plasma stream of ECR plasma source on condition that the plasma is collisionless. We can get the distribution of ion density and the effect of magnetic field on the plasma along the divergent magnetic field. The research is beneficial to plasma processing applications.展开更多
Amorphous hydrogenated carbon thin films have been deposited with benzene plasma in an electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition system. The characteristic of Benzene discharge plas...Amorphous hydrogenated carbon thin films have been deposited with benzene plasma in an electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition system. The characteristic of Benzene discharge plasma has been monitored by Mast spectrometry. It shows that the majority of the plasma species in the downstream ECR Plasma with benzene as gas source are acetylene, ethylene and higher mass species. In the experiments, the effects of the substrate temperature on the deposition rates have been emphatically studied. The structures of the films were analyzed by FTIR and Ramam spectrum.The results show that when the substrate temperature rises, the deposition rate drops down, the hydrogen Foment decreases, with the higher SP3 content being presented in the film.展开更多
The sheath plasma characteristics changing with the negative bias applied to the substrate during electron cyclotron resonance plasma nitriding are studied. The sheath characteristics obtained by a Langmuir single pr...The sheath plasma characteristics changing with the negative bias applied to the substrate during electron cyclotron resonance plasma nitriding are studied. The sheath characteristics obtained by a Langmuir single probe and an ion energy analyzer show that when the negative bias applied to the substrate is increasing, the most probable energy of ions in the sheath and the full width of half maximum of ions energy distribution increase, the thickness of the sheath also increases, whereas the saturation current of ion decreases. It has been found from the optical emission spectrum that there are strong lines of N2 and N+2. Based on our experiment results the mechanism of plasma nitriding is discussed.展开更多
A sputtering-type microwave multipolar ECR plasma processing for preparing thin films, is built with Nd-Fe-B magnets and 2.45 GHz, TE<sub>10</sub> mode microwave. The plasma distributions in the axial dire...A sputtering-type microwave multipolar ECR plasma processing for preparing thin films, is built with Nd-Fe-B magnets and 2.45 GHz, TE<sub>10</sub> mode microwave. The plasma distributions in the axial direction, which is important for preparing thin films, are found to be very sensitive to the magnetic potential fields in plasma chamber. The plasma parameters are also influenced by the background gas pressure.展开更多
Amorphous carbon nitride thin films were prepared by plasma-enhanced DC magnetron sputtering using twinned microwave electron cyclotron resonance plasma sources. Chemical structure of deposited films was investigated ...Amorphous carbon nitride thin films were prepared by plasma-enhanced DC magnetron sputtering using twinned microwave electron cyclotron resonance plasma sources. Chemical structure of deposited films was investigated using X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. The results indicate that the deposition rate is strongly affected by direct current bias, and the films are mainly composed of a single amorphous carbon nitride phase with N/C ratio close to C3N4, and the bonding is predominantly of C^N type.展开更多
A new type of hybrid discharge is experimentally investigated in this work. A helicon source and an electron cyclotron resonance（ECR） source were combined to produce plasma. As a preliminary study of this type of pl...A new type of hybrid discharge is experimentally investigated in this work. A helicon source and an electron cyclotron resonance（ECR） source were combined to produce plasma. As a preliminary study of this type of plasma, the optical emission spectroscopy（OES） method was used to obtain values of electron temperature and density under a series of typical conditions. Generally,it was observed that the electron temperature decreases and the electron density increases as the pressure increased. When increasing the applied power at a certain pressure, the average electron density at certain positions in the discharge does not increase significantly possibly due to the high degree of neutral depletion. Electron temperature increased with power in the hybrid mode.Possible mechanisms of these preliminary observations are discussed.展开更多
To reveal the argon plasma characteristics within the entire region of an electron cyclotron resonance（ECR） ion source, the plasma parameters were diagnosed using a bended Langmuir probe with the filament axis perpe...To reveal the argon plasma characteristics within the entire region of an electron cyclotron resonance（ECR） ion source, the plasma parameters were diagnosed using a bended Langmuir probe with the filament axis perpendicular to the diagnosing plane. Experiments indicate that,with a gas volume flow rate and incident microwave power of 4 sccm and 8.8 W, respectively,the gas was ionized to form plasma with a luminous ring. When the incident microwave power was above 27 W, the luminous ring was converted to a bright column, the dark area near its axis was narrowed, and the microwave power absorbing efficiency was increased. This indicates that there was a mode transition phenomenon in this ECR ion source when the microwave power increased. The diagnosis shows that, at an incident microwave power of 17.4 W, the diagnosed electron temperature and ion density were below 8 eV and 3×10^17 m^-3, respectively, while at incident microwave power levels of 30 W and 40 W, the maximum electron temperature and ion density were above 11 eV and 6.8×10^17 m^-3, respectively. Confined by magnetic mirrors, the higher density plasma region had a bow shape, which coincided with the magnetic field lines but deviated from the ECR layer.展开更多
基金This work was supported by the National Key Basic Research and.Development Program of China(No.G19990650).
文摘In order to study the atomic oxygen corrosion of spacecraft materials in low earth orbit environment, an atomic oxygen simulator was established. In the simulator, a 2.45 GHz microwave source with maximum power of 600 W was launched into the circular cavity to generate ECR (electron cyclotron resonance) plasma. The oxygen ion beam moved onto a negatively biased Mo plate under the condition of symmetry magnetic mirror field confine, then was neutralized and reflected to form oxygen atom beam. The properties of plasma density, electron temperature, plasma space potential and ion incident energy were characterized. The atomic oxygen beam flux was calibrated by measuring the mass loss rate of Kapton during the atomic oxygen exposure. The test results show that the atomic oxygen beam with flux of 1016-1017 atoms-cm-2·s-1 and energy of 5-30 eV and a cross section of φ80 mm could be obtained under the operating pressure of 10-1-10-3 Pa. Such a high flux source can provide accelerated simulation tests of materials and coatings for space applications.
基金National Natural Science Foundation of China （No. 10575039） Chinese Specialized Research Foundation for the Doctoral Program of Higher Education （No. 2004057408）+1 种基金 Science Project of Guangzhou city （No. 2005Z3D2031） Key Project of Science Research Foundation of Guangdong （No. 05100534）
文摘The spatial distribution of Electron Cyclotron Resonance （ECR） plasma in the ECRPlasma Enhanced Metalorganic Chemical Vapour Deposition （ECR-PECVD） reaction chamber is diagnosed by a Langmuir probe. The uniformity is also investigated. The results show that the ECR plasma in the upper region of the reaction chamber under the influence of magnetic field has poor radial and axial uniformity. However, the plasma in the downstream region of the reaction chamber has fine radial uniformity. This excellent uniform plasma in the downstream has extensive application in plasma process.
基金supported by Shenzhen Key Laboratory of Sensors Technology Open Fund of China (Nos.SST200908, SST200911)
文摘Electron cyclotron resonance （ECR） plasma was applied to enhance the direct current magnetron sputtering to prepare hydrogenated diamond-like carbon （H-DLC） films. For different microwave powers, both argon and hydrogen gas are introduced separately as the ECR working gas to investigate the influence of microwave power on the microstructure and electrical property of the H-DLC films deposited on P-type silicon substrates. A series of characterization methods including the Raman spectrum and atomic force microscopy are used. Results show that, within a certain range, the increase in microwave power affects the properties of the thin films, namely the sp3 ratio, the hardness, the nanoparticle size and the resistivity all increase while the roughness decreases with the increase in microwave power. The maximum of resistivity amounts to 1.1×10^9 Ω.cm. At the same time it is found that the influence of microwave power on the properties of H-DLC films is more pronounced when argon gas is applied as the ECR working gas, compared to hydrogen gas.
基金supported by National Natural Science Foundation of China (No. 10875093)
文摘Ion parameters in electron cyclotron resonance （ECR） microwave plasma were measured by ion sensitive probe and were compared with the electron parameters obtained by double Langmuir probe. The effects of gas pressure and microwave power on the ion temperature and density were analyzed. The spatial distribution of the ion parameters was also investigated by the ion sensitive probes with a tunable radial depth installed on different probe windows along the chamber axis. Results showed that the ion density measured by the ion sensitive probe was in good agreement with the electron density measured by the double Langmuir probe. The influ- ence of gas pressure on the ion parameters was stronger than that of microwave power. With the increase in working pressure, the ion temperature decreased monotonously with a decreasing rate larger than that at higher pressure. The ion density first increased to a peak （42.3~ 101~ cm-3） at 1 Pa and then decreased. The ion temperature and density increased little with the increase in the microwave power from 400 W to 800 W, The plasma far away from the resonant point is found to be radially uniform.
基金the Guangdong Provincial Natural Science Foundation under grant No. 031502.
文摘Nitrogen ion was implanted into the nano-TiO2 film surfaces by electron cyclotron resonance （ECR） plasma modification to improve the optical reactivity in visible-light region for nano-TiO2. Diagnosing the N2 plasma by optical emission spectroscopy （OES） was applied to the process of plasma modification. X-ray photoelectron spectroscopy （XPS） was used for analysis of the binding of element after plasma modification. It is shown that the surface modification was caused by excitated N. The injecting of N2 and N＋ leads to the increase in the dissociative interstitial state N in the films. The doped N makes for TiO2-xNx appearing in the TiO2 films. TiO2-xNx forms the impurity energy state in the TiO2 energy band gap and reduces the energy band gap. This is the main reason leading to the red shift of absorption edge.
文摘Application of the Langmuir probe in plasma circumstance for deposition of diamond-like carbon （DLC） thin films usually faces the problem of rapid failure of the probe due to surface insulative coating. In this paper, we circumvent the problem by using the floating harmonic probe technique. In the real circumstance of DLC film deposition, the floating harmonic probe worked reliably over 3 hours, correctly indicating the ion density and electron temperature. The technique was practically used to measure the ion density and electron temperature in DLC film deposition processes using the microwave ECR plasma enhanced sputtering. Combined with the Raman spectroscopic characterization of the films, the conditions for deposition of DLC films were investigated.
基金supported by National Natural Science Foundation of China(No.10875093)
文摘Magnetoelectric heating was used to heat ions in an ECR plasma with a magnetic mirror field.The temperature and density of ions were measured by an ion sensitive probe（ISP） before and after magnetoelectric heating in order to investigate the influence of the anode ring’s radius,axial position and working pressure on magnetoelectric heating.Results showed that a suitable radius of the anode ring could improve the ion temperature effectively and the optimal size of the anode ring depended on the cyclotron radius of ions.The radial uniformity of the ion density was improved by increasing the radius of the anode ring after heating.The magnetic mirror field could reduce the loss of ions caused by collision with the wall of the chamber and it was beneficial to increase the ion temperature and the ion density.It was suitable to heat the ions when the anode ring was set at the center of the magnetic mirror field where there was a weaker magnetic field strength.Lower pressure contributed to the increase in the ion temperature and efficiency of magnetoelectric heating.
基金This work was supported by the National Natural Science Foundation of China No.19835030.
文摘An atomic-oxygen beam source with compact ECR plasma was successfully investigated. The microwave was produced and transmitted in a coaxial mode, and coupled with the loop. The plasma was produced at a higher asymmetry magnetic mirror field, and neutralized with the molybdenum target at a lower asymmetry magnetic mirror field. The magnetic field was constituted with permanent magnets. This source has a higher flux density of atom beam, a lower operating pressure, a smaller power consumption and low-cost. When it was installed at the equipment to study the interaction of the beam with the surface, the operation was carried out very easily and with a good stability.
文摘A compact mirror-like ECR (electron cyclotron resonance) Plasma source for the ionosphere environment simulator was described for the fort time in China. The Overall sources system was composed of a 200 W 2.45 GHz microwave source, a coastal 3A./4 TEM-mode microwave resonance applicator, column and cylindrical Nd-Fe-P magnets, a quartz bell-shaped discharge chamber, a gas inlet system and a plasma-diffusing bore. The preliminary experiment demonstrated that ambi-polar diffusion plasma stream into the simulator (-500 mm long) formed an environment with following parameters: a plasma density ne of 104 cm-3 - 106 cm-3, an electron temperature Te < 5 eV at a pressure P of 10-1 Pa-10-3 Pa, a Plasma uniformity of > 80% over the experimental target with a 160-mm-in-diameter, satisfying primarily the requirement of simulating in a severe ionosphere environment.
文摘Using a Monte Carlo method and resonable data in our experiment device, we simulate the plasma stream of ECR plasma source on condition that the plasma is collisionless. We can get the distribution of ion density and the effect of magnetic field on the plasma along the divergent magnetic field. The research is beneficial to plasma processing applications.
基金Nature Science Foundation of Jiangsu Province, P.R.China
文摘Amorphous hydrogenated carbon thin films have been deposited with benzene plasma in an electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition system. The characteristic of Benzene discharge plasma has been monitored by Mast spectrometry. It shows that the majority of the plasma species in the downstream ECR Plasma with benzene as gas source are acetylene, ethylene and higher mass species. In the experiments, the effects of the substrate temperature on the deposition rates have been emphatically studied. The structures of the films were analyzed by FTIR and Ramam spectrum.The results show that when the substrate temperature rises, the deposition rate drops down, the hydrogen Foment decreases, with the higher SP3 content being presented in the film.
基金This work was supported by the National Natural Science Foundation of Grant Nos. 19838030 and 19875030
文摘The sheath plasma characteristics changing with the negative bias applied to the substrate during electron cyclotron resonance plasma nitriding are studied. The sheath characteristics obtained by a Langmuir single probe and an ion energy analyzer show that when the negative bias applied to the substrate is increasing, the most probable energy of ions in the sheath and the full width of half maximum of ions energy distribution increase, the thickness of the sheath also increases, whereas the saturation current of ion decreases. It has been found from the optical emission spectrum that there are strong lines of N2 and N+2. Based on our experiment results the mechanism of plasma nitriding is discussed.
文摘A sputtering-type microwave multipolar ECR plasma processing for preparing thin films, is built with Nd-Fe-B magnets and 2.45 GHz, TE<sub>10</sub> mode microwave. The plasma distributions in the axial direction, which is important for preparing thin films, are found to be very sensitive to the magnetic potential fields in plasma chamber. The plasma parameters are also influenced by the background gas pressure.
基金supported by the National Natural Science Foundation of China under grant number 50135040&90206022.
文摘Amorphous carbon nitride thin films were prepared by plasma-enhanced DC magnetron sputtering using twinned microwave electron cyclotron resonance plasma sources. Chemical structure of deposited films was investigated using X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. The results indicate that the deposition rate is strongly affected by direct current bias, and the films are mainly composed of a single amorphous carbon nitride phase with N/C ratio close to C3N4, and the bonding is predominantly of C^N type.
文摘A new type of hybrid discharge is experimentally investigated in this work. A helicon source and an electron cyclotron resonance（ECR） source were combined to produce plasma. As a preliminary study of this type of plasma, the optical emission spectroscopy（OES） method was used to obtain values of electron temperature and density under a series of typical conditions. Generally,it was observed that the electron temperature decreases and the electron density increases as the pressure increased. When increasing the applied power at a certain pressure, the average electron density at certain positions in the discharge does not increase significantly possibly due to the high degree of neutral depletion. Electron temperature increased with power in the hybrid mode.Possible mechanisms of these preliminary observations are discussed.
基金financial support of National Natural Science Foundation of China (Grant No.11475137)
文摘To reveal the argon plasma characteristics within the entire region of an electron cyclotron resonance（ECR） ion source, the plasma parameters were diagnosed using a bended Langmuir probe with the filament axis perpendicular to the diagnosing plane. Experiments indicate that,with a gas volume flow rate and incident microwave power of 4 sccm and 8.8 W, respectively,the gas was ionized to form plasma with a luminous ring. When the incident microwave power was above 27 W, the luminous ring was converted to a bright column, the dark area near its axis was narrowed, and the microwave power absorbing efficiency was increased. This indicates that there was a mode transition phenomenon in this ECR ion source when the microwave power increased. The diagnosis shows that, at an incident microwave power of 17.4 W, the diagnosed electron temperature and ion density were below 8 eV and 3×10^17 m^-3, respectively, while at incident microwave power levels of 30 W and 40 W, the maximum electron temperature and ion density were above 11 eV and 6.8×10^17 m^-3, respectively. Confined by magnetic mirrors, the higher density plasma region had a bow shape, which coincided with the magnetic field lines but deviated from the ECR layer.
