Opening the silicon oxide mask of a capacitor in dynamic random access memory is a critical process on a capacitive coupled plasma(CCP)etch tool.Three steps,dielectric anti-reflective coating(DARC)etch back,silicon ox...Opening the silicon oxide mask of a capacitor in dynamic random access memory is a critical process on a capacitive coupled plasma(CCP)etch tool.Three steps,dielectric anti-reflective coating(DARC)etch back,silicon oxide etch and strip,are contained.To acquire good performance,such as low leakage current and high capacitance,for further fabricating capacitors,we should firstly optimize DARC etch back.We developed some experiments,focusing on etch time and chemistry,to evalu-ate the profile of a silicon oxide mask,DARC remain and critical dimension.The result shows that etch back time should be con-trolled in the range from 50 to 60 s,based on the current equipment and condition.It will make B/T ratio higher than 70%mean-while resolve the DARC remain issue.We also found that CH_(2)F_(2) flow should be~15 sccm to avoid reversed CD trend and keep in-line CD.展开更多
1控制台我院GE Bright Speed 16排螺旋CT操作控制台主要由HP8200工作站、数据采集重建控制系统DARC、扫描数据磁盘阵列SDDA（scan data disk array）、图像重建器IG等组成。DARC系统类似于一个小型主机,它主要由采用Intel双核CPU的主板...1控制台我院GE Bright Speed 16排螺旋CT操作控制台主要由HP8200工作站、数据采集重建控制系统DARC、扫描数据磁盘阵列SDDA（scan data disk array）、图像重建器IG等组成。DARC系统类似于一个小型主机,它主要由采用Intel双核CPU的主板、2 GB DDR内存。展开更多
Duffy抗原趋化因子受体(Duffy antigen receptor for chemokines,DARC)是红细胞膜上的一种多功能杂性趋化因子受体。DARC不仅是位于红细胞膜表面的血型抗原,同时还作为间日疟原虫受体、HIV辅助受体、趋化因子受体,在疟疾的发生、炎症调...Duffy抗原趋化因子受体(Duffy antigen receptor for chemokines,DARC)是红细胞膜上的一种多功能杂性趋化因子受体。DARC不仅是位于红细胞膜表面的血型抗原,同时还作为间日疟原虫受体、HIV辅助受体、趋化因子受体,在疟疾的发生、炎症调节以及抗肿瘤免疫反应等方面发挥重要作用。本文根据近年的研究进展,就DARC在炎症调节、感染以及抗肿瘤反应中的作用进行综述。展开更多
文摘Opening the silicon oxide mask of a capacitor in dynamic random access memory is a critical process on a capacitive coupled plasma(CCP)etch tool.Three steps,dielectric anti-reflective coating(DARC)etch back,silicon oxide etch and strip,are contained.To acquire good performance,such as low leakage current and high capacitance,for further fabricating capacitors,we should firstly optimize DARC etch back.We developed some experiments,focusing on etch time and chemistry,to evalu-ate the profile of a silicon oxide mask,DARC remain and critical dimension.The result shows that etch back time should be con-trolled in the range from 50 to 60 s,based on the current equipment and condition.It will make B/T ratio higher than 70%mean-while resolve the DARC remain issue.We also found that CH_(2)F_(2) flow should be~15 sccm to avoid reversed CD trend and keep in-line CD.
文摘1控制台我院GE Bright Speed 16排螺旋CT操作控制台主要由HP8200工作站、数据采集重建控制系统DARC、扫描数据磁盘阵列SDDA（scan data disk array）、图像重建器IG等组成。DARC系统类似于一个小型主机,它主要由采用Intel双核CPU的主板、2 GB DDR内存。
文摘Duffy抗原趋化因子受体(Duffy antigen receptor for chemokines,DARC)是红细胞膜上的一种多功能杂性趋化因子受体。DARC不仅是位于红细胞膜表面的血型抗原,同时还作为间日疟原虫受体、HIV辅助受体、趋化因子受体,在疟疾的发生、炎症调节以及抗肿瘤免疫反应等方面发挥重要作用。本文根据近年的研究进展,就DARC在炎症调节、感染以及抗肿瘤反应中的作用进行综述。
