In order to prolong the service life of piston rings of heavy vehicle engine and decrease the friction and wear of piston rings and cylinder liner,CrMoN/MoS_2 multilayer films were deposited on the surface of rings by...In order to prolong the service life of piston rings of heavy vehicle engine and decrease the friction and wear of piston rings and cylinder liner,CrMoN/MoS_2 multilayer films were deposited on the surface of rings by magnetron sputtering and low temperature ion sulfuration.FESEM equipped with EDX was adopted to analyze the compositions and morphologies of surface,cross-section,and wear scars of the multilayer films.The nano-hardness and Young＇s modulus of the films were measured by a nano tester.Tribologicalproperties of the films were tested by an SRV~174;4 wear tester.The experimentalresults indicate that the structures of the multilayer films are dense and compact.The films possess nano hardness value of approximately 26.7 GPa and superior ability of plastic deformation resistance.The multilayer films can activate solid lubricating,and possess an excellent antifriction and wear resistance under the conditions of heavy load,high frequency,high temperature,and dynamic load.展开更多
CrMoN composite coatings were deposited on the surface of the stainless steel by magnetron sputtering, then were treated by low temperature ion sulfuration. FESEM equipped with EDX was adopted to analyze the morpholog...CrMoN composite coatings were deposited on the surface of the stainless steel by magnetron sputtering, then were treated by low temperature ion sulfuration. FESEM equipped with EDX was adopted to analyze the morphologies and compositions of the surface, cross-section and worn scar of the sulfuration layer. The valence states of the film surface were detected by XPS. The nano-hardness and nano-modulus of the layer were measured by a nano tester. The results of the friction and wear show that the CrMoN/MoS2 composite coating is a kind of ideal solid lubrication layer and possess an excellent antifriction and wear-resistance.展开更多
Heterojunction and morphology control assume a significant part in adjusting the intrinsic electromagnetic properties of absorbers to acquire outstanding microwave absorption(MA)performance,but this still faces huge c...Heterojunction and morphology control assume a significant part in adjusting the intrinsic electromagnetic properties of absorbers to acquire outstanding microwave absorption(MA)performance,but this still faces huge challenges.Herein,FeS_(2)/C/MoS_(2)composite with core–shell structure was successfully designed and prepared via a multi-interface engineering.MoS_(2)nanosheets with 1T and 2H phases are coated on the outside of FeS_(2)/C to form a porous interconnected structure that can optimize the impedance matching characteristics and strengthen the interfacial polarization loss capacity.Remarkably,as-fabricated FCM-3 harvests a broad effective absorption bandwidth(EAB)of 5.12 GHz and a minimum reflection loss(RL_(min))value of-45.1 d B.Meanwhile,FCM-3 can accomplish a greatest radar cross section(RCS)reduction value of 18.52 d B m^(2)when the detection angle is 0°.Thus,the convenient computer simulation technology(CST)simulations and encouraging accomplishments provide a novel avenue for the further development of efficient and lightweight MA materials.展开更多
Metal–insulator–semiconductor(MOS) capacitor is a key structure for high performance MOS field transistors(MOSFETs), requiring low leakage current, high breakdown voltage, and low interface states. In this paper, β...Metal–insulator–semiconductor(MOS) capacitor is a key structure for high performance MOS field transistors(MOSFETs), requiring low leakage current, high breakdown voltage, and low interface states. In this paper, β-Ga_(2)O_(3) MOS capacitors were fabricated with ALD deposited Al_(2)O_(3) using H_(2)O or ozone(O_(3)) as precursors. Compared with the Al_(2)O_(3) gate dielectric with H_(2)O as ALD precursor, the leakage current for the O_(3) precursor case is decreased by two orders of magnitude, while it keeps the same level at the fixed charges, interface state density, and border traps. The SIMS tests show that Al_(2)O_(3) with O_(3) as precursor contains more carbon impurities. The current transport mechanism analysis suggests that the C–H complex in Al_(2)O_(3) with O_(3) precursor serves as deep energy trap to reduce the leakage current. These results indicate that the Al_(2)O_(3)/β-Ga_(2)O_(3)MOS capacitor using the O_(3) precursor has a low leakage current and holds potential for application in β-Ga_(2)O_(3) MOSFETs.展开更多
基于密度泛函理论的第一性原理方法,计算了Se掺杂单层MoS_2能带结构和光吸特性,并分析了对其光解水性质的影响。结果表明:本征单层MoS_2为直接带隙结构,禁带宽度为1.740 e V,导带底电位在H+/H2还原势之上0.430 e V,价带顶电位在O2/H2O...基于密度泛函理论的第一性原理方法,计算了Se掺杂单层MoS_2能带结构和光吸特性,并分析了对其光解水性质的影响。结果表明:本征单层MoS_2为直接带隙结构,禁带宽度为1.740 e V,导带底电位在H+/H2还原势之上0.430 e V,价带顶电位在O2/H2O的氧化势之下0.080 e V,具有可见光催化分解水的能力,但氧化和还原能力不均衡,导致单层MoS_2作为光催化剂分解水的效率不高。通过Se掺杂计算发现,单层MoS_2的禁带宽度变为1.727 e V,相应的光吸收谱变化幅度几乎不变,且体系的形成能较低,表明其热力学稳定性良好。然而,导带底电位调整到H+/H2还原势之上0.253 e V,价带顶电位处于O2/H2O的氧化势之下0.244e V,平衡了氧化与还原能力,单层MoS_2可见光催化分解水的效率得到提高。展开更多
基金Funded by the National Natural Science Foundation of China(No.50901089)the Project supported by Army Important Researches(No.2012ZB02)
文摘In order to prolong the service life of piston rings of heavy vehicle engine and decrease the friction and wear of piston rings and cylinder liner,CrMoN/MoS_2 multilayer films were deposited on the surface of rings by magnetron sputtering and low temperature ion sulfuration.FESEM equipped with EDX was adopted to analyze the compositions and morphologies of surface,cross-section,and wear scars of the multilayer films.The nano-hardness and Young＇s modulus of the films were measured by a nano tester.Tribologicalproperties of the films were tested by an SRV~174;4 wear tester.The experimentalresults indicate that the structures of the multilayer films are dense and compact.The films possess nano hardness value of approximately 26.7 GPa and superior ability of plastic deformation resistance.The multilayer films can activate solid lubricating,and possess an excellent antifriction and wear resistance under the conditions of heavy load,high frequency,high temperature,and dynamic load.
基金supported by the National Natural Science Foundation of China(No.50901089)National Key Laboratory for Remanufacturing(No.9140C850207100C8506)
文摘CrMoN composite coatings were deposited on the surface of the stainless steel by magnetron sputtering, then were treated by low temperature ion sulfuration. FESEM equipped with EDX was adopted to analyze the morphologies and compositions of the surface, cross-section and worn scar of the sulfuration layer. The valence states of the film surface were detected by XPS. The nano-hardness and nano-modulus of the layer were measured by a nano tester. The results of the friction and wear show that the CrMoN/MoS2 composite coating is a kind of ideal solid lubrication layer and possess an excellent antifriction and wear-resistance.
基金financially supported by the National Natural Science Foundation of China(Nos.52402354,62174016 and 12374394)China Postdoctoral Science Foundation(Nos.2023M740471)the Natural Science Foundation of Jiangsu Higher Education Institutions(Nos.24KJB430002)。
文摘Heterojunction and morphology control assume a significant part in adjusting the intrinsic electromagnetic properties of absorbers to acquire outstanding microwave absorption(MA)performance,but this still faces huge challenges.Herein,FeS_(2)/C/MoS_(2)composite with core–shell structure was successfully designed and prepared via a multi-interface engineering.MoS_(2)nanosheets with 1T and 2H phases are coated on the outside of FeS_(2)/C to form a porous interconnected structure that can optimize the impedance matching characteristics and strengthen the interfacial polarization loss capacity.Remarkably,as-fabricated FCM-3 harvests a broad effective absorption bandwidth(EAB)of 5.12 GHz and a minimum reflection loss(RL_(min))value of-45.1 d B.Meanwhile,FCM-3 can accomplish a greatest radar cross section(RCS)reduction value of 18.52 d B m^(2)when the detection angle is 0°.Thus,the convenient computer simulation technology(CST)simulations and encouraging accomplishments provide a novel avenue for the further development of efficient and lightweight MA materials.
基金Project supported in part by the Science and Technology Development Plan Project of Jilin Province, China (Grant No. YDZJ202303CGZH022)the National Key Research and Development Program of China (Grant No. 2024YFE0205300)+1 种基金the National Natural Science Foundation of China (Grant No. 62471504)the Open Fund of the State Key Laboratory of Optoelectronic Materials and Technologies (Sun Yat-Sen University) (Grant No. OEMT-2023KF-05)。
文摘Metal–insulator–semiconductor(MOS) capacitor is a key structure for high performance MOS field transistors(MOSFETs), requiring low leakage current, high breakdown voltage, and low interface states. In this paper, β-Ga_(2)O_(3) MOS capacitors were fabricated with ALD deposited Al_(2)O_(3) using H_(2)O or ozone(O_(3)) as precursors. Compared with the Al_(2)O_(3) gate dielectric with H_(2)O as ALD precursor, the leakage current for the O_(3) precursor case is decreased by two orders of magnitude, while it keeps the same level at the fixed charges, interface state density, and border traps. The SIMS tests show that Al_(2)O_(3) with O_(3) as precursor contains more carbon impurities. The current transport mechanism analysis suggests that the C–H complex in Al_(2)O_(3) with O_(3) precursor serves as deep energy trap to reduce the leakage current. These results indicate that the Al_(2)O_(3)/β-Ga_(2)O_(3)MOS capacitor using the O_(3) precursor has a low leakage current and holds potential for application in β-Ga_(2)O_(3) MOSFETs.
文摘基于密度泛函理论的第一性原理方法,计算了Se掺杂单层MoS_2能带结构和光吸特性,并分析了对其光解水性质的影响。结果表明:本征单层MoS_2为直接带隙结构,禁带宽度为1.740 e V,导带底电位在H+/H2还原势之上0.430 e V,价带顶电位在O2/H2O的氧化势之下0.080 e V,具有可见光催化分解水的能力,但氧化和还原能力不均衡,导致单层MoS_2作为光催化剂分解水的效率不高。通过Se掺杂计算发现,单层MoS_2的禁带宽度变为1.727 e V,相应的光吸收谱变化幅度几乎不变,且体系的形成能较低,表明其热力学稳定性良好。然而,导带底电位调整到H+/H2还原势之上0.253 e V,价带顶电位处于O2/H2O的氧化势之下0.244e V,平衡了氧化与还原能力,单层MoS_2可见光催化分解水的效率得到提高。
