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Effect of chromium interlayer thickness on interfacial thermal conductance across copper/diamond interface 被引量:2
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作者 Xiaoyan Liu Fangyuan Sun +8 位作者 Wei Wang Jie Zhao Luhua Wang Zhanxun Che Guangzhu Bai Xitao Wang Jinguo Wang Moon JKim Hailong Zhang 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 2022年第11期2020-2031,共12页
The thermal conductivity of diamond particles reinforced copper matrix composite as an attractive thermal management material is significantly lowered by the non-wetting heterointerface.The paper investigates the heat... The thermal conductivity of diamond particles reinforced copper matrix composite as an attractive thermal management material is significantly lowered by the non-wetting heterointerface.The paper investigates the heat transport behavior between a 200-nm Cu layer and a single-crystalline diamond substrate inserted by a chromium(Cr)interlayer having a series of thicknesses from 150 nm down to 5 nm.The purpose is to detect the impact of the modifying interlayer thickness on the interfacial thermal conductance(h)between Cu and diamond.The time-domain thermoreflectance measurements suggest that the introduction of Cr interlayer dramatically improves the h between Cu and diamond owing to the enhanced interfacial adhesion and bridged dissimilar phonon states between Cu and diamond.The h value exhibits a decreasing trend as the Cr interlayer becomes thicker because of the increase in thermal resistance of Cr interlayer.The high h values are observed for the Cr interlayer thicknesses below 21 nm since phononic transport channel dominates the thermal conduction in the ultrathin Cr layer.The findings provide a way to tune the thermal conduction across the metal/nonmetal heterogeneous interface,which plays a pivotal role in designing materials and devices for thermal management applications. 展开更多
关键词 SPUTTERING diamond metal/nonmetal interface interfacial thermal conductance time-domain thermoreflectance
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Interfacial Structure and Mechanical Properties of Diamond/Copper Joint Brazed by Ag-Cu-In-Ti Low-Temperature Brazing Filler 被引量:2
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作者 Pan Yufan Liang Jiabin +10 位作者 Nie Jialong Liu Xin Sun Huawei Chang Yunfeng Li Huaxin Lu Chuanyang Xu Dong Wang Xingxing Yang Yang Yang Jianguo He Yanming 《稀有金属材料与工程》 北大核心 2025年第2期301-310,共10页
Ag-Cu-In-Ti low-temperature filler was used to braze the diamond and copper,and the effects of brazing temperature and soaking time on the microstructure and mechanical properties of the joints were investigated.In ad... Ag-Cu-In-Ti low-temperature filler was used to braze the diamond and copper,and the effects of brazing temperature and soaking time on the microstructure and mechanical properties of the joints were investigated.In addition,the joint formation mechanism was discussed,and the correlation between joint microstructure and mechanical performance was established.Results show that adding appropriate amount of In into the filler can significantly reduce the filler melting point and enhance the wettability of filler on diamond.When the brazing temperature is 750°C and the soaking time is 10 min,a uniformly dense braze seam with excellent metallurgical bonding can be obtained,and its average joint shear strength reaches 322 MPa.The lower brazing temperature can mitigate the risk of diamond graphitization and also reduce the residual stresses during joining. 展开更多
关键词 diamond microwave window vacuum brazing Ag-Cu-In-Ti microstructure mechanical properties
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Enhancement of nucleation of diamond films deposited on copper substrate by nickel modification layer 被引量:3
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作者 刘学璋 魏秋平 +1 位作者 翟豪 余志明 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2013年第3期667-673,共7页
A Ni layer with a thickness of about 100 nm was sputtered on Cu substrates,followed by an ultrasonic seeding with nanodiamond suspension.High-quality diamond film with its crystalline grains close to thermal equilibri... A Ni layer with a thickness of about 100 nm was sputtered on Cu substrates,followed by an ultrasonic seeding with nanodiamond suspension.High-quality diamond film with its crystalline grains close to thermal equilibrium shape was deposited on Cu substrates by hot-filament chemical vapor deposition(HF-CVD),and the sp2 carbon content was less than 5.56%.The nucleation and growth of diamond film were investigated by micro-Raman spectroscopy,scanning electron microscopy,and X-ray diffraction.The results show that the nucleation density of diamond on the Ni-modified Cu substrates is 10 times higher than that on blank Cu substrates.The enhancement mechanism of the nucleation kinetics by Ni modification layer results from two effects:namely,the nanometer rough Ni-modified surface shows an improved absorption of nanodiamond particles that act as starting points for the diamond nucleation during HF-CVD process;the strong catalytic effect of the Ni-modified surface causes the formation of graphite layer that acts as an intermediate to facilitate diamond nucleation quickly. 展开更多
关键词 diamond film nickel interlayer Cu substrate chemical vapor deposition nucleation kinetics surface modification
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Effects of rare earth element lanthanum on the microstructure of copper matrix diamond tool materials 被引量:7
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作者 JIAChengchang SONGYueqing +1 位作者 YUMing WANGTing 《Rare Metals》 SCIE EI CAS CSCD 2002年第2期90-94,共5页
Effects of rare earth element La on the microstructure of Cumatrix diamond tools were researched under the conditions of variousmaterials components and the process parameters in order to improvematerials properties. ... Effects of rare earth element La on the microstructure of Cumatrix diamond tools were researched under the conditions of variousmaterials components and the process parameters in order to improvematerials properties. SEM, XPS and X-ray were used to investigate thefracture section, microstructure and the element valence inmaterials. The Results shown that the combination of rare earthelement La and transition element Ti is advantageous to the bondingstate Between diamond particles and matrix, so it can improve thematerials properties. Suitable sintering temperature is 790 deg. C. 展开更多
关键词 rare earth element La interface reaction copper matrix diamond tool TITANIUM
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新生儿Diamond-Blackfan贫血1例
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作者 魏红玲 韩彤妍 +1 位作者 朱小辉 关硕 《中国当代儿科杂志》 北大核心 2025年第10期1276-1280,共5页
患儿,男,足月儿,生后因肤色苍白30 min,呼吸困难10 min入院。体格检查示肤色苍白,眼距宽,耳位低,颈部可触及囊性包块,肝大,右拇指连接球状赘生物,右足第2足趾趾甲异位。入院后查血红蛋白44 g/L,骨髓增生减低,全外显子组测序显示患儿RPS1... 患儿,男,足月儿,生后因肤色苍白30 min,呼吸困难10 min入院。体格检查示肤色苍白,眼距宽,耳位低,颈部可触及囊性包块,肝大,右拇指连接球状赘生物,右足第2足趾趾甲异位。入院后查血红蛋白44 g/L,骨髓增生减低,全外显子组测序显示患儿RPS19基因存在c.175T>C(p.Ser59Pro)杂合致病变异,该患儿明确诊断为Diamond-Blackfan贫血。随访至2岁2个月,血红蛋白及网织红细胞计数处于正常水平。该患儿起病早、贫血程度重,其症状丰富了临床疾病谱,为临床诊疗提供思路。 展开更多
关键词 贫血 diamond-Blackfan RPS19基因 新生儿
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Thermal conductivity of diamond/copper composites with a bimodal distribution of diamond particle sizes prepared by pressure infiltration method 被引量:3
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作者 CHEN Chao GUO Hong CHU Ke YIN Fazhang ZHANG Ximing HAN Yuanyuan FAN Yeming 《Rare Metals》 SCIE EI CAS CSCD 2011年第4期408-413,共6页
The thermal conductivity of diamond/copper composites with bimodal particle sizes was studied. The composites were prepared through pressure infiltration of liquid copper into diamond preforms with a mixture of 40 and... The thermal conductivity of diamond/copper composites with bimodal particle sizes was studied. The composites were prepared through pressure infiltration of liquid copper into diamond preforms with a mixture of 40 and 100 pm-size diamonds. The permeability of the preforms with different coarse-to-fine volume ratios of diamonds was investigated. The thermal conductivity of the diamond/copper composites with bimodal size distribution was compared to the theoretical value derived from an analytical model developed by Chu. It is predicted that the diamond/copper composites could reach a higher thermal conductivity and their surface roughness could be improved by applying bimodal diamond particle sizes. 展开更多
关键词 metallic matrix composites thermal conductivity diamonds copper size distribution pressure infiltration
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Effects of submicron diamonds on the growth of copper in Cu-diamond co-deposition 被引量:2
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作者 You-yang Wei Wei-ping Li +2 位作者 Hui-cong Liu Yong-zheng Liu Li-qun Zhu 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 2012年第1期72-76,共5页
Submicron diamonds were co-deposited on aluminum substrates with copper from the acid copper sulfate electrolyte by electro- lyte-suspension co-deposition. After submicron diamonds were added to the electrolyte, the s... Submicron diamonds were co-deposited on aluminum substrates with copper from the acid copper sulfate electrolyte by electro- lyte-suspension co-deposition. After submicron diamonds were added to the electrolyte, the shape of copper grains transformed from oval or round to polyhedron, the growth mode of copper grains transformed from columnar growth to gradual change in size, and the preferred ori- entation of copper grains transformed from (220) to (200). Analyzing the variation of cathodic overpotential, it was found that the cathodic overpotential tended to remain tmchanged when copper plane (220) grew in the process of electrodepositing pure copper, while it tended to decrease with time when copper plane (200) grew in the process of co-deposition. It was inferred that copper plane (200) was propitious to the deposition of submicron diamonds. 展开更多
关键词 composite coatings copper diamond CO-DEPOSITION gradient materials grain growth
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Preparation and thermal conductivity of tungsten coated diamond/copper composites 被引量:11
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作者 Shu-gang DAI Jin-wang LI Chang-ji WANG 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2022年第9期2979-2992,共14页
Tungsten was plated on the surface of diamond by using thermal diffusion method.Different process parameters were employed to prepare the composites with tungsten,diamond and copper.The micro morphology of different s... Tungsten was plated on the surface of diamond by using thermal diffusion method.Different process parameters were employed to prepare the composites with tungsten,diamond and copper.The micro morphology of different samples was observed,and the thermal conductivity of samples was measured by laser flash method.The optimal process parameters for preparing diamond/copper composites with high thermal conductivity were investigated.The results indicated that plating tungsten on diamond could modify the interface bonding.When the diamond was plated for 60 min,the coating appeared intact,uniform and flat,and the thermal conductivity of the sample could reach as high as 486 W/(m·K).The integrity and uniformity were more important than thickness for the coating.When the tungsten-plated diamond was further annealed,the metallurgical bonding between the coating and the diamond was enhanced,and the thermal conductivity rose to 559 W/(m·K). 展开更多
关键词 diamond/copper composites coating thermal conductivity interface bonding
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Microstructure and thermal conductivity of copper matrix composites reinforced with mixtures of diamond and SiC particles 被引量:14
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作者 Han, Yuanyuan Guo, Hong +3 位作者 Yin, Fazhang Zhang, Ximin Chu, Ke Fan, Yeming 《Rare Metals》 SCIE EI CAS CSCD 2012年第1期58-63,共6页
The thermal conductivity of diamond hybrid SiC/Cu,diamond/Cu and SiC/Cu composite were calculated by using the extended differential effective medium (DEM) theoretical model in this paper.The effects of the particle v... The thermal conductivity of diamond hybrid SiC/Cu,diamond/Cu and SiC/Cu composite were calculated by using the extended differential effective medium (DEM) theoretical model in this paper.The effects of the particle volume fraction,the particle size and the volume ratio of the diamond particles to the total particles on the thermal conductivity of the composite were studied.The DEM theoretical calculation results show that,for the diamond hybrid SiC/Cu composite,when the particle volume fraction is above 46% and the volume ratio of the diamond particles to the SiC particles is above 13:12,the thermal conductivity of the composite can reach 500 W·m-1·K-1.The thermal conduc-tivity of the composite has little change when the particle size is above 200μm.The experimental results show that Ti can improve the wettability of the SiC and Cu.The thermal conductivity of the diamond hybrid SiCTi/Cu is almost two times better than that of the diamond hybrid SiC/Cu.It is feasible to predict the thermal conductivity of the composite by DEM theoretical model. 展开更多
关键词 diamond hybrid SiC/Cu composite MICROSTRUCTURE thermal conductivity differential effective medium
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掺杂元素X(B、Al、Sn、Co)对IDB-X/Diamond界面结合性能的影响
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作者 简小刚 姚文山 +4 位作者 张毅 梁晓伟 胡吉博 陈哲 陈茂林 《金刚石与磨料磨具工程》 北大核心 2025年第1期37-45,共9页
基于量子力学第一性原理,建立了IDB-B/Diamond、IDB-Al/Diamond、IDB-Sn/Diamond和IDB-Co/Diamond 4种膜基界面模型,计算了膜基界面结合能、差分电荷密度和布居数,以探究孕镶金刚石钻头(impregnated diamond bits,IDB)基体中的常用元素X... 基于量子力学第一性原理,建立了IDB-B/Diamond、IDB-Al/Diamond、IDB-Sn/Diamond和IDB-Co/Diamond 4种膜基界面模型,计算了膜基界面结合能、差分电荷密度和布居数,以探究孕镶金刚石钻头(impregnated diamond bits,IDB)基体中的常用元素X(X=B、Al、Sn、Co)对IDB-X/Diamond膜基结合强度的影响机制。计算结果表明:膜基界面结合能大小为W_(ad-B)>W_(ad-Al)>W_(ad-Co)>W_(ad-Sn);B、Al是增强膜基结合强度的有益元素,因为B、Al原子的电荷主要转移到掺杂位点附近的C1~C3原子,其与C1~C3原子的键合作用强;Sn、Co会削弱膜基结合强度,这是由于Sn、Co原子与C1~C3原子的键合作用弱,同时膜基界面间的其他C原子因俘获电荷而相斥。压痕对比的实验结果与仿真结论相符。 展开更多
关键词 第一性原理 金刚石涂层 膜基结合 电荷转移 布居数 压痕实验
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Fabrication and characterization of copper-diamond particles
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作者 NIAZI A R 李树奎 +3 位作者 王迎春 刘金旭 呼陟宇 Usman 《Journal of Beijing Institute of Technology》 EI CAS 2013年第2期278-284,共7页
The electroless copper deposition on both pure and Cr-coated diamond particles was stud- ied to produce copper/diamond composites for electronic packaging materials. The particles were characterized and the mechanism ... The electroless copper deposition on both pure and Cr-coated diamond particles was stud- ied to produce copper/diamond composites for electronic packaging materials. The particles were characterized and the mechanism of product formation was investigated through scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS), X-ray diffraction (XRD), and X-ray photoelectron spectra (XPS). The particle coating thickness was measured using optical micro- graphs. The diamond particles got uniform coating thickness of copper crystals layers. This method provided an excellent base for the fabrication of metal-based composites using cheap equipments, and was less time consuming, nature friendly and economical compared with other methods of dia- mond surface metallization. 展开更多
关键词 diamond/Cu composites electroless copper deposition CHARACTERIZATIONS
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Microscratch of copper by a Rockwell C diamond indenter under a constant load 被引量:1
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作者 Ming Liu 《Nanotechnology and Precision Engineering》 CAS CSCD 2021年第3期20-44,共25页
The scratch test is used for quality control mostly in phenomenological ways,and whether fracture toughness can be obtained from this test is still a matter of debate requiring further elucidation.In this paper,values... The scratch test is used for quality control mostly in phenomenological ways,and whether fracture toughness can be obtained from this test is still a matter of debate requiring further elucidation.In this paper,values of the fracture toughness of copper obtained by different scratch-based approaches are compared in order to examine the applicability of scratch-based methodologies to characterize the fracture toughness of soft metals.The scratch response of copper to a Rockwell C diamond indenter is studied under a constant normal load condition.The variations of penetration depth,residual depth,and residual scratch width with applied normal load are quantified from spherical to sphero-conical contact regimes by piecewise functions.A newly proposed size effect law is found to be the most suitable for scratch-based approaches to characterizing the fracture toughness of soft metallic materials with significant plasticity.A simple expression relating the nominal stress to the penetration depth is proposed for the spherical contact regime and gives almost the same value of fracture toughness.The residual scratch width provides useful information on pile-up of material and on the spherical tip radius of the indenter.It is found that the values of the fracture toughness obtained from the microscratch test are influenced by the data range for analysis. 展开更多
关键词 Microscratching Rockwell C diamond probe Constant normal load Fracture toughness Residual scratch width
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Cu/diamond复合材料平面研磨实验研究
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作者 赵翠翠 刘成炜 +2 位作者 于晓琳 焦可如 黄树涛 《表面技术》 北大核心 2025年第10期208-224,共17页
目的 为实现Cu/diamond复合材料表面高效平坦化的研磨加工提供理论和实验基础,满足该材料应用需求。方法 对Cu/diamond复合材料进行平面研磨加工实验,研究了研磨盘转速、研磨压力及磨粒粒度对研磨表面质量和材料去除率的影响。结果 实... 目的 为实现Cu/diamond复合材料表面高效平坦化的研磨加工提供理论和实验基础,满足该材料应用需求。方法 对Cu/diamond复合材料进行平面研磨加工实验,研究了研磨盘转速、研磨压力及磨粒粒度对研磨表面质量和材料去除率的影响。结果 实验结果表明:Cu/diamond复合材料研磨过程中金刚石增强颗粒的去除形式主要包括延性去除、局部破碎、整体脱落、表面和边缘微小脆性破碎几种形式;研磨表面金刚石增强颗粒与Cu基体两相之间呈现台阶现象,随着金刚石磨粒粒度的增加台阶现象越显著,增强颗粒研磨表面整体平整,增强颗粒间的基体区域较为平坦;Cu/diamond复合材料研磨过程材料去除率随研磨盘转速、研磨压力的增大先增大后减小,随磨粒粒度的增大而增大,研磨盘转速对表面粗糙度影响不大,研磨压力对表面质量的影响大于研磨盘转速,其中磨粒粒度对表面质量及材料去除率的影响最为显著;综合研磨加工效果,Cu/diamond复合材料在研磨120 min,研磨盘转速为180 r/min、研磨压力为1.2 MPa、金刚石磨粒粒度为W14的条件下加工,可以获得表面粗糙度为0.488μm的平坦表面,材料去除率可达0.785μm/min。结论 通过合理选择研磨速度、研磨压力和金刚石磨料粒度对Cu/diamond复合材料进行研磨加工,能够以较高的研磨效率获得较为平坦的表面。 展开更多
关键词 Cu/diamond复合材料 平面研磨 材料去除率 表面粗糙度 表面形貌 研磨参数
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Deposition of Diamond Films on Copper Substrate
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作者 马志斌 邬钦崇 +3 位作者 舒兴胜 汪建华 王传新 黎向锋 《Plasma Science and Technology》 SCIE EI CAS CSCD 2000年第2期207-212,共6页
The direct deposition of diamond films on copper substrate has been suffered fromadhesion problems due to the mismatch of the thermal expansion coefficients of diamond andcopper. In this paper nuclei with valuable den... The direct deposition of diamond films on copper substrate has been suffered fromadhesion problems due to the mismatch of the thermal expansion coefficients of diamond andcopper. In this paper nuclei with valuable density were directly introduced thirough a submicrondiamond powder layer. The diamond grits partially were buried in the copper substrate leadingto better adhesion. Another method with nickel intermediate layer for enhancing the adhesionwas studied here in detail. It was suggested that Cu-Ni eutectic between the copper substrate andNi interlayer might contribute to the adhesion improvement. The quality of the diamond filmsdeposited wlth rnckel interlayer was investigated by scanning electron microscopy and Ramanspectroscopy. 展开更多
关键词 NI OO Deposition of diamond Films on copper Substrate
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Diamond Particles Deposited among Nickel/Copper Particles in Energy Controlled CH<sub>4</sub>/H<sub>2</sub>RF Discharge Plasmas
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作者 Junichi Emi Satoru Iizuka 《Journal of Surface Engineered Materials and Advanced Technology》 2012年第3期158-162,共5页
Formation of diamond particles was investigated in an energy-controlled CH4/H2 radio-frequency (RF) discharge plasma. Here, in particular, it was examined how diamond particles grew on a nickel substrate under an infl... Formation of diamond particles was investigated in an energy-controlled CH4/H2 radio-frequency (RF) discharge plasma. Here, in particular, it was examined how diamond particles grew on a nickel substrate under an influence of Cu vapor that was supplied from a heated Cu wire. Here, the plasma was generated by a hollow-magnetron-type (HMT) RF plasma source at the frequency of 13.56 MHz. Total pressure was kept at 100 mTorr. Diamond particles grew besides Ni and Cu particles. From Raman spectrum the substrate surface was covered with thin graphite film deposited as a background layer. It was shown that diamond could grow in a self-organized manner even when the other atomic gas species such as Ni and Cu were contained in the gas at the same time during the growth process. 展开更多
关键词 diamond MICROPARTICLE diamond Growth SELF-ORGANIZATION Graphite Cu Particle
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Effects of Implant Copper Layer on Diamond Film Deposition on Cemented Carbides
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作者 马志斌 汪建华 +1 位作者 邬钦崇 王传新 《Plasma Science and Technology》 SCIE EI CAS CSCD 2001年第1期647-651,共5页
The deposition of high-quality diamond films and their adhesion on cemented carbides are strongly influenced by the catalytic effect of cobalt under typical deposition conditions. Decreasing Co content on the surface... The deposition of high-quality diamond films and their adhesion on cemented carbides are strongly influenced by the catalytic effect of cobalt under typical deposition conditions. Decreasing Co content on the surface of the cemented carbide is often used for the diamond film deposition. But the leaching of Co from the WC-Co substrate leading to a mechanical weak surface often causes a poor adhesion. In this paper we adopted an implant copper layer prepared by vaporization to improve the mechanical properties of the Co-leached substrate. The diamond films were grown by microwave plasma chemical vapor deposition from CH4:H2 gas mixture. The cross section and the morphology of the diamond film were characterized by scanning electron microscopy (SEM). The non-diamond content in the film was analyzed by Raman spectroscopy. The effects of pretreatment on the concentrations of Co and Cu near the interfacial region were examined by energy dispersive spectrum (EDS) equipped with SEM. The adhesion of the diamond on the substrate was evaluated with a Rockwell-type hardness tester. The results indicate that the diamond films prepared with implant copper layer have a good adhesion to the cemented carbide substrate due to the recovery of the mechanical properties of the Co-depleted substrate after the copper implantation and the formation of less amorphous carbon between the substrate and the diamond film. 展开更多
关键词 Effects of Implant copper Layer on diamond Film Deposition on Cemented Carbides Co
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Role of copper in central nervous system physiology and pathology 被引量:2
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作者 Martina Locatelli Cinthia Farina 《Neural Regeneration Research》 SCIE CAS 2025年第4期1058-1068,共11页
Copper is a transition metal and an essential element for the organism,as alterations in its homeostasis leading to metal accumulation or deficiency have pathological effects in several organs,including the central ne... Copper is a transition metal and an essential element for the organism,as alterations in its homeostasis leading to metal accumulation or deficiency have pathological effects in several organs,including the central nervous system.Central copper dysregulations have been evidenced in two genetic disorders characterized by mutations in the copper-ATPases ATP7A and ATP7B,Menkes disease and Wilson’s disease,respectively,and also in multifactorial neurological disorders such as Alzheimer’s disease,Parkinson’s disease,amyotrophic lateral sclerosis,and multiple sclerosis.This review summarizes current knowledge about the role of copper in central nervous system physiology and pathology,reports about unbalances in copper levels and/or distribution under disease,describes relevant animal models for human disorders where copper metabolism genes are dysregulated,and discusses relevant therapeutic approaches modulating copper availability.Overall,alterations in copper metabolism may contribute to the etiology of central nervous system disorders and represent relevant therapeutic targets to restore tissue homeostasis. 展开更多
关键词 ASTROCYTES central nervous system copper CUPRIZONE multiple sclerosis MYELIN neurodegenerative disorders
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Role of copper chelating agents: between old applications and new perspectives in neuroscience 被引量:1
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作者 Rosalba Leuci Leonardo Brunetti +4 位作者 Vincenzo Tufarelli Marco Cerini Marco Paparella Nikola Puvača Luca Piemontese 《Neural Regeneration Research》 SCIE CAS 2025年第3期751-762,共12页
The role of copper element has been an increasingly relevant topic in recent years in the fields of human and animal health, for both the study of new drugs and innovative food and feed supplements. This metal plays a... The role of copper element has been an increasingly relevant topic in recent years in the fields of human and animal health, for both the study of new drugs and innovative food and feed supplements. This metal plays an important role in the central nervous system, where it is associated with glutamatergic signaling, and it is widely involved in inflammatory processes. Thus, diseases involving copper(Ⅱ) dyshomeostasis often have neurological symptoms, as exemplified by Alzheimer's and other diseases(such as Parkinson's and Wilson's diseases). Moreover, imbalanced copper ion concentrations have also been associated with diabetes and certain types of cancer, including glioma. In this paper, we propose a comprehensive overview of recent results that show the importance of these metal ions in several pathologies, mainly Alzheimer's disease, through the lens of the development and use of copper chelators as research compounds and potential therapeutics if included in multi-target hybrid drugs. Seeing how copper homeostasis is important for the well-being of animals as well as humans, we shortly describe the state of the art regarding the effects of copper and its chelators in agriculture, livestock rearing, and aquaculture, as ingredients for the formulation of feed supplements as well as to prevent the effects of pollution on animal productions. 展开更多
关键词 agriculture Alzheimer's disease CHELATORS copper feed supplements MULTI-TARGET
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磨粒粒度对Cu/diamond复合材料研磨效果的影响
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作者 赵翠翠 黄树涛 《机械工程与自动化》 2025年第6期49-50,共2页
对Cu/diamond复合材料进行研磨加工实验,研究不同磨粒粒度对研磨表面质量和去除率的影响。实验结果表明:Cu/diamond复合材料的研磨去除率随着磨粒粒度的增大而增大,表面粗糙度也随着磨粒粒度的增大而增大;磨粒粒度越小,研磨效率越低,表... 对Cu/diamond复合材料进行研磨加工实验,研究不同磨粒粒度对研磨表面质量和去除率的影响。实验结果表明:Cu/diamond复合材料的研磨去除率随着磨粒粒度的增大而增大,表面粗糙度也随着磨粒粒度的增大而增大;磨粒粒度越小,研磨效率越低,表面质量越好。 展开更多
关键词 Cu/diamond复合材料 表面粗糙度 材料去除率 平面研磨
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Atomic surface of diamond induced by novel green photocatalytic chemical mechanical polishing with high material removal rate 被引量:1
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作者 Zhibin Yu Zhenyu Zhang +6 位作者 Zinuo Zeng Cheng Fan Yang Gu Chunjing Shi Hongxiu Zhou Fanning Meng Junyuan Feng 《International Journal of Extreme Manufacturing》 2025年第2期661-676,共16页
Atomic surfaces are strictly required by high-performance devices of diamond.Nevertheless,diamond is the hardest material in nature,leading to the low material removal rate(MRR)and high surface roughness during machin... Atomic surfaces are strictly required by high-performance devices of diamond.Nevertheless,diamond is the hardest material in nature,leading to the low material removal rate(MRR)and high surface roughness during machining.Noxious slurries are widely used in conventional chemical mechanical polishing(CMP),resulting in the possible pollution to the environment.Moreover,the traditional slurries normally contain more than four ingredients,causing difficulties to control the process and quality of CMP.To solve these challenges,a novel green CMP for single crystal diamond was developed,consisting of only hydrogen peroxide,diamond abrasive and Prussian blue(PB)/titania catalyst.After CMP,atomic surface is achieved with surface roughness Sa of 0.079 nm,and the MRR is 1168 nm·h^(-1).Thickness of damaged layer is merely 0.66 nm confirmed by transmission electron microscopy(TEM).X-ray photoelectron spectroscopy,electron paramagnetic resonance and TEM reveal that·OH radicals form under ultraviolet irradiation on PB/titania catalyst.The·OH radicals oxidize diamond,transforming it from monocrystalline to amorphous atomic structure,generating a soft amorphous layer.This contributes the high MRR and formation of atomic surface on diamond.The developed novel green CMP offers new insights to achieve atomic surface of diamond for potential use in their high-performance devices. 展开更多
关键词 photocatalytic chemical mechanical polishing diamond photocatalytic Fenton reaction material removal rate atomic diamond surface
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