In this study,the design,analysis,manufacturing,and testing of a 3D-printed conformal microstrip array antenna for high-temperature environments is presented.3D printing technology is used to fabricate a curved cerami...In this study,the design,analysis,manufacturing,and testing of a 3D-printed conformal microstrip array antenna for high-temperature environments is presented.3D printing technology is used to fabricate a curved ceramic substrate,and laser sintering and microdroplet spraying processes are used to add the conductive metal on the curved substrate.The problems of gain loss,bandwidth reduction,and frequency shift caused by high temperatures are addressed by using a proper antenna design,with parasitic patches,slots,and metal resonant cavities.The antenna prototype is characterized by the curved substrates and the conductive metals for the power dividers,the patch,and the ground plane;its performance is examined up to a temperature of 600℃in a muffle furnace and compared with the results from the numerical analysis.The results show that the antenna can effectively function at 600℃and even higher temperatures.展开更多
Lithography is a Key enabling technique in modern micro/nano scale technology.Achieving the optimal trade-off between resolution,throughput,and cost remains a central focus in the ongoing development.However,current l...Lithography is a Key enabling technique in modern micro/nano scale technology.Achieving the optimal trade-off between resolution,throughput,and cost remains a central focus in the ongoing development.However,current lithographic techniques such as direct-write,projection,and extreme ultraviolet lithography achieve higher resolution at the expense of increased complexity in optical systems or the use of shorter-wavelength light sources,thus raising the overall cost of production.Here,we present a cost-effective and wafer-level perfect conformal contact lithography at the diffraction limit.By leveraging a transferable photoresist,the technique ensures optimal contact between the mask and photoresist with zero-gap,facilitating the transfer of patterns at the diffraction limit while maintaining high fidelity and uniformity across large wafers.This technique applies to a wide range of complex surfaces,including non-conductive glass surfaces,flexible substrates,and curved surfaces.The proposed technique expands the potential of contact photolithography for novel device architectures and practic al manufacturing processes.展开更多
One-dimensional nano-grating standard(ODNGS)is widely recognized as a crucial nanometric standard for metrological technology.However,achieving the ultratiny size of ODNGS with high consistent uniformity and low rough...One-dimensional nano-grating standard(ODNGS)is widely recognized as a crucial nanometric standard for metrological technology.However,achieving the ultratiny size of ODNGS with high consistent uniformity and low roughness by conventional processes such as the inductively coupled plasma(ICP)etching methodpresents a significant challenge in obtaining accurate calibration values.In this work,a 50-nm ODNGS with a conformal buffer layer(Al_(2)O_(3))is successfully obtained,indicating outstanding stability and abrasion resistance.Remarkably,the introduction of hydrogen silsesquioxane(HSQ)and amorphous Al_(2)O_(3)simultaneously guarantees an incredibly small expanded uncertainty(0.5 nm)and repeatability of the standard uniformity(less than 0.3 nm)in the grating dimensions.TheⅠ-Ⅴcurves of ODNGS with an Al_(2)O_(3)buffer layer at room temperature(RT)and200℃are depicted respectively to showcase the sustained favorable insulation properties.Notably,the nanostructure fluctuation,line edge roughness(LER)and line width roughness(LWR)of the standard can be decreased obviously by 64.1%,63%and 70%,respectively.Our results suggest that the ODNGS with Al_(2)O_(3)exhibits exceptional precision and robust calibration reliability for calibrating nanoscale measuring instruments.It holds tremendous potential for manufacturing high-precision nanostructures and grating arrays with precisely controllable dimensions,which will play a pivotal role in the fabrication of microfluidics chips,metasurface and photodetectors in the future.展开更多
Self-consolidating concrete(SCC)is an important innovation in concrete technology due to its superior properties.However,predicting its compressive strength remains challenging due to variability in its composition an...Self-consolidating concrete(SCC)is an important innovation in concrete technology due to its superior properties.However,predicting its compressive strength remains challenging due to variability in its composition and uncertainties in prediction outcomes.This study combines machine learning(ML)models with conformal prediction(CP)to address these issues,offering prediction intervals that quantify uncertainty and reliability.A dataset of over 3000 samples with 17 input variables was used to train four ensemble methods,including Random Forest(RF),Gradient Boosting Regressor(GBR),Extreme gradient boosting(XGBoost),and light gradient boosting machine(LGBM),along with CP techniques,including cross-validation plus(CV+)and conformalized quantile regression(CQR)methods.Results demonstrate that LGBM and XGBoost outperform RF,improving R^(2) by 4.5%and 5.7%and reducing Root-mean-square Error(RMSE)by 24.6%and 24.8%,respectively.While CV+yielded narrower but constant intervals,CV+_Gamma and CQR provided adaptive intervals,highlighting trade-offs among precision,adaptability,and coverage reliability.The integration of CP offers a robust framework for uncertainty quantification in SCC strength prediction and marks a significant step forward in ML applications for concrete research.展开更多
A structured method to generate conformal finite element(FE)mesh for realistic 3D woven textile reinforced composite is proposed.It is based on a voxel structure mesh reconstruction framework and aims to provide accur...A structured method to generate conformal finite element(FE)mesh for realistic 3D woven textile reinforced composite is proposed.It is based on a voxel structure mesh reconstruction framework and aims to provide accurate composite model at yarn level with material properties ready for use in commercial FE software.The textile representative volume element(RVE)is generated at filament level implementing the digital element method.Yarn structure is determined by filament bundle with variant cross-section shapes along its path.Yarn surface is then extracted using the Delaunay triangulation algorithm and a surface mesh is initiated.Then,the mesh domain is defined and constructed by voxel structure.Periodic boundary conditions,inter-yarn,and yarnmatrix interfaces are eliminated by re-mesh and mesh optimization.An element splitting rule is established to split the voxel unit into sub-elements to create smooth interface.A 3D orthogonal weave fabric reinforced composite is generated and simulated under compressive load.The composite structure and damage morphology are in good agreement with those of the experiment.展开更多
Electronic 3D printing possesses a remarkable molding ability and convenience in integrated circuits,flexible wearables,and individual automobile requirements.However,traditional 3D printing technology still struggles...Electronic 3D printing possesses a remarkable molding ability and convenience in integrated circuits,flexible wearables,and individual automobile requirements.However,traditional 3D printing technology still struggles to meet the demands of high precision and high efficiency in the process of fabricating a curved surface circuit,particularly achieving precise silver circuit molding on irregular substrates.Here,a high-precision and muti-scaled conformal manufacturing method for silver circuits is presented through the digital light processing(DLP)of ultraviolet-curable silver paste(UV-SP)with adjustable photocuring properties,enabling the successful preparation of micro-scaled conductive structure on the sharply skewed hook face.The minimum modeling depth and width of the cured silver paste can be well controlled to 10 and 88µm,respectively.Compared with traditional printing technology,the printing efficiency of complex patterns has increased by over 70%.The printed silver circuit demonstrates an exceptionally high electrical conductivity,reaching as high as 1.16×10^(7) S/m.Additionally,the UV-SP exhibits significant manufacturing efficiency and superior molding resolution compared to conventional direct ink writing and inkjet printing techniques,thereby contributing to the attainment of high precision and efficiency of conformal and micro-molding manufacturing in sensors,communication antennas,and other electronic devices based on curved substrates.展开更多
Parallel mechanisms with fewer degrees of freedom that incorporate two or more SPR limbs have been widely adopted in industrial applications in recent years.However,notable theoretical gaps persist,particularly in the...Parallel mechanisms with fewer degrees of freedom that incorporate two or more SPR limbs have been widely adopted in industrial applications in recent years.However,notable theoretical gaps persist,particularly in the field of analytical solutions for forward kinematics.To address this,this paper proposes an innovative forward kinematics analysis method based on Conformal Geometric Algebra(CGA)for complex hybrid mechanisms formed by serial concatenation of such parallel mechanisms.The method efficiently represents geometric elements and their operational relationships by defining appropriate unknown parameters.It constructs fundamental geometric objects such as spheres and planes,derives vertex expressions through intersection and dual operations,and establishes univariate high-order equations via inner product operations,ultimately obtaining complete analytical solutions for the forward kinematics of hybrid mechanisms.Using the(2-SPR+RPS)+(3-SPR)serial-parallel hybrid mechanism as a validation case,three configuration tests implemented in Mathematica demonstrate that:for each configuration,the upper 3-SPR mechanism yields 15 mathematical solutions,while the lower 2-SPR+RPS mechanism yields 4 mathematical solutions.After geometric constraint filtering,a unique physically valid solution is obtained for each mechanism.SolidWorks simulations further verify the correctness and reliability of the model.This research provides a reliable analytical method for forward kinematics of hybrid mechanisms,holding significant implications for advancing their applications in high-precision scenarios.展开更多
Ink-jetting printing stands out among various conformal additive manufacturing techniques for its multi-material,digital control,and process flexibility.Ink-jetting-based conformal additive manufacturing is renowned f...Ink-jetting printing stands out among various conformal additive manufacturing techniques for its multi-material,digital control,and process flexibility.Ink-jetting-based conformal additive manufacturing is renowned for its adaptability to complex topological surfaces and is emerging as a critical technology for future comprehensive conformal printing systems.This review highlights the distinctiveness of four primary ink-jetting printing techniques in conformal additive manufacturing—piezoelectric jetting,thermal bubble jetting,aerosol jetting,and electrohydrodynamic jetting—and delves into how these attributes endow ink-jetting printing with unique advantages in conformal processes.Furthermore,leveraging these advantages,the review discusses potential applications in conformal electronics,energy devices,biology,and electromagnetics to bolster the ongoing development and application.Considering the current state of this technology,the review identifies critical challenges for future advancements,such as dynamic surface printing,integrated fabrication of multifunctional conformal structures,and the balance between resolution and throughput.This review summarizes the latest research and technological advancements in ink-jetting-based conformal additive manufacturing,aiding in its innovative applications and enhanced manufacturing capabilities in the future.展开更多
We revisit the issue of whether the effective potential for the conformal factor of the metric,which is generated by quantized matter fields,possesses a non-vanishing vacuum expectation value(VEV)or not.We prove that ...We revisit the issue of whether the effective potential for the conformal factor of the metric,which is generated by quantized matter fields,possesses a non-vanishing vacuum expectation value(VEV)or not.We prove that the effective potential has a vanishing vacuum expectation value on the basis of a global GL(4)symmetry.We also account for why there seems to be two different effective potentials for the conformal factor in a theory,one of which gives rise to a vanishing VEV for the conformal factor,whereas the other has a non-vanishing VEV.展开更多
In the present paper we obtain the following result: Theorem Let M^R be a compact submanifold with parallel mean curvature vector in a locally symmetric and conformally flat Riemannian manifold N^(n+p)(p>1). If the...In the present paper we obtain the following result: Theorem Let M^R be a compact submanifold with parallel mean curvature vector in a locally symmetric and conformally flat Riemannian manifold N^(n+p)(p>1). If then M^n lies in a totally geodesic submanifold N^(n+1).展开更多
In this paper, the relation of the conformal invariance, the Noether symmetry, and the Lie symmetry for the Hamilton system is discussed in detail. The definition of the conformal invariance for Hamilton systems is gi...In this paper, the relation of the conformal invariance, the Noether symmetry, and the Lie symmetry for the Hamilton system is discussed in detail. The definition of the conformal invariance for Hamilton systems is given. The relation between the conformal invariance and the Noether symmetry is discussed, the conformal factors of the determining expressions are found by using the Noether symmetry, and the Noether conserved quantity resulted from the conformal invariance is obtained. The relation between the conformal invariance and the Lie symmetry is discussed, the conformal factors are found by using the Lie symmetry, and the Hojman conserved quantity resulted from the conformal invariance of the system is obtained. Two examples are given to illustrate the application of the results.展开更多
We propose a new concept of the conformal invariance and the conserved quantities for holonomic systems with quasi-coordinates. A one-parameter infinitesimal transformation group and its infinitesimal transformation v...We propose a new concept of the conformal invariance and the conserved quantities for holonomic systems with quasi-coordinates. A one-parameter infinitesimal transformation group and its infinitesimal transformation vector of generators for holonomic systems with quasi-coordinates are described in detail. The conformal factor in the determining equations of the Lie symmetry is found. The necessary and sufficient conditions of conformal invariance, which are simultaneously of Lie symmetry, are given. The conformal invariance may lead to corresponding Hojman conserved quantities when the conformal invariance satisfies some conditions. Finally, an illustration example is introduced to demonstrate the application of the result.展开更多
Conformal invariance and conserved quantities of a general holonomic system with variable mass are studied. The definition and the determining equation of conformal invariance for a general holonomic system with varia...Conformal invariance and conserved quantities of a general holonomic system with variable mass are studied. The definition and the determining equation of conformal invariance for a general holonomic system with variable mass are provided. The conformal factor expression is deduced from conformal invariance and Lie symmetry. The relationship between the conformal invariance and the Lie symmetry is discussed, and the necessary and sufficient condition under which the conformal invariance would be the Lie symmetry of the system under an infinitesimal oneparameter transformation group is deduced. The conserved quantities of the system are given. An example is given to illustrate the application of the result.展开更多
Mixed multifractal analysis studies the simultaneous scaling behavior of finitely many measures. A self-conformal measure is a measure invariant under a set of conformal mappings. In this paper, we provide a descript....Mixed multifractal analysis studies the simultaneous scaling behavior of finitely many measures. A self-conformal measure is a measure invariant under a set of conformal mappings. In this paper, we provide a descript.ion of the mixed multifractal theory of finitely many self-conformal measures.展开更多
As an efficient artificial truncating boundary condition, conformal perfectly matched layer (CPML) is a kind of multilayer anisotropic absorbing media. To reduce computing effort of CPML, this article proposes a layer...As an efficient artificial truncating boundary condition, conformal perfectly matched layer (CPML) is a kind of multilayer anisotropic absorbing media. To reduce computing effort of CPML, this article proposes a layer-oriented element integration algorithm. In this algorithm, the relative dielectric constant and permeability are considered as constants for each the very thin monolayer of CPML, and the element integration of multilayer along the normal direction is substituted by the element integration of m...展开更多
In this paper, we establish a differential equation about scalar curvature of conformally flat K-contact manifolds, and prove that a conformally symmetric K-contact manifold is a Riemann manifold with constant curvatu...In this paper, we establish a differential equation about scalar curvature of conformally flat K-contact manifolds, and prove that a conformally symmetric K-contact manifold is a Riemann manifold with constant curvature 1. At the same time, the results on Sasaki manifolds which are given by Miyazaawa and Yamagushi are generalized to K-contact manifolds.展开更多
N = 4 superconformal quantum mechanics of nonrelativistic particles in the typical 1/x2-potentials, which holds not only supersymmetry but also dynamical conformal symmetry, is studied. The corresponding superconforma...N = 4 superconformal quantum mechanics of nonrelativistic particles in the typical 1/x2-potentials, which holds not only supersymmetry but also dynamical conformal symmetry, is studied. The corresponding superconformal quantum mechanical algebra, which contains supersymmetric quantum mechanical algebra with four supercharges and conformal algebra as subalgebras, and its two canonical group chains are established.展开更多
This paper studies the conformed invariance and conserved quantities of general holonomic systems in phase space. The definition and the determining equation of conformed invariance for general holonomic systems in ph...This paper studies the conformed invariance and conserved quantities of general holonomic systems in phase space. The definition and the determining equation of conformed invariance for general holonomic systems in phase space are provided. The conformed factor expression is deduced from conformed invariance and Lie symmetry. The relationship between the conformed invariance and the Lie symmetry is discussed, and the necessary and sufficient condition that the conformal invariance would be the Lie symmetry of the system under the infinitesimal single-parameter transformation group is deduced. The conserved quantities of the system are given. An example is given to illustrate the application of the result.展开更多
This paper studies conformal invariance and generalized Hojman conserved quantities of mechanico-electrical systems. The definition and the determining equation of conformal invariance for mechanico-electrical systems...This paper studies conformal invariance and generalized Hojman conserved quantities of mechanico-electrical systems. The definition and the determining equation of conformal invariance for mechanico-electrical systems are provided. The conformal factor expression is deduced from conformal invariance and Lie symmetry under the infinitesimal single- parameter transformation group. The generalized Hojman conserved quantities from the conformal invariance of the system are given. An example is given to illustrate the application of the result.展开更多
In this note,we investigate conformal Killing vectors(CKVs)of locally rotationally symmetric(LRS)Bianchi type V spacetimes.Subject to some integrability conditions,CKVs up to implicit functions of(t,x)are obtained.Sol...In this note,we investigate conformal Killing vectors(CKVs)of locally rotationally symmetric(LRS)Bianchi type V spacetimes.Subject to some integrability conditions,CKVs up to implicit functions of(t,x)are obtained.Solving these integrability conditions in some particular cases,the CKVs are completely determined,obtaining a classification of LRS Bianchi type V spacetimes.The inheriting conformal Killing vectors of LRS Bianchi type V spacetimes are also discussed.展开更多
基金National Natural Science Foundation of china(No.U2241205)the Natural Science Basic Research Program of Shaanxi(Nos.2022JC-33,2023-GHZD-35,and 2024JC-ZDXM-25)+1 种基金the Fundamental Research Funds for the Central Universitiesthe National 111 Project to provide fund for conducting experiments。
文摘In this study,the design,analysis,manufacturing,and testing of a 3D-printed conformal microstrip array antenna for high-temperature environments is presented.3D printing technology is used to fabricate a curved ceramic substrate,and laser sintering and microdroplet spraying processes are used to add the conductive metal on the curved substrate.The problems of gain loss,bandwidth reduction,and frequency shift caused by high temperatures are addressed by using a proper antenna design,with parasitic patches,slots,and metal resonant cavities.The antenna prototype is characterized by the curved substrates and the conductive metals for the power dividers,the patch,and the ground plane;its performance is examined up to a temperature of 600℃in a muffle furnace and compared with the results from the numerical analysis.The results show that the antenna can effectively function at 600℃and even higher temperatures.
基金supported by the National Key Research and Development Program of China (2022YFB4602600)National Natural Science Foundation of China (Grant Nos. 52425508 & 52221001)the Hunan Provincial Natural Science Foundation of China (2025JJ60286)。
文摘Lithography is a Key enabling technique in modern micro/nano scale technology.Achieving the optimal trade-off between resolution,throughput,and cost remains a central focus in the ongoing development.However,current lithographic techniques such as direct-write,projection,and extreme ultraviolet lithography achieve higher resolution at the expense of increased complexity in optical systems or the use of shorter-wavelength light sources,thus raising the overall cost of production.Here,we present a cost-effective and wafer-level perfect conformal contact lithography at the diffraction limit.By leveraging a transferable photoresist,the technique ensures optimal contact between the mask and photoresist with zero-gap,facilitating the transfer of patterns at the diffraction limit while maintaining high fidelity and uniformity across large wafers.This technique applies to a wide range of complex surfaces,including non-conductive glass surfaces,flexible substrates,and curved surfaces.The proposed technique expands the potential of contact photolithography for novel device architectures and practic al manufacturing processes.
基金financially supported by the National Natural Science Foundation of China(No.52175434)the National Key Research and Development Program of China(No.2022YFB3204801)
文摘One-dimensional nano-grating standard(ODNGS)is widely recognized as a crucial nanometric standard for metrological technology.However,achieving the ultratiny size of ODNGS with high consistent uniformity and low roughness by conventional processes such as the inductively coupled plasma(ICP)etching methodpresents a significant challenge in obtaining accurate calibration values.In this work,a 50-nm ODNGS with a conformal buffer layer(Al_(2)O_(3))is successfully obtained,indicating outstanding stability and abrasion resistance.Remarkably,the introduction of hydrogen silsesquioxane(HSQ)and amorphous Al_(2)O_(3)simultaneously guarantees an incredibly small expanded uncertainty(0.5 nm)and repeatability of the standard uniformity(less than 0.3 nm)in the grating dimensions.TheⅠ-Ⅴcurves of ODNGS with an Al_(2)O_(3)buffer layer at room temperature(RT)and200℃are depicted respectively to showcase the sustained favorable insulation properties.Notably,the nanostructure fluctuation,line edge roughness(LER)and line width roughness(LWR)of the standard can be decreased obviously by 64.1%,63%and 70%,respectively.Our results suggest that the ODNGS with Al_(2)O_(3)exhibits exceptional precision and robust calibration reliability for calibrating nanoscale measuring instruments.It holds tremendous potential for manufacturing high-precision nanostructures and grating arrays with precisely controllable dimensions,which will play a pivotal role in the fabrication of microfluidics chips,metasurface and photodetectors in the future.
基金financially supported by the Natural Sciences and Engineering Research Council of Canada(NSERCGrant No.ALLRP 576708-22)ten industrial partners.
文摘Self-consolidating concrete(SCC)is an important innovation in concrete technology due to its superior properties.However,predicting its compressive strength remains challenging due to variability in its composition and uncertainties in prediction outcomes.This study combines machine learning(ML)models with conformal prediction(CP)to address these issues,offering prediction intervals that quantify uncertainty and reliability.A dataset of over 3000 samples with 17 input variables was used to train four ensemble methods,including Random Forest(RF),Gradient Boosting Regressor(GBR),Extreme gradient boosting(XGBoost),and light gradient boosting machine(LGBM),along with CP techniques,including cross-validation plus(CV+)and conformalized quantile regression(CQR)methods.Results demonstrate that LGBM and XGBoost outperform RF,improving R^(2) by 4.5%and 5.7%and reducing Root-mean-square Error(RMSE)by 24.6%and 24.8%,respectively.While CV+yielded narrower but constant intervals,CV+_Gamma and CQR provided adaptive intervals,highlighting trade-offs among precision,adaptability,and coverage reliability.The integration of CP offers a robust framework for uncertainty quantification in SCC strength prediction and marks a significant step forward in ML applications for concrete research.
基金co-supported by the Chongqing Natural Science Foundation General Project,China(No.CSTB2022NSCQ-MSX1115)。
文摘A structured method to generate conformal finite element(FE)mesh for realistic 3D woven textile reinforced composite is proposed.It is based on a voxel structure mesh reconstruction framework and aims to provide accurate composite model at yarn level with material properties ready for use in commercial FE software.The textile representative volume element(RVE)is generated at filament level implementing the digital element method.Yarn structure is determined by filament bundle with variant cross-section shapes along its path.Yarn surface is then extracted using the Delaunay triangulation algorithm and a surface mesh is initiated.Then,the mesh domain is defined and constructed by voxel structure.Periodic boundary conditions,inter-yarn,and yarnmatrix interfaces are eliminated by re-mesh and mesh optimization.An element splitting rule is established to split the voxel unit into sub-elements to create smooth interface.A 3D orthogonal weave fabric reinforced composite is generated and simulated under compressive load.The composite structure and damage morphology are in good agreement with those of the experiment.
基金supported by the National Natural Science Foundation of China(Nos.51972079 and 52302062)the National Key Research and Development Program of China(Nos.2022YFB370630202 and 2022YFB3706305).
文摘Electronic 3D printing possesses a remarkable molding ability and convenience in integrated circuits,flexible wearables,and individual automobile requirements.However,traditional 3D printing technology still struggles to meet the demands of high precision and high efficiency in the process of fabricating a curved surface circuit,particularly achieving precise silver circuit molding on irregular substrates.Here,a high-precision and muti-scaled conformal manufacturing method for silver circuits is presented through the digital light processing(DLP)of ultraviolet-curable silver paste(UV-SP)with adjustable photocuring properties,enabling the successful preparation of micro-scaled conductive structure on the sharply skewed hook face.The minimum modeling depth and width of the cured silver paste can be well controlled to 10 and 88µm,respectively.Compared with traditional printing technology,the printing efficiency of complex patterns has increased by over 70%.The printed silver circuit demonstrates an exceptionally high electrical conductivity,reaching as high as 1.16×10^(7) S/m.Additionally,the UV-SP exhibits significant manufacturing efficiency and superior molding resolution compared to conventional direct ink writing and inkjet printing techniques,thereby contributing to the attainment of high precision and efficiency of conformal and micro-molding manufacturing in sensors,communication antennas,and other electronic devices based on curved substrates.
基金Supported by Hebei Provincial Natural Science Foundation(Grant No.F2024202052)National Natural Science Foundation of China(Grant No.52175019)+3 种基金Beijing Municipal Natural Science Foundation(Grant No.L222038)Beijing Nova Programme Interdisciplinary Cooperation Project(Grant No.20240484699)Joint Funds of Industry-University-Research of Shanghai Academy of Spaceflight Technology(Grant No.SAST2022-017)Beijing Municipal Key Laboratory of Space-ground Interconnection and Convergence of China and Key Laboratory of IoT Monitoring and Early Warning,Ministry of Emergency Management。
文摘Parallel mechanisms with fewer degrees of freedom that incorporate two or more SPR limbs have been widely adopted in industrial applications in recent years.However,notable theoretical gaps persist,particularly in the field of analytical solutions for forward kinematics.To address this,this paper proposes an innovative forward kinematics analysis method based on Conformal Geometric Algebra(CGA)for complex hybrid mechanisms formed by serial concatenation of such parallel mechanisms.The method efficiently represents geometric elements and their operational relationships by defining appropriate unknown parameters.It constructs fundamental geometric objects such as spheres and planes,derives vertex expressions through intersection and dual operations,and establishes univariate high-order equations via inner product operations,ultimately obtaining complete analytical solutions for the forward kinematics of hybrid mechanisms.Using the(2-SPR+RPS)+(3-SPR)serial-parallel hybrid mechanism as a validation case,three configuration tests implemented in Mathematica demonstrate that:for each configuration,the upper 3-SPR mechanism yields 15 mathematical solutions,while the lower 2-SPR+RPS mechanism yields 4 mathematical solutions.After geometric constraint filtering,a unique physically valid solution is obtained for each mechanism.SolidWorks simulations further verify the correctness and reliability of the model.This research provides a reliable analytical method for forward kinematics of hybrid mechanisms,holding significant implications for advancing their applications in high-precision scenarios.
基金supported by the National Natural Science Foundation of China(Grant Nos.52005059 and 52375306)the Open Foundation of the Key Laboratory of Advanced Marine Materials(Grant No.2024K01)the Graduate Research and Innovation Foundation of Chongqing,China(Grant No.CYB240011)。
文摘Ink-jetting printing stands out among various conformal additive manufacturing techniques for its multi-material,digital control,and process flexibility.Ink-jetting-based conformal additive manufacturing is renowned for its adaptability to complex topological surfaces and is emerging as a critical technology for future comprehensive conformal printing systems.This review highlights the distinctiveness of four primary ink-jetting printing techniques in conformal additive manufacturing—piezoelectric jetting,thermal bubble jetting,aerosol jetting,and electrohydrodynamic jetting—and delves into how these attributes endow ink-jetting printing with unique advantages in conformal processes.Furthermore,leveraging these advantages,the review discusses potential applications in conformal electronics,energy devices,biology,and electromagnetics to bolster the ongoing development and application.Considering the current state of this technology,the review identifies critical challenges for future advancements,such as dynamic surface printing,integrated fabrication of multifunctional conformal structures,and the balance between resolution and throughput.This review summarizes the latest research and technological advancements in ink-jetting-based conformal additive manufacturing,aiding in its innovative applications and enhanced manufacturing capabilities in the future.
基金supported in part by the JSPS Kakenhi under Grant No.21K03539。
文摘We revisit the issue of whether the effective potential for the conformal factor of the metric,which is generated by quantized matter fields,possesses a non-vanishing vacuum expectation value(VEV)or not.We prove that the effective potential has a vanishing vacuum expectation value on the basis of a global GL(4)symmetry.We also account for why there seems to be two different effective potentials for the conformal factor in a theory,one of which gives rise to a vanishing VEV for the conformal factor,whereas the other has a non-vanishing VEV.
文摘In the present paper we obtain the following result: Theorem Let M^R be a compact submanifold with parallel mean curvature vector in a locally symmetric and conformally flat Riemannian manifold N^(n+p)(p>1). If then M^n lies in a totally geodesic submanifold N^(n+1).
文摘In this paper, the relation of the conformal invariance, the Noether symmetry, and the Lie symmetry for the Hamilton system is discussed in detail. The definition of the conformal invariance for Hamilton systems is given. The relation between the conformal invariance and the Noether symmetry is discussed, the conformal factors of the determining expressions are found by using the Noether symmetry, and the Noether conserved quantity resulted from the conformal invariance is obtained. The relation between the conformal invariance and the Lie symmetry is discussed, the conformal factors are found by using the Lie symmetry, and the Hojman conserved quantity resulted from the conformal invariance of the system is obtained. Two examples are given to illustrate the application of the results.
基金supported by the National Natural Science Foundation of China (Grant Nos.10672143 and 60575055)
文摘We propose a new concept of the conformal invariance and the conserved quantities for holonomic systems with quasi-coordinates. A one-parameter infinitesimal transformation group and its infinitesimal transformation vector of generators for holonomic systems with quasi-coordinates are described in detail. The conformal factor in the determining equations of the Lie symmetry is found. The necessary and sufficient conditions of conformal invariance, which are simultaneously of Lie symmetry, are given. The conformal invariance may lead to corresponding Hojman conserved quantities when the conformal invariance satisfies some conditions. Finally, an illustration example is introduced to demonstrate the application of the result.
基金Project supported by the Key Disciplines’ Building Foundation of Henan Institute of Educationthe Natural Science Foundation of Education Bureau of Henan Province,China (Grant No. 2009A140003)the Young Core Instructor from Henan Institute of Education
文摘Conformal invariance and conserved quantities of a general holonomic system with variable mass are studied. The definition and the determining equation of conformal invariance for a general holonomic system with variable mass are provided. The conformal factor expression is deduced from conformal invariance and Lie symmetry. The relationship between the conformal invariance and the Lie symmetry is discussed, and the necessary and sufficient condition under which the conformal invariance would be the Lie symmetry of the system under an infinitesimal oneparameter transformation group is deduced. The conserved quantities of the system are given. An example is given to illustrate the application of the result.
基金Supported by the National Science Foundation of China (10671180)the Education Foundation of Jiangsu Province (08KJB110003)Jiangsu University (05JDG041)
文摘Mixed multifractal analysis studies the simultaneous scaling behavior of finitely many measures. A self-conformal measure is a measure invariant under a set of conformal mappings. In this paper, we provide a descript.ion of the mixed multifractal theory of finitely many self-conformal measures.
基金National Natural Science Foundation of China (10477018) Science and Technology Innovation Foundation of North-western Polytechnical University (W016143)
文摘As an efficient artificial truncating boundary condition, conformal perfectly matched layer (CPML) is a kind of multilayer anisotropic absorbing media. To reduce computing effort of CPML, this article proposes a layer-oriented element integration algorithm. In this algorithm, the relative dielectric constant and permeability are considered as constants for each the very thin monolayer of CPML, and the element integration of multilayer along the normal direction is substituted by the element integration of m...
文摘In this paper, we establish a differential equation about scalar curvature of conformally flat K-contact manifolds, and prove that a conformally symmetric K-contact manifold is a Riemann manifold with constant curvature 1. At the same time, the results on Sasaki manifolds which are given by Miyazaawa and Yamagushi are generalized to K-contact manifolds.
文摘N = 4 superconformal quantum mechanics of nonrelativistic particles in the typical 1/x2-potentials, which holds not only supersymmetry but also dynamical conformal symmetry, is studied. The corresponding superconformal quantum mechanical algebra, which contains supersymmetric quantum mechanical algebra with four supercharges and conformal algebra as subalgebras, and its two canonical group chains are established.
基金supported by the Key Disciplines’ Building Foundation of Henan Institute of Education,the Natural Science Foundation f Education Bureau of Henan Province,China (Grant No 2009A140003)
文摘This paper studies the conformed invariance and conserved quantities of general holonomic systems in phase space. The definition and the determining equation of conformed invariance for general holonomic systems in phase space are provided. The conformed factor expression is deduced from conformed invariance and Lie symmetry. The relationship between the conformed invariance and the Lie symmetry is discussed, and the necessary and sufficient condition that the conformal invariance would be the Lie symmetry of the system under the infinitesimal single-parameter transformation group is deduced. The conserved quantities of the system are given. An example is given to illustrate the application of the result.
文摘This paper studies conformal invariance and generalized Hojman conserved quantities of mechanico-electrical systems. The definition and the determining equation of conformal invariance for mechanico-electrical systems are provided. The conformal factor expression is deduced from conformal invariance and Lie symmetry under the infinitesimal single- parameter transformation group. The generalized Hojman conserved quantities from the conformal invariance of the system are given. An example is given to illustrate the application of the result.
文摘In this note,we investigate conformal Killing vectors(CKVs)of locally rotationally symmetric(LRS)Bianchi type V spacetimes.Subject to some integrability conditions,CKVs up to implicit functions of(t,x)are obtained.Solving these integrability conditions in some particular cases,the CKVs are completely determined,obtaining a classification of LRS Bianchi type V spacetimes.The inheriting conformal Killing vectors of LRS Bianchi type V spacetimes are also discussed.
