The results of the investigation of conduction mechanism of silicate glass doped by oxide compounds of ruthenium (thick film resistor) are reported. The formation of diffusion zones in the softened glass during firing...The results of the investigation of conduction mechanism of silicate glass doped by oxide compounds of ruthenium (thick film resistor) are reported. The formation of diffusion zones in the softened glass during firing process of the mixture of the glass and the dopant powders is considered. As the result the doping glass becomes conductive. These diffusion zones have higher conductivity and act as percolation levels for the free charge carriers. The effect of tem-perature and duration of firing process on the conductivity of doped glass is considered. Experimental results are in a good agreement with the model.展开更多
This article is the final part of the investigation of conduction mechanism of silicate glass doped by oxide compounds of ruthenium (thick film resistors). In the first part [1], the formation of percolation levels du...This article is the final part of the investigation of conduction mechanism of silicate glass doped by oxide compounds of ruthenium (thick film resistors). In the first part [1], the formation of percolation levels due to diffusion of dopant atoms into the glass has been considered. The diffusion mechanism allowed us to explain shifting of the percolation threshold towards to lower value and the effect of firing conditions as well as the components composition on the electrical conduction of the doped glass. The coexistence of thermal activation and localization of free charge carriers as the result of nanocrystalline structure of the glass was the subject of the second part [2]. Because of it, the resistivity of the doped silicate glass is proportional to exp (–aT–ζ) at low temperatures (T 50 K), 0.4 ζ < 0.8. Structural transitions of nanocrystals take place at high temperatures (T > 800 K) and the conductivity of the doped silicate glass decreases sharply. We consider the origin of the minimum in the temperature dependence of resistivity of the doped silicate glass here. It is shown that the minimum arises from merge of impurity band into the valence band of glass at temperature high enough, so thermal activation of charge carriers as well as its hopping are failed, and scattering of free charge carriers become predominant factor in the temperature dependence of the resistivity.展开更多
利用地沟油与正常食用油的导电率不同导致单位体积电阻不同,提出一种基于互补金属氧化物半导体工艺(Complementary Metal Oxide Semiconductor,CMOS)的线性检测模块。由于使用直接选择与短接到地的方法实现电阻串分压,使得分压线性度更...利用地沟油与正常食用油的导电率不同导致单位体积电阻不同,提出一种基于互补金属氧化物半导体工艺(Complementary Metal Oxide Semiconductor,CMOS)的线性检测模块。由于使用直接选择与短接到地的方法实现电阻串分压,使得分压线性度更高。在脉冲计数的作用下,电阻分压通过与参考电压相比较可以得到不同的高电平数,不仅可以区分地沟油与正常食用油,还可以得出正常油掺入地沟油的质量分数。在检测计核心电路设计方面,由于采用CMOS工艺设计,所以可以实现低面积和低功耗的检测。展开更多
文摘The results of the investigation of conduction mechanism of silicate glass doped by oxide compounds of ruthenium (thick film resistor) are reported. The formation of diffusion zones in the softened glass during firing process of the mixture of the glass and the dopant powders is considered. As the result the doping glass becomes conductive. These diffusion zones have higher conductivity and act as percolation levels for the free charge carriers. The effect of tem-perature and duration of firing process on the conductivity of doped glass is considered. Experimental results are in a good agreement with the model.
文摘This article is the final part of the investigation of conduction mechanism of silicate glass doped by oxide compounds of ruthenium (thick film resistors). In the first part [1], the formation of percolation levels due to diffusion of dopant atoms into the glass has been considered. The diffusion mechanism allowed us to explain shifting of the percolation threshold towards to lower value and the effect of firing conditions as well as the components composition on the electrical conduction of the doped glass. The coexistence of thermal activation and localization of free charge carriers as the result of nanocrystalline structure of the glass was the subject of the second part [2]. Because of it, the resistivity of the doped silicate glass is proportional to exp (–aT–ζ) at low temperatures (T 50 K), 0.4 ζ < 0.8. Structural transitions of nanocrystals take place at high temperatures (T > 800 K) and the conductivity of the doped silicate glass decreases sharply. We consider the origin of the minimum in the temperature dependence of resistivity of the doped silicate glass here. It is shown that the minimum arises from merge of impurity band into the valence band of glass at temperature high enough, so thermal activation of charge carriers as well as its hopping are failed, and scattering of free charge carriers become predominant factor in the temperature dependence of the resistivity.
文摘利用地沟油与正常食用油的导电率不同导致单位体积电阻不同,提出一种基于互补金属氧化物半导体工艺(Complementary Metal Oxide Semiconductor,CMOS)的线性检测模块。由于使用直接选择与短接到地的方法实现电阻串分压,使得分压线性度更高。在脉冲计数的作用下,电阻分压通过与参考电压相比较可以得到不同的高电平数,不仅可以区分地沟油与正常食用油,还可以得出正常油掺入地沟油的质量分数。在检测计核心电路设计方面,由于采用CMOS工艺设计,所以可以实现低面积和低功耗的检测。
