本文以稻壳基多孔炭为载体,采用硼氢化钠为还原剂,制备了非贵金属负载复合材料,即Fe-AC、Co-AC和Ni-AC。采用XRD、SEM、BET和XPS分别表征复合材料的物理化学性质。将复合材料分别制成的复合电极,在1 M KOH的三电极体系中,利用循环伏安...本文以稻壳基多孔炭为载体,采用硼氢化钠为还原剂,制备了非贵金属负载复合材料,即Fe-AC、Co-AC和Ni-AC。采用XRD、SEM、BET和XPS分别表征复合材料的物理化学性质。将复合材料分别制成的复合电极,在1 M KOH的三电极体系中,利用循环伏安、交流阻抗、电化学活性表面积(ECSA)、塔菲尔斜率等方法研究复合电极电催化氧化肼(HzOR)的性能与机理。结果表明,成功地获得了非贵金属包膜多孔炭复合材料,并成功地应用于碱体系的电催化氧化肼中。综合性能推断,其中Co-AC比表面积可达到804.4 m^(2)/g,Co-AC表现出最高的ECSA为49.3 cm^(2),扫速为10 mV/s时反应速率最快,并且能在大于100 mA/cm^(2)的电流密度下保持持续稳定工作,说明具有良好的稳定性。展开更多
Enhancement of post-annealing stability in Co/ Ni multilayers with perpendicular magnetic anisotropy （PMA） was obtained by inserting Au layers into Ni/Co interfaces. After annealing at 350 ℃, the effective mag- net...Enhancement of post-annealing stability in Co/ Ni multilayers with perpendicular magnetic anisotropy （PMA） was obtained by inserting Au layers into Ni/Co interfaces. After annealing at 350 ℃, the effective mag- netic anisotropy density （Kef0 for Ta（3）/Pt（2）/[Co（0.3）/ Ni（0.6）/Au（0.3）]× 3/Co（0.3）/Pt（1）/Ta（3） （in nm） keeps at 0.48 × 105 J·m^-3. Scanning transmission electron micro- scopy-high-angle annular dark field （STEM-HAADF） analysis shows that the diffusion between Ni and Co layers is obstructed by the Au insertion layers among them, which is responsible for the post-annealing stability enhancement of the multilayers. Multilayers with Pt insertion layers were also investigated as reference samples in this work. Com- pared with Pt-layer-inserted Co/Ni multilayers, the Au insertion layers are found to bring seldom interfacial PMA to the multilayers, making it competitive in being employed to enhance the post-annealing stability of PMA Co/Ni multilayers which are used for magnetic random access memory devices （MRAM）.展开更多
In this study,the possibility of obtaining micro and nano-scaled Co/Ni bi-layered films by use of the electrochemical method was investigated.The electrodeposition process was performed with presence and absence of a ...In this study,the possibility of obtaining micro and nano-scaled Co/Ni bi-layered films by use of the electrochemical method was investigated.The electrodeposition process was performed with presence and absence of a uniform external magnetic field up to 1T to examine its influence on structure and morphology of the obtained thin films. Afterwards,each sample was annealed under high magnetic field with strength up to 12 T at 623 K,what allowed compare and determine the changes in morphology and structure,before and after heat treatment.The Co/Ni bi-layered thin films were deposited onto an indium-doped tin oxide(ITO)-coated conducting glass substrate from sulfate baths with boric acid as an additive.The results show drastic changes in the morphology between macro and nano-scaled films which were strongly affected by an introduction of the magnetic field to the electrodeposition process.The annealing process allowed to determine the nucleus transition and showed that under the high temperature treatment it is possible to control the growth mode as well as the phase composition changes.展开更多
基金financially supported by the National Natural Science Foundation of China(Nos.51101012, 51271211,51331002,51371025,51371027,51471028 and 51571017)the National Key Scientific Research Projects of China(No. 2015CB921502)+1 种基金the Beijing Nova Program(No.Z141103001814039)the Fundamental Research Funds for the Central Universities(No. FRF-TP-14-002C1)
文摘Enhancement of post-annealing stability in Co/ Ni multilayers with perpendicular magnetic anisotropy （PMA） was obtained by inserting Au layers into Ni/Co interfaces. After annealing at 350 ℃, the effective mag- netic anisotropy density （Kef0 for Ta（3）/Pt（2）/[Co（0.3）/ Ni（0.6）/Au（0.3）]× 3/Co（0.3）/Pt（1）/Ta（3） （in nm） keeps at 0.48 × 105 J·m^-3. Scanning transmission electron micro- scopy-high-angle annular dark field （STEM-HAADF） analysis shows that the diffusion between Ni and Co layers is obstructed by the Au insertion layers among them, which is responsible for the post-annealing stability enhancement of the multilayers. Multilayers with Pt insertion layers were also investigated as reference samples in this work. Com- pared with Pt-layer-inserted Co/Ni multilayers, the Au insertion layers are found to bring seldom interfacial PMA to the multilayers, making it competitive in being employed to enhance the post-annealing stability of PMA Co/Ni multilayers which are used for magnetic random access memory devices （MRAM）.
基金Item Sponsored by National Natural Science Foundation of China(51061130557,51101032)French ANR,Champagne-Ardenne Region Council and Pole MATERALIA(Programme COMAGNET,Grant No.2010-INTB-903-01)
文摘In this study,the possibility of obtaining micro and nano-scaled Co/Ni bi-layered films by use of the electrochemical method was investigated.The electrodeposition process was performed with presence and absence of a uniform external magnetic field up to 1T to examine its influence on structure and morphology of the obtained thin films. Afterwards,each sample was annealed under high magnetic field with strength up to 12 T at 623 K,what allowed compare and determine the changes in morphology and structure,before and after heat treatment.The Co/Ni bi-layered thin films were deposited onto an indium-doped tin oxide(ITO)-coated conducting glass substrate from sulfate baths with boric acid as an additive.The results show drastic changes in the morphology between macro and nano-scaled films which were strongly affected by an introduction of the magnetic field to the electrodeposition process.The annealing process allowed to determine the nucleus transition and showed that under the high temperature treatment it is possible to control the growth mode as well as the phase composition changes.
