The buffer layer CeO2 films were grown on cube textured metallic Ni substrates by using reactive magnetrun sputtering. Ar/H2 mixed atmosphere, which effectively inhibited the formation of NiO, was used as pre-depositi...The buffer layer CeO2 films were grown on cube textured metallic Ni substrates by using reactive magnetrun sputtering. Ar/H2 mixed atmosphere, which effectively inhibited the formation of NiO, was used as pre-depositing gas before CeO2 films were grown in Ar and 02. At 700 ℃ under the total pressure of 26 Pa,the pure c-axis orientation tilm was obtained. X-ray θ-2θscan, pole figure and φ-scan were used to observe the microstructure of the buffer layer. The resuits show that CeO2 film has strong cube texture and the FWHM is 9°. In addition, the CeO2 film is dense and crack-free.展开更多
The metal organic deposition (MOD) method was used for the epitaxial growth of the CeO2/La2Zr2O7(LZO)/LZO seed layer structure on a cube-textured Ni5W substrate layer by layer. The material phase and the macro-orienta...The metal organic deposition (MOD) method was used for the epitaxial growth of the CeO2/La2Zr2O7(LZO)/LZO seed layer structure on a cube-textured Ni5W substrate layer by layer. The material phase and the macro-orientations were analyzed by XRD. The surface morphology and the blocking performance of the buffer layer were investigated by SEM and AES. The grain orientation and the crystallographic growth mode of the CeO2 layer were first characterized by electron backscattering diffraction (EBSD). The uniformly distributed islanded LZO seed layer optimized both the in-plan and the out-plan orientation of the CeO2/LZO buffer layers, and the CeO2/LZO buffer layers with a thickness of 175 nm acted as an efficient Ni,W barrier. The EBSD analysis indicated that the crystallographic orientation of each layer can be obtained at various accelerating voltages for the multilayer sample, the percentage of {001}<110> rotated cube texture of CeO2 layer reaching 97.4% at the accelerating voltage of 15 kV, thus showing epitaxial deposition with a high texture.展开更多
The CeO2 and Y2O3 buffer layers were deposited on the cube textured metallic Ni substrates by using reactive magnetron sputtering. Ar/H2 mixed atmosphere, which is used as pre-depositing gas, can effectively inhibit t...The CeO2 and Y2O3 buffer layers were deposited on the cube textured metallic Ni substrates by using reactive magnetron sputtering. Ar/H2 mixed atmosphere, which is used as pre-depositing gas, can effectively inhibit the formation of NiO. In addition, the linear relationship between pre-depositing time and total depositing time is required to ensure the epitaxial growth of the films. The growth conditions of CeO2 and Y2O3 were comparatively studied, and it is found that the windows of substrate temperatures and pressures for CeO2 films are wider than that for Y2O3 films.展开更多
文摘The buffer layer CeO2 films were grown on cube textured metallic Ni substrates by using reactive magnetrun sputtering. Ar/H2 mixed atmosphere, which effectively inhibited the formation of NiO, was used as pre-depositing gas before CeO2 films were grown in Ar and 02. At 700 ℃ under the total pressure of 26 Pa,the pure c-axis orientation tilm was obtained. X-ray θ-2θscan, pole figure and φ-scan were used to observe the microstructure of the buffer layer. The resuits show that CeO2 film has strong cube texture and the FWHM is 9°. In addition, the CeO2 film is dense and crack-free.
基金National Basic Research Program "973" of China (2006CB601005)National Natural Science Foundation of China (50771003)National High Technology Research and Development Program of "863" (2009AA032401)
文摘The metal organic deposition (MOD) method was used for the epitaxial growth of the CeO2/La2Zr2O7(LZO)/LZO seed layer structure on a cube-textured Ni5W substrate layer by layer. The material phase and the macro-orientations were analyzed by XRD. The surface morphology and the blocking performance of the buffer layer were investigated by SEM and AES. The grain orientation and the crystallographic growth mode of the CeO2 layer were first characterized by electron backscattering diffraction (EBSD). The uniformly distributed islanded LZO seed layer optimized both the in-plan and the out-plan orientation of the CeO2/LZO buffer layers, and the CeO2/LZO buffer layers with a thickness of 175 nm acted as an efficient Ni,W barrier. The EBSD analysis indicated that the crystallographic orientation of each layer can be obtained at various accelerating voltages for the multilayer sample, the percentage of {001}<110> rotated cube texture of CeO2 layer reaching 97.4% at the accelerating voltage of 15 kV, thus showing epitaxial deposition with a high texture.
文摘The CeO2 and Y2O3 buffer layers were deposited on the cube textured metallic Ni substrates by using reactive magnetron sputtering. Ar/H2 mixed atmosphere, which is used as pre-depositing gas, can effectively inhibit the formation of NiO. In addition, the linear relationship between pre-depositing time and total depositing time is required to ensure the epitaxial growth of the films. The growth conditions of CeO2 and Y2O3 were comparatively studied, and it is found that the windows of substrate temperatures and pressures for CeO2 films are wider than that for Y2O3 films.
