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A 10GHz LC Voltage-Controlled Oscillator in 0.25μm CMOS
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作者 王欢 王志功 +2 位作者 冯军 章丽 李伟 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2008年第3期484-489,共6页
A monolithic 10GHz LC voltage-controlled oscillator (VCO) is implemented in standard 0.25μm CMOS technology. The VCO adopts an optimized symmetric circular inductor with center-tap, an accumulation-mode MOS (A-MOS... A monolithic 10GHz LC voltage-controlled oscillator (VCO) is implemented in standard 0.25μm CMOS technology. The VCO adopts an optimized symmetric circular inductor with center-tap, an accumulation-mode MOS (A-MOS) varactor in series with a passive metal-isolator-metal capacitor (MIM-CAP) and a tail current source with an LC filter to operate with high-frequency and low-noise resulting in - 103.2dBc/Hz at 1MHz offset from carrier frequency of 10.2GHz and approximately 11.5% tuning range. With a 3.3V supply voltage, the core circuit consumes 9.9mW. The chip area is 0.67mm × 0.58mm. 展开更多
关键词 VCO LC oscillator cmos technology
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Improving Characteristics of Integrated Switched-Capacitor DC-DC Converter by CMOS Technology
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作者 隋晓红 陈治明 +2 位作者 赵敏玲 余宁梅 王立志 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2003年第12期1239-1243,共5页
An integrated 3.3V/1.2V SC DC-DC converter operating under 10MHz with a fixed duty radio of 0.5 is presented.To improve the output current of the converter,CMOS technology is adopted to fabricate the switching devices... An integrated 3.3V/1.2V SC DC-DC converter operating under 10MHz with a fixed duty radio of 0.5 is presented.To improve the output current of the converter,CMOS technology is adopted to fabricate the switching devices,and mutually compensatory circuitry technology is also employed to double the output current furthermore.The simulation results using Hspice simulation software,show that the output currents of a single unit circuit and two unit circuits connected in a mutually compensatory manner of the improved converter is about 12.5mA and 26mA,respectively.The power conversion efficiency of the mutually compensatory circuit can amount to 73%,while its output voltage ripple is less than 1.5%.The converter is fabricated in standard Rohm 0.35μm CMOS technology in Tokyo University of Japan.The test result indicates that the output current of 9.8mA can be obtained from a single unit circuit of the improved converter. 展开更多
关键词 DC-DC converter cmos technology monolithic integration
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CMOS Quadrature Modulator and Up-Conversion Mixer for 802.11a Wireless LAN Systems
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作者 李文渊 王志功 毛银伟 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2007年第9期1364-1368,共5页
A quadrature modulator and an up-conversion mixer for an 802. lla wireless LAN system are designed and fabricated in 0.18μm gate length standard CMOS technology. A current feedback loop with a transconductor is used ... A quadrature modulator and an up-conversion mixer for an 802. lla wireless LAN system are designed and fabricated in 0.18μm gate length standard CMOS technology. A current feedback loop with a transconductor is used to improve the linearity of the quadrature modulator;An LC resonant tank is used as the load of the upconversion mixer to improve its gain and increase the voltage swing. The measurement results show that the input P1dB achieves -3.6dBm, the transducer power gain of the circuit is -3.6dB,and the current consumes about 45.8mA with a 1.8V power supply. 展开更多
关键词 RFIC cmos technology quadrature modulator up-conversion mixer Gilbert cell
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A 155Mbps 0.5μm CMOS Limiting Amplifier
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作者 焦阳 王志功 +1 位作者 王蓉 管志强 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2007年第2期176-181,共6页
This paper presents a 155Mbps limiting amplifier for STM-1 systems of SDH optical communication. It is implemented in CSMC 0.5μm CMOS technology. Under a supply voltage of 3.3V, it has a power consumption of 198mW. T... This paper presents a 155Mbps limiting amplifier for STM-1 systems of SDH optical communication. It is implemented in CSMC 0.5μm CMOS technology. Under a supply voltage of 3.3V, it has a power consumption of 198mW. The core of the circuit is composed of 6 cascaded amplifiers that are in a conventional structure of differential pairs,an output buffer, and a DC offset cancellation feedback loop. The small signal gain can be adjusted from 74 to 44dB by an off-chip resistor. The chip was packaged before being tested. The experimental results indicate that the circuit has an input dynamic range of 54dB and provides a single-ended output swing of 950mV. Its output eye diagram remains satisfactory when the pseudo-random bit sequence (PRBS) input speed reaches 400Mbps. 展开更多
关键词 optical communication limiting amplifier cmos technology SDH
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11.6-GHz 0.18-μm monolithic CMOS phase-locked loop
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作者 王骏峰 冯军 +4 位作者 李义慧 袁晟 熊明珍 王志功 胡庆生 《Journal of Southeast University(English Edition)》 EI CAS 2007年第1期35-38,共4页
A design of a ll. 6-GHz phase-locked loop (PLL) fabricated in 49-GHz 0. 18-μm CMOS (complementary metal-oxide-semiconductor transistor) technology is described. An analog multiplier phase detector (PD), a one-p... A design of a ll. 6-GHz phase-locked loop (PLL) fabricated in 49-GHz 0. 18-μm CMOS (complementary metal-oxide-semiconductor transistor) technology is described. An analog multiplier phase detector (PD), a one-pole passive low pass filter and a three-stage ring oscillator with variable negativeresistance loads build up the monolithic phase-locked loop. The measured rms jitter of output signal via onwafer testing is 2. 2 ps under the stimulation of 2^31 - 1 bit-long pseudo random bit sequence (PRBS) at the bit rate of 11.6 GHz. And the tracking range is 250 MHz. The phase noise in the locked condition is measured to be - 107 dBc/Hz at 10 MHz offset, and that of the ring VCO at the central frequency is -99 dBc/Hz at 10 MHz offset. The circuit area of the proposed PLL is only 0. 47mm×0.72mm and the direct current (DC) power dissipation is 164 mW under a 1.8-V supply. 展开更多
关键词 phase-locked loop cmos technology high speed
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Design of CMOS class-E power amplifier for low power applications
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作者 袁成 李智群 +1 位作者 刘继华 王志功 《Journal of Southeast University(English Edition)》 EI CAS 2009年第2期180-184,共5页
A fully integrated class-E power amplifier(PA) at 2.4 GHz implemented in a 0. 18 μm 6-metal-layer mixed/RF CMOS ( complementary metal-oxide-semiconductor transistor ) technology is presented. A two-stage amplific... A fully integrated class-E power amplifier(PA) at 2.4 GHz implemented in a 0. 18 μm 6-metal-layer mixed/RF CMOS ( complementary metal-oxide-semiconductor transistor ) technology is presented. A two-stage amplification structure is chosen for this PA. The driving stage produces a high swing switch signal by using resonation technology. The output stage is designed as a class-E topology to realize the power amplification. Under a 1.2 V power supply, the PA delivers a maximum output power of 8. 8 dBm with a power-added efficiency (PAE) of 44%. A new power control method for the class-E power amplifier is described. By changing the amplitude and duty cycle of the signal which enters the class-E switch transistor, the output power can be covered from - 3 to 8. 8 dBm through a three-bit control word. The proposed PA can be used in low power applications, such as wireless sensor networks and biotelemetry systems. 展开更多
关键词 class-E power amplifier complementary metal-oxidesemiconductor transistor(cmos technology low power application
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Investigation of the characteristics of GIDL current in 90nm CMOS technology 被引量:2
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作者 陈海峰 郝跃 +5 位作者 马晓华 张进城 李康 曹艳荣 张金凤 周鹏举 《Chinese Physics B》 SCIE EI CAS CSCD 2006年第3期645-648,共4页
A specially designed experiment is performed for investigating gate-induced drain leakage (GIDL) current in 90nm CMOS technology using lightly-doped drain (LDD) NMOSFET. This paper shows that the drain bias VD has... A specially designed experiment is performed for investigating gate-induced drain leakage (GIDL) current in 90nm CMOS technology using lightly-doped drain (LDD) NMOSFET. This paper shows that the drain bias VD has a strong effect on GIDL current as compared with the gate bias VG at the same drain-gate voltage VDG. It is found that the difference between ID in the off-state ID - VG characteristics and the corresponding one in the off-state ID - VD characteristics, which is defined as IDIFF, versus VDG shows a peak. The difference between the influences of VD and VG on GIDL current is shown quantitatively by IDIFF, especially in 90nm scale. The difference is due to different hole tunnellings, Furthermore, the maximum IDIFF(IDIFF,MAX) varies linearly with VDG in logarithmic coordiuates and also VDG at IDIFF,MAX with VF which is the characteristic voltage of IDIFF, The relations are studied and some related expressions are given. 展开更多
关键词 GIDL 90nm cmos technology band-to-band tunnelling
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Development of 0.50μm CMOS Integrated Circuits Technology
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作者 Yu Shan, Zhang Dingkang and Huang Chang 《Journal of Systems Engineering and Electronics》 SCIE EI CSCD 1992年第4期7-10,2,共5页
Submicron CMOS IC technology, including triple layer resist lithography technology, RIE, LDD, Titanium Salicide, shallow junction, thin gate oxide, no bird's beak isolation and channel's multiple implantation ... Submicron CMOS IC technology, including triple layer resist lithography technology, RIE, LDD, Titanium Salicide, shallow junction, thin gate oxide, no bird's beak isolation and channel's multiple implantation doping technology have been developed. 0.50μm. CMOS integrated circuits have been fabricated using this submicron CMOS process. 展开更多
关键词 In m cmos Integrated Circuits Technology Development of 0.50 cmos
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Research on Electric Field Confinement Effect in Silicon LED Fabricated by Standard CMOS Technology
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作者 YANG Guanghua WANG Wei 《Semiconductor Photonics and Technology》 CAS 2010年第2期84-87,92,共5页
The wedge-shaped and leaf-type silicon light-emitting devices(LED)are designed and fabricated with the Singapore Chartered Semi Inc.'s dual-gate standard 0.35μm CMOS process.The basic structure of the two devices... The wedge-shaped and leaf-type silicon light-emitting devices(LED)are designed and fabricated with the Singapore Chartered Semi Inc.'s dual-gate standard 0.35μm CMOS process.The basic structure of the two devices is N well-P+ junction.P+ area is the wedge-shaped structure,which is embedded in N well.The leaf-type silicon LED device is a combination of the three wedge-shaped LED devices.The main difference between the two devices is their different electrode distribution,which is mainly in order to analyze the application of electric field confinement(EFC).The devices' micrographs were measured with the Olympus IC test microscope.The forward and reverse bias electrical characteristics of the devices were tested.Light measurements of the devices show that the electrode layout is very important when the electric field confinement is applied. 展开更多
关键词 silicon LED standard cmos technology electric field confinement effect
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CMOS Realization of VDVTA and OTA Based Fully Electronically Tunable First Order All Pass Filter with Optimum Linearity at Low Supply Voltage ±0.85 V
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作者 Ghanshyam Singh 《Circuits and Systems》 2020年第4期39-49,共11页
This paper presents a new first order all pass filter configurations. The proposed all pass filter configuration employs two configurations namely VDVTA and OTAs based first order all pass filter configuration. The fi... This paper presents a new first order all pass filter configurations. The proposed all pass filter configuration employs two configurations namely VDVTA and OTAs based first order all pass filter configuration. The first proposed configuration employs a single VDVTA and one grounded capacitor whereas the second proposed configuration employs two OTAs and one grounded capacitor. Both types of proposed configurations are fully electronically tunable and their quality factors do not depend on tunable pole frequency range. The reported configurations yield low active and passive sensitivities and also have low power consumption with very low supply voltage ± 0.85 V with Bias Voltage ± 0.50 V. The PSPICE simulation of the proposed VDVTA and two OTAs based first order all pass filter configurations are verified using 0.18 μm CMOS Technology Process Parameters. 展开更多
关键词 Operational Transconductance Amplifier (OTA) Voltage Differencing Trans-conductance Amplifier (VDVTA) cmos Technology
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Integrated circuit for single channel neural signal regeneration 被引量:1
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作者 李文渊 王志功 《Journal of Southeast University(English Edition)》 EI CAS 2008年第2期155-158,共4页
Based on the 4-channel neural signal regeneration system which is realized by using discrete devices and successfully used for in-vivo experiments on rats and rabbits, a single channel neural signal regeneration integ... Based on the 4-channel neural signal regeneration system which is realized by using discrete devices and successfully used for in-vivo experiments on rats and rabbits, a single channel neural signal regeneration integrated circuit (IC)is designed and realized in CSMC ' s 0. 6 μm CMOS ( complementary metal-oxide-semiconductor transistor ) technology. The IC consists of a neural signal detection circuit with an adjustable gain, a buffer, and a function electrical stimulation (FES) circuit. The neural signal regenerating IC occupies a die area of 1.42 mm × 1.34 mm. Under a dual supply voltage of ±2. 5 V, the DC power consumption is less than 10 mW. The on-wafer measurement results are as follows: the output resistor is 118 ml), the 3 dB bandwidth is greater than 30 kHz, and the gain can be variable from 50 to 90 dB. The circuit is used for in-vivo experiments on the rat' s sciatic nerve as well as on the spinal cord with the cuff type electrode array and the twin-needle electrode. The neural signal is successfully regenerated both on a rat' s sciatic nerve bundle and on the spinal cord. 展开更多
关键词 neural signal regeneration function electrical stimulation integrated circuit ELECTRODE cmos technology
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Neuronal signal detecting and stimulating circuit array for monolithic integrated MEA
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作者 谢书珊 王志功 +1 位作者 潘海仙 吕晓迎 《Journal of Southeast University(English Edition)》 EI CAS 2009年第2期175-179,共5页
A neuronal signal detecting circuit and a neuronal signal stimulating circuit designed for a monolithic integrated MEA(micro-electrode array) system are described. As a basic cell of the circuits, an OPA( operation... A neuronal signal detecting circuit and a neuronal signal stimulating circuit designed for a monolithic integrated MEA(micro-electrode array) system are described. As a basic cell of the circuits, an OPA( operational amplifier) is designed with low power, low noise, small size and high gain. The detecting circuit has a chip area of 290 μm × 400 μm, a power dissipation of 2.02 mW, an equivalent input noise of 17.72 nV/ Hz, a gain of 60. 5 dB, and an output voltage from - 2. 48 to + 2. 5 V. The stimulating circuit has a chip area of 130 μm × 290 μm, a power dissipation of 740 μW, and an output voltage from - 2. 5 to 2. 04 V. The parameters show that two circuits are suitable for a monolithic integrated MEA system. The detecting circuit and MEA have been fabricated. The test results show that the detecting circuit works well. 展开更多
关键词 neuronal signal detecting noise micro-electrode array MEA complementary metal-oxide-semiconductor transistor cmos technology
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Challenges of Process Technology in 32nm Technology Node 被引量:1
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作者 吴汉明 王国华 +1 位作者 黄如 王阳元 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2008年第9期1637-1653,共17页
According to the international technology roadmap for semiconductors (ITRS),32nm technology node will be introduced around 2009. Scaling of CMOS logic devices from 45 to 32nm node has come across significant barrier... According to the international technology roadmap for semiconductors (ITRS),32nm technology node will be introduced around 2009. Scaling of CMOS logic devices from 45 to 32nm node has come across significant barriers. Overcoming these pitch-scaling induced barriers requires integrating the most advanced process technologies into product manufacturing. This paper reviews and discusses new technology applications that could be potentially integrated into 32nm node in the following areas:extension of immersion lithography,mobility enhancement substrate technology,metal/ high-k (MHK) gate stack, ultra-shallow junction (USJ) and other strain enhancement engineering methods, including stress proximity effect (SPT), dual stress liner (DSL), stress memorization technique (SMT), high aspect ratio process (HARP) for STI and PMD,embedded SiGe (for pFET) and SiC (for nFET) source/drain (S/D) using selective epitaxial growth (SEG) method,metallization for middle of line (MOL) and back-end of line (BEOL) ,and ultra low-k (ULK) integration. 展开更多
关键词 cmos technology 32nm technology node mobility enhancement metal gate/high k dielectrics ultra low k dielectrics
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Hybrid material integration in silicon photonic integrated circuits 被引量:3
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作者 Swapnajit Chakravarty† Min Teng +1 位作者 Reza Safian Leimeng Zhuang 《Journal of Semiconductors》 EI CAS CSCD 2021年第4期33-42,共10页
Hybrid integration ofⅢ-Ⅴand ferroelectric materials is being broadly adopted to enhance functionalities in silicon photonic integrated circuits(PICs).Bonding and transfer printing have been the popular approaches fo... Hybrid integration ofⅢ-Ⅴand ferroelectric materials is being broadly adopted to enhance functionalities in silicon photonic integrated circuits(PICs).Bonding and transfer printing have been the popular approaches for integration of III–V gain media with silicon PICs.Similar approaches are also being considered for ferroelectrics to enable larger RF modulation bandwidths,higher linearity,lower optical loss integrated optical modulators on chip.In this paper,we review existing integration strategies ofⅢ-Ⅴmaterials and present a route towards hybrid integration of bothⅢ-Ⅴand ferroelectrics on the same chip.We show that adiabatic transformation of the optical mode between hybrid ferroelectric and silicon sections enables efficient transfer of optical modal energies for maximum overlap of the optical mode with the ferroelectric media,similar to approaches adopted to maximize optical overlap with the gain section,thereby reducing lasing thresholds for hybridⅢ-Ⅴintegration with silicon PICs.Preliminary designs are presented to enable a foundry compatible hybrid integration route of diverse functionalities on silicon PICs. 展开更多
关键词 cmos technology photonic integrated circuits hybrid integration ferroelectric modulator
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A frequency servo SoC with output power stabilization loop technology for miniaturized atomic clocks 被引量:1
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作者 Hongyang Zhang Xinlin Geng +3 位作者 Zonglin Ye Kailei Wang Qian Xie Zheng Wang 《Journal of Semiconductors》 EI CAS CSCD 2024年第6期13-22,共10页
A frequency servo system-on-chip(FS-SoC)featuring output power stabilization technology is introduced in this study for high-precision and miniaturized cesium(Cs)atomic clocks.The proposed power stabilization loop(PSL... A frequency servo system-on-chip(FS-SoC)featuring output power stabilization technology is introduced in this study for high-precision and miniaturized cesium(Cs)atomic clocks.The proposed power stabilization loop(PSL)technique,incorporating an off-chip power detector(PD),ensures that the output power of the FS-SoC remains stable,mitigating the impact of power fluctuations on the atomic clock's stability.Additionally,a one-pulse-per-second(1PPS)is employed to syn-chronize the clock with GPS.Fabricated using 65 nm CMOS technology,the measured phase noise of the FS-SoC stands at-69.5 dBc/Hz@100 Hz offset and-83.9 dBc/Hz@1 kHz offset,accompanied by a power dissipation of 19.7 mW.The Cs atomic clock employing the proposed FS-SoC and PSL obtains an Allan deviation of 1.7×10^(-11) with 1-s averaging time. 展开更多
关键词 cmos technology atomic clock phase-locked loop output power stabilization 1PPS
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A Plus Type CC-Based Current-Mode Universal Biquad 被引量:1
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作者 Takao Tsukutani Noboru Yabuki 《Journal of Electrical Engineering》 2020年第1期17-20,共4页
This paper introduces a current-mode universal biquad circuit using only plus type CCs(current conveyors)(i.e.DVCCs(differential voltage current conveyors)and CCIIs(second generation current conveyors)).The circuit en... This paper introduces a current-mode universal biquad circuit using only plus type CCs(current conveyors)(i.e.DVCCs(differential voltage current conveyors)and CCIIs(second generation current conveyors)).The circuit enables LP(low-pass),BP(band-pass),HP(high-pass),BS(band-stop)and AP(all-pass)responses by the selection and/or addition of the input and output currents without any component matching constraints.Moreover the circuit parametersω0 and Q can be set orthogonally adjusting the circuit components.A design example is given together with simulation responses by PSPICE. 展开更多
关键词 Analog circuit biquad responses current conveyors cmos technology
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10Gb/s transmit equalizer using duobinary signaling over FR4 backplane 被引量:1
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作者 张银行 Hu Qingsheng 《High Technology Letters》 EI CAS 2017年第3期266-270,共5页
A 10Gb/s 6-tap transmit equalizer based on partial response signaling for high speed backplane transmission is presented. By combining features of equalizer and frequency-dependent channel,duobinary signaling can be g... A 10Gb/s 6-tap transmit equalizer based on partial response signaling for high speed backplane transmission is presented. By combining features of equalizer and frequency-dependent channel,duobinary signaling can be generated at the output of FR4 backplane,aiming at increasing data rate while reducing design complexity. Based on 0.18μm CMOS technology,this equalizer has been designed and fabricated,in which both variable capacitor and load resistor calibration techniques are explored to eliminate the effect of process variations. The chip occupies 0.68×0.8mm^2 including I/O pads and consumes a power of 194 mW with 1.8V power supply. Measurement results show that a typical 3-level eye diagram can be obtained at the receiver and the equalizer can work properly at the data rate of 10Gb/s. 展开更多
关键词 transmit equalizer duobinary partial response load resistor calibration cmos technology
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Accelerating hybrid and compact neural networks targeting perception and control domains with coarse-grained dataflow reconfiguration
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作者 Zheng Wang Libing Zhou +12 位作者 Wenting Xie Weiguang Chen Jinyuan Su Wenxuan Chen Anhua Du Shanliao Li Minglan Liang Yuejin Lin Wei Zhao Yanze Wu Tianfu Sun Wenqi Fang Zhibin Yu 《Journal of Semiconductors》 EI CAS CSCD 2020年第2期29-41,共13页
Driven by continuous scaling of nanoscale semiconductor technologies,the past years have witnessed the progressive advancement of machine learning techniques and applications.Recently,dedicated machine learning accele... Driven by continuous scaling of nanoscale semiconductor technologies,the past years have witnessed the progressive advancement of machine learning techniques and applications.Recently,dedicated machine learning accelerators,especially for neural networks,have attracted the research interests of computer architects and VLSI designers.State-of-the-art accelerators increase performance by deploying a huge amount of processing elements,however still face the issue of degraded resource utilization across hybrid and non-standard algorithmic kernels.In this work,we exploit the properties of important neural network kernels for both perception and control to propose a reconfigurable dataflow processor,which adjusts the patterns of data flowing,functionalities of processing elements and on-chip storages according to network kernels.In contrast to stateof-the-art fine-grained data flowing techniques,the proposed coarse-grained dataflow reconfiguration approach enables extensive sharing of computing and storage resources.Three hybrid networks for MobileNet,deep reinforcement learning and sequence classification are constructed and analyzed with customized instruction sets and toolchain.A test chip has been designed and fabricated under UMC 65 nm CMOS technology,with the measured power consumption of 7.51 mW under 100 MHz frequency on a die size of 1.8×1.8 mm^2. 展开更多
关键词 cmos technology digital integrated circuits neural networks dataflow architecture
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Small Area ROM Design for Embedded Applications
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作者 崔嵬 吴嗣亮 《Journal of Beijing Institute of Technology》 EI CAS 2007年第4期460-464,共5页
The compact full custom layout design of a 16 kbit mask-programmable complementary metal oxide semiconductor (CMOS) read only memory (ROM) with low power dissipation is introduced. By optimizing storage cell size and ... The compact full custom layout design of a 16 kbit mask-programmable complementary metal oxide semiconductor (CMOS) read only memory (ROM) with low power dissipation is introduced. By optimizing storage cell size and peripheral circuit structure, the ROM has a small area of 0.050 mm2 with a power-delay product of 0.011 pJ/bit at +1.8 V. The high packing density and the excellent power-delay product have been achieved by using SMIC 0.18 μm 1P6M CMOS technology. A novel and simple sense amplifier/driver structure is presented which restores the signal full swing efficiently and reduces the signal rising time by 2.4 ns, as well as the memory access time. The ROM has a fast access time of 8.6 ns. As a consequence, the layout design not only can be embedded into microprocessor system as its program memory, but also can be fabricated individually as ROM ASIC. 展开更多
关键词 complementary metal oxide semiconductor (cmos) technology read only memory (ROM) address decoder sense amplifier
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A Positive Type DVCC-Based Universal Biquad
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作者 Takao Tsukutani Noboru Yabuki 《Journal of Physical Science and Application》 2023年第1期6-8,共3页
This paper presents a current-mode universal biquad employing only positive type DVCCs(differential voltage current conveyors).The circuit enables LP(low-pass),BP(band-pass),HP(high-pass),BS(band-stop)and AP(all-pass)... This paper presents a current-mode universal biquad employing only positive type DVCCs(differential voltage current conveyors).The circuit enables LP(low-pass),BP(band-pass),HP(high-pass),BS(band-stop)and AP(all-pass)responses by the selection and addition of the input and output currents without any component matching constraints.Moreover the circuit parametersω0 and Q can be set orthogonally adjusting the circuit components.A design example is given together with simulation results by PSPICE. 展开更多
关键词 Analogue circuit Biquad characteristic DVCC cmos technology
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