期刊文献+
共找到2篇文章
< 1 >
每页显示 20 50 100
Performance enhancement of CMOS terahertz detector by drain current
1
作者 张行行 纪小丽 +3 位作者 廖轶明 彭静宇 朱晨昕 闫锋 《Chinese Physics B》 SCIE EI CAS CSCD 2017年第9期491-495,共5页
In this paper, we study the effect of the drain current on terahertz detection for Si metal-oxide semiconductor fieldeffect transistors(MOSFETs) both theoretically and experimentally. The analytical model, which is ... In this paper, we study the effect of the drain current on terahertz detection for Si metal-oxide semiconductor fieldeffect transistors(MOSFETs) both theoretically and experimentally. The analytical model, which is based on the smallsignal equivalent circuit of MOSFETs, predicts the significant improvement of the voltage responsivity Rv with the bias current. The experiment on antennas integrated with MOSFETs agrees with the analytical model, but the Rv improvement is accompanied first by a decrease, then an increase of the low-noise equivalent power(NEP) with the applied current. We determine the tradeoff between the low-NEP and high-Rv for the current-biased detectors. As the best-case scenario, we obtained an improvement of about six times in Rv without the cost of a higher NEP. We conclude that the current supply scheme can provide high-quality signal amplification in practical CMOS terahertz detection. 展开更多
关键词 drain current cmos terahertz detectors voltage responsivity noise equivalent power
原文传递
A low-cost infrared absorbing structure for an uncooled infrared detector in a standard CMOS process
2
作者 申宁 唐祯安 +1 位作者 余隽 黄正兴 《Journal of Semiconductors》 EI CAS CSCD 2014年第3期97-101,共5页
This paper introduces a low-cost infrared absorbing structure for an uncooled infrared detector in a standard 0.5 m CMOS technology and post-CMOS process. The infrared absorbing structure can be created by etching the... This paper introduces a low-cost infrared absorbing structure for an uncooled infrared detector in a standard 0.5 m CMOS technology and post-CMOS process. The infrared absorbing structure can be created by etching the surface sacrificial layer after the CMOS fabrication, without any additional lithography and deposition procedures. An uncooled infrared microbolometer is fabricated with the proposed infrared absorbing structure.The microbolometer has a size of 6565 m2and a fill factor of 37.8%. The thermal conductance of the microbolometer is calculated as 1.3310 5W/K from the measured response to different heating currents. The fabricated microbolometer is irradiated by an infrared laser, which is modulated by a mechanical chopper in a frequency range of 10–800 Hz. Measurements show that the thermal time constant is 0.995 ms and the thermal mass is 1.3210 8J/K. The responsivity of the microbolometer is about 3.03104V/W at 10 Hz and the calculated detectivity is 1.4108cm Hz1=2/W. 展开更多
关键词 infrared absorbing structure cmos infrared detectors microbolometer low-cost infrared detectors uncooled infrared detectors
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部