The continued development of CMOS technology and the emergence of new applications demand continued improvement and enhancement of compact models. This paper outlines the recent work of the BSIM project at the Univers...The continued development of CMOS technology and the emergence of new applications demand continued improvement and enhancement of compact models. This paper outlines the recent work of the BSIM project at the University of California, Berkeley,including BSIM5 research, BSIM4 enhancements, and BSIMSOI development. BSIM5 addresses the needs of nano-CMOS technology and RF high-speed CMOS circuit simulation. BSIM4 is a mature industrial standard MOSFET model with several improvements to meet the technology requirements. BSIMSOI is developed into a generic model framework for PD and FD SOI technology. An operation mode choice,via the calculation of the body potential △Vbi and body current/charge,helps circuit designers in the trend of the coexistence of PD and FD devices.展开更多
基于BSIMSOI模型研究了深亚微米级部分耗尽型绝缘体上硅金属氧化物半导体场效应晶体管(PD SOI MOSFET)器件的自加热效应、体接触效应及浮体效应,并提出了PD SOI MOSFET的建模方法及相应的模型参数提取方法。根据上述方法对西安微电子技...基于BSIMSOI模型研究了深亚微米级部分耗尽型绝缘体上硅金属氧化物半导体场效应晶体管(PD SOI MOSFET)器件的自加热效应、体接触效应及浮体效应,并提出了PD SOI MOSFET的建模方法及相应的模型参数提取方法。根据上述方法对西安微电子技术研究所0.35μm工艺条件下的PD SOI器件进行了建模和验证,结果显示所建立的模型与测试数据吻合,表明本文所提方法的准确性及有效性。展开更多
介绍了SOI技术的优势和器件建模的意义.针对0.35μm SOI CMOS工艺的开发,设计了用于建模的测试芯片.对于SOI MOSFET中存在的自加热等寄生效应设计了参数提取的流程,并设计了相应的测试方法.在得到所需的测试数据后,采用局部优化方法进...介绍了SOI技术的优势和器件建模的意义.针对0.35μm SOI CMOS工艺的开发,设计了用于建模的测试芯片.对于SOI MOSFET中存在的自加热等寄生效应设计了参数提取的流程,并设计了相应的测试方法.在得到所需的测试数据后,采用局部优化方法进行参数提取.最后通过模型仿真结果和测试数据的比较证明了建立的0.35μ mSOI CMOS模型有较高的精度.展开更多
文摘The continued development of CMOS technology and the emergence of new applications demand continued improvement and enhancement of compact models. This paper outlines the recent work of the BSIM project at the University of California, Berkeley,including BSIM5 research, BSIM4 enhancements, and BSIMSOI development. BSIM5 addresses the needs of nano-CMOS technology and RF high-speed CMOS circuit simulation. BSIM4 is a mature industrial standard MOSFET model with several improvements to meet the technology requirements. BSIMSOI is developed into a generic model framework for PD and FD SOI technology. An operation mode choice,via the calculation of the body potential △Vbi and body current/charge,helps circuit designers in the trend of the coexistence of PD and FD devices.
文摘基于BSIMSOI模型研究了深亚微米级部分耗尽型绝缘体上硅金属氧化物半导体场效应晶体管(PD SOI MOSFET)器件的自加热效应、体接触效应及浮体效应,并提出了PD SOI MOSFET的建模方法及相应的模型参数提取方法。根据上述方法对西安微电子技术研究所0.35μm工艺条件下的PD SOI器件进行了建模和验证,结果显示所建立的模型与测试数据吻合,表明本文所提方法的准确性及有效性。
