The silicon epitaxial wafter for X band double Read-type DDR IMPATT diodes has been fabricatedby normal-low pressure growth technique. The hyperabrupt impurity profile and very thin p-layer, n-layerwere achieved.
文摘The silicon epitaxial wafter for X band double Read-type DDR IMPATT diodes has been fabricatedby normal-low pressure growth technique. The hyperabrupt impurity profile and very thin p-layer, n-layerwere achieved.
