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Total Ionization Dose Effects on Charge Storage Capability of Al2O3/HfO2/Al2O3-Based Charge Trapping Memory Cell 被引量:1
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作者 Yan-Nan Xu Jin-Shun Bi +5 位作者 Gao-Bo Xu Bo Li Kai Xi Ming Liu Hai-Bin Wang Li Luo 《Chinese Physics Letters》 SCIE CAS CSCD 2018年第11期86-89,共4页
Because of the discrete charge storage mechanism, charge trapping memory(CTM) technique is a good candidate for aerospace and military missions. The total ionization dose(TID) effects on CTM cells with Al2O3/HfO2/... Because of the discrete charge storage mechanism, charge trapping memory(CTM) technique is a good candidate for aerospace and military missions. The total ionization dose(TID) effects on CTM cells with Al2O3/HfO2/Al2O3(AHA) high-k gate stack structure under in-situ 10 keV x-rays are studied. The C-V characteristics at different radiation doses demonstrate that charge stored in the device continues to be leaked away during the irradiation,thereby inducing the shift of flat band voltage(V(fb)). The dc memory window shows insignificant changes, suggesting the existence of good P/E ability. Furthermore, the physical mechanisms of TID induced radiation damages in AHA-based CTM are analyzed. 展开更多
关键词 AHA Total Ionization Dose Effects on Charge Storage capability of al2O3/HfO2/al2O3-Based Charge Trapping Memory Cell al
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